衬底加热和电极修饰对提高有机场效应晶体管性能的影响

通过衬底加热和氧化钼(MoO3)修饰源漏极制备了并五苯有机场效应晶体管.研究了衬底温度和电极修饰层厚度对器件性能的影响.实验结果表明:当衬底温度为60℃、MoO3修饰层为10 nm时,器件性能获得了显著增强,场效应迁移率由原来的3.39×10-3 cm2/(V·s)提高到2.25 ×10-1 cm2/(V·s),阈值电压由12 V降低到3V.器件性能的改善归因于:衬底加热可以优化有源层形貌,改善载流子传输;而MoO3修饰层显著降低了电极与有源层之间的接触势垒,提高了载流子的注入.因此,衬底加热与电极修饰对于制备高性能有机场效应晶体管是不可或缺的优化手段.     

基于超薄Al2O3栅绝缘层的低工作电压IGZO薄膜晶体管及其在共源极放大器中的应用

随着薄膜晶体管(Thin-film transistor,TFT)在各类新兴电子产品中得到广泛应用,作为各类电子设备的关键组件,其工作电压和稳定性面临着巨大挑战。为了满足未来高度集成化、功能复杂的应用场合,实现其低工作电压和高稳定性就变得异常重要。我们在150 mm×150 mm大面积玻璃基底上,采用磁控溅射非晶铟镓锌氧化物(amorphous indium-gallium-zinc-oxide,a-IGZO)作为有源层,以原子层沉积(ALD)Al2O3为栅绝缘层,制备了底栅顶接触型a-IGZO TFT,并研究了50,40,30,20 nm超薄Al2O3栅绝缘层对TFT器件的影响。其中,20 nm超薄Al2O3栅绝缘层TFT具有最优综合性能:1 V的低工作电压、接近0 V的阈值电压和仅为65.21 mV/dec的亚阈值摆幅,还具有15.52 cm^2/(V·s)的高载流子迁移率以及5.85×10^7的高开关比。同时,器件还表现出优异的稳定性:栅极±5 V偏压1 h阈值电压波动最小仅为0.09 V以及优良的150 mm×150 mm大面积分布均一性。实现了TFT器件的低工作电压和高稳定性。最后,以该TFT器件为基础设计了共源极放大器,得到14 dB的放大增益。     

溶胶凝胶法制备以Al_2O_3为界面修饰层的铪铟锌氧薄膜晶体管

利用溶液法制备了以HfSiOx为绝缘层、HfInZnO为有源层、Al_2O_3为界面修饰层的TFT器件。HfSiOx薄膜经Al_2O_3薄膜修饰后,薄膜表面粗糙度从0.24nm降低至0.16nm。Al2O3薄膜与HfSiOx薄膜之间的界面接触良好,以Al_2O_3为界面修饰层的TFT器件整体性能得到提升,具体表现为:栅极电压正向和反向扫描过程中产生的阈值电压漂移显著减小,器件的阈值电压和亚阈值摆幅降低,迁移率与开关比增大。研究证明,溶液法制备Al_2O_3薄膜适合作为改善器件性能的界面修饰层。     

薄膜热处理对ZnO薄膜晶体管性能的提高

制备了两种以SiO2为绝缘层的底栅ZnO薄膜晶体管,分别以未退火和退火处理的ZnO薄膜作为有源层.与未退火处理的ZnO薄膜晶体管相比,退火处理的ZnO薄膜晶体管的饱和迁移率由2.3 cm2/(V·s)增大至3.12 cm2/(V·s),阈值电压由20.8V减小至9.9V,亚阈值摆幅由2.6 V/dec减小至1.9 V/...     

Ta_2O_5-PMMA复合栅绝缘层对OFETs性能的影响（英文）

选用五氧化二钽(Ta_2O_5)-聚甲基丙烯酸甲酯(PMMA)复合材料作为栅绝缘层制备了并五苯有机场效应晶体管(OFETs)。通过在Ta_2O_5表面旋涂一层PMMA可以降低栅绝缘层的表面粗糙度,增大其场效应晶体管的迁移率。研究了厚度在20~60 nm范围内的PMMA对复合绝缘层表面形貌、粗糙度以及器件电学性能的影响。结果表明,当PMMA厚度为40 nm时,器件的电学性能最佳。与单一的Ta_2O_5栅绝缘层器件相比,其场效迁移率由4.2×10~(-2)cm~2/(V·s)提高到0.31 cm~2/(V·s);栅电压增加到-20 V时,开关电流比由2.9×10~2增大到2.9×10~5。     

利用混合有机空穴传输材料提升有机薄膜晶体管场效应迁移率

通过采用在并五苯薄膜与源漏电极之间插入10 nm并五苯掺杂的N,N'-二苯基-N,N'-二(3-甲基苯基)-1,1'-联苯-4,4'-二胺薄膜的方法研究了基于并五苯有源层的底栅错面型有机薄膜晶体管的电学特性。研究发现:N,N'-二苯基-N,N'-二(3-甲基苯基)-1,1'-联苯-4,4'-二胺的引入可以有效改善有源层和源漏电极接触界面的表面形貌,利于形成欧姆接触,从而改善器件性能,最终使优化器件的迁移率由(0.1±0.01)cm2/(V·s)提升至(0.31±0.02)cm2/(V·s),阈值电压由(-34.6±1.3)V降至(-30.1±1.2)V。     

有机薄膜晶体管驱动聚合物发光二极管研究

研究了有机薄膜晶体管(OTFT)与聚合物发光二极管(PLED)集成制备技术和相关物理问题.OTFT结构为栅极钽(Ta)/绝缘层五氧化二钽(Ta2O5)/有源层并五苯(Pentacene)/源漏极金(Au);PLED器件结构为ITO/PEDOT:PEO(polyethylene oxide)/P-PPV或MEH-PPV/Ba/Al.PEDOT:PEO,P-PPV和MEH-PPV薄膜层均采用丝网印刷技术,实现了OTFT与PLED器件集成发光.其中OTFT器件的阈值电压为-7V,迁移率为0.91cm2/(V.s),并通过OTFT驱动得到以P-PPV和MEH-PPV为发光层的PLED器件的发光亮度分别达到124和26cd/m2,电流效率分别为12.4和1.1cd/A.利用丝网印刷技术可以有效控制高分子薄膜的沉积区域,实现功能器件的集成.     

溶胶凝胶法制备高性能锆铝氧化物作为绝缘层的薄膜晶体管

本文采用溶胶凝胶法制备了锆掺杂铝氧化物(锆铝氧化物)和铪铟锌氧化物薄膜,并用于制造薄膜晶体管的绝缘层和有源层.锆铝氧化物绝缘层具有较高的介电常数,其相对介电常数为19.67,且薄膜表面光滑,致密,其表面粗糙度仅为0.31 nm.获得的薄膜晶体管具备良好的器件性能,当器件宽长比为5时,器件的饱和迁移率为21.3 cm2/V·s,阈值电压为0.3 V,开关比可以达到4.3×107,亚阈值摆幅仅有0.32 V/dec.     

氧化锌锡薄膜晶体管的研究

在ITO玻璃基底上用射频磁控溅射技术生长氧化锌锡(ZnSnO)沟道有源层、用PECVD生长SiO₂薄膜作为薄膜晶体管的栅绝缘层研制了薄膜晶体管(TFT), 器件的场效应迁移率最高达到μ_n=9.1 cm²/(V ·s),阈值电压-2 V,电流开关比为10⁴. 关键词： 氧化锌锡 薄膜晶体管 场效应迁移率     

负电荷层对a-IGZO TFT阈值电压的影响

采用脉冲直流磁控溅射的方式沉积In-Ga-Zn-O (IGZO)膜层作为TFT的有源层.在TFT沟道处的有源层和绝缘层的界面上, 通过溅射法制作一定厚度的负电荷层对阈值电压(V_th)进行调制, 使得V_th由-3.8 V升高至-0.3 V, 器件由耗尽型向增强型转变.通过增加Al₂O₃作为负电荷层, 可有效地将V_th控制在0 V附近, 并且提高其器件稳定性, 得到较好的电学特性:电流开关比I_on/I_off>10⁹, 亚阈值摆幅SS为0.2 V/dec, 阈值电压V_th为-0.3 V, 迁移率μ为9.2 cm² /(V·s).     

基于Al_2O_3/MoO_3复合阳极缓冲层的倒置聚合物太阳能电池的研究

采用旋涂Al_2O_3前驱体溶液和低温退火的方法在活性层上形成Al_2O_3薄膜,并与MoO_3结合形成Al_2O_3/MoO_3复合阳极缓冲层,制备了以聚3-己基噻吩:[6.6]-苯基-C_(61)-丁酸甲酯(P3HT:PC_(61)BM)为活性层的倒置聚合物太阳能电池,并通过改变Al_2O_3前驱体溶液的浓度来分析复合阳极缓冲层对器件性能的影响.结果发现,Al_2O_3/MoO_3复合阳极缓冲层能有效调控倒置聚合物太阳能电池的光电性能及其稳定性.当Al_2O_3前驱体溶液的浓度为0.15%时,器件光伏性能达到最优值,与MoO_3单缓冲层的器件相比,光电转换效率(PCE)由3.85%提高到4.64%;经过80天老化测试后,具有复合阳极缓冲层的器件PCE保留为初始值的76%,而单缓冲层的器件PCE已经下降到50%以下.器件性能得到改善的原因是Al_2O_3/MoO_3复合阳极缓冲层增强了倒置太阳能电池器件阳极对空穴的收集能力,同时钝化了器件活性层,从而提升了太阳能电池器件的光伏性能及其稳定性.     

沟道层厚度对室温制备的In2O3薄膜晶体管器件性能的影响

在室温下采用直流磁控溅射以SiO₂/Si为衬底制备了不同沟道层厚度的底栅式In₂O₃薄膜晶体管,讨论了沟道层厚度对底栅In₂O₃薄膜晶体管的电学性能的影响。实验结果表明:器件的特性与沟道层厚度有关,最优沟道层厚度的In₂O₃薄膜晶体管为增强型,其阈值电压为2.5 V,开关电流比约为10⁶,场效应迁移率为6.2 cm²·V^-1·s^-1。     

Low voltage program-erasable Pd-Al_2O_3-Si capacitors with Ru nanocrystals for nonvolatile memory application

Pd-Al2O3-Si capacitors with Ru nanocrystals are fabricated and electrically characterized for nonvolatile memory application.While keeping the entire insulator Al2O3thickness fixed,the memory window has a strong dependence on the tunneling layer thickness under low operating voltages,whereas it has weak dependence under high operating voltages.As for the optimal configuration comprised of 6-nm tunneling layer and 22-nm blocking layer,the resulting memory window increases from 1.5 V to 5.3 V with bias pulse increasing from 10 5s to 10 2s under±7 V.A ten-year memory window as large as 5.2 V is extrapolated at room temperature after±8 V/1 ms programming/erasing pulses.     

A self-driven photodetector based on a SnS2/WS2 van der Waals heterojunction with an Al2O3 capping layer

Photodetectors based on two-dimensional (2D) materials have attracted considerable attention because of their unique properties. To further improve the performance of self-driven photodetectors based on van der Waals heterojunctions, a conductive band minimum (CBM) matched self-driven SnS₂/WS₂ van der Waals heterojunction photodetector based on a SiO₂/Si substrate has been designed. The device exhibits a positive current at zero voltage under 365 nm laser illumination. This is attributed to the built-in electric field at the interface of the SnS₂ and WS₂ layer, which will separate and transport the photogenerated carriers, even at zero bias voltage. In addition, the Al₂O₃ layer is covered by the surface of the SnS₂/WS₂ photodetector to further improve the performance, because the Al₂O₃ layer will introduce tensile stress on the surface of the 2D materials leading to a higher electron concentration and smaller effective mass of electrons in the films. This work provides an idea for the research of self-driven photodetectors based on a van der Waals heterogeneous junction.     

Growth and magnetism of Ni nanoparticles in Ni/Al2O3/Si or Si3N4 multilayers

We report on the fabrication of Ni/Al₂O₃/Si and textured Ni/Al₂O₃/Si₃N₄ multilayers containing Ni nanoparticles that exhibit significantly improved results. The secondary phases arising from thermal reaction between Ni and Si can be remarkably suppressed with increasing layers of Al₂O₃ and deposition of Ni/Al₂O₃ multilayers on Si₃N₄ substrates. Atomic force microscopy shows the formation of large as well as nanoclusters of Ni when grown on Si, whereas textured Ni nanoparticles are formed on Si₃N₄ substrates. The magnetization measurements on Ni/Al₂O₃/Si containing a single buffer layer of Al₂O₃ shows higher coercivity field with magnetic nanowire-like behavior, whereas with several Al₂O₃ alternate layers almost a superparamagnetic-like behavior is observed. However, significantly improved magnetic hysteresis was observed in textured Ni/Al₂O₃/Si₃N₄ multilayers due to preferred alignment of Ni nanocrystallites.     

SF6中氧化铝环氧复合材料的纳秒脉冲闪络特性

氧化铝掺杂环氧树脂复合材料在电力绝缘设备中应用广泛,然而人们对其在纳秒脉冲下的绝缘性能研究较少,这限制了它在指导脉冲功率装置中的应用。为探究其在纳秒脉冲下的沿面绝缘性能,对氧化铝掺杂环氧树脂复合材料在前沿数十ns快脉冲电压下的闪络特性进行了研究,结果显示,其闪络电场较纯环氧有较大提高,闪络电压符合韦伯分布。实验表明,闪络电压随电压上升率的增加而显著增加,从5.8 kV/ns时的108 kV上升到20.5 kV/ns时的226 kV,增幅超过1倍。闪络时延随电压上升率的上升呈现“先快速下降、后趋于平缓”的趋势。在试样闪络通道表面观测到明显的碳化现象,说明实验中的闪络放电对复合材料有破坏性影响。     

Atomic-layer-deposited Al_2O_3 and HfO_2 on InAlAs: A comparative study of interfacial and electrical characteristics

Al_2O_3 and HfO_2 thin films are separately deposited on n-type InAlAs epitaxial layers by using atomic layer deposition(ALD).The interfacial properties are revealed by angle-resolved x-ray photoelectron spectroscopy(AR-XPS).It is demonstrated that the Al_2O_3 layer can reduce interfacial oxidation and trap charge formation.The gate leakage current densities are 1.37×10~6 A/cm~2 and 3.22×10~6 A/cm~2 at+1V for the Al_2O_3/InAlAs and HfO_2/InAlAs MOS capacitors respectively.Compared with the HfO_2/InAlAs metal-oxide-semiconductor(MOS) capacitor,the Al_2O_3/InAlAS MOS capacitor exhibits good electrical properties in reducing gate leakage current,narrowing down the hysteresis loop,shrinking stretch-out of the C-V characteristics,and significantly reducing the oxide trapped charge(Q_(ot)) value and the interface state density(D_(it)).     

BN&Al2O3/环氧树脂复合材料粘接层对LED灯结温的影响

自制BN/EP(环氧树脂)复合材料和Al₂O₃/EP复合材料作为LED灯PCB板和散热铝块之间的粘接层材料,采用精密钻孔的方法用高精度测温仪测量LED灯正常工作时的温度分布,讨论粘接层对结温的影响,并与COMSOL Multiphysics软件模拟结果进行对比分析。实验测量LED结温与模拟结温变化趋势基本一致,结温会随着粘接层厚度的增加而上升、随着粘接层复合材料热导率的增加先快速降低而后趋于平缓。最终得到PCB板和散热铝块间最佳粘接层厚度和粘接层复合材料配比,当BN的质量分数为60%时,BN/EP复合材料粘接层的热导率最高,此时LED结温为75.2 ℃,比纯环氧树脂粘接层LED的结温降低了27.6 ℃。而Al₂O₃/EP复合材料粘接层LED的最低结温为78.2 ℃,此时Al₂O₃的质量分数为50%。     

Dramatic reduction in dark current of β-Ga2O3 ultraviolet photodectors via β-(Al0.25Ga0.75)2O3 surface passivation

Solar-blind ultraviolet photodetectors with metal-semiconductor-metal structure were fabricated based on β -(Al_0.25Ga_0.75)₂O₃/β -Ga₂O₃ film grown by metal-organic chemical vapor deposition. It was known that various surface states increase dark current and a large number of defects can hinder the transport of carriers, resulting in low switching ratio and low responsivity of the device. In this work, β -(Al_0.25Ga_0.75)₂O₃ films are used as surface passivation materials. Owning to its wide band gap, we obtain excellent light transmission and high lattice matching with β -Ga₂O₃. We explore the change and mechanism of the detection performance of the β -Ga₂O₃ detector after β -(Al_0.25Ga_0.75)₂O₃ surface passivation. It is found that under the illumination with 254 nm light at bias 5 V, the β -(Al_0.25Ga_0.75)₂O₃/β -Ga₂O₃ photodetectors show dark current of just 18 pA and high current on/off ratio of 2.16×10⁵. The dark current is sharply reduced about 50 times after passivation of the β -Ga₂O₃ surface, and current on/off ratio increases by approximately 2 times. It is obvious that β -Ga₂O₃ detectors with β -(Al_0.25Ga_0.75)₂O₃ surface passivation can offer superior detector performance.