Surface modification of indium tin oxide anode with self-assembled monolayer modified Ag film for improved OLED device characteristics

Modification of electrodes has attracted much attention in the study of organic semiconductor devices. A self-assembled monolayer (SAM) of 4-fluorothiophenol is employed to modify the Ag film on the surface of indium tin oxide (ITO) to improve the hole injection and the surface morphology. The modified anode was characterized by X-ray photoelectron spectroscopy (XPS), atomic force microscope (AFM), and UV–vis transmittance spectra. To investigate the effect of the modification on the device characteristics, typical double layer devices with the structure of anode/-naphthylphenylbiphenyl diamine (NPB, 60 nm)/tris-(8-hydroxyquinoline) aluminum (Alq₃, 60 nm)/LiF(0.7 nm)/Al(100 nm) were fabricated using the modified anode and the bare ITO. The effect of Ag layer thickness on the device performance is also investigated. The results revealed that SAM modified ultra-thin Ag film is an effective buffer layer for organic light emitting diode. The device using the ITO/Ag (5 nm)/SAM as anode show improved device characteristics than that of using bare ITO as anode. The enhancements in luminance and efficiency are attributed to enhanced hole injection and smooth surface between anode and the organic material. The Ag thickness of 5 nm is chosen as an acceptable compromise between substrate transparency and the device performance.     

Enhanced performance of the OLED with plasma treated ITO and plasma polymerized thiophene buffer layer

In this work, indium-tin-oxide (ITO) electrode in organic light emitting device (OLED) was modified by using an O₂ plasma treatment and plasma polymerized thiophene buffer layers were inserted between ITO (anode) and organic layer in order to improve the hole injection efficiency. Furthermore, electron injection to cathode (Al) in the test OLED seemed to be improved due to introduction of quantum well in the cathode. The plasma-polymerized thiophene buffer layer on the O₂ plasma-treated transparent ITO electrode seemed to result in formation of a stable interface and consequently, reduction the hole mobility, which in turn caused enhanced recombination of hole and electron in the emitting layer. Compared with the test device without buffer layer, the turn-on voltage of the test device with the buffer layer was lowered by 1.0 V.     

纳米结构氧化镍缓冲层对蓝色有机发光二极管性能的影响

在阳极和空穴传输层分别引入氧化镍纳米结构缓冲层,制备了蓝色有机发光二极管,对二极管的电学和光学特性进行了测试分析,研究了采用电化学方法制备的氧化镍纳米结构对器件的影响.结果表明,纳米结构氧化镍缓冲层能够有效地提高空穴-电子对的产生和复合效率,它的引入带来了高效的空穴注入及发光层中的载流子平衡,能有效提高有机发光二极管的电致发光特性.氧化镍缓冲层沉积时间为30 s的器件具有最高的亮度和电流效率,分别为42 460 cd/m2和24 cd/A,该器件的CIEx,y 色坐标为(0.212 9,0.325 2).     

PrF3阳极缓冲层对OLED器件性能的影响

使用真空热蒸镀法制备的OLED器件,利用不同厚度的PrF3作阳极缓冲层,并和未加缓冲层的器件进行了对比.实验结果表明:0.5nm厚的PrF3阳极缓冲层可以有效增强OLED器件的空穴注入能力,增强电子和空穴的浓度平衡,优化器件的电致发光特性.器件的最大电流效率为4.9 cd/A,最大亮度为33 600 cd/m2,分别是...     

MoO_3作空穴注入层的有机电致发光器件(英文)

研究了三氧化钼(MoO3)薄层作为有机电致发光器件空穴注入层的器件性能和注入机制。发现1nm厚度下发光器件性能最佳,器件的最大电流效率比对比发光器件的最大电流效率提高1.6倍。器件的电容曲线表明MoO3薄层能有效提高空穴载流子的注入,多数载流子开始注入的拐点大约降低了9V。单空穴载流子电流曲线说明MoO3器件的电流注入是空间电荷受限电流注入机制,MoO3使阳极界面处形成欧姆接触,而对比器件的电流注入是陷阱电荷受限电流注入机制。器件的光伏曲线进一步说明器件性能的提高是由于MoO3层能使阳极界面能级分布发生改变,1nmMoO3厚度下器件的内建电势从对比器件的0.25V提高到了0.8V,有效降低了空穴注入势垒,提高了器件性能,但过厚的MoO3层由于增加了器件的串联内阻,会导致器件性能降低。     

Progress in Modification of Indium-Tin Oxide/Organic Interfaces for Organic Light-Emitting Diodes

The oxide/organic interfaces play crucial roles in the hole injection from the anode electrodes to the emitting organics in organic light-emitting diodes (OLEDs), and hence have strong impacts on the efficiencies and other properties of the devices. Indium-tin oxide (ITO) is currently the most popular anode material used in OLEDs due to several merits, such as good etch ability, good adherence, high transparency, low resistivity, and high work function. Interfacial engineering between the ITO electrode and the overlying organic layers is an important process to obtain the high performance of the diode devices. In this article, recent progress in modification of the ITO/organic interfaces is reviewed, as these interfaces are important to the development of the technologies aiming at improving the electroluminescence, and efficiencies as well as reducing the operation voltages of OLEDs. ITO/Organic interfacial properties can be controlled or modified by simply changing the surface properties of ITO using chemical or physical treatments, and by adding a buffer layer (e.g., metal, oxide, or organic thin films) between the ITO and hole transport or emitting organic layers. The literature data showed that the electroluminescence, efficiencies, and lifetimes of the OLEDs could be greatly increased and the operation voltage considerably decreased when the ITO/organic interfaces have been properly improved.     

Nickel doped indium tin oxide anode and effect on dark spot development of organic light-emitting devices

This article demonstrated that introducing nickel (Ni) atoms into an indium tin oxide (ITO) anode could considerably decrease ITO surface roughness and eliminate the formation of dark spots of an organic light-emitting device (OLED). A dramatic drop in surface roughness from 6.52 nm of an conventional ITO to 0.46 nm of an 50 nm Ni(50 W)-doped ITO anode was observed, and this led to an improved lifetime performance of an Alq3 based OLED device attributed to reduced dark spots. Reducing thickness of Ni-doped ITO anode was found to worsen surface roughness. Meanwhile, the existence of Ni atoms showed little effect on deteriorating the light-emitting mechanism of OLED devices.     

基于器件结构提高TADF-OLED器件的发光性能

为了提高以TADF材料作为主体、天蓝色荧光材料作为客体的混合薄膜的OLED器件光电性能,我们调整了器件结构,使主体材料发挥其优势。制备了基本结构为ITO/NPB(40 nm)/DMAC-DPS∶x%BUBD-1(40 nm)/Bphen(30 nm)/LiF(0.5 nm)/Al的OLED器件。研究了主-客体材料在不同掺杂浓度下的OLED器件的光电特性。为了提高主体材料的利用率,在空穴传输层和发光层之间加入10 nm的DMAC-DPS作为间隔层;然后,在阳极和空穴传输层之间加入HAT-CN作为空穴注入层,形成HAT-CN/NPB结构的PN结,有效降低了器件的启亮电压(2.7 V)。测量了有无HAT-CN的单空穴器件的阻抗谱。结果表明,在最佳掺杂比例(2%)下,器件的外量子效率(EQE)达到4.92%,接近荧光OLED的EQE理论极限值;加入10 nm的DMAC-DPS作为间隔层,使得器件的EQE达到5.37%;HAT-CN/NPB结构的PN结有效地降低了器件的启亮电压(2.7 V),将OLED器件的EQE提高到5.76%;HAT-CN的加入提高了器件的空穴迁移率,降低了单空穴器件的阻抗。TADF材料作为主体材料在提高OLED器件的光电性能方面具有很大的潜力。     

空穴注入层对蓝色有机电致发光器件性能的影响

以DPVBi为发光层,NPB为空穴传输层,在阳极ITO和NPB之间分别插入不同的空穴注入层CuPc和PEDOT:PSS,制备了两种结构的蓝色有机电致发光器件(OLEDs):ITO/CuPc/NPB/DPVBi/BCP/Alq3/Al和ITO/PEDOT:PSS/NPB/DPVBi/BCP/Alq3/Al,研究了不同空穴注入材料对蓝色OLEDs发光性能的影响,并与没有空穴注入层的器件进行了比较.其中CuPc分别采用旋涂和真空蒸镀两种丁艺,比较了不同成膜工艺对器件发光特性的影响.结果表明:加入空穴注入层的器件比没有空穴注入层器件性能要好,其中插入水溶性CuPc的器件,其发光亮度和效率虽然比蒸镀CuPc器件要低,但比插入PEDOT:PSS 器件发光性能要好.又由于水溶性CuPc采用旋涂工艺成膜,与传统CuPc相比,制备工艺简单,所以为一种不错的空穴注入材料.     

高效率的有机电致发光器件

有机电致发光器件 (OL EDs)的发光机理包括电子和空穴从电极的注入、激子的形成及复合发光 ,其中 ,空穴和电子的注入平衡是非常重要的。为了平衡载流子的注入以得到高效率和稳定性好的器件 ,人们不仅使用了电子注入更为有效的 L i F/ Al[1] 和 Cs F/ Al[2 ] 等复合电极 ,同时也使用了空穴缓冲层 ,如 S.A.Van Slyke等 [3]在ITO和 NPB之间使用 Cu Pc,使得器件的稳定性得到了明显的提高 ;A.Gyoutoku等[4 ] 用碳膜使器件的半寿命超过 3 5 0 0小时 ;最近 ,Y.Kurosaka等 [5]和 Z.B.Deng[6 ]分别在 ITO和空穴传输层之间插入一薄层 Al…     

Improved performance of organic light-emitting devices with plasma treated ITO surface and plasma polymerized methyl methacrylate buffer layer

Transparent indium-tin-oxide (ITO) anode surface was modified using O₃ plasma and organic ultra-thin buffer layers were deposited on the ITO surface using 13.56 MHz rf plasma polymerization technique. A plasma polymerized methyl methacrylate (ppMMA) ultra-thin buffer layer was deposited between the ITO anode and hole transporting layer (HTL). The plasma polymerization of the buffer layer was carried out at a homemade capacitively coupled plasma (CCP) equipment. N,N′-Diphenyl-N,N′-bis(3-methylphenyl)-1,1′-diphenyl-4,4′-diamine (TPD) as HTL, Tris(8-hydroxy-quinolinato)aluminum (Alq₃) as both emitting layer (EML)/electron transporting layer (ETL), and aluminum layer as cathode were deposited using thermal evaporation technique. Electroluminescence (EL) efficiency, operating voltage and stability of the organic light-emitting devices (OLEDs) were investigated in order to study the effect of the plasma surface treatment of the ITO anode and role of plasma polymerized methyl methacrylate as an organic ultra-thin buffer layer.     

MoO_3阳极缓冲层对有机太阳电池性能的影响

研究了MoO3阳极缓冲层对基于CuPc/C60异质结的有机小分子太阳电池器件性能的影响。发现:MoO3阳极缓冲层略微降低了器件的短路电流、开路电压及能量转换效率;MoO3阳极缓冲层提高了器件的整流比;具有MoO3阳极缓冲层的器件在持续光照条件下连续工作20min,其主要性能参数(如短路电流、开路电压、填充因子及能量转换效率)无明显衰减,而没有MoO3阳极缓冲层的对比器件在相同条件下连续工作20min,其能量转换效率衰减了大约45%。研究结果表明:MoO3阳极缓冲层明显提高了基于CuPc/C60异质结的有机小分子太阳电池器件的稳定性,可能的原因主要是MoO3阳极缓冲层改善了ITO阳极和CuPc界面,抑制了因持续光照连续工作引起的界面老化,从而提高了器件的稳定性。     

具有Au/MoO_3空穴注入层的有机发光二极管

研究了单层MoO3(5nm)和复合Au(4nm)/MoO3(5nm)HILs对OLEDs器件性能的影响,器件结构为ITO/HIL/NPB(40nm)/Alq3(60nm)/LiF(1nm)/Al(100nm)。与单层MoO3HIL的器件相比,具有复合Au/MoO3HIL的器件具有较大的电流和亮度。这是由于Au的功函数介于ITO和MoO3之间,导致Au的引入提高了空穴的注入效率。     

一种采用Li3N掺杂电子注入层的底发射倒置结构OLED的制备

采用Li3N掺杂电子注入层Alq3∶Li3N,制作了一种结构为ITO/Alq3 Alq3∶Li3N/Alq3/NPB/MoO3/Al的倒置底发射有机发光器件.其中ITO玻璃作为透明阴极,金属Al作为顶部阳极,在ITO阴极与电子传输层之间加入Li3N n型掺杂层,改善了该器件的电子注入和传输能力|在Al阳极与空穴传输层之间加入MoO3缓冲层,降低了Al阳极与NPB之间较大的空穴注入势垒,改善了空穴注入能力.实验表明:此结构的倒置底发射有机发光器件性能可达到传统结构的常用有机发光器件如ITO/NPB/Alq3/LiF/Al的性能,完全可以满足非晶硅薄膜晶体管有源有机发光器件中驱动电路的匹配及性能要求.     

空穴传输层掺杂SrF2的高效率蓝色磷光OLED器件

通过在OLED器件的空穴传输层中掺杂不同比例的SrF2制作出了高效率蓝色磷光OLED器件.这种器件能有效提高蓝色磷光OLED器件的空穴注入与传输特性,降低器件的的工作电压,提高流明效率(19.11m/W)、电流效率(26.9 cd/A)以及亮度(22 220 cd/m2),和未经掺杂的参比器件相比,分别提高了85.4％...     

采用高传导率银铜镍网格电极的柔性聚合物太阳能电池

采用一种新的阳极材料:银、铜、镍的复合金属网格阳极,利用旋涂法制成了活性层为P3HT (poly(3-hexylthiophene)):PCBM([6,6]-phenylC61-butyricacidmethylester)的柔性衬底聚合物太阳能电池.制备了5种不同结构的柔性聚合物太阳能电池器件,将采用新型阳极材料的柔性衬底聚合物太阳能电池与传统ITO(Indium tin oxide)阳极的柔性衬底聚合物太阳能电池进行对比,发现新型阳极材料所制成的器件性能得到大幅度的提高,其电池器件在50 mW/cm~2强度光照下,开路电压(V_(oc))为0.54 V,短路电流密度(J_(sc))为5.39 mA/cm~2,能量转换效率为2.060%.     

Inverted structure perovskite solar cells: A theoretical study

We analysed perovskite CH₃NH₃PbI_3-xCl_x inverted planer structure solar cell with nickel oxide (NiO) and spiro-MeOTAD as hole conductors. This structure is free from electron transport layer. The thickness is optimized for NiO and spiro-MeOTAD hole conducting materials and the devices do not exhibit any significant variation for both hole transport materials. The back metal contact work function is varied for NiO hole conductor and observed that Ni and Co metals may be suitable back contacts for efficient carrier dynamics. The solar photovoltaic response showed a linear decrease in efficiency with increasing temperature. The electron affinity and band gap of transparent conducting oxide and NiO layers are varied to understand their impact on conduction and valence band offsets. A range of suitable band gap and electron affinity values are found essential for efficient device performance.     

利用p型掺杂技术制备的高效有机电致发光器件

利用氧化钼(MoO_x)作为p型掺杂剂,以掺杂层4,4'-bis(carbazol-9-yl)biphenyl(CBP):MoO_x作为空穴注入层,制备了一种结构为ITO/MoO_x/CBP:MoO_x/CBP/CBP:tris(2-phenylpyridine)iridium(III)(Ir(ppy)₃)/4,7-diphenyl-1,10-phenanthroline(Bphen)/LiF/Al的有机电致发光器件.器件中CBP同时作为空穴注入层、空穴传输层以及发光层母体材料,这种结构具有结构简单同时能有效降低空穴注入势垒等优点.研究发现,随着空穴注入层厚度的增加,器件的电流密度增加,表明p型掺杂层的引入能够有效增强空穴的注入;通过优化器件空穴注入层与空穴传输层厚度,器件性能有所提高,最大电流效率为29.8 cd/A,可以认为合理的优化空穴注入层和空穴传输层的厚度,使载流子在发光层中的分布更加平衡是提高器件发光效率的主要原因.值得指出的是,从电流效率最大值到亮度为 20 000 cd/m²时,优化后器件的效率衰减仅为17.7%,而常规器件的效率衰减则为62.1%,优化后器件效率衰减现象得到了明显的改善.分析认为优化后的器件中未掺杂的CBP有助于展宽激子形成区宽度,进而减弱了三线态-三线态湮灭、三线态-极化子淬灭现象,激子形成区的展宽是改善效率衰减的主要原因.     

采用复合空穴注入层提高有机电致发光器件的性能

制备了以Ag/SAM/m-MTDATA为复合空穴注入层的NPB/Alq₃双层异质结发光器件,研究了器件的性能并与传统的器件进行了对比。考察了银膜厚度的变化对器件性能的影响。研究了光谱窄化以及微腔效应对器件的影响。研究结果表明:在ITO表面制备4-FTP自组装单分子膜修饰的5 nm厚的金属银膜,可以在保持阳极透明性的基础上,增强空穴的注入,改善界面的形貌,进而提高器件性能。制备的ITO/Ag/SAM/m-MTDATA/NPB/Alq₃/LiF/Al器件的启亮电压为4 V,最 大电流效率为6.9 cd/A, 最大亮度为34 680 cd/m²(12 V);优于以ITO为阳极的对比器件(25 300 cd/m² @12 V)。     

The enhanced performance of organic light-emitting diodes by using PCBM as the anode modification layer

[6,6]-Phenyl C₆₁ butyric acid methyl ester (PCBM) is used to modify an indium tin oxide (ITO)-coated substrate. Organic light-emitting diodes (OLEDs) using PCBM as the anode modification layer are fabricated. The dependence of performance on different PCBM thicknesses is also investigated. When the thickness of the PCBM film is appropriate, the brightness and efficiency of OLEDs are enhanced, which is attributed to an enhanced hole injection and an improved carrier balance. The enhancement of hole injection was ascribed to the formation of a dipole layer at the anode/organic interface.