�����Է��ﲣ���̻�ר�õ�����������ֵģ����ʵ���о�

采用了数值模拟与实验结合的方法研究了用于模拟放射性固体废物玻璃固化的非转移弧型等离子体炬的电、热特性。基于包括电弧室和开放空间在内的3D 模型得到了电弧等离子体和等离子体射流的温度场。根据计算结果,电弧室内的最高温度位于第一阳极内,达到41.77×10 K;弧电压的计算值高于实测值,二者之间的差异随着电流强度的增大而逐渐减小。采用该等离子体炬熔融模拟废物的实验发现,所确定的等离子体炬到炉底的距离能够满足废物熔融的要求,与计算的结果相符合。上述结果表明,数值模拟的结果可以作为等离子体炉工程设计的依据,并可以用作进一步分析等离子体炉炉膛内工艺过程的输入条件。     

放射性废物玻璃固化专用等离子体炬的数值模拟与实验研究

采用了数值模拟与实验结合的方法研究了用于模拟放射性固体废物玻璃固化的非转移弧型等离子体炬的电、热特性。基于包括电弧室和开放空间在内的3D 模型得到了电弧等离子体和等离子体射流的温度场。根据计算结果,电弧室内的最高温度位于第一阳极内,达到1.77×10⁴ K;弧电压的计算值高于实测值,二者之间的差异随着电流强度的增大而逐渐减小。采用该等离子体炬熔融模拟废物的实验发现,所确定的等离子体炬到炉底的距离能够满足废物熔融的要求,与计算的结果相符合。上述结果表明,数值模拟的结果可以作为等离子体炉工程设计的依据,并可以用作进一步分析等离子体炉炉膛内工艺过程的输入条件。     

射频容性耦合等离子体放电特性的光谱诊断

利用流体模型模拟和发射光谱实验诊断相结合的方法,研究了中等气压、中等功率下射频容性耦合等离子体的放电特性。理论上,采用基于流体模型的COMSOL软件仿真,建立一维等离子体放电模型,以Ar气为工作气体,研究了不同气压以及不同射频输入功率下等离子体电子温度和电子密度的分布规律。实验上,依据仿真模型设计制作了相同尺寸的密闭玻璃腔体和平板电极,采用13.56 MHz射频放电技术电离腔体内的工作气体Ar气,测量了不同气压、不同射频输入功率时放电等离子体的发射光谱。通过分析和选择适当的Ar Ⅰ和Ar Ⅱ的特征谱线,分别利用玻尔兹曼斜率法以及沙哈-玻尔兹曼方程计算了等离子体的电子温度与电子密度,并结合模拟仿真结果对光谱诊断结果进行了修正。结果表明：当气体压强为300~400 Pa、输入功率为600~800 W时,等离子体近似服从玻尔兹曼分布,此时利用光谱法得到的等离子体参数与仿真结果相符合。仿真模拟与光谱实验诊断相结合的方法可初步诊断出中等气压下等离子体的放电参数,增加了玻尔兹曼斜率法和沙哈-玻尔兹曼方程在等离子体放电中的使用范围,扩大了光谱法在低电子密度容性耦合等离子体参数诊断的应用场合,为中等气压容性耦合等离子体在工业与军事上的应用研究提供了重要物理状态的分析手段。     

����������������ʵ��ϵͳ�ĵ����Է���

采用PSpice软件进行了等离子体流动控制实验系统的电特性仿真。将等离子体放电建模为分段非线性的电压控制电流源子模块,较好地解决了等离子体流动控制系统电特性仿真的关键问题。在此基础上,对等离子体流动控制实验系统进行了仿真。仿真结果证实了等离子体放电模型的有效性,可用于指导进一步仿真和流动控制实验系统的改进。     

容性耦合射频氩等离子体放电诊断研究及仿真模拟

针对中等气压、中等功率下射频容性耦合(CCRF)等离子体的放电特性,采用基于流体模型的COMSOL软件仿真,建立一维等离子体放电模型,以Ar为工作气体,研究同一气压时不同射频输入功率下等离子体电子温度和电子密度的分布规律。同时依据仿真模型设计制作相同尺寸的密闭玻璃腔体和平板电极,实验测量了不同射频输入功率时放电等离子体的有效电流电压及发射光谱,进而计算等离子体的电子温度及电子密度;利用玻耳兹曼双线测温法,得到光谱法下等离子体的电子温度及电子密度。结果表明:当气体压强为250 Pa、输入功率为100~450 W时,等离子体电压电流呈线性关系,电子密度随功率的增大而增大,而电子温度并未随功率的变化而有明显变化,其与功率无关。运用仿真模拟验证了实验的准确性,通过比较,三种方法所得的结果相近。通过结合等效回路法、光谱法和数值模拟仿真法初步诊断出中等气压下等离子体的放电参数,提出了结合三种方法作为实验研究的方法,使实验结果更具说服力,证明其方法的可靠性,也为进一步的等离子体特性研究提供依据。     

有源等离子体在开放大气环境下的反应扩散过程研究

利用一维模型用数值模拟的方法,研究了低气压开放环境下大气等离子体在存在等离子体源的情况下的反应扩散过程.得到了考虑化学反应、扩散以及漂移共同作用下的大气等离子体的主要成分随等离子体注入流量的变化规律及一定流量情况下主要带电成分随时空的演化规律. 将数值模拟结果与一个近似解析公式相衔接,估计达到稳态时维持一定电子密度所需要的等离子体流量,可据此进一步估计所需功率. 关键词： 大气等离子体 等离子体源 数值模拟 反应扩散过程     

Computational study of plasma-surface interaction in plasma-assisted technologies

The influence of the unevenness of substrates immersed into plasma important for plasma-based treatment of materials were studied by computer experiment. The role of both substrate properties and plasma parameters was investigated. For this analysis the combination of multidimensional fluid modelling and particle simulation was used. The fluid part of our model consisted of continuity equations for all charged species, energy balance equation for electrons and Poisson equation. The basic scattering processes were also included. The particle simulation technique was used both for the calculation of electron energy distribution function and for the derivation of quantities characterising plasma-surface interaction. This approach enabled us to study in detail the structure of the sheath and presheath near metal substrates with realistic geometries and finite dimensions. The main attention was devoted to the influence of substrate geometry in both macroscopic and microscopic spatial scales on the local electric fields in plasma.     

等离子体密度标长对高次谐波转换效率的影响

通过等离子体粒子模拟研究了在强激光与等离子体相互作用产生高次谐波的过程中,等离子体密度标长对转换效率的影响,计算了在不同密度标长下p偏振非相对论强度激光与高密度等离子体相互作用产生高次谐波的转换效率,发现等离子体密度标长对转换效率有重要的影响,这种影响与谐波级次,等离子体密度,激光脉冲宽度有关。     

Modeling of argon discharge characteristics of planar-type surface wave plasmas in an electron fluid model

The planar-type surface wave plasma (SWP) device permits the generation of high-density and uniform processing plasmas via 2.45-GHz microwave power without the application of an external magnetic field. In the present study, the discharge characteristics in the SWP device were analyzed using a two-dimensional numerical simulation code, and the results were compared with experimental observations. The simulation code is based on the finite-difference time-domain (FDTD) method for the microwave field and on the electron fluid model for the argon discharge plasma. Experimental measurements were performed, and they showed that the surface-wave discharge at a filling pressure of 10-100 mtorr has characteristic electron-density distributions that have a peak at approximately 2 cm from the surface. This characteristic of the electron density profiles, as well as the electron temperature profiles in the plasma, is reproduced by the simulation code, albeit with some discrepancies. In order to reduce the effects of these discrepancies, intentional changes in the electron heat conductivity were introduced, and the adiabatic assumption was found to result in a reasonable electron temperature profile. The effects of the alumina window thickness were also investigated in the simulation.     

PIC/MCC Simulation of Electron and Ion Currents to Spherical Langmuir Probe

The Particle In Cell/Monte Carlo Collisions (PIC/MCC) simulation was used for the calculation of electron and ion currents to a spherical Langmuir (electrostatic) probe. This simulation took into account the collisions of collected charged particles with neutral gas particles around the probe and it can calculate the probe currents at higher neutral gas pressures. The improvements of usual simulation techniques enabled to speed up the simulation and to calculate the probe current even for neutral gas pressures above 1 kPa. The simulations were carried out for two cases: i) probe with radius of 0.5 mm in non‐thermal plasma with high electron temperature, ii) probe with radius of 10 µm in afterglow plasma with low electron temperature. The influence of probe radius on electron probe current was also studied. The simulations showed that thick sheath limit of OML theory provides incorrect values of probe current for probes with radii larger than 200 µm at plasma parameters considered even at very low neutral gas pressures. The probe characteristics were calculated for probe with 0.5 mm radius for pressures up to 500 Pa and for probe with 10 μm radius for pressures up to 3 kPa. The influence of collisions on electron and ion probe current was demonstrated and the procedure for determination of electron and ion densities from the probe measurement at higher pressures was developed. The results from PIC/MCC simulations were compared with results from continuum theory. (© 2015 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Top down nano technologies in surface modification of materials

This article contains a broad overview of etch process as one of the most important top-down technologies widely used in semiconductor manufacturing and surface modification of nanostructures. In plasma etching process, the complexity comes from the introduction of new materials and from the constant reduction in dimensions of the structures in microelectronics. The emphasis was made on two types of etching processes: dry etching and wet etching illustrated by three dimensional (3D) simulation results for the etching profile evolution based on the level set method. The etching of low-k dielectrics has been demonstrated via modelling the porous materials. Finally, simulation results for the roughness formation during isotropic etching of nanocomposite materials as well as smoothing of the homogeneous materials have also been shown and analyzed. Simulation results, presented here, indicate that with shrinking microelectronic devices, plasma and wet etching interpretative and predictive modeling and simulation have become increasingly more attractive as a tool for design, control and optimization of plasma reactors.     

大气压微波等离子体射流装置放电特性研究

基于同轴传输线结构设计了两种不同喷嘴结构的大气压微波等离子体射流(MW-APPJ)装置,其工作频率2.45 GHz,工作气体为氩气,分别研究了两种不同喷嘴结构对等离子体放电特性产生的影响。仿真结果表明,MW-APPJ在气体喷嘴处会产生高强度的电场,经过优化结构,实现在频率2.45 GHz下,喷嘴处的场强满足氩气电离的击穿场强阈值要求。同时,利用多物理场耦合仿真软件对装置的气流分布进行了稳态模拟,并通过实验对比分析了两种喷嘴结构下大气压氩等离子体射流的基本特性。实验结果表明,不同的喷嘴结构会影响等离子体装置的反射系数随输入功率的变化规律,但并不影响等离子体射流长度随输入功率的变化规律和反射功率随进气流量的变化规律;同时,在大气压下,稳态微波等离子体射流呈现出类金属性,等离子体中的电子只能在很薄的区域中吸收微波能量,因而造成微波的反射功率较大。     

A New Unconditionally Stable Algorithm for Steady-State Fluid Simulation of High Density Plasma Discharge

A new unconditionally stable algorithm for steady-state fluid simulation of high density plasma discharge is suggested. The physical origin of restriction on simulation time step is discussed and a new method to overcome it is explained. To compare the new method with previous other methods, a one-dimensional fluid simulation of inductively coupled plasma discharge is performed.     

Circuit model for two-electrode AC discharge

This paper presents a circuit model for a two-electrode AC discharge, which has two electrodes separated from the discharge gap by an insulator. The model consists of a series connection of an equivalent circuit for plasma and two capacitors for insulator. The equivalent circuit for plasma was constructed using the measured electrical properties of a two-electrode DC discharge. The validity of model was checked with experiments on a three-electrode test device; two electrodes exposed to the discharge gap and the other electrode separated from the discharge gap by an insulator. The measured voltages of the test device are compared with those obtained by circuit simulation. For various waveforms, which are being used widely to drive an AC plasma display panel, the results of circuit simulation agree well with experiment.     

The investigation of neutralization process of gas-phase sewage sludge using thermal plasma method

The purpose of this research is to investigate the influence of plasma flow on the composition of gaseous phase organic waste. The experimental method and simulation program “Chemical Workbench” were used for this research. The gas phase waste was neutralized using air plasma in the temperature range of 1200–1700 K. The reactor simulation results showed that the amount of atomic oxygen and nitrogen decreases by 0.5%, meanwhile the amount of carbon monoxide increases by 0.5 percent, as the plasma forming gas is air. The investigation of percentage concentration results showed that as the temperature reaches 1700 K, the H₂ decreases by 4%, CO increases by 7%, CH₄ decreases by 0.4%, CO increases by 0.5%, N₂ decreases by 5%. The experimental measurement results of percentage concentration correlates sufficiently with simulation results for listed gas.     

Self-consistent charge-up simulation for the microscopic feature of SiO2 layer in rf capacitive discharge

The charge-up simulation of the microscopic feature with SiO₂ layer was investigated in various conditions of rf capacitive discharge by using the three-dimensional (3-D) particle-in-cell (PIC) charge-up simulation coupled with the one-dimensional (1-D) particle-in-cell Monte Carlo collision (PIC-MCC) simulation of rf capacitive argon discharge. The result showed that the charge-up effect on the micro-trench was greatly influenced by the conditions of the gas pressure and the discharge voltage in rf capacitive discharge. Based on the analysis of the distributions of electrons and ions arriving at the substrate in various plasma conditions, the charge-up effect and its reduction mechanisms on the micro-trench of capacitive discharge were discussed. This article is expected to provide qualitative and quantitative insight for the understanding of charging and its reduction mechanism on many plasma processes performed by the rf capacitive discharge.     

电磁波在非均匀碰撞等离子体中的透射增强效应

为研究碰撞等离子体对电磁波传输性质的影响,基于电磁波在介质中的传输特性,将等离子体作为一种特殊的介质,针对一定实验条件下的高功率微波（HPM）大气等离子体与一定范围电磁波的透射特性开展了实验、理论及仿真研究。研究发现:S波段HPM在50 Pa真空下形成的等离子体对不同频率的电磁波透射特性具有较大影响,且在一定频率范围内有规律地出现电磁波透射信号增强效应现象;获取了一系列不同频率连续电磁波穿过HPM等离子体区域的透射波形,并对波形进行了归一化处理,在32.4 GHz下,连续电磁波穿过有无等离子体区域的透射系数约有2倍的差异。建立了仿真模型,获得31.5～32.5 GHz范围内透射系数分布曲线图,穿过等离子体的电磁波出现透射增强效应,且在某些频点上出现了约1.9倍的透射增强。该研究成果为HPM大气等离子体在隐身、应急通讯、黑障通讯等方面的应用提供了重要的技术支撑。     

Structure and phase transition of a two—dimensional dusty plasma

The structure and phase transition of a two-dimensional (2D) dusty plasma have been investigated in detail bymolecular dynamics simulation. Pair correlation function, static structure factor, mean square displacement, and bondangle correlation function have been calculated to characterize the structural properties. The variation of internalenergy, shear modulus, particle trajectories and structural properties with temperature has been monitored to studythe phase transition of the 2D dusty plasma system. The simulation results are in favour of a two-step continuoustransition for this kind of plasma.     

Simulation of ion beam extraction and focusing system

The characteristics of ion beam extraction and focused to a volume as small as possible were investigated with the aid of computer code SIMION 3D version 7.This has been used to evaluate the extraction characteristics(accel-decel system)to generate an ion beam with low beam emittance and high brightness.The simulation process can provide a good study for optimizing the extraction and focusing system of the ion beam without any losses and transported to the required target.Also,a study of a simulation model for the extraction system of the ion source was used to describe the possible plasma boundary curvatures during the ion extraction that may be affected by the change in an extraction potential with a constant plasma density meniscus.     

ֱ��˫����绡������������ֵģ��

为了提高等离子体废物处理效率,根据磁流体动力学理论,利用计算流体力学软件FLUENT,采用磁矢量势的方法对直流双阳极非转移型电弧等离子体炬进行了二维轴对称数值模拟。计算中采用了SIMPLE算法。数值模拟得到了等离子体的温度、速度等分布。结果表明,等离子体的温度随着轴向距离的增加而减小,随弧电流增加而增加;其速度随着轴向距离的增加而先增大后减小,随弧电流增加而增加;等离子体炬出口处的温度和速度随着径向距离的增加而减小。这些结果与实验结果基本相符。