热退火对电子束蒸镀方法制备的ZnO:Al薄膜光电性质的影响

采用电子束蒸镀方法在Si(100)衬底上沉积了ZnO:Al(ZAO)薄膜.在氧气气氛下对ZnO:Al薄膜进行了退火处理,退火温度的范围为400～800℃.X射线衍射(XRD)图样表明所制备的ZnO:Al薄膜具有六方结构,为c轴(002)择优取向的多晶薄膜.用Van der Pauw法测量了ZAO薄膜的电学特性,结果显示其电导率在500℃达到最大值.测量了ZAO薄膜的室温微区光致发光和变温发光光谱,观测到了ZnO自由激子、束缚在中性施主中心(D0)上的束缚激子以及束缚在离化施主中心(D+0)上的束缚激子发射.     

磁控溅射沉积掺锡氧化铟透明导电薄膜的光电性能研究

采用直流磁控溅射技术在玻璃衬底上制备了掺锡氧化铟(ITO)透明导电薄膜,通过XRD、XPS、四探针仪和分光光度计等测试方法,研究了沉积速率对ITO薄膜微观结构和光电性能的影响.实验结果表明:ITO样品为具有(222)择优取向的立方锰铁矿结构,其晶体结构和光电性能明显受到沉积速率的影响.当沉积速率为4 nm/min时,所制备的ITO薄膜具有最大的晶粒尺寸(32.5 nm)、最低的电阻率(1.1×10-3Ω·cm)、最高的可见光区平均透过率(86.4;)和最大的优良指数(7.9×102 S·cm-1),其光电综合性能最佳.同时采用Tauc法则计算了ITO薄膜的光学能隙,结果显示沉积速率增大时,ITO薄膜的光学能隙单调减小.     

衬底对宽带隙CGS薄膜的影响

分别在Al∶ ZnO(ZAO)薄膜和Mo薄膜两种不同衬底材料上,采用“三步法”共蒸发工艺沉积了约0.8 μm厚的CuGaSe2(CGS)薄膜,用X射线衍射仪测量薄膜的织构,研究不同衬底材料对CGS薄膜的影响.在ZAO薄膜底电极上沉积的CGS薄膜的(112)衍射峰强度较Mo薄膜底电极上减弱,(220/204)衍射峰反而增强.     

ZnO/SnO2复合透明导电膜性能的研究

采用直流磁控溅射工艺在SnO:透明导电玻璃上沉积一层ZnO膜,制备出ZnO/SnO2复合透明导电膜,作为硅薄膜太阳电池前电极.比较了具有不同ZnO厚度的复合膜氢轰击前后的光电性能,发现适当控制ZnO膜的厚度至关重要.研究了快速热退火(RTA)对薄膜的结构及光电性能的影响,发现400℃退火能够改善薄膜的光学性能.     

孪生对靶直流磁控溅射制备ZnO:Al薄膜及其特性研究

本文以ZnO:A l(ZAO)陶瓷为靶材,采用孪生对靶直流磁控溅射工艺在玻璃衬底上制备出高质量的铝掺杂氧化锌透明导电膜,研究了该薄膜的结构、光电及力学特性。采用孪生对靶制备ZAO薄膜可使样品避开等离子体直接轰击,减少基底薄膜的损伤。制备的薄膜具有结晶程度高、电阻率低、迁移率高等优点。ZAO薄膜的最低电阻率达到了4.47×10-4Ω.cm,在可见光区的平均透过率达到85%以上,非常适合做为铜铟硒(C IS)薄膜太阳电池窗口层。     

电沉积制备的ZnO薄膜在染料敏化太阳能电池中光电性能的研究

采用阴极电沉积法在导电玻璃基体上制备了ZnO薄膜,研究了工艺条件对ZnO薄膜在染料敏化太阳能电池(DSSC)中的光电性能的影响.通过热分析(TG-DTA),X射线衍射(XRD)和电子扫描电镜(SEM)对ZnO薄膜的结构和形貌进行了表征.实验结果表明,电沉积制备的ZnO薄膜为纤锌矿结构,薄膜颗粒均匀,在DSSC中表现出较好的光伏性能.     

衬底温度对MOCVD-ZnO薄膜特性的影响

利用金属有机物化学气相沉积(MOCVD)生长技术,制备本征ZnO薄膜,并研究薄膜的结构、形貌及光电等性能.结果表明:衬底温度对ZnO薄膜的微观结构、电学、光学及表面形貌等有显著影响.在衬底温度为180℃时获得电阻率为2.17×10-2Ω·cm.平均透过率为85;的低电阻、高透过率、结晶质量高、表面呈绒面结构的本征ZnO薄膜.对本征ZnO薄膜进一步掺杂和结构优化有望用于硅薄膜太阳能电池的前电极.     

MgO(100)衬底上生长BaTi2O5薄膜及其性能研究

利用脉冲激光沉积技术,在MgO(100)衬底上生长了BaTi2O5薄膜,探讨了沉积条件(衬底温度和氧分压)对薄膜结构的影响,并对其介电和光学性能进行了研究.结果表明:随衬底温度和氧分压的改变,BaTi2O5薄膜的物相和结晶取向逐渐变化;适宜的脉冲激光沉积工艺为衬底温度950~1000 K、氧分压12.5 Pa,在该条件下获得了b轴方向择优生长的BaTi2O5薄膜;该薄膜具有较高的居里温度(750 K),介电常数达2000,而且在可见光和红外波长范围内具有较高的透过率.     

衬底温度对碲化镉薄膜结构及光学性能的影响

碲化镉(CdTe)因具有良好的光电性能和吸收性能经常被作为太阳电池的吸收层材料.以纯度为99.99;的CdTe陶瓷靶为靶材在玻璃衬底上采用射频磁控溅射的方法制备了一系列的CdTe薄膜,研究了衬底温度对样品薄膜的厚度、结构和光学性能的影响.结果表明:随着衬底温度的增加薄膜的厚度在逐渐地减少;制备的薄膜都是立方闪锌矿结构且具有高度的(111)面择优取向;薄膜对可见光有较好的吸收性能,随衬底温度的增加而减小.     

钛掺杂对ZnO∶Ti透明导电薄膜性能的影响

以不同钛掺杂含量的氧化锌陶瓷靶作为溅射源材料,采用射频磁控溅射工艺在玻璃基片上沉积了Ti掺ZnO(TZO)透明导电薄膜,通过XRD、XPS、分光光度计和霍尔效应测试系统,研究了钛掺杂含量对TZO薄膜微观结构和光电特性的影响.结果表明:所有TZO薄膜均为六角纤锌矿结构,并且具有(002)择优取向,钛掺杂含量对薄膜性能具有明显的影响.当钛掺杂含量为3wt;时,TZO薄膜的结晶质量最好、可见光平均透过率最高、电阻率最低、品质因数最大(748.15 S/cm),具有最佳的光电综合性能.TZO薄膜的光学带隙随钛掺杂含量增加而单调增大.     

离子液体辅助溶胶-凝胶法制备ZnO∶Al透明导电薄膜及其光电性能研究

采用溶胶-凝胶法,以离子液体为辅助溶剂,在玻璃衬底上制备了ZnO∶Al(ZAO)薄膜。通过X-射线衍射(XRD)、场发射扫描电镜(FE-SEM)、紫外-可见分光光度计(UV-Vis)和霍尔效应等测试手段,分析了不同Al掺杂浓度ZAO薄膜的微观结构、光学和电学性能。结果表明,所制备的薄膜为非(002)取向的多晶膜。随着Al离子掺杂浓度的提高,薄膜的(002)晶面取向增强,晶粒逐渐由片状向球形转变,电阻率先降低后升高。进一步研究发现,在还原气氛NH3下退火可显著降低薄膜的电阻率,Al掺杂浓度为1 mol%时,薄膜电阻率达到4.7×10-2Ω·cm,可见光透过率平均在80%以上。     

Fabrication and characterization of transparent conductive ZnO:Al thin films prepared by direct current magnetron sputtering with highly conductive ZnO(ZnAl2O4) ceramic target

Using a highly conductive ZnO(ZnAl₂O₄) ceramic target, c-axis-oriented transparent conductive ZnO:Al₂O₃ (ZAO) thin films were prepared on glass sheet substrates by direct current planar magnetron sputtering. The structural, electrical and optical properties of the films (deposited at different temperatures and annealed at 400°C in vacuum) were characterized with several techniques. The experimental results show that the electrical resistivity of films deposited at 320°C is 2.67×10⁻⁴ Ω cm and can be further reduced to as low as 1.5×10⁻⁴ Ω cm by annealing at 400°C for 2 h in a vacuum pressure of 10⁻⁵ Torr. ZAO thin films deposited at room temperature have flaky crystallites with an average grain size of ∼100 nm; however those deposited at 320°C have tetrahedron grains with an average grain size of ∼150 nm. By increasing the deposition temperature or the post-deposition vacuum annealing, the carrier concentration of ZAO thin films increases, and the absorption edge in the transmission spectra shifts toward the shorter wavelength side (blue shift).     

Ba1-xSrxTiO3薄膜的Sol-gel制备技术与微结构

研究了利用钡、锶的碳酸盐代替醋酸盐作原料,采用新的Sol-gel技术制备Ba1-xSrxTiO3(BST)铁电薄膜的技术.采用碳酸钡、碳酸锶和钛酸四丁酯作原料配制BST溶胶;通过TG/DTA分析确定了BST薄膜的制膜工艺;使用XRD、SEM、AFM技术分析了薄膜的微结构.研究结果表明,采用碳酸盐作为钡、锶的原料,用冰醋酸和乙二醇甲醚混合液作溶剂,可配制出澄清透明、能长时间放置的溶胶,用此溶胶制备出了膜厚均匀、表面光洁致密、没有裂纹的全钙钛矿相的BST薄膜;采用扫描探针显微镜的压电响应模式(PFM)观察到了BST薄膜中的具有纳米结构的a畴和c畴.     

Optical and structural characterisation of zinc oxide thin films prepared by sol‐gel process

Zinc oxide thin films have been prepared on different substrates by the sol‐gel method using 2‐methoxyethanol solution of zinc acetate dihydrate stabilized by monoethanolamine. The photoluminescence spectra of the films show the band‐edge and sub‐band transitions. The intensity of the band edge emission peak increases, while the intensity of the deep level emission peak decreases in the films coated on sapphire substrate. Transmittance spectra show that the films are transparent beyond 400 nm. The structural property of the films has been evaluated using X‐ray diffraction. The X‐ray peak intensity of the film (002) grown on sapphire substrate is higher than the films grown on glass and quartz substrates. The AFM images show improvement in the surface of the annealed films as compared to the as‐grown ZnO films coated on sapphire substrates. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

金刚石膜在Si(100)衬底上的选择沉积

采用自行设计的微波等离子体化学气相沉积系统,利用铜网作为模板实现了在Si(100)衬底上金刚石膜的选择沉积.用场发射扫描电子显微镜(SEM)、Raman散射谱对样品进行了表征与分析.并与同样生长条件下未采用模板时得到的金刚石样品进行了比较.结果发现,采用模板后,金刚石膜的成核密度和质量都得到很大提高.     

Controlled deposition and transformation of amorphous calcium carbonate thin films

Controlled synthesis of amorphous calcium carbonate (ACC) films was realized by using the multiple templates, which are composed of a self‐assembled film (SAF, insoluble Poly (ε‐caprolactone) film) and a soluble modifier (poly allylamine), as modifiers. The formation of self‐assembled film was analyzed by monitoring the morphologies using atomic force microscopy. Even more noteworthy, using anhydrous ethanol as media, the ACC‐to‐vaterite‐to‐calcite transformation was also investigated, and the obtained products were characterized by scanning electron microscopy, Fourier transform infrared spectroscopy, and X‐ray diffraction. The results demonstrated that organic solvent has profound influence on transformation of amorphous calcium carbonate thin films. In the air of anhydrous ethanol, the controlled synthesis of calcium carbonate films with different morphologies, such as planar films with a few sporadic particles, symmetric rhombohedral crystals, novel crystals with symmetrical terraced convexity formation of calcite, was obtained by the fine‐tuning of induction time. It provides a new and simple method to prepare polymorphic CaCO₃ crystal films from the ACC films by controlling the crystallization process (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

X光电子能谱研究氧离子束辅助PLD共淀积ZnO薄膜

在ZnO的XPS分析中,ZnLMM俄歇峰能很好地指认氧化锌淀积膜中Zn的价态,结合O1s光电子峰的分析,可表征ZnO中缺氧程度。通过XPS的对比实验,表明采用氧(O)离子辅助PLD共淀积ZnO薄膜,能明显改善淀积ZnO膜的缺氧问题,降低薄膜层中的孔隙率,提高淀积ZnO薄膜质量。XPS深度剖析结果还表明采用O离子辅助PLD共淀积后膜层中Zn的氧化组分和孔隙率随深度变化平缓。     

用PECVD在低温衬底上制备类金刚石碳膜

本文报道用 RF PECVD在低温衬底上制备了类金刚石碳(DLC)膜.研究了氢稀释、气体压力和 RF 功率对薄膜性质的影响. 用光透射率、红外吸收谱和小角度X射线衍射谱分析了DLC膜的结构和光学性质.结果表明,这样制备的DLC膜是无定形态的,包含了大量的C-H键,具有良好的透明性.厚度为230nm的DLC膜在480nm后的可见光区和近红外区的透过率大于83;,所导出的Tauc光学带隙在2.7eV和3.7eV之间.本文还探讨了应用这种DLC膜作为二次电子发射材料的可能性.     

TiO2 thin films as sensing gas materials

TiO₂ thin films were prepared by DC reactive magnetron sputtering on heated Si, quartz and glass substrates using O₂ and water vapor as reactive gases. The percentage of anatase and rutile as well as the grain size strongly depend on the deposition conditions, as revealed by X-ray diffraction patterns. The films deposited on Si substrates are pure rutile, while a mixed anatase/rutile structure occurs in the films deposited on glass and quartz substrates. Smaller grain rutile and anatase films were prepared in a water vapor atmosphere, in contrast to the films grown in oxygen. The former choice considerably increases the sensing properties of titanium dioxide films. The gas sensitivity was investigated for some reducing gases (methane, acetone, ethanol and liquefied petroleum gas) and the optimum operating temperatures were found.     

基于原子层沉积的氧化锆薄膜工艺优化研究

利用原子层沉积技术(Atomic layer deposition, ALD)进行ZrO2薄膜工艺研究,获得了低温下ZrO2薄膜ALD的最佳工艺条件.分析了在低温下前驱体脉冲时间,吹扫时间生长工艺条件对薄膜性能的影响.以四(二甲基氨)基锆(TDMAZ)和H2O为前驱体,制备了均匀性良好,表面粗糙度低,可见光透过率高,水汽阻挡效果良好的ZrO2薄膜.