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Andreas C. Fischer Lyubov M. Belova Yuri G. M. Rikers B. Gunnar Malm Henry H. Radamson Mohammadreza Kolahdouz Kristinn B. Gylfason Göran Stemme Frank Niklaus 《Advanced functional materials》2012,22(19):4004-4008
A method for additive layer‐by‐layer fabrication of arbitrarily shaped 3D silicon micro‐ and nanostructures is reported. The fabrication is based on alternating steps of chemical vapor deposition of silicon and local implantation of gallium ions by focused ion beam (FIB) writing. In a final step, the defined 3D structures are formed by etching the silicon in potassium hydroxide (KOH), in which the local ion implantation provides the etching selectivity. The method is demonstrated by fabricating 3D structures made of two and three silicon layers, including suspended beams that are 40 nm thick, 500 nm wide, and 4 μm long, and patterned lines that are 33 nm wide. 相似文献
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Graphene: Synthesis of Layer‐Tunable Graphene: A Combined Kinetic Implantation and Thermal Ejection Approach (Adv. Funct. Mater. 24/2015) 下载免费PDF全文
Gang Wang Miao Zhang Su Liu Xiaoming Xie Guqiao Ding Yongqiang Wang Paul K. Chu Heng Gao Wei Ren Qinghong Yuan Peihong Zhang Xi Wang Zengfeng Di 《Advanced functional materials》2015,25(24):3796-3796
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Sodium‐Ion Batteries: An Integrated Free‐Standing Flexible Electrode with Holey‐Structured 2D Bimetallic Phosphide Nanosheets for Sodium‐Ion Batteries (Adv. Funct. Mater. 26/2018) 下载免费PDF全文
Xiao‐Wei Wang Hai‐Peng Guo Ji Liang Jia‐Feng Zhang Bao Zhang Jia‐Zhao Wang Wen‐Bin Luo Hua‐Kun Liu Shi‐Xue Dou 《Advanced functional materials》2018,28(26)
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Jason L. Goldman Brandon R. Long Andrew A. Gewirth Ralph G. Nuzzo 《Advanced functional materials》2011,21(13):2411-2411
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Yuanhua Xiao Shaojun Liu Feng Li Aiqin Zhang Jihong Zhao Shaoming Fang Dianzhen Jia 《Advanced functional materials》2012,22(19):4051-4051
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