Some aspects of plasma polymerization of fluorine-containing organic compounds. II. Comparison of ethylene and tetrafluoroethylene

Plasma polymerizations of ethylene and tetrafluoroethylene are compared. In the plasma polymerization of ethylene and of tetrafluoroethylene, glow characteristics play an important role. Glow characteristic is dependent on a combined factor of W/F_m, where W is discharge power and F_m is monomer flow rate. At higher flow rates, higher wattages are required to maintain “full glow.” In the plasma polymerization of tetrafluoroethylene, simultaneous decomposition of the monomer competes with plasma polymerization. Above a certain value of W/F_m, decomposition becomes the predominant reaction, and the polymer deposition rate decreases with increasing discharge power. ESCA results indicate that the plasma polymer of tetrafluoroethylene that is formed in an incomplete glow region (low W/F_m) is a hybrid of polymers of plasma polymerization and of plasma-induced polymerization of the monomer. Polymers formed under conditions of high W/F_m to produce “full glow” are similar, regardless of the extent of decomposition of the monomer. They contain carbons with different numbers of F(CF₃, ? CF₂? , >CF? , >C<) and carbons bonded to other more electronegative substituents.     

Critical evaluation of conditions of plasma polymerization

Under conditions of plasma polymerization, we are dealing with the “reactive” or “self-exhausting” rather than the “nonreactive” or “non-self-exhausting” gas phase (plasma). Therefore, many parameters that define the gas phase, such as system pressure and monomer flow rate, which are measured in the nonplasma state (before glow discharge is initiated), do not apply to a steady state of plasma, the conditions under which most of the studies on plasma polymerization are carried out. Consequently, information based on: (1) the polymer deposition rate measured at a fixed flow rate and discharge power, (2) the dependence of deposition rate on flow rate at fixed discharge power, or (3) the dependence of deposition rate on discharge power at fixed flow rate, does not provide meaningful data that can be used to compare the characteristic nature of various organic compounds in plasma polymerization. The significance and true meaning of experimental parameters applicable to conditions of plasma polymerization are discussed. The most important feature is that plasma polymerizations of various organic compounds should be compared at comparable levels of composite discharge power parameter W/FM, where W is discharge power, F is the monomer flow rate (given in moles), and M is the molecular weight of a monomer.     

Distribution of polymer deposition in plasma polymerization. III. Effect of discharge power

Distribution of polymer deposition in an inductively coupled rf discharge system is studied as a function of level of discharge power with acetylene and styrene as monomers. When a fixed flow rate is used, the discharge power has a relatively small effect on the pattern of distribution of polymer deposition as long as values of W/FM, where W is discharge wattage, F is flow rate, and M is molecular weight of monomer, are maintained above a critical level to maintain full glow in the reaction tube. It has been shown that plasma polymerization of two monomers which have different molecular weights can be compared in a fair manner by selecting conditions to yield similar value of W/FM.     

Distribution of polymer deposition in plasma polymerization. II. Effect of reactor design

The effects of relative positions of the monomer inlet and the r.f. coil, and of the inlet and outlet, on the distribution of polymer deposition in plasma polymerization of ethylene were investigated using an electrodeless glow discharge by a 13.5-MHz radiofrequency source. The diffusional transport of active species created under the r.f. coil, diffusional transport of polymer forming species, and flow of gas in the system are important factors that determine the distributions of polymer deposition observed in plasma polymerization of ethylene. The mechanisms of polymer deposition are discussed in conjunction with postulated plasma polymerization mechanisms.     

POLYMERIZATION OF OCTAFLUOROCYCLOBUTANE IN GLOW DISCHARGE Ⅱ. ESCA AND IR CHARACTERIZATION OF POLYMER STRUCTURE*

In a capacitively coupled discharge with external electrodes, He, H_2, N_2 or Ar were used as plasmagas, polymerization of octafluorocyclobutane was carried out under different conditions by varyingdischarge power, pressure, plasma gas and plasma-gas/monomer ratio. Structure of polymerizedproducts was characterized by IR spectroscopy and ESCA measurement. It was found that therewere six elements in the products, i.e. C, F, Si, O, N and H. The probably existed groups in poly-mers wer investigated. By analyzing the resolved peaks of C_(1S) region in ESCA spectra, effect of thereaction conditions on degree of branching of the polymerized products and the relationship of thepolymer structure wth the mechanism of the competitive ablation and polymerization process werestudied. In addition, polymer deposition process occurring in glow discharge was discussed.     

Plasma polymerization of tetrafluoroethylene. III. Reproducibility and effects of substrate and reactor materials

Plasma polylmerization occurs in plasmas surrounded by surfaces and polymer formation is one of the complicated interactions that take place between active species and molecules which constitute surfaces and gas phases. Effects of reactor wall, substrate materials, flow rate, and discharge power on polymer formation, and properties of polymer deposits were investigated by ESCA, IR (infrared) spectroscopy, and the measurement of system pressure. The effect of surface is important at the initial stage of plasma polymerization which can be easily detected by the system pressure change; however, integrated properties such as IR spectroscopy and the deposition rate show the effect in a less pronounced manner. ESCA, which reflects the properties of surface (approximately 20 A? in depth), showed the effect of surface in an even less sensitive manner. The amount and properties (including the effects of surfaces) are dependent on plasma polymerization parameter W/FM(W, wattage; F, volume flow rate; and M, molecualar weight of monomer) and the location of deposition within a reactor. IR and ESCA data clearly showed the dependence of polymer properties on W/FM; i.e., increase of W and decrease of M to be equivalent. When all these factors were kept under control, the reproducibility of plasma polymerization was found to be excellent.     

Plasma polymerization of fluoromethanes

Methane and fluoromethanes (CH_nF_4−n, 1 ≤ n ≤ 3) were subjected to an rf glow discharge plasma. All the fluoromethanes (including methane) polymerized in the plasma and formed thin films. The deposition rate of the fluoromethanes depended on their monomer structure: CH₂F₂, of which the F/H ratio is unity, showed the greatest deposition rate. The elimination of H and F atoms as H—F was found to be a key factor for the polymerization of fluoromethanes. The chemical composition of the polymerized film, measured with X-ray photoelectron spectroscopy and glow discharge emission spectroscopy, was also found to be strongly dependent on monomer structure. © 1998 John Wiley & Sons, Inc. J. Polym. Sci. A Polym. Chem. 36: 2043–2050, 1998     

Effects of Reaction Conditions on the Structure of Plasma-Polymerized Ethylene

Liquid and solid polymeric products were derived from a low-pressure glow discharge of ethylene. Polymerization pressure, discharge power, and monomer flow rate were systematically varied. Products were analyzed by infrared spectroscopy to determine the concentrations of characteristic functional groups in each. Polymer form, apparent crosslink density, and deposition rate were also reported. Structural variations and the form of the polymerization products can be explained in terms of the prevailing discharge conditions and the deposition rate, both of which are functions of the reactor operating parameters. It was found that the degree of crosslinking in rigid films of plasma polymerized ethylene is in the range of 6 to 16 chain carbons between crosslinks.     

Creation of Polymerizable Species in Plasma Polymerization

Plasma polymerization of trimethylsilane (TMS) was carried out and investigated in a direct current (dc) glow discharge. The formation of TMS plasma glow was carefully examined with optical photography as compared with an Ar dc glow discharge. It was found that there exists a significant difference in the nature of glow and how the glow is created in TMS glow discharge, which polymerizes or causes deposition, and that of monatomic gas such as Ar, which does not polymerize or deposit. In dc Ar discharge, the negative glow, which is the most luminous zone in the discharge, develops in a distinctive distance away from the cathode surface, and the cathode remains in the dark space. In a strong contrast to this situation, in TMS dc discharge, the primary glow that is termed as cathode-glow in this paper appears at cathode surface, while a much weaker negative glow as a secondary glow was observed at the similar location to where the Ar negative glow appears. The deposition results of plasma polymers and gas phase composition data of TMS in a closed reactor acquired by ellipsometry and residual gas analyzer (RGA) measurements clearly indicated that the cathode-glow in TMS glow discharge is mainly associated with chemically reactive species that would polymerize or form deposition, but the negative glow is related to species from simple gases that would not polymerize or deposit. Based on the glow location with respect to the cathode, it was deduced that the cathode-glow is due to photon emitting species created by molecular dissociation of the monomer that is caused by low energy electrons emanating from the cathode surface. The negative glow is due to the ionization and the formation of excited neutrals of fragmented atoms caused by high-energy electrons. Polymerizable species that would cause deposition of material (plasma polymers) are created mainly by the fragmentation of monomer molecules by low energy electrons, but not by electron-impact ionization of the monomer.     

Plasma polymerization investigated by the substrate temperature dependence

Plasma polymerization of tetra fluoroethylene (TFE), perfluoro-2-butyl-tetrahydrofuran (PFBTHF), ethylene, and styrene were investigated in various combinations of monomer flow rates and discharge wattages for the substrate temperature range of ?50 to 80°C. The polymer deposition rates can be generally expressed by k₀ = Ae^?bt, where k₀ is the specific deposition rate given by k₀ = (deposition rate)/(mass flow rate of monomer), A is the preexponential factor representing the extrapolated value of k₀ at zero absolute temperature, and b is the temperature-dependence coefficient. It was found that the value of b is not dependent on the condensibility of monomer but depends largely on the group of monomer; that is, perfluorocarbons versus hydrocarbons. The values of A are dependent on domains of plasma polymerization. In the energy deficient region A is given by A = α(W/FM)ⁿ, where α is the proportionality constant, W is discharge wattage, FM is the mass flow rate, and n is close to unity. In the monomer deficient region A becomes a constant. The kinetic equation is discussed in view of the bicyclic rapid step-growth polymerization mechanisms.     

Fundamentals of Plasma Polymerization

The plasma polymerization of ethylene is used as an example through which to discuss the elementary steps involved in forming a polymer in an electric discharge. The relationship of the experimentally controlled variables to the rate of formation of first generation active species is discussed. These species are related, in turn, to the overall rate of polymerization through a simple model. Two asymptotic conditions are discussed which correspond to minimal and total conversion of monomer to polymer. The dependence of polymer deposition rate on monomer flow rate predicted by the model is found to correspond very closely to that observed experimentally. The predicted effect of gas pressure on polymer deposition rate also agrees with that found experimentally.     

Plasma polymerization of some organic compounds and properties of the polymers

Plasma polymerizations (under 13.5-MHz radiofrequency inductively coupled glow discharge) of some organic compounds are investigated by their properties (elemental analysis, surface energy, and infrared spectra) and their relations to the concentrations of free radicals in the polymers as detected by electron spin resonance (ESR) spectroscopy. Monomers that have been investigated are hexamethyldisiloxane, tetrafluoroethylene, acetylene, acetylene/N₂, acetylene/H₂O, acetylene/N₂/H₂O, allene, allene/N₂, allene/H₂O, allene/N₂/H₂O, ethylene, ethylene/N₂, ethylene oxide, propylamine, allylamine, propionitrile, and acrylonitrile. Plasma-polymerized polymers generally contain oxygen, even if the starting monomers do not contain oxygen. This oxygen incorporation is related to the free-radical concentration in the polymer. Molecular nitrogen copolymerizes with other organic monomers such as acetylene, allene, and ethylene, and their properties are very similar to those of plasma-polymerized polymers from nitrogen-containing compounds such as amines and nitriles. The addition of water to the monomer mixture reduces in a dramatic manner the concentration of free radicals in the polymer and consequently the oxygen-incorporation after the polymer is exposed to air. The concentrations of free radicals (by ESR) are directly correlated to the change of the properties of plasma-polymerized polymers with time of exposure to the atmosphere. These changes are primarily the introduction of carbonyl (and possibly hydroxyl) groups. The addition of water to the plasma introduces these groups during the polymerization.     

Plasma polymerization of tetrafluoroethylene. IV. Comparison of ethylene and tetrafluoroethylene by measurement of electron temperature and density of positive ions

The double probe method was applied to plasma of tetrafluoroethylene (TFE) and ethylene and the electron temperature (T_e) and density of positive ions (n_p) were measured at various discharge wattages. The probe current-probe voltage diagrams for TFE were different from those for ethylene. The shape of its diagram indicates that a considerable number of negative ions exist in TFE plasma. The levels of n_p for TFE were also nearly six times greater than those for ethylene at the same discharge current. The dependence of TFE polymer deposition and the chemical structure of the polymer, based on ESCA data on discharge current, was related to T_e and n_p measured by the probe method. The values of T_e and n_p may not be directly related to the polymer formation in a plasma; the method provides a direct measure of plasma energy density where plasma polymerization takes place, whereas it cannot be accurately estimated by the input energy of a discharge. It was found that plasma energy density based on (n_pT_e) for TFE plasma and that for ethylene differ significantly at the same level of input parameter (W/FM), where W is the discharge wattage, F is the volume flow rate, and M is the molecular weight of the monomer.     

In situ FTIR investigation of MMA plasmas,plasma-polymerized films,and reaction mechanisms

Methyl methacrylate (MMA) plasmas and plasma-polymerized methyl methacrylate (PPMMA) films were studied in situ with FTIR and FTIR/ATR (attenuated total reflection) in an r.f. capacitively coupled glow discharge. A statistically designed experiment was conducted by varying the r.f. power, process pressure, and MMA flow rate. MMA plasma fragments were identified from the gas-phase FTIR measurements. They include the intermediate species such as dimethylketene, formaldehyde, allene, and propene; small hydrocarbons such as acetylene, methane, and ethylene; and oxygenates such as carbon dioxide, carbon monoxide, and methanol. Statistical analysis techniques (correlation analysis, analysis of variance and regression analysis) were used on both gas and film data. Gas-phase reaction mechanisms are proposed, and the relationship between the gas and film data is investigated to understand the film deposition chemistry. The deposition rate is positively correlated to the relative concentrations of MMA fragments which are identified as the major film precursors in the deposition process. © 1998 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 36: 587–602, 1998     

The Role of Halogens in the Plasma Polymerization of Hydrocarbons

Vinyl chloride, vinyl fluoride, and tetrafluoroethylene were polymerized in a radio frequency electric glow discharge. It was found that when compared with the unhalogenated simple hydrocarbons, the rates of polymer deposition are in the order vinyl chloride, acetylene, tetrafluoroethylene, vinyl fluoride, ethylene. This observation can be rationalized by considering the ease with which free radical and unsaturated species can be formed in the plasma. IR spectra show that the structures of plasma-polymerized vinyl chloride and vinyl fluoride are in many respects similar to the plasma-polymerized hydrocarbon. The spectrum of plasma-polymerized tetrafluoroethylene, however, does not resemble that of conventional polytetrafluoroethylene. Addition of dichlorodifluoromethane to the monomer stream dramatically increased the polymer deposition rate; the effect is more subdued for chloromethane and is negligible for tetrafluoromethane. Elemental analysis indicates that little of the added halogens is present in the resultant polymers. Thus the halogenated compounds appear to act as a gas phase catalyst for the plasma polymerization of hydrocarbons.     

DC plasma polymerization of hexamethyldisiloxane

Hexamethyldisiloxane (HMDS) was polymerized onto metallic and insulating substrates in a parallel-plate DC reactor. The limits of the DC reactor with respect to pressure and power were determined for deposition of PP-HMDS films. In all conditions ranging from 5 Pa/0.3 W to 100 Pa/50 W, solid films were deposited. No powders or oily films were obtained under any condition in this operating range. The films were polymeric in nature,i.e., they were neither carbon-like nor SiO _x -like films. The structures and crosslink densities of the plasma films dependend strongly on the deposition conditions. The highest deposition rates, up to 2 μm per minute (or0.3 mg/cm² min), were obtained at high power, pressure, and flow rate conditions. An efficiency ɛ is introduced, defined as the fraction of the monomer that is retained in the form of a polymer deposited on the substrate. Efficiencies as high as 25% could be obtained in certain conditions. Pulsing the discharge power increased the conversion efficiency markedly, but the effect depended strongly on the monomer used. In addition to HMDS, plasma polymers were also deposited from pyrrole in pulsed conditions for comparison. A method is described for depositing films on insulators from a DC glow discharge using two wire meshes held at a negative potential.     

Zone-resolved mass spectroscopic study on RF plasma polymerization of styrene

The radiofrequency (rf) glow discharge plasma of styrene was investigated by direct sampling mass spectroscopy. Measurements were taken in three regions of the discharge: the plasma column and two dark zones before the electrodes. The plasma-polymerized styrene (PPS) thin films were analyzed by infrared spectroscopy (IR). The effects of monomer pressure and rf power on the ratios of mass peak heights C₄H/C₄H, C₆H/C₆H₅()CH in the three discharge regions, the polymer deposition rate, and the polymeric structure of the PPS films were studied. It was found that in the different discharge regions and under various discharge conditions, a variety of reactive species were formed by electron impact on monomer molecules. The polymer deposition rate was mainly dependent on the total number of the reactive species produced in the discharge. The concentration of phenyl groups in PPS films was proportional to the relative concentration of phenyl ring-containing reactive species in the gas phase plasma. © 1996 John Wiley & Sons, Inc.     

The Role of Dielectric Barrier Discharge Atmosphere and Physics on Polypropylene Surface Treatment

Dielectric barrier discharge (DBD) is the discharge involved in corona treatment, widely used in industry to increase the wettability or the adhesion of polymer films or fibers. Usually DBD's are filamentary discharges but recently a homogeneous glow DBD has been obtained. The aim of this paper is to compare polypropylene surface transformations realized with filamentary and glow DBD in different atmospheres (He, N₂, N₂ + O₂ mixtures) and to determine the relative influence of both the discharge regime and the gas nature, on the polypropylene surface transformations. From wettability and XPS results it is shown that the discharge regime can have a significant effect on the surface transformations, because it changes both the ratio of electrons to gas metastables, and the space distribution of the plasma active species. This last parameter is important at atmospheric pressure because the mean free paths are short (m). These two points explain why in He, polypropylene wettability increase is greater by a glow DBD than by a filamentary DBD. In N₂, no significant effect of the discharge regime is observed because electrons and metastables lead to the same active species throughout the gas bulk. The specificity of a DBD in N₂ atmosphere compared to an atmosphere containing oxygen is that it allows very extensive surface transformations and a greater increase of the polypropylene surface wettability. Indeed, even in low concentration and independently of the discharge regime, when O₂ is present in the plasma gas, it controls the surface chemistry and degradation occurs.     

Effects of Monomer Flow Rate,Flow Configuration,and Reactor Geometry on the Rate of Plasma Polymerization

The effects of flow rate on the plasma polymerization of ethylene in an rf discharge were investigated using both a tubular and a bell-jar-type of reactor. Both reactors contained parallel plate internal electrodes. Experiments with the tubular reactor showed that both the total thickness of the deposit and its distribution in the axial direction were strong functions of the flow rate. At low flow rates the polymer thickness decreased in the flow direction, while at high flow rates the polymer thickness increased. Each of these observations is explained by a simple model of plasma polymerization. Using the bell-jar reactor, different monomer flow distribution configurations were tested to determine their effect on the distribution of polymer thickness. It was found that distribution or diffusion of the monomer inflow provided a more uniform film.     

Glow discharge polymerization of tetramethyltin

Glow discharge polymerizations in the systems tetramethyltin (TMT), TMT/CH₄, TMT/C₂H₂ and TMT/N₂ were investigated and compared with those for methane and tetramethylsilane (TMS); some properties of the resulting polymers were examined. TMT is more easily polymerized in glow discharge than methane, and is deposited to as great an extent as TMS. Polymers prepared in these systems contain less carbon, nitrogen and oxygen than polymers from TMS; they consist mainly of CH₃, CH₂, CH, SnO and SnOSn groups. When nitrogen gas was mixed with TMT, amino groups were formed in the polymers. This formation arises from hydrolysis of SnN groups formed by interaction with TMT and nitrogen in glow discharge. This is distinctly different from the case of TMS. Surface energy, u.v. and visible absorption curve and thermal stability were measured. Adhesion between plasma films and polymer substrate is discussed.