The mass spectra of some tris(trimethylsilyl)acylsilanes and tris(trimethylsilyl)silanes

While tris(trimethylsilyl) alkanoylsilanes fragment in the acylsilane form yielding [(Me₃Si)₃SiCO]⁺ by α-cleavage, the molecular ions of their aryl counterparts rearrange to ionized silaethenes prior to cleavage, paralleling known photochemical behaviour. Sila-allyl type structures are attributed to the stable [M? Me˙]⁺ ions obtained by subsequent cleavage. Metastable ion characteristics reveal the identity of the structures of the monomeric silaethene ions obtained from one of the aroylsilanes and a 1,2-disilacyclobutane. The non-compliance of the alkanoylsilanes with their photochemical behaviour is attributed to a preferred elimination of the stable alkyl radical (R˙) from the molecular ions. Several polysilanes display abundant odd-electron ions which may possess a disilene structure.     

Synthesis of high-purity tris(trimethylsilyl) borate

A method was developed for synthesis of high-purity tris(trimethylsilyl) borate by reaction of trimethylacetoxysilane with powdered boric acid.     

A voltammetric study of some tris(trimethylsilyl)-methyltin derivatives

Classical d.c. polarography, supplemented by other voltammetric techniques, is used to elucidate the mechanism of reduction of di- and tri-halide derivatives of tris(trimethylsilyl) methyltm, despite the difficulties encountered in work at very negative potentials in ethanolic solutions. The dihalides are reduced in two irreversible one-electron steps; the trihalides are reduced in three one-electron steps, the first of which is quasi-reversible, the other two being irreversible. The first step in each case is adsorption-controlled while the others are diffusion-controlled. D.c. polarography is suitable for the determination of these compounds down to 5 × lO^-5 M.     

Tris(trimethylsilyl)silyl versus tris(trimethylsilyl)germyl: Radical reactivity and oxidation ability

A comparison of the tris(trimethylsilyl)silyl I and tris(trimethylsilyl)germyl II radical reactivity is provided. Their formation as well as their reactivity encountered in a large variety of chemical processes (addition to double bond, halogen abstraction, peroxyl radical formation…) is examined by laser flash photolysis, quantum mechanical calculations and electron spin resonance (ESR) experiments. The starting compound (TMS)₃GeH is more reactive than (TMS)₃SiH toward the t-butoxyl, the t-butylperoxyl and the phosphinoyl radicals. A similar behavior is noted for an aromatic ketone triplet state. II exhibits a lower absolute electronegativity: accordingly, the addition to electron rich alkenes is less efficient than for I. Radical II is also found less reactive for both the peroxylation and the halogen abstraction reactions. The rearrangement of is slower than for ; this is related to the respective exothermicity of the processes.     

Radical-mediated silyl- and germyldesulfonylation of vinyl and (alpha-fluoro)vinyl sulfones: application of tris(trimethylsilyl)silanes and tris(trimethylsilyl)germanes in Pd-catalyzed couplings

[reaction: see text] Radical-mediated silyl- and germyldesulfonylations of various vinyl and (alpha-fluoro)vinyl sulfones with tris(trimethylsilyl)silane and germanium hydrides provide access to vinyl and (alpha-fluoro)vinyl silanes and germanes. Upon oxidative treatment with hydrogen peroxide in basic aqueous solution, the vinyl tris(trimethylsilyl)silanes and -germanes undergo Pd-catalyzed cross-couplings with aryl halides.     

Synthesis of some tris(trimethylsilyl)germyl compounds

A variety of compounds containing the tris(trimethylsilyl)germyl group were prepared and characterized spectroscopically. Photolysis of adamantoyltris(trimethylsilyl)germane failed to yield the isomeric germene: in CCl₄ the photolysis appeared to occur by a Norrish type 1 process.     

Elimination of bis(trimethylsilyl)stannylene from tris(trimethylsilyl)stannylated zirconocene and hafnocene chlorides

Reactions of (Me₃Si)₃SnK with Cp₂MCl₂ (M = Zr, Hf) give the respective stannylated metallocene chlorides. These complexes display a tendency to eliminate bis(trimethylsilyl)-stannylene under Cp₂M(Cl)SiMe₃ formation.     

Vinyl tris(trimethylsilyl)silanes: substrates for Hiyama coupling

The oxidative treatment of vinyl tris(trimethylsilyl)silanes with hydrogen peroxide in aqueous sodium hydroxide in tetrahydrofuran generates reactive silanol or siloxane species that undergo Pd-catalyzed cross-couplings with aryl, heterocyclic, and alkenyl halides in the presence of Pd(PPh₃)₄ and tetrabutylammonium fluoride. Hydrogen peroxide and base are necessary for the coupling to occur while activation of the silanes with fluoride is not required. The conjugated and unconjugated tris(trimethylsilyl)silanes serve as good cross-coupling substrates. The (E)-silanes undergo coupling with retention of stereochemistry while coupling of (Z)-silanes occurred with lower stereoselectivity to produce an E/Z mixture of products.     

Application of vinyl tris(trimethylsilyl)germanes in Pd-catalyzed couplings

The oxidative treatment of vinyltris(trimethylsilyl)germanes with hydrogen peroxide (NaOH/H(2)O/THF) or tert-butyl peroxide (KH/THF) generates reactive germanol or germanoxane species that undergo Pd-catalyzed cross-couplings with aryl and alkenyl halides and aryl triflates in the presence of Pd(PPh(3))(4). Vinylgermanes having either a conjugated or isolated double bond serve as versatile transmetalation reagents. The E-germanes undergo coupling with retention of stereochemistry under aqueous and anhydrous conditions, while coupling of Z-germanes occurs with less stereoselectivity to produce a mixture of E/Z products.     

三(三甲硅基)环戊二烯基三羰基钼负离子的反应性

三(三甲硅基)环戊二烯基三羰基钼负离子锂盐[{η^5-(Me~3Si)~3C~5H~2}Mo(CO)~3]^-Li^+(1), 分别与MeI、phCH~2Cl及ClCH~2COOC~2H~5反应生成相应的烃基化钼衍生物[{η^5-(Me~3Si)~3C~5H~2}Mo(CO)~3R,] (R=-CH~3, 2; -CH~2ph, 3;-CH~2COOC~2H~5, 4)。1与PCl~3反应除得到预期的钼氯化物[{η^5-(Me~3Si)~3C~5H~2}Mo(CO)~3Cl](5)外, 主要得到钼磷氯化物[{η^5-(Me~3Si)~3C~5H~2}Mo(CO)~3PCl~2] 6; 1与碘反应得到钼碘化物[{η^5-(Me~3Si)~3C~5H~2}Mo(CO)~3I] 7; 1与HOAc作用后分别和CCl~4、NBS室温反应, 仅分离到脱去一个Me~3Si的钼卤化物[{η^5-(Me~3Si)~2C~5H~2}Mo(CO)~3X], (X:Cl, 8; Br, 9)。     

Reactivity of tris(trimethylsilyl)silane toward diarylaminyl radicals

Absolute rate constants for the reaction of tri-tert-butylphenoxyl radical (ArO*) with (TMS)(3)SiH were measured spectrophotometrically in the temperature range 321-383 K. Rate constants for the hydrogen abstraction from (TMS)(3)SiH by diarylaminyl radicals of type (4-X-C(6)H(4))(2)N* were determined by using a method in which the corresponding amines catalyze the reaction of ArO* with (TMS)(3)SiH. At 364.2 K, rate constants are in the range of 2-50 M(-)(1) s(-)(1) for X = H, CH(3), CH(3)O, and Br, whereas the corresponding value for ArO* is 3 orders of magnitude lower. A common feature of these reactions is the low preexponential factor [log(A/M(-1)s(-1)) of 4.4 and 5.2 for ArO* and Ph(2)N*, respectively], which reflects high steric demand in the transition state. A semiempirical approach based on intersecting parabolas suggests that the observed reactivity is mainly related to the enthalpy of the reaction and allowed to estimate activation energies for the reaction of (4-X-C(6)H(4))(2)N* and ArO* radicals with a variety of silicon hydrides.     

Pd-catalyzed couplings of (α-fluoro)vinyl tris(trimethylsilyl)germanes

The (α-fluoro)vinyl tris(trimethylsilyl)germanes undergo Pd-catalyzed cross-couplings with aryl and alkenyl halides upon oxidative treatment with hydrogen peroxide under basic aqueous conditions to give access to fluoroalkenes and fluorodienes with retention of stereochemistry.     

Regioselective hydrosilylations of propiolate esters with tris(trimethylsilyl)silane

Lewis acid and substituent dependency on the regioselectivity of hydrosilylation of propiolate esters 1a-c with tris(trimethylsilyl)silane (2a) was found. The reaction of methyl and ethyl propiolate esters and 2a without Lewis acid and in the presence of EtAlCl2 and Et2AlCl gave beta-silicon-substituted Z-alkenes 3 selectively. On the other hand, reaction in the presence of AlCl3 in dichloromethane gave alpha-silicon-substituted alkenes 4. In the case of trifluoroethyl propiolate ester 1c, reaction with aluminum chloride-based Lewis acids gave alpha-silicon-substituted alkenes 4 exclusively. Two competitive mechanisms, free-radical and ionic, are proposed as the source of the complementary regioselectivity displayed in these reactions. A transition state of the radical-forming step was obtained computationally. The reaction of various reactive acetylene substrates and 2a without Lewis acid and without solvent at room temperature gave beta-silicon-substituted Z-alkenes 3 selectively.     

Addition of tris(trimethylsilyl) phosphite to N-substituted 4-piperidone

Russian Journal of General Chemistry - Convenient methods for the synthesis of functionalized phosphonic acids containing piperidine moieties via the reaction of tris(trimethylsilyl) phosphite with...     

The preparation of the sterically hindered alcohol tris(trimethylsilyl)methanol

The alcohol (Me₃Si)₃COH, with potential for use in the preparation of sterically hindered metal alkoxides, has been prepared by hydrogen peroxide oxidation of the boronic acid (Me₃Si)₃CB(OH)₂.     

Preparation of tris(trimethylsilyl)methyl (“trisyl”) derivatives of silicon

Treatment of (Me₃Si)₃CLi (“trisyl”lithium, TsiLi) with appropriate silicon halides has given a range of compounds of the type (Me₃Si)₃CSiRR′X; e.g., TsiSiCl₃, TsiSiMeCl₂, TsiSiMe₂X (X = Cl, OMe), TsiSiPh₂X (X = F, Cl, OMe), and TsiSiPhMeH. The trisyl group causes very large steric hindrance to nucleophilic displacements at the silicon to which it is attached, so that (unless one or more hydride ligands are present) most of the common displacements at silicon do not occur. However, halides can be reduced to hydrides by LiAlH₄, and the hydrides can be converted into halides in electrophilic displacements by hallogens. The presence of even one hydride ligand markedly reduces the hindrance, so that, for example, TsiSiPhHI reacts with refluxing methanol to give TsiSiPhH(OMe).