Metal-insulator transition in SrTiO(3-x) thin films induced by frozen-out carriers

We report optical, electrical and magnetotransport properties of oxygen deficient SrTiO(3) (SrTiO(3-x)) thin films fabricated by pulsed laser deposition technique. The oxygen vacancies (O(vac)) in the thin film are expected to be uniform. By comparing its electrical properties to those of bulk SrTiO(3-x), it was found that O(vac) in bulk SrTiO(3-x) is far from uniform over the whole material. The metal-insulator transition (MIT) observed in the SrTiO(3-x) film was found to be induced by the carrier freeze-out effect. The low temperature frozen state can be reexcited by Joule heating, electric and intriguingly magnetic field.     

High-quality epitaxial LaNiO3 thin films on SrTiO3(100) and LaAlO3(100)

LaNiO₃ thin films have been deposited by pulsed laser deposition on SrTiO₃(100) and LaAlO₃(100) substrates. The processing conditions have been investigated in order to optimize electrical resistivity, crystal quality, and surface morphology. Excellent properties are achieved at moderate substrate temperature and relatively low oxygen pressure, without the need for annealing. Thickness exerts an important influence on electrical transport, as the electrical resistivity increases quickly in films thicker than a few tens of nanometer. The surface of the films on LaAlO₃ is very flat in all the studied thickness range, but the films on SrTiO₃ develop a pattern of boundaries and even cracks as the thickness is higher. Below the critical thickness, high-quality epitaxial films with very smooth surface and low electrical resistivity are obtained under the optimum conditions of substrate temperature and oxygen pressure. The optimum processing conditions are different depending on the substrate, and control is especially critical in films deposited on SrTiO₃.     

Anomalous strain effect in heteroepitaxial SrRuO3 films on (111) SrTiO3 substrates

We report comprehensive investigations into the structure of high-quality (111)-oriented SrRuO₃ films on SrTiO₃ substrates to elucidate the effect of (111) heteroepitaxial strain. We found that SrRuO₃ film with a thickness of ～ 40 nm is compressively strained in plane on the substrate with full coherency. Nevertheless, the out-of-plane spacing is almost the same as in the bulk, which is at odds with the conventional paradigm. By probing a series of half-order Bragg reflections using synchrotron-based x-ray diffraction combined with analyses of the scanning transmission electron microscopy images, we discovered that the heteroepitaxial strain is accommodated via significant suppression of the degree of c⁺ octahedral tilting and the formation of three equivalent domain structures on the (111) SrTiO₃ substrate. This anomalous effect sheds light on the understanding of an unconventional paradigm of film-substrate coupling for the (111) heteroepitaxial strain.     

Structure of SrTiO3 films on Si

The epitaxial deposition of oxides on silicon opens the possibility of incorporating their diverse properties into silicon-device technology. Deposition of SrTiO(3) on silicon was first reported over a decade ago, but growing the coherent, lattice-matched films that are critical for many applications has been difficult for thicknesses beyond 5 unit cells. Using a combination of density functional calculations and x-ray diffraction measurements, we determine the atomic structure of coherent SrTiO(3) films on silicon, finding that the Sr concentration at the interface varies with the film thickness. The structures with the lowest computed energies best match the x-ray diffraction. During growth, Sr diffuses from the interface to the surface of the film; the increasing difficulty of Sr diffusion with film thickness may cause the disorder seen in thicker films. The identification of this unique thickness-dependent interfacial structure opens the possibility of modifying the interface to improve the thickness and quality of metal oxide films on silicon.     

SrTiO3(110) thin films grown directly on different oriented silicon substrates

We have grown (110)-oriented SrTiO₃ (STO) thin films on silicon without any buffer layer, by means of pulsed laser deposition technique. The crystal structures of the grown films were examined by X-ray diffraction analysis including θ–2θ scan and rocking curve as well as Laue diffraction methods. STO films with single (110) out-of-plane orientation were formed on all (100), (110) and (111)-oriented Si substrates. The in-plane alignments for the epitaxial STO films grown directly on Si (100) were found as STO[001]//Si[001] and STO[11̄0]//Si[010]. The results should be of interest for better understanding of the growth of perovskite oxide thin films on silicon wafers. PACS 77.55.+f; 68.55.JK; 81.15Fg     

Crystal structure of (La,Ca)MnO3 ultrathin films deposited on SrTiO3 substrates

Epitaxial La_1?x Ca _x MnO₃ (x???0.33) ultrathin films with thickness between 3 and 6?nm have been grown on (001) SrTiO₃ substrates by sputter deposition. The films do not exhibit an insulator-metal transition as a function of temperature, which is normal in thicker films. High-resolution transmission electron microscopy and electron diffraction were used to investigate the crystal structure. It was found that the films grow coherently on the substrates and are perfectly crystalline. Their crystal structure was determined to be a body-centred orthorhombic structure with space group Imma, instead of the orthorhombic Pnma bulk structure. This structure change is probably responsible for the insulating property of the films.     

Phase transitions in adsorbed films of barium on W(011)

Phase transitions in barium submonolayers adsorbed on W(011) are studied in a wide range of temperatures and coverages by the LEED technique, including the temperature measurement of the diffraction intensity. The regions of ordered and disordered structures are determined, the result is presented in the form of phase diagram. The temperature dependence of the adfilm Bragg intensity in the low temperature limit (the lowest temperature is 5 K) shows an appreciable slope for all incoherent and almost all coherent structures, except for (3×2). The fact is discussed in terms of the adfilm long- and quasi-long-range order. The disordering of the (3 × 2) lattice near T_c=130 K is the second-order phase transition with the order parameter critical exponent β=0.16. the adfilm is two-phase in the range n=(3.2?3.8)×10¹⁴cm^?2 and singlehase for the rest of the coverages. The effect of the first-order phase transition on the character of the work function change in the two-phase region is discussed.     

Studies of threading dislocations in Nb(011) films

We obtain strain contrast in low-energy electron microscopy, by dark-field imaging of the strain-sensitive variants of a surface reconstruction. This is employed to make visible the strain fields of dislocations in Nb(011) thin single-crystal films. The strain field symmetries reveal the dislocation Burgers vectors and identify the existence of [111] a /2 and [100] a Burgers vectors for threading dislocations in these epitaxial materials. The contrast also allows interfacial and screw dislocations to be imaged.     

Polar dependent in-plane electric transport of epitaxial ZnO thin films on SrTiO(3) substrates

Polar (001) and nonpolar (110) ZnO epitaxial thin films were grown on SrTiO(3) substrates by the pulsed laser deposition method and the in-plane electric transport was investigated. Both films display semiconducting behavior. The polar thin films have linear I-V relations with mobility increasing almost linearly with temperature. In contrast, for nonpolar ZnO thin films, the I-V curves are symmetric and nonlinear with room temperature resistivity 30 times larger than that of polar thin films. We conclude that in nonpolar ZnO thin films the bound polarization charge induced barrier limits the carrier transport. Instead, for polar thin films, the polar effect on the in-plane transport is negligible, and the charged dislocation scattering is dominant. Our observations suggest the polar effect should be considered in the design of ZnO related devices.     

Morphology and microstructure of all-epitaxial ferroelectric tri-layered (Bi,La)4Ti3O12/Pb(Zr0.4Ti0.6)O3/ (Bi,La)4Ti3O12 thin films on SrTiO3(011)

The morphology and microstructure of all-epitaxial (Bi,La)₄Ti₃O₁₂/Pb(Zr_0.4Ti_0.6)O₃/(Bi,La)₄Ti₃O₁₂ (BLT/PZT/BLT) tri-layered ferroelectric films, grown on (011)-oriented SrTiO₃ (STO) substrates by pulsed laser deposition, are investigated by transmission electron microscopy (TEM). X-ray diffraction and electron diffraction patterns demonstrate that the epitaxial relationship between BLT, PZT and STO can be described as ; . Cross-sectional TEM images show that the growth rate of BLT is nearly two times that for PZT at the same growth conditions, and 90° ferroelectric domain boundaries lying on {110} planes are observed in the PZT layer. The 90° ferroelectric domains in the PZT layer extend up to 600 nm in length. Long domains penetrate into the neighboring columnar grain through the columnar grain boundary, whereas others are nucleating at the columnar grain boundaries. The roughness of the PZT/BLT interfaces appears to depend on the viewing direction, i.e., it is different for different azimuthal directions. Planar TEM investigations show that the grains in the top BLT layer have a rod-like morphology, preferentially growing along the [110]_BLT direction. The grain width is rather constant at about 90 nm, whereas the length of the grains varies from 150 to 625 nm. These morphological details point to the important role the crystal anisotropy of BLT plays for the growth and structure of the tri-layered films. PACS 81.15-z; 68.37.Lp; 77.84.-s     

Growth of InN films on (1 1 1)GaAs substrates by reactive magnetron sputtering

Indium nitride (InN) films were grown on (1 1 1)GaAs substrates by reactive magnetron sputtering using an indium target. It was found that the crystal quality of InN films depends strongly on the substrate temperature and sputtering gas pressure, and highly c-axis preferred wurtzite InN films can be obtained at growth temperature as low as 100°C. Based on these results, the growth mechanism of InN films in the reactive magnetron sputtering was discussed.     

Bimodal growth of Au on SrTiO3(001)

We have investigated the vapor phase growth of Au on SrTiO3(001)-(2 x 1) substrates by UHV scanning tunneling microscopy. Submonolayer (ML) coverages below 300 degrees C wet the surface as disordered metastable 2D islands. Beyond 0.75 ML fcc nanocrystals with a (111) interface are nucleated and ripen by dewetting the surrounding layer. Some multiply twinned fivefold symmetric clusters are also created. Above 400 degrees C dewetting occurs for all coverages and the surface is only populated by nanocrystals and fivefold clusters. A planar ground state configuration for small Au clusters and a higher interface energy for crystals than for wetted 2D ML films explains these results.     

In-situ imaging of the nucleation and growth of epitaxial anatase TiO2(001) films on SrTiO3(001)

The growth of TiO₂ anatase films on Nb‐doped SrTiO₃(001) molecular beam epitaxy has been studied in-situ by scanning tunneling microscopy. We show that the initial growth follows the Stranski–Krastanov mode, where islands form on top of a wetting layer consisting of two monolayers (ML) of TiO₂. The epitaxial islands subsequently nucleate and coalesce into large commonly oriented crystallites. The reconstruction observed by reflection high-energy electron diffraction (RHEED) is shown to result from the coexistence of individual (4 × 1) and (1 × 4) reconstructions present on different crystallite surfaces. The anatase grows in units of bilayers, resulting in a step height of 2 ML (~ 0.5 nm). This result explains the fact that the measured period of the RHEED specular-beam intensity oscillations corresponds to the time required for deposition of 2 ML. Ar ion sputtering and UHV annealing results in a transformation to coexisting (4 × 1) and (1 × 4) reconstructed terraces on individual crystallites, as commonly observed by ex-situ STM studies.     

Surface morphology and surface chemical states of epitaxial Pb(Zr0.95Ti0.05)O3 thin films grown on SrTiO3(100) by sputter deposition

0.95 Ti_0.05)O₃ thin films of an orthorhombic perovskite structure were obtained on SrTiO₃(100) substrates by radio frequency sputter deposition. The surface morphology of the films was investigated with atomic force microscopy, scanning electron microscopy, and reflection electron microscopy. It is shown that the film surfaces are rather bumpy. There are undulations of about 400 nm in length in an in-plane direction. The mean roughness perpendicular to the surface is 39.6 nm, for the film thickness of 0.45 μm. The surface roughening was probably caused by island-shaped nucleation and growth during the film growth. It has also been found that some gorges and a number of small pits remain at the film surfaces. The surface chemical states of the films were characterized by using X-ray photoelectron spectroscopy. A Pb enrichment layer and a large amount of adsorbed oxygen have been found at the surfaces of the films. Near the film surface Pb and Zr exist mainly in the forms of, besides Pb(Zr,Ti)0₃, metal Pb, metal Zr, oxygen-chemisorbed Pb, and various lead oxides. In addition, a small amount of lead, whose binding energy of Pb 4f_7/2 is much lower than that of metal Pb, was observed at the film surfaces, but its chemical state is unknown up to now. Received: 2 June 1997/Accepted: 22 September 1997     

Growth of SrTiO3 on Si(001) by hybrid molecular beam epitaxy

We report the heteroepitaxial growth of SrTiO₃ thin films on Si(001) by hybrid molecular beam epitaxy (hMBE). Here, elemental strontium and the metal‐organic precursor titanium tetraisopropoxide (TTIP) were co‐supplied in the absence of additional oxygen. The carbonization of pristine Si surfaces during native oxide removal was avoided by freshly evaporating Sr into the hMBE reactor prior to loading samples. Nucleation, growth and crystallization behavior as well a structural properties and film surfaces were characterized for a series of 46‐nm‐thick SrTiO₃ films grown with varying Sr to TTIP fluxes to study the effect of non‐stoichiometric growth conditions on film lattice parameter and surface morphology. High quality SrTiO₃ thin films with epitaxial relationship (001)SrTiO₃ || (001)Si and [110]SrTiO₃ || [100]Si were demonstrated with an amorphous layer of around 4 nm thickness formed at the SrTiO₃/Si interface. The successful growth of high quality SrTiO₃ thin films with atomically smooth surfaces using a thin film technique with scalable growth rates provides a promising route towards heterogeneous integration of functional oxides on Si. (© 2014 WILEY‐VCH Verlag GmbH &Co. KGaA, Weinheim)     

Growth of InN films on spinel substrates by pulsed laser deposition

We have grown InN films on MgAl₂O₄(111) substrates with atomically flat surfaces using pulsed laser deposition (PLD) and compared their structural properties with those grown on (Mn,Zn)Fe₂O₄(111) substrates. It has been revealed that InN(0001) films grow on MgAl₂O₄(111) with an in‐plane epitaxial relationship of InN[1 00] // MgAl₂O₄[1 0], achieving a lattice mismatch minimum. The InN films exhibited a clear sixfold rotational symmetry, without 30° rotational domains and with a full width at half maximum value of the InN 0002 rocking curve being 17.5 arcmin. Comparison between InN films grown on MgAl₂O₄ and those on (Mn,Zn)Fe₂O₄ led us to conclude that suppression of the interfacial reactions between the InN films and the substrate is inherently important to obtain high quality InN on substrates with a spinel structure. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Absence of traditional magnetoresistivity mechanisms in Sr(2)FeMoO(6) thin films grown on SrTiO(3), MgO and NdGaO(3) substrates

Magnetoresistive double perovskite Sr(2)FeMoO(6) thin films were grown with two different deposition pressures on SrTiO(3), MgO and NdGaO(3) substrates by pulsed laser deposition and thorough structural, magnetic and magneto-transport characterization was made. According to x-ray diffraction, all the films were phase pure and fully textured. Indication of substrate dependent strain and low angle grain boundaries was found, especially in films on MgO. Both the deposition pressure and the choice of the substrate have a strong influence on the saturation magnetization, M(s), and Curie temperature, T(C). The structural and magnetic data indicate the presence of anti-site disorder (ASD) in the films. The temperature dependence of resistivity showed semiconductive behaviour at temperatures below 100 K and metallic behaviour at higher temperatures. The semiconductive behaviour was found to increase with increasing ASD. In good quality films, up to 12% negative magnetoresistance (MR) was observed and films grown on MgO and NGO substrates also showed low field MR. However, the most significant observation of this study was that the magnetoresistivity of these Sr(2)FeMoO(6) thin films could not be explained with any traditional MR mechanism, but carried the clear signature of superposition of different mechanisms, in particular low angle grain boundary tunnelling and suppression of antiferromagnetically ordered domains under a magnetic field.     

Magnetoresistance anisotropy of strontium ruthenate films grown coherently on a TiO2-terminated SrTiO3(001) substrate

The SrRuO₃ films with a thickness of 80 nm have been coherently grown on a TiO₂-terminated SrTiO₃(001) substrate. Biaxial mechanical stresses induce a considerable difference between the unit cell parameters of the SrRuO₃ layer in the substrate plane (??3.904 ?) and along the normal to the substrate surface (??3.952 ?). The electrical resistivity of the SrRuO3 film decreases practically linearly with increasing magnetic field strength H when the latter is parallel to the current I _b and the projection of the easy magnetization axis in the substrate plane. At T = 4.2 K, ??₀ H = 14 T, and the magnetic field oriented along the hard magnetization axis, the negative anisotropic magnetoresistance of the grown layers reaches 16% and exerts a notice-able effect on the response of electrical resistivity of the SrRuO₃ film to the magnetic field.     

Possible transition from space-charge-limited to injection-limited conduction in poly(3-hexylthiophene) thin films

Two-terminal thin films of poly(3-hexylthiophene) (P3HT) with a wide electrode separation (150 m) has been studied using current-voltage characteristics at different temperatures. Space-charge-limited conduction (SCLC) with high injection barriers (1.3 eV) has been observed at all temperatures in the low electric field regime. A possible transition from SCLC to injection-limited conduction (ILC) is reported. The experimental results have been compared with the disorder-controlled injection model proposed by Arkhipov et al. [V.I. Arkhipov, H. von Seggern, E.V. Emilianova, Appl. Phys. Lett. 83 (2003) 5074; V.I. Arkhipov, E.V. Emilianova, Y.-H. Tak, H. Bässler, J. Appl. Phys. 84 (1998) 848; V.I. Arkhipov, U. Wolf, H. Bässler, Phys. Rev. B 59 (1999) 7514].