过渡金属W、Mn、V、Ti掺杂二维材料MoSi2N4的第一性原理计算

本文基于密度泛函理论(DFT)的第一性原理计算了W、Mn、V、Ti替位掺杂二维MoSi₂N₄后的几何结构、电子结构以及光学性质的变化.电子结构分析表明W、Mn、W、Ti替位掺杂二维MoSi₂N₄后的禁带宽度分别为1.806 e V、1.003 e V、1.218 e V和1.373 e V;四种过渡金属掺杂后MoSi₂N₄的带隙类型没有发生改变,均为间接带隙半导体;W掺杂后的杂质能级靠近价带顶,费米能级靠近价带顶,为p型半导体,杂质能级为受主能级;Mn掺杂后的杂质能级靠近导带底,费米能级靠近导带底,为n型半导体;V和Ti掺杂后杂质能级位于费米能级附近,为复合中心;光学性质分析表明,在2 e V～4 e V的能量区间内,W掺杂结构的吸收波长为336 nm,体系发生红移;Mn、V和Ti替位掺杂后的吸收波长分别为320 nm、358 nm和338 nm,且掺杂体系均发生蓝移.     

Si中Au受主能级的流体静压力移动

用恒温的瞬态电容法测量了各向同性流体静压力P下,Si中Au受主能级E_T的压力系数。在0—8kbar压力范围内,(?(E_c-E_T))/(?P)=-1.9meV/kbar。该能级对电子俘获截面在实验误差范围内与压力无关。以上数据与文献[13]报道的Si中Au受主深能级在单轴应力下的压力系数作了比较。结果说明该深能级缺陷势不具有T_d对称性,因此Si中Au受主能级看来并不来源于简单的Si中Au替位或间隙组态。 关键词：     

过渡金属 X（ X=Cr、Mn、Fe、Tc、Re ）掺杂Janus Ga2SSe 的第一性原理研究

利用密度泛函理论的第一性原理赝势平面波方法,研究过渡金属X(X=Cr、Mn、Fe、Tc、Re)原子掺杂Janus Ga₂SSe的磁性、电子性质及光学性质.研究表明：过渡金属掺杂Janus Ga₂SSe体系在Chalcogen-rich条件下有着比Ga-rich条件下更好的稳定性.其中Mn掺杂体系形成能在两种条件下皆为最低.本征Ga₂SSe是具有2.02 eV带隙的间接带隙半导体,在紫外区域有着很好的光伏吸收能力.与本征Ga₂SSe相比,Cr掺杂体系自旋向上通道出现杂质能级,自旋向上与向下通道不对称,呈磁矩为2.797μ_B铁磁性半金属. Mn掺杂体系在其自旋向上通道产生的杂质能级,呈磁矩为3.645μ_B的磁性P型半导体. Fe掺杂体系自旋向下通道产生的杂质能级,呈磁矩为3.748μ_B磁性P型半导体.在Tc与Re掺杂后,带隙皆由间接变直接带隙,呈无磁性的P型半导体.从光学性质来看,各掺杂体系与未掺杂Ga₂SSe在介电...     

C掺杂锐钛矿相TiO2吸收光谱的第一性原理研究

运用第一性原理,对C掺杂锐钛矿相TiO₂的电子结构进行了研究,从能带结构理论解释了C掺杂TiO₂吸收光谱的一些实验现象.发现在C掺杂后的锐钛矿相TiO₂的禁带宽度增大,并且在带隙中出现了杂质能级,这些杂质能级主要是由C 2p轨道上的电子构成的,它们之间是独立的,正是这些独立的杂质能级使TiO₂掺杂后可以发生可见光响应.价带上的电子可以吸收一定能量的光子跃迁到杂质能级,而杂质能级上的电子也可以吸收一定能量的光子跃迁到导带,所以从理论上可以计算出掺杂后的TiO₂在可见光范围内存在两个吸收边,与实验中所得到的现象相一致. 关键词： C掺杂 2')" href="#">锐钛矿TiO₂ 能带结构 吸收光谱     

a-Si:H中本征缺陷引起的赝隙态

本文取原子集团模型Si₈H₁₈,Si₁₇及从连续无规网络中挖取的集团模型Si₂₉和Si₄₇,用CNDO LCAO-MO方法计算其电子结构,探讨了a-Si:H中由弱键、弯键和带电组态等本征缺陷引起的赝隙态分布。结果表明,当弱键拉伸时,两个弱键态移动并收缩至带隙中央;过剩电荷使弱键能级移至价带顶或导带底附近;弯键态主要出现在价带顶附近。当弯键曲率较大时,弯键态上移至带隙中央以下的区域。结构拓扑无序导致 关键词：     

氨分子在000和201带的选择光离解

本文利用脉冲紫外激光(UV)选择激发氨分子到?¹A″₂电子激发态的两个最低振动能级ν′₂=0和ν′₂=1(ν₂振动),然后检测新生态H原子的飞行谱(TOF),研究了氨分子的光碎片动力学。光谱证实了最近所测的离解能D₀⁰(H-NH₂)=4.645eV;绝大多数生成的NH₂(X²B₁)基处于非振动激发,但是具有围绕a惯性轴的高度转动激发。通过NH₃(?)的ν′₂=1光离解产生的NH₂(X)基具有较高的内部激发,并且显示了在N=K_a转动能级上的反转布居。 关键词：     

硅中的过渡元素杂质能级

本文提出了半导体中过渡元素杂质的一个简单模型,用格林函数方法计算了硅中替代和间隙原子产生的杂质能级和波函数。发现两者的性质有很大的差别。替代原子只有当d原子能级V_d低于价带顶时才能产生杂质能级。它的波函数主要是悬键态,当能级靠近导带边时变成正键态。间隙原子只有当V_d高于价带顶时才能产生杂质能级。它的波函数主要是中心原子d态,当能级靠近导带边时变成弱反键态。最后定性地说明了过渡元素杂质能级的化学趋势和一些实验事实。 关键词：     

用Re/Al2O3/Al隧道结的电子隧道测定重掺杂Re膜的超导能隙

用Re/Al₂O₃/Al隧道结的电子隧道测定了重掺杂Re膜的超导能隙,△₀=(1.04±0.02)meV,2△₀/kT_c=3.31±0.04。△₀值是用电导极大值法确定的。结果表明,杂质使Re膜的T_c与能隙△₀增加了许多倍,但是Re仍然属于弱耦合超导体。 关键词：     

元素替代对MgH2储氢材料释氢影响机理的第一原理研究

用基于密度泛函理论的赝势平面波第一原理方法研究金属元素替代对MgH₂释氢的影响机理.结果表明：带隙的宽窄和带隙中是否存在杂质能级是影响MgH₂储氢材料释氢性能的关键因素,Nb,Fe,Ti,V在能隙近中央引入杂质能级,使得MgH₂的H-Mg键键强减弱,有利于放氢.La在导带底引入杂质能级,降低带隙宽度,晶体中结合最弱的键断裂变得容易,也有利于放氢.Nb,Fe,Ti,V,La与近邻氢原子间形成共价键,形成金属氢化物,对释氢起到催化作用.La与H间的共价作用较弱,其金属氢化物的催化作用相对较弱.掺杂元素使Mg与周围H的静电作用力不对称,与Mg作用力小的H容易释放出来,起到提高MgH₂释氢的作用.比较发现V,Fe明显降低Mg-H间的离子键强度.     

密度泛函理论研究Run和RunAu(n=1-12)团簇的结构和电子性质

采用密度泛函理论中的广义梯度近似(GGA) 对 Ru_n Au和Ru_n 团簇的几何构型进行优化,并对能量、频率、电子性质和磁性质进行了计算. 结果表明,Ru_n Au团簇的最低能量结构可以通过Au原子代替Ru_n+1团簇中的Ru原子生长而成.除了局域的结构畸变,Ru_n Au和Ru_n+1团簇具有相似的几何结构.二阶能量差分、电离势、亲和势和分裂能表明Ru₅, Ru₈, Ru₅Au, Ru₈Au 是稳定的团簇,Au的掺杂没有改变Ru_n 的相对稳定性.通过电子性质的分析发现,当Au原子掺杂在Ru_n 中,团簇的化学活性增加,且团簇的能隙主要由电子的配对效应决定;对于大多数团簇来说,Au原子掺杂提高了Ru_n Au的磁矩. 关键词： n Au和Ru_n 团簇')" href="#">Ru_n Au和Ru_n 团簇 几何结构 电子性质     

Band-structure engineering of gold atomic wires on silicon by controlled doping

We report on the systematic tuning of the electronic band structure of atomic wires by controlling the density of impurity atoms. The atomic wires are self-assembled on Si(111) by substitutional gold adsorbates and extra silicon atoms are deposited as the impurity dopants. The one-dimensional electronic band of gold atomic wires, measured by angle-resolved photoemission, changes from a fully metallic to semiconducting one with its band gap increasing above 0.3 eV along with an energy shift as a linear function of the Si dopant density. The gap opening mechanism is suggested to be related to the ordering of the impurities.     

Electronic structure of alkali-metal impurities in InP

The electronic structure of the substitutional alkali metal impurities in InP has been studied by MSX_αSCF method. The shift of the t^DBH₂-level for different impurities is determined. In none of the cases the impurity level is shifted out of the band gap. Li and Na impurities with their shallow acceptor levels behave as p-type semiconductors whereas K impurity with its deep level behave somewhat like a semi-insulator.     

The magnetic and hyperfine properties of iron in silicon carbide

The magnetic and hyperfine properties of iron impurities in 3C- and 6H- silicon-carbide are calculated using the abinitio method of full-potential linear-augmented-plane-waves. The iron atoms are introduced at substitutional carbon, Fe _C , and silicon, Fe _Si , sites as well as at the tetrahedral interstitial sites with four nearest neighbours carbon atoms, Fe _I (C), and four nearest neighbours silicon atoms, Fe _I (Si). The effect of introducing vacancies at the neighbours of these sites is also studied. Fe atoms with complete neighbors substituted at Si or C sites are found to be nonmagnetic, while Fe atoms at interstitial sites are magnetic. Introduction of a vacancy at a neighboring site reverse the picture.     

Tuning the electronic properties of the fullerene C<Subscript>20</Subscript> cage via silicon impurities

The fullerene C₂₀ represents one of the most active classes of nanostructures, and they have been widely used as active materials for important applications. In this study, we investigate and discuss the tuning of the electronic properties of the fullerene C₂₀ cage via various consternations and locations of silicon atoms. All calculations are based on the density functional theory (DFT) at the B3LYP/3-21G level through the Gaussian 09W program package. The optimized structures, density of state (DOS) analysis, total energies, dipole moments, HOMO energies, Fermi level energies, LUMO energies, energy gaps, and the work functions were performed and discussed. Our results show that the electronic properties of C₂₀ cage do not only depend on the silicon impurity concentrations, but also depend on the geometrical pattern of silicon impurities in the C₂₀ cage. The tuning of the electronic properties leads to significant changes in the charge transport and the absorption spectra for C₂₀ cage via engineering the energy gap. So, we suggest that substitutional impurities are the best viable option for enhancement of desired electronic properties of C₂₀ cage for using these structures in nanoelectronics and solar cell applications.     

Electrical properties and diffusion behavior of hafnium in single crystal silicon

Electrical properties and diffusivity of Hf in single crystal Si have been studied. Several deep level defects were found for Hf in both the upper and lower half of the silicon band gap, and their parameters were measured. Energy levels, concentrations, and capture cross sections were determined for all Hf defects. The DLTS spectra depend on the cooling rate. Analysis of electrical properties yielded a dominant deep level defect at E_C -0.27 eV, which showed field enhanced emission due to Poole–Frenkel effect, confirming its donor nature. This agreed with results obtained using CV and TSCAP. In the lower half of the bandgap, a defect level at E_V +0.24 eV was found to have a capture barrier of 0.04 eV. Diffusivity of Hf was studied using two methods for Hf incorporation in Si – ion implantation and sputtering. Analysis of broadening of the Hf profile in implanted samples, which were annealed for 168 h, allowed us to estimate the diffusivity of Hf as 1.7×10^-15 cm²/s at 1250 °C: the spreading of implanted profiles at lower temperatures was too small. Analysis of Hf depth profiles in the sputtered and annealed samples reveals that Hf appears to have a fast and slow component to its diffusivity whose migration energy was determined to be 3.5±0.3 eV and 4.1±0.3 eV respectively. The fast and slow component are ascribed to interstitial and substitutional Hf with an energy level of E_C -0.27 eV and E_V +0.43 eV respectively. The mechanism for the fast component seems to indicate a direct interstitial diffusion mechanism whereas the diffusion of the substitutional Hf seems most consistent with the concerted exchange diffusion mechanism. In addition, estimates of solubility for both, interstitial and substitutional Hf, are included. PACS 61.72.Tt; 66.30.Jt; 71.55.Cn     

Band engineering of silicon for light emission: First-principles approach to the effect of co-doping with nitrogen and fluorine

A Si-based light emitter has long been the final key component for electronic and photonic integrated circuits on Si, because Si has an indirect band gap. Atomistic and electronic structures and energy gains of formation of possible nitrogen (N) and fluorine (F) complexes in Si have been researched from first-principles, in order to engineer the band structure of Si for light emission. The calculated results show that the substitutional nitrogen N_S and bond center fluorine F_BC pair complex has large stabilization energy, and that the pair-complex-doped Si has direct band gap, which is reduced with respect to that of Si. These results lead to the possibilities of doping-based engineering of Si optical properties with introduction of deep-level impurity and charge compensation.     

Electronic structure,mechanical and optical properties of ternary semiconductors Si1-xGexC (X = 0, 0.25, 0.50, 0.75, 1)

The electronic structure of silicon carbide with increasing germanium content have been examined using first principles calculations based on density functional theory. The structural stability is analysed between two different phases, namely, cubic zinc blende and hexagonal phases. The zinc blende structure is found to be the stable one for all the Si_1-xGe_xC semiconducting carbides at normal pressure. Effect of substitution of Ge for Si in SiC on electronic and mechanical properties is studied. It is observed that cubic SiC is a semiconductor with the band gap value 1.243?eV. The band gap value of SiC is increased due to the substitution of Ge and the band gap values of Si _0.75 Ge _0.25 C, Si _0.50 Ge _0.50 C, Si _0.25 Ge _0.75 C and GeC are 1.322 eV, 1.413 eV, 1.574 eV and 1.657?eV respectively. As the pressure is increased, it is found that the energy gap gets decreased for Si_1-x Ge_xC (X?=?0, 0.25, 0.50, 0.75, 1). The elastic constants satisfy the Born – Huang elastic stability criteria. The bulk modulus, shear modulus, Young’s modulus and Poisson’s ratio are also calculated and compared with the other available results.     

Band structure of the superconducting MgB2 compound and modeling of related ternary systems

Band structure of a novel superconductor—magnesium diboride—is studied by the self-consistent FP-LMTO method. Density of states near the Fermi level of MgB₂ and its electronic properties are governed by the metal-like boron 2p orbitals in the planar network of boron atoms. The modification of the band structure of MgB₂ upon doping the boron (with Be, C, N, and O substitutional impurities) and the magnesium (with Be, Ca, Li, and Na substitutional impurities) sublattices or upon the introduction of structural vacancies (boron nonstoichiomety) is analyzed. The electronic structures of MgB₂ and hypothetical CaB₂ are also studied as functions of pressure.     

Study on the structure and optical property of Zn1−xCuxO sol–gel thin films on quartz substrate

Zn_1−xCu_xO thin films (x=0, 1.0, 3.0, 5.0%) are prepared on quartz substrate by sol–gel method. The structure and morphology of the samples are investigated by X-ray diffraction (XRD) and atomic force microscopy (AFM). The results show that Cu ions were effectively penetrated into the ZnO crystal lattices with substitutional and interstitial impurities to form stable solid solutions without changing the polycrystalline wurtzite structure. Two peaks at 420 nm (2.95 eV, violet), 485 nm (2.56 eV, blue) have been observed from the photoluminescence (PL) spectra of the samples. It is concluded that the violet peak may correspond to the exciton emission; the blue emission corresponds to the electron transition from the bottom of the conduction band to the acceptor level of zinc vacancy. The optical test shows that the optical band gap E_g is decreased with the increase amount of Cu doping in ZnO. The band gap decrease from 3.40 eV to 3.25 eV gradually. It is also found that the transmission rate is increased rapidly with the increase of Cu ions concentration.     

P掺杂锐钛矿相TiO2的第一性原理计算

利用基于密度泛函理论的第一性原理对不同P掺杂形式(P替位Ti, P替位O, 间隙P)的锐钛矿相TiO₂的晶格常数、电荷布居、能带结构、分态密度和吸收光谱进行了计算. 结果表明, P替位Ti时, TiO₂体积减小, P替位O和间隙P的存在使TiO₂的体积膨胀; 替位Ti的P和间隙P均有不同程度的氧化, 而替位O的P带有负电荷. 三种P掺杂形式均导致锐钛矿相TiO₂禁带宽度的增大, 并在TiO₂禁带之内引入了掺杂局域能级. P掺杂导致TiO₂禁带宽度增大的程度依次为: 间隙P>P替位Ti>P替位O. 吸收光谱的计算结果表明, P替位Ti并不能增强TiO₂的可见光吸收能力, 但间隙P的存在大幅提高了TiO₂的可见光光吸收能力, 间隙P有可能是造成实验上P掺杂增强锐钛矿相TiO₂光催化活性的重要原因. 关键词： P掺杂 2')" href="#">锐钛矿相TiO₂ 第一性原理