Effect of annealing on the dielectric permittivity of strontium titanate films in the SrTiO3/Al2O3 structure

The paper reports an experimental study of the structure of a strontium titanate film on a sapphire substrate and of the dielectric properties of capacitors based on a SrTiO₃/Pt/Al₂O₃ multilayer system before and after a high-temperature anneal. The macro-and microstructure of SrTiO₃ films and its variation induced by the annealing have been investigated. The temperature and field dependences of the dielectric permittivity of strontium titanate films have been determined, and their comparison with similar data for single crystals carried out. The mechanisms by which annealing can affect the capacitor capacitance and the properties of SrTiO₃ films are discussed. Fiz. Tverd. Tela (St. Petersburg) 40, 1473–1478 (August 1998)     

Dielectric properties of solid solutions PbMg1/3Nb2/3O3-SrTiO3

Ceramic samples of the solid solutions PbMg_1/3Nb_2/3O₃-SrTiO₃ are synthesized. The dielectric properties are studied and a phase diagram is constructed. The results obtained are discussed in terms of ideas concerning relaxor ferroelectrics for solid solutions on the PMN side and from the standpoint of potential ferroelectrics on the SrTiO₃ side. The introduction of SrTiO₃ into PMN gradually degrades relaxor properties, and the introduction of PMN into SrTiO₃ does not result in initiation of the ferroelectric phase transition, possibly because of the appearance of random fields in the lattice. The possibility of practical applications of the synthesized system is also discussed. Fiz. Tverd. Tela (St. Petersburg) 41, 1091–1095 (June 1999)     

Dielectric and insulating properties of SrTiO3/Si heterostructure controlled by cation concentration

SrTiO3 films with different cation concentration were deposited on Si(001)substrates by oxide molecular beam epitaxy.An amorphous layer was observed at the interface whose thickness depends on the oxygen pressure and the substrate temperature during growth.Although lowering the oxygen vacancy concentration in SrTiO3led to better insulating performance as indicated by the lowered leakage current density of the heterostructure,the dielectric performance was deteriorated because of the thickened interfacial layer that dominated the capacitance of SrTiO3/Si heterostructure.Instead of adjusting the oxygen vacancy concentration,we propose that controlling the film cation concentration is an effective way to tune the dielectric and insulating properties of SrTiO3/Si at the same time.     

TbMnO3 epitaxial thin films by pulsed-laser deposition

Epitaxial TbMnO₃ films have been fabricated on SrTiO₃(001) and LaAlO₃(001) substrates by pulsed laser deposition (PLD), the structure and surface morphology of the films were characterized by X-ray diffraction with Cu K_α radiation and atomic force microscopy. The electrical transport and magnetic properties of the TbMnO₃ films and bulk were examined, the resistivity and the forbidden band width E_g change with epitaxial orientation, semiconductor transport properties are found in the films and bulk, the average of the E_g of the films on SrTiO₃ and on LaAlO₃ is equal to the E_g of the bulk. The two TMO films have different magnetization mode, the magnetization of the film on SrTiO₃ have an analogy to that of TbMnO₃ single crystal.     

Microstructure and dielectric properties of pulsed-laser-deposited CaCu 3 Ti 4 O 12 thin films on LaNiO 3 buffered Pt/Ti/SiO 2 /Si substrates

CaCu₃Ti₄O₁₂ (CCTO) thin films have been prepared by a pulsed-laser-deposition method on LaNiO₃ buffered Pt/Ti/SiO₂/Si substrates, and their microstructure and dielectric properties have been compared with those of the films deposited directly on Pt/Ti/SiO₂/Si substrates. The crystalline structure and the surface morphology of the CCTO thin films were markedly affected by the bottom electrodes. Both the films show temperature-independent dielectric properties in a wide temperature range, which is similar to those properties obtained in single-crystal or epitaxial thin films, while the room-temperature dielectric constant of the 350-nm-thick CCTO films on LaNiO₃/Pt/Ti/SiO₂/Si substrates at 100 kHz was found to be 2300, which was increased significantly compared with that obtained in the films on Pt/Ti/SiO₂/Si substrates. Using the impedance spectroscopy technique, it has been suggested that the high dielectric constant response of the CCTO thin films originates from the grain boundary layer mechanism as found in internal barrier layer capacitors. PACS 77.55.+f; 81.15.Fg; 68.55.-a     

Investigation of structural phase transition in polycrystalline SrTiO3 thin films by Raman spectroscopy

Polycrystalline SrTiO₃ thin films were prepared by pulsed laser deposition technique. The phonon properties and structural phase transition were studied by Raman spectroscopy. The first-order Raman scattering, which is forbidden in SrTiO₃ single crystal, has been observed in the films, due to the structural distortion caused by strain effect and oxygen vacancies. The Fano-type line shape of TO₂ phonon reveals the existence of polar microregions in the STO thin films. The evolution of TO₂ and TO₃ phonons with temperature shows the occurrence of a structural phase transition at 120 K related to the formation of polar macroregions in the films.     

SUPERCONDUCTING PROPERTIES AND STRUCTURAL PERFECTION OF EPITAXIAL YBa2Cu3O7-x THIN FILMS

High quality epitaxial YBa₂Cu₃O_7-x thin films have been succcessfully prepared by dc magnetron sputtering deposition, on (100) and (110) aligned SrTiO₃, LaAlO₃ and yttria-stabilized zirconia (YSZ) substrates. The films showed zero resistance around 90 K and had a J_c (at 77 K, H=0) over 10⁶A/cm². It was found that superconducting properties and structures of the films were strongly dependent on oxygen pressure and substrate temperature. The epitaxial structure of the films have been studied by X-ray diffraction. Rutherford backscattering and channeling spectroscopy, X-ray double-crystal diffraction and transmission election microscopy. The experimental results demonstrated that the epitaxial YBa₂Cu₃O_7-x films had excellent superconducting properties and quite perfect structure.     

Impact of anisotropic strains on low-frequency dielectric properties and room-temperature polar phases of SrTiO3 epitaxial thin films

Impact of anisotropic strains on low-frequency dielectric properties and room-temperature polar phases of SrTiO₃ epitaxial thin films is investigated. The dielectric properties show a remarkable change as a function of anisotropic strains. The number of room-temperature polar phases is as twice as that of isotropically strained SrTiO₃ thin films.     

Effect of deposition temperature on orientation and electrical properties of (K0.5Na0.5)NbO3 thin films by pulsed laser deposition

Lead-free ferroelectric K_0.5Na_0.5NbO₃ (KNN) thin films have been prepared on Pt/TiO₂/SiO₂/Si substrates by pulsed laser deposition process. The structures, crystal orientations and electrical properties of thin films have been investigated as a function of deposition temperature from 680 °C to 760 °C. It is found that the deposition temperature plays an important role in the structures, crystal orientations and electrical properties of thin films. The crystallization of thin films improves with increasing deposition temperature. The thin film deposited at 760 °C exhibits strong (0 0 1) preferential orientation, large dielectric constant of 930 and the remnant polarization of 8.54 μC/cm².     

C-oriented SrBi2Nb2O9 films grown on YBa2Cu3O7−δ /SrTiO3 and NdGaO3

Epitaxial SrBi₂Nb₂O₉ films were grown by laser ablation on (001)YBa₂Cu₃O_7?δ /(100)SrTiO₃ and (001)NdGaO₃, with c axis normal to the substrate plane. The SrBi₂Nb₂O₉ films were grown in a layer-by-layer regime on NdGaO₃ substrates in 25-Å steps at a condensation temperature of 700 °C. Microinclusions of secondary phases and a-oriented grains were observed to exist on the surface of (001)SrBi₂Nb₂O₉ films grown on (001)YBa₂Cu₃O_7?δ /(100)SrTiO₃. The dielectric permittivity of the SrBi₂Nb₂O₉ films measured along the c axis is 123 (T=300 K, f=100 kHz), and tan δ≈0.04.     

Polar state in a SrTiO3-KTaO3 solid solution

Dielectric properties of ceramic samples of a 0.85SrTiO₃-0.15KTaO₃ solid solution have been studied. The temperature dependence of the dielectric permittivity exhibits maxima with a strong frequency dispersion, which is described by the Vogel-Fulcher law with a characteristic temperature T _g=26 K. These features are apparently connected with transition to a polar glasslike state. Fiz. Tverd. Tela (St. Petersburg) 39, 1838–1840 (October 1997)     

Effect of Bi substitution on the magnetic and dielectric properties of epitaxially grown BaFe0.3Zr0.7O3−δ thin films on SrTiO3 substrates

The structural, dielectric and magnetic properties of single crystalline Ba_1−xBi_xFe_0.3Zr_0.7O_3−δ (x=0.0-0.29) thin films have been studied. The pseudotetragonal epitaxial thin films were obtained by pulsed laser-beam deposition (PLD) on (0 0 1) SrTiO₃ (STO) single-crystal substrates. The Bi substitution for the Ba ions up to an extent of x=0.18 caused a slight improvement in the leakage current properties, as well as an enhancement of the apparent dielectric constant. The saturation magnetization of the films was significantly decreased following Bi substitution. These changes were thought to be related to the increase in oxygen deficiencies in the films. The effect of the Bi substitution on the dielectric and magnetic properties was analyzed in conjunction with the change in valence value of the Fe ions.     

脉冲激光淀积BaTiO3薄膜的介电与铁电特性

用脉冲激光淀积方法在SrTiO₃衬底上制备了BaTiO₃/YBa₂Cu₃O_7-δ（铁电/超导）双层膜，X射线分析表明BaTiO₃薄膜是高度c取向的．对BaTiO₃薄膜的介电和铁电性能进行了实验研究．观察到铁电薄膜特有的电滞线和蝶型C-V曲线，薄膜呈现出较好的铁电性，在铁电随机存储等领域有重要的应用前景 关键词：     

La0.33Pr0.34Ca0.33MnO3薄膜的应变效应

采用脉冲激光沉积法分别在(100)LaAlO₃和(100)SrTiO₃基片上生长了La_0.33Pr_0.34Ca_0.33MnO₃薄膜,并通过磁测量和电输运测量对生长在不同基片上的La_0.33Pr_0.34Ca_0.33MnO₃薄膜的物性进行了研究.结果表明,基片和薄膜之间的压应力导致La_{关键词： 钙钛矿锰氧化物 相分离 电荷有序}     

Structural and electric properties of Bi2Zn2/3Nb4/3O7 thin films prepared by pulsed laser deposition

Bi₂Zn_2/3Nb_4/3O₇ thin films were deposited on Pt/TiO₂/SiO₂/Si(100) substrates under an oxygen pressure of 10 Pa by pulsed laser deposition. The substrate temperature varied from 500 ^°C to 750 ^°C. Effects of substrate temperature on the crystallinity, microstructure, and electric properties of Bi₂Zn_2/3Nb_4/3O₇ thin films have been systematically investigated. Bi₂Zn_2/3Nb_4/3O₇ thin films are amorphous in nature at a substrate temperature of 500 ^°C. With increase of substrate temperature to 550 ^°C, thin films begin to crystallize. At higher temperature of 750 ^°C, Bi₂O₃ phase can be detected in thin films. However, the crystallized thin films exhibit a cubic pyrochlore structure, not a monoclinic zirconolite structure, which is probably attributed by the composition deviation from the stoichiometric ratio. The resultant Bi₂Zn_2/3Nb_4/3O₇ thin films exhibit the character with high dielectric constant and low loss tangent. The dielectric constant gradually increases with the substrate temperature and reaches a maximum at 700 ^°C. The dielectric constant and loss tangent of the thin films deposited at 700 ^°C are 152 and 0.002 at 10 kHz, respectively. With further increase of substrate temperature to 750 ^°C, the dielectric constant decreases to 128. However, the tunability of the resultant thin films disappears, and the temperature coefficients are positive, which implies a more ordered structure in thin films.     

High-quality epitaxial LaNiO3 thin films on SrTiO3(100) and LaAlO3(100)

LaNiO₃ thin films have been deposited by pulsed laser deposition on SrTiO₃(100) and LaAlO₃(100) substrates. The processing conditions have been investigated in order to optimize electrical resistivity, crystal quality, and surface morphology. Excellent properties are achieved at moderate substrate temperature and relatively low oxygen pressure, without the need for annealing. Thickness exerts an important influence on electrical transport, as the electrical resistivity increases quickly in films thicker than a few tens of nanometer. The surface of the films on LaAlO₃ is very flat in all the studied thickness range, but the films on SrTiO₃ develop a pattern of boundaries and even cracks as the thickness is higher. Below the critical thickness, high-quality epitaxial films with very smooth surface and low electrical resistivity are obtained under the optimum conditions of substrate temperature and oxygen pressure. The optimum processing conditions are different depending on the substrate, and control is especially critical in films deposited on SrTiO₃.     

Structural and electrical properties of La0.5Sr0.5CoO3 films on SrTiO3 and porous a-Al2O3 substrates

Films of La_0.5Sr_0.5CoO₃ (LSCO) have been deposited on specially treated TiO₂-terminated (001) SrTiO₃ substrate surfaces and on macroporous polycrystalline !-Al₂O₃ substrates, having a mean pore diameter of 80 nm, by pulsed laser deposition. The films deposited on SrTiO₃ are good conducting, (001) textured, and exceptionally smooth (1-2 Å for 100 nm thick films). LSCO films deposited on porous !-Al₂O₃ are polycrystalline and exhibit good crystallographic and electrical properties despite the large substrate roughness and the differences in lattice parameters and crystal structure between the film and the substrate. Different growth modes have been observed on the porous !-Al₂O₃ substrates depending on the oxygen pressure during film deposition. Films grown at an oxygen pressure of 10^-1 mbar are macroporous, whereas films grown at 10^-2 mbar completely cover the substrate pores. In the latter case, strain effects lead to film cracking.     

Dielectric property of CaCu3Ti4O12 thin film grown on Nb-doped SrTiO3(100) single crystal

Thin film of CaCu₃Ti₄O₁₂ (CCTO) has been deposited on Nb-doped SrTiO₃(100) single crystal using pulsed laser deposition. The dielectric constant and AC conductivity of CCTO film in the metal–insulator–metal capacitor configuration over a wide temperature (80 to 500 K) and frequency (100 Hz to 1 MHz) range have been measured. The small dielectric dispersion with frequency observed in the lower temperature region (<300 K) indicates the presence of small defects in the deposited CCTO thin film. The frequency-dependent AC conductivity at lower temperature indicates the hopping conduction. The dielectric dispersion data has been analyzed in the light of both conductivity relaxation and Debye type relaxation with a distribution of relaxation times. Origin of dielectric dispersion is attributed to the distribution of barrier heights such that some charge carriers are confined between long-range potential wells associated with defects and give rise to dipolar polarization, while those carriers which do not encounter long-range potential well give rise to DC conductivity.     

Colossal magnetoresistance effect in epitaxially grown La2/3Ca1/3MnO3 perovskite-like manganite thin films

We report in this work, study on colossal magnetoresistance (CMR) effect in epitaxial La_2/3Ca_1/3 MnO₃ thin films grown on SrTiO₃ (0 0 1) substrates by pulsed laser deposition (PLD) technique. The films were grown on as-received SrTiO₃ substrates and on SrTiO₃ substrates prepared by HF etching (Koster et al., Appl. Phys. Lett. 73 (1998) 2920; V. Leca et al., Wet etching methods for perovskite substrates, University of Twente, MESA+ Research Institute, Low Temperature Division). Two of the samples were annealed in different conditions to investigate the films heat treatment effect on electric and magnetic properties. Electrical resistance was done using the four-probe method at temperatures in the range of 2–375 K without a magnetic field and in an external field of 5 T applied in the film plane. Resistance-magnetic field (R vs. H) at 77 K for the two annealed samples was done in a 5 T sweep magnetic field. The surface morphology and structural information of the films were obtained using atomic force microscopy (AFM) and X-ray diffraction (XRD), respectively. Secondary ion mass spectroscopy (SIMS) analysis was performed on the annealed samples to investigate any possible chemical reaction between La_2/3Ca_1/3MnO₃ thin films and SrTiO₃ substrate.     

Morphology dependence of the dielectric properties of epitaxial BaTiO3 films and epitaxial BaTiO3/SrTiO3 multilayers

Epitaxial BaTiO₃ films and epitaxial BaTiO₃/SrTiO₃ multilayers were grown by pulsed laser deposition on vicinal surfaces of (001)-oriented Nb-doped SrTiO₃ (SrTiO₃:Nb) single-crystal substrates. Atomic force microscopy was used to investigate the surface topography of the deposited films. The morphology of the films, of the BaTiO₃/SrTiO₃ interfaces, and of the column boundaries was investigated by cross-sectional high-resolution transmission electron microscopy. Measurements of the dielectric properties were performed by comparing BaTiO₃ films and BaTiO₃/SrTiO₃ multilayers of different numbers of individual layers, but equal overall thickness. The dielectric loss saturates for a thickness above 300 nm and linearly decreases with decreasing film thickness below a thickness of 75 nm. At the same thickness of 75 nm, the thickness dependence of the dielectric constant also exhibits a change in the linear slope both for BaTiO₃ films and BaTiO₃/SrTiO₃ multilayers. This behaviour is explained by the change observed in the grain morphology at a thickness of 75 nm. For the thickness dependence of the dielectric constant, two phenomenological models are considered, viz. a series-capacitor model and a dead-layer model. PACS 77.22.-d; 77.22.Ch; 77.55.+f; 77.22.Gm; 77.84.Dy; 81.15.-z ; 81.16.Mk; 81.65.-b; 68.55.-a; 68.37.-d