高折射率聚合物-无机纳米光学杂化材料的设计与制备及其应用

传统的高折射率聚合物光学材料,可以通过向聚合物中引入一些芳香环,含硫基团以及除氟以外的其他卤素原子来提高聚合物光学材料的折射率,但是就目前的研究现状来看,这类纯聚合物光学材料的折射率一般都低于1.8.而将具有高折射率的无机纳米粒子引入到聚合物中,所制备的聚合物-无机纳米光学材料的折射率能够达到1.8以上.而且这类高折射率聚合物-无机纳米光学杂化材料同时具有高分子光学材料和无机材料的双重优点,具有广泛的应用前景.鉴于当前高折射率聚合物-无机纳米光学杂化材料发展之迅速和其研究与开发的重要性,并结合目前国内外的研究现状,本文就高折射率聚合物-无机纳米光学杂化材料的设计、制备方法及其相关应用做一个比较系统的介绍,同时对这类材料在未来研究中所应注意的问题也提出了相应的看法.     

梯度折射率聚合物细棒的制备和数学模拟

在聚甲基丙烯酸甲酯 (Poly(methylmethacrylate) ,PMMA)管中 ,加入单体甲基丙烯酸甲酯 (Methylmethacrylate ,MMA)和另一种高折射率的掺杂剂溴苯 (Bromobenzene ,BB) ,用界面凝胶均聚合方法制备了梯度折射率聚合物光纤预制棒 .这种光纤预制棒的梯度折射率是通过具有不同折射率的分子扩散而形成的 .通过对界面凝胶聚合过程的描述 ,该工作讨论了预制棒中聚合物的浓度分布及边界条件的假设 .并根据自由体积理论对其折射率分布进行理论模拟 .将得到的折射率抛物线分布与实验结果进行对比 ,结果表明聚合浓度的分布为ω =a(r/R) 2 +b时 ,理论预计的光纤预制棒的折射率分布与实验结果有着较好的符合 .同时 ,对聚合体系中BB对聚合物浓度分布的影响进行了讨论     

含氟丙烯酸酯光致聚合物的全息特性研究

提高记录单体在成膜物中的迁移速率,加大记录单体与成膜物的折射率差,可以实现光致聚合物的折射率空间调制最大化.本工作以高折射率的超支化聚酯(折射率1.586)为成膜树脂,利用超支化聚合物分子结构疏松、便于小分子在其间扩散的特性,同时以低折射率的单官能团含氟丙烯酸酯(折射率1.372)和高活性的双官能团丙烯酸酯(折射率1.457)为记录单体制备了光致聚合物全息膜,以衍射效率为指标优化单体构成和全息膜的厚度,研究了该全息膜的衍射效率、空间分辨率、折射率调制度等性能.该光致聚合物全息材料的折射率调制度为4.82×10^-3,衍射效率达到99.4%,在空间分辨率3750 lp/mm的衍射效率仍然达到85.6%,感光灵敏度56 mJ/cm².     

梯度型聚合物光纤中折射率分布的洛仑兹函数模型应用

利用洛仑兹函数对梯度型聚合物光纤(棒)中折射率分布曲线进行模拟,建立折射率分布的洛仑兹函数模型.该模型只需掺杂物的初始浓度、分子体积和聚合温度3个基本参数.利用该模型对各种高折射率的掺杂物掺杂聚甲基丙烯酸甲酯(PMMA)制备的梯度型聚合物光纤中的折射率分布进行了预测,发现掺杂物的折射率比分子体积对折射率梯度的影响更大;惰性掺杂物中二苯硫(DPS)掺杂效率最高;共聚掺杂物中苯甲酸乙烯酯(VB)掺杂效率最高.     

傅里叶变换表面等离子体共振频率对金膜表面溶液折射率响应

采用新型傅里叶变换表面等离子体共振仪（FT-SPR）,测定了NaCl、KCl和乙醇3种水溶液在不同浓度下的SPR响应值,建立了SPR响应与溶液浓度和折射率之间的定量关系R=1.53×105(n -1.3333),测定了FT-SPR 100型仪器的折射率响应常数m=1.53×105,即液体折射率每变化0.000 1,FT-SPR响应值变化为15 cm-1。 其结果为用FT-SPR直接测定液体样品的折射率提供了可能。     

可交联聚甲基丙烯酸甲酯的合成、表征及在阵列式波导光栅中的应用

合成了含环氧基团的可交联的甲基丙烯酸甲酯和甲基丙烯酸环氧丙酯的共聚物[Poly(MMA-co-GMA)],通过FTIR,NMR,GPC,DSC和AFM等技术对其进行了表征. 结果表明,所合成的聚合物材料具有较好的成膜性; 通过热固化使引入的环氧基团开环交联,该聚合物的玻璃化转变温度(Tg)比固化前提高了24 K,同时有效地降低了聚合物的双折射率. 用Poly(MMA-co-GMA)作为包层材料,双酚A型环氧化合物作为高折射率材料, 将其引入到包层材料中形成芯层材料的折射率在波长1.55 μm处可调,其范围是1.483~1.588. 采用旋涂、 铝掩膜和氧反应离子刻蚀的方法(RIE)制得了阵列式光波导. 测试结果表明,制作的波导在1.55 μm处实现了光的单模传输,光损小于3.0 dB/cm.      

光漂白全过程中聚合物薄膜折射率和厚度的实时分析

在基于衰减全反射原理的基础上提出一种新的测量方法, 动态研究漂白动力学过程, 即利用波导的衰减全反射吸收峰对聚合物材料的折射率和厚度敏感的特性, 实时测量聚合物材料的折射率和厚度. 实验系统采用CCD摄像头将标志波导模式的一组暗线显示在计算机屏幕上, 然后根据暗线的移动, 可以精确测量每一时刻波导薄膜的折射率和膜厚. 利用这种技术, 对聚合物薄膜的光漂白过程进行了实时监控. 发现在光漂白全过程中, 聚合物薄膜的折射率和厚度的变化同时存在化学和物理两种变化过程.     

用氟离子选择电极方法测定四氟乙烯与全氟[3,6-二氧杂4-甲基-△~7辛基磺酰氟]共聚物的交换容量

分析四氟乙烯与全氟[3,6-二氧杂4-甲基-△~7辛基磺酰氟]共聚物(简称QF-1)的组成,一般是先将此共聚物在氢氧化钠中水解,使磺酰氟基团变为磺酸钠,然后用盐酸转型为磺酸,再用氯化钠溶液进行交换,用标准碱溶液滴定。这个方法是按离子交换膜测定交换容量(IEC)的方法求得聚合物的当量值,从而得知其组成,但步骤较多。为了减少滴定的误差,聚合物用量也较多,一般需在0.5克以上。考虑到QFeel中除磺酞氟以外的氟原子对碱均很稳定。在水解时只发生下列反应.R,一50:F ZNaOH一)一一今R,一50必Na NaF H:O因而氟离子和磺酸基是等当量的.测定该聚合物碱水解液中的氟离子量,即可知交换当量.粉状树脂不需加工成膜,即可作为试样进行测定,操作简便。又由于氟离子选择电极灵敏度很高,     

分离和精制

89.苯酚-水-丁酮三元系统相平衡Ⅱ1956,30,№ 2,305)——本文包括三个部分:1.配制了许多已知组成的苯酚-水-丁酮三元混合物,在45°测定这些混合物的比重和折射率.用三角坐标图表示出三元混合物的组成和恒比重、恒折射率的关系.2.测定了在25°和45°两个恒定温     

聚合物与纳米晶的杂化及性能优化

聚合物-纳米晶杂化材料因结合了有机和无机材料的优点而逐渐地受到了人们普遍的关注,聚合物为纳米晶的形成与生长提供了优良的环境,纳米晶的引入同样也增加和强化了聚合物的功能特性.如聚硫代氨基甲酸酯与TiO2杂化的高折射率薄膜,该薄膜不仅保持了原有的性能,而且有较高的折射率.此外,还有许多不同纳米粒子与不同聚合物的杂化体系.如...     

Quantitative characterization of the optical properties of absorbing polymer films: Comparative investigation of the internal reflection intensity analysis method

Nondestructive, three‐dimensional refractive‐index measurements are used for the determination of both the crystallinity and orientation in thin polymer films. The prism wave‐guide coupler is particularly suited for three‐dimensional isotropic and anisotropic thin‐film studies because of the quantitative character of the information obtained and the ease of data acquisition. It has been limited, however, to determining only the refractive index of transparent or weakly absorbing thin‐film samples. On the basis of thin‐film optics, this study develops a new internal reflection intensity analysis (IRIA) method, which uses the intensity information rather than the conventional mode angle values to acquire both the refractive index and the extinction coefficient over a range of transparent to highly absorbing polymer films. Therefore, the IRIA method overcomes the limitations of this prism wave‐guide coupler technique, which can only measure the refractive index of a weakly absorbing sample. With a Metricon PC‐2010 as the skeletal framework, a prototype instrument has been developed to apply and test the IRIA method. A study comparing both the refractive index and extinction coefficient obtained with ellipsometry, ultraviolet–visible/near‐infrared reflectometry, and IRIA for solvent blue 59 dyed polystyrene films confirms that the IRIA method is effective for obtaining the three‐dimensional refractive indices and extinction coefficients of polymer films. In addition, the refractive index and extinction coefficient spectrum (400–800 nm) of solvent blue 59 have been determined with the effective media theory. Furthermore, the three‐dimensional complex refractive indices of highly absorbing black electrical tape, inaccessible to other optical measurement because of its surface character, has been determined by the IRIA method. © 2003 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 41: 842–855, 2003     

Optical anisotropy of polymeric films measured by waveguide propagation mode determination

Extruded thin films of a liquid-crystalline charge-conjugated rigid-rod polymer poly(p-phenylenebenzobisthiazole), PBT, and a semicrystalline thermoplastic polyethylene-terephthalate (Mylar) were fabricated and examined for film thickness, refractive index, and linear attenuation coefficient. Optical waveguide modes were successfully induced on the polymeric films using a prism coupler at λ = 633 and 1300 nm. Highly consistent thickness values were obtained for the polymeric films. In addition, the anisotropic nature of the optical properties was determined using TE and TM propagation modes. A refractive index as high as 2.3 was observed on PBT film. The refractive index data suggested that the PBT and Mylar films were optically anisotropic with refractive indices n? (out-of-plane) invariably smaller than n∥ (in-plane). Large anisotropy was also discovered in the linear attenuation coefficient α, with α_∥/α_? ≈ 50 for the Mylar films. Complementary polarimetric and spectroscopic interference measurements were also applied to investigate the optical anisotropy of the extruded polymeric films. © 1992 John Wiley & Sons, Inc.     

The stability of high refractive index polymer materials for high-density planar optical circuits

Owing to the structural flexibility, easy processing and fabrication capabilities, polymers are being increasingly attractive for a variety of optical applications. In order to increase the integration density of such optical circuits, higher index contrasts and, thus, polymers with considerably higher refractive index are essentially needed. An organometallic polymer and a conventional epoxy material are combined to form a compatible high index material. When cured at elevated temperatures, the organometallic polymer decomposes to form a highly dispersed metal oxide phase that imparts high index properties to the polymer films. These hybrid high refractive index polymer films must be stable in patterning of optical waveguide structure for photonic manufacturing. In this paper, we report the stability and optical characterization study of a modified organometallic high refractive index polymer film in manufacturing of optical waveguide devices.     

Azo dye doped polymer films for nonlinear optical applications

Azo dye doped polymer films were prepared on glass substrates using spin-coating technique. FTIR, UV-Vis spectra and PL measurements were recorded to characterize the structure of the metanil yellow doped PVA films. Surface morphology and thickness of the films were studied using AFM and FESEM. The magnitude of both real and imaginary parts of third-order nonlinear susceptibility χ3 of metanil yellow were determined by the Z-scan technique. The nonlinear refractive index n2 and the nonlinear absorption coefficient β of the azo dye doped polymer films were calculated respectively. The real part of the third-order susceptibility χ3 is much larger than its imaginary part indicating that the third-order optical response of the metanil yellow doped PVA films is dominated by the optical nonlinear refractive behavior.     

掺硼p型非晶硅薄膜的制备及光学性能的表征

以高氢稀释的硅烷(SiH₄ )为反应气体,硼烷(B₂H₆)为掺杂气体,利用RF-PECVD方法,在玻璃衬底上制备出掺硼的氢化非晶硅(a-Si:H)薄膜,研究了硼掺杂量对氢化非晶硅(a-Si:H)薄膜的光学性能的影响.利用NKD-7000 W光学薄膜分析系统测试薄膜的透射谱和反射谱,并利用该系统的软件拟合得出薄膜的折射率、消光系数、吸收系数等光学性能参数,利用Tauc法计算掺硼的非晶硅薄膜的光学带隙.实验结果表明,随着硼掺杂量的增加,掺杂非晶硅薄膜样品在同一波长处的折射率先增大后减小,而且每一样品均随着入射光波长的增加而减小,在波长500 nm处的折射率均达到4.3以上;薄膜的消光系数和吸收系数随着硼掺杂量的增大而增大,在500 nm处的吸收系数可高达1.5×10⁵cm^-1.在实验的硼掺杂范围内,光学带隙从1.81 eV变化到1.71 eV.     

Determination of optical constants of sol‐gel derived Zn0.9Mg0.1O films by spectroscopic ellipsometry with various models

The Zn_0.9Mg_0.1O thin films were prepared on Si (100) substrates by the sol‐gel method. The structural and the optical properties of Zn_0.9Mg_0.1O thin films, submitted to an annealing treatment in the 400–700 °C ranges, are studied by X‐ray diffraction (XRD) and ultraviolet (UV)‐visible spectroscopic ellipsometry (SE). The thickness, refractive index, and extinction coefficient of these films have been determined by analyzing the SE spectra using parameterized dispersion model. Moreover, we made a detailed comparison among various dispersion models and found that the Sellmeier model was superior to others in fitting the ellipsometric spectra in the transparent region. In the interband transition region, point‐by‐point fit was used. The spectral dependence of the refractive index and extinction coefficient was obtained in the photon energy range of 1.5–4.71 eV. The influence of annealing temperature on the refractive index, the extinction coefficient, and the optical bandgap energy was also discussed. We found that the refractive index and the extinction coefficient increase with increasing the annealing temperature, meaning the optical quality of Zn_0.9Mg_0.1O films is improved by annealing. Copyright © 2009 John Wiley & Sons, Ltd.     

不同基底对TiO2和SiO2薄膜的光学性能的影响

采用溶胶-凝胶法分别在K9玻璃、单晶硅和石英玻璃基底上制备了纳米TiO₂和SiO₂薄膜。利用SEM、UV-Vis及反射式椭圆偏振光谱仪对薄膜的微观结构及光学特性进行了表征和分析。结果表明:3种基底中, 单晶硅基底上TiO₂和SiO₂薄膜折射率最大;在非晶态K9玻璃和石英玻璃基底上TiO₂薄膜折射率和透光率差异较大;SiO₂薄膜在非晶态基底上折射率、透光率相近;3种基底上薄膜的折射率和消光系数都有随波长增大而减小的趋势, 同时Cauchy模型能较好的描述单晶硅基底上两种薄膜在400~800 nm波段的光学性能。     

不同基底对TiO2和SiO2薄膜的光学性能的影响

采用溶胶-凝胶法分别在K9玻璃、单晶硅和石英玻璃基底上制备了纳米TiO₂和SiO₂薄膜。利用SEM、UV-Vis及反射式椭圆偏振光谱仪对薄膜的微观结构及光学特性进行了表征和分析。结果表明：3种基底中, 单晶硅基底上TiO₂和SiO₂薄膜折射率最大;在非晶态K9玻璃和石英玻璃基底上TiO₂薄膜折射率和透光率差异较大;SiO₂薄膜在非晶态基底上折射率、透光率相近;3种基底上薄膜的折射率和消光系数都有随波长增大而减小的趋势, 同时Cauchy模型能较好的描述单晶硅基底上两种薄膜在400~800 nm波段的光学性能。     

Large Photoinduced Refractive Index Change in a Polyimide Film by Charge‐Transfer Complex Formation with a Polymer‐Bound Phenylazide Fragment

A large photo‐induced refractive index change as large as 0.014 at 632.8 nm in thermostable transparent polymer films has been realized for the first time by using photoirradiation of polyimide precursor films containing a phenylazide and successive imidization. The phenylazide fragment forms a charge‐transfer complex with imide moiety. The films maintained high transmittance in a wide visible region in contrast to usual polyimide films. This value of refractive index change is sufficient to make thermostable channel waveguides and other optical devices.     

Preparation and characterization of nanorods Sb doped CdO films by sol–gel technique

Pure and antimony (Sb) doped CdO films were grown using sol–gel spin coating technique. The structural properties of the films were investigated using atomic force microscopy. The structure of CdO film is converted from microrods to nanorods with Sb dopant. The analysis of optical absorption revealed that optical bandgap of the films changes with doping. The optical bandgap for 0.1, 0.5, 1.0, and 2.0% Sb doped CdO was determined to be 2.28, 2.30, 2.56, and 2.42 eV, respectively. Other optical constants such as refractive index, extinction coefficient, and dielectric constants were calculated using the optical data. The refractive index dispersion of the films obeys the single oscillator model. The volume and surface energy loss functions were calculated and observed to increase with increase in the photon energy.