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1.
Poly(tetrafluoroethylene) (PTFE) surfaces are modified with remote and direct Ar plasma, and the effects of the modification on the hydrophilicity of PTFE are investigated. The surface microstructures and compositions of the PTFE film were characterized with the goniometer, scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). Results show that the remote and direct plasma treatments modify the PTFE surface in morphology and composition, and both modifications cause surface oxidation of PTFE films, in the forming of some polar functional groups enhancing polymer wettability. When the remote and direct Ar plasma treats PTFE film, the contact angles decrease from the untreated 108-58° and 65.2°, respectively. The effect of the remote Ar plasma is more noticeable. The role of all kinds of active species, e.g. electrons, ions and free radicals involved in plasma surface modification is further evaluated. This shows that remote Ar plasma can restrain the ion and electron etching reaction and enhance radical reaction.  相似文献   

2.
Wood/polyethylene (PE) composites are widely used in many fields for its excellent properties, but they are hard to adhere for the surface lacking of polarity. So low-pressure glow discharge of air plasma was used to improve the adhesion properties of wood/PE composites. The composites were treated by plasma under different discharge power. And the changes on the surface properties of the treated and untreated composites were studied by contact angle, Fourier transform infrared spectroscopy (FTIR), scanning electron microscope (SEM), atomic force microscope (AFM) and X-ray photoelectron spectroscopy (XPS) analysis. The measurement showed that the contact angle decreased after plasma treatment, and the contact angle decreased gradually with the increasing of discharge power. The FTIR analysis results showed that the polar groups such as hydroxyl, carbonyl and carboxyl were formed on the surface of the composites treated under plasma. SEM and AFM results showed that the roughness of plasma treated samples increased. XPS analysis results indicated that the content of carbon element decreased while the content of oxygen element in the composition of wood/PE composites surface element increased and it reached a balance in a higher power, meanwhile a lot of carboxyl groups were formed. The newly formed polar groups are benefit for the adhesion of composites. The shear bonding strength test showed that the adhesion properties of wood/PE composites improved effectively after plasma treatment.  相似文献   

3.
Fluorination plasma treatments at atmospheric pressure were used to modify the surface composition of EPDM elastomer. In this study, two different precursors (CF4 and SF6) and two carrier gases (He and Ar) were used for the surface modification of EPDM elastomer. The surface modifications were studied by means of X-ray photoelectron spectroscopy. We have observed a strong influence of the gas selection on the extent of the surface modification induced with these treatments. In general terms, the use of CF4 generates a higher concentration of fluorine in the elastomer surface. On the other hand, the use of He as carrier gas also increases the effectiveness of the modification process. The fluorine uptake varies between 2 and 13%, although the formation of fluorine-containing functional groups was detected when the amount of fluorine on the surface exceeded 7%. After all treatments, an important oxygen uptake was observed, with amounts three or four times higher than the untreated elastomer.  相似文献   

4.
The formation of a passivation film (solid electrolyte interphase, SEI) at the surface of the negative electrode of full LiCoO2/graphite lithium-ion cells using different salts (LiBF4, LiPF6, LiTFSI, LiBETI) in carbonate solvents as electrolyte was investigated by X-ray photoelectron spectroscopy (XPS). The analyzes were carried out at different potential stages of the first cycle, showing the potential-dependent character of the surface film species formation and the specificity of each salt. At 3.8 V, for all salts, we have mainly identified carbonated species. Beyond this potential, the specific behavior of LiPF6 was identified with a high LiF deposit, whereas for other salts, the formation process of the SEI appears controlled by the solvent decomposition of the electrolyte.  相似文献   

5.
The characterization of the “native” surface thin film on pure polycrystalline iron has been studied by high resolution X-ray photoelectron (XP) spectroscopy of Fe 2p and O 1s regions. The film was allowed to form by exposing the sample to atmosphere at ambient conditions for a period of 1 h. The systematic approach used here includes the determination of curve fitting parameters from external standards and their use in fitting the raw data for the surface thin film. The quantitative high resolution XPS analysis involved an angle resolved study of the surface to determine the chemical composition and thickness of this native film. The film was found to be a mixture of Fe3O4 and Fe(OH)2 with a thickness of 1.2 ± 0.3 nm. This conclusion is consistent with thermodynamics as indicated by the Pourbaix diagram for the Fe-H2O system and the phase diagram for the Fe-oxygen system. A detailed TEM study of the native surface film also supports this conclusion.  相似文献   

6.
《Current Applied Physics》2015,15(3):183-189
Transformer-coupled toroidal plasma (TCTP) has found applications in versatile fields as a high-power-density plasma source. However, most research on TCTP has focused on plasma states in the TCTP, without any change in reactor structures. Therefore, in this paper, we present a study on the effects of inner-surface modification of a TCTP reactor on plasma conditions. Using two types of reactors with different inner surfaces, the silicon-wafer etch rate by fluorine atoms from dissociated NF3 gas molecules is compared. Then a computer simulation, which derives various plasma parameters, is carried out. As a result, the TCTP reactor with a grooved inner surface shows a higher etch rate than the reactor with a normal inner surface. The computer simulation suggests the reason for this etch rate difference is that the reactor with the grooved inner surface structure has a higher neutral gas temperature than the reactor with the normal inner surface so that more pyrolytic dissociation, resulting in a higher fluorine atom density, is achieved. Our results may be useful for those fields that require a higher neutral temperature or a higher degree of pyrolysis.  相似文献   

7.
A new preparing technology, very high frequency plasma assisted reactive thermal chemical vapour deposition (VHFPA-RTCVD), is introduced to prepare SiGe:H thin films on substrate kept at a lower temperature. In the previous work, reactive thermal chemical vapour deposition (I~TCVD) technology was successfully used to prepare SiGe:H thin films, but the temperature of the substrate needed to exceed 400℃. In this work, very high frequency plasma method is used to assist RTCVD technology in reducing the temperature of substrate by largely enhancing the temperature of reacting gases on the surface of the substrate. The growth rate, structural properties, surface morphology, photo- conductivity and dark-conductivity of SiGe:H thin films prepared by this new technology are investigated for films with different germanium concentrations, and the experimental results are discussed.  相似文献   

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