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聚噻吩在离子液体中的电化学合成研究 总被引:12,自引:0,他引:12
在 1 丁基 3 甲基咪唑六氟磷酸盐离子液体 (BMIM)PF6 中直接电化学合成制备了聚噻吩膜 .通过红外光谱 (FT IR)和扫描电子显微镜 (SEM)对聚噻吩膜的结构和形貌进行了表征 .利用紫外可见光谱 (UV Vis)、循环伏安法 (CV)和四探针法研究了聚噻吩膜的电子和电化学特性 .研究结果表明 ,在电位 1.7~ 1.9V(相对于Ag/AgCl) ,在(BMIM)PF6 中可以制备均匀的聚噻吩膜 ,其中 ,离子液体 (BMIM)PF6 既作为溶剂又作支持电解质 ;在离子液体中制备的聚噻吩膜具有良好的稳定性和充放电能力 ,聚噻吩膜的电导率在 0 .0 1~ 0 .1S/cm . 相似文献
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以局域规整聚(3-己基噻吩) (P3HT)制备了TiO2/聚合物型双层结构光伏电池.利用稳态电流-电压测试和动态强度调制光电压谱,结合差热分析、吸收光谱和荧光光谱, 研究了非晶支化聚亚乙基亚胺(BPEI)作为P3HT膜层的添加成分对TiO2/P3HT双层电池性能的影响.由于P3HT链的高结晶性,使得TiO2/P3HT界面接触不好,导致电池性能差.当在P3HT中共混重量比WBPEI/P3HT=1%—5%的BPEI时,电池性能得到显著改善;尤其是当WBPEI/P3HT= 1%时,电池表现出近0.8V的开路电压和20μA/cm2的短路电流.结果表明BPEI对电池性能的影响不是源于P3HT-BPEI共混体系光学性能的变化,而主要是由于其改变了TiO2/P3HT界面接触性能.BPEI对TiO2/P3HT界面接触有两个相互竞争的影响,这取决于P3HT-BPEI共混体系的组成.一方面,通过降低P3HT的结晶度和增强与TiO2表面的相互作用,改善P3HT链在TiO2 表面的附着;另一方面,当BPEI含量过高时,BPEI在TiO2表面的附着量将增加,反而会阻碍P3HT与TiO2表面的接触.良好的TiO2/P3HT界面接触有利于提高激子的界面分离效率、光生电子的寿命和电池效率.本文结果有望为聚合物光伏电池性能的改善提供新的认识和方法.
关键词:
聚(3-己基噻吩)
二氧化钛
共轭聚合物
光伏电池 相似文献
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考察了通过自主研发的高温热裂解辅助硒化装置所产生的高活性硒对CIGS薄膜结构和器件性能的影响.通过调节高温裂解系统的温度可以有效调节不同的硒活性.研究发现, 第一台阶HC-Se气氛可以提高CIGS薄膜表面的Ga含量, 使得CIGS薄膜内的Ga分布更加平缓, 进而提高CIGS薄膜表面禁带宽度.而且HC-Se气氛可以消除CIGS"两相分离"现象.两种因素的共同作用使得CIGS薄膜太阳电池的开路电压提高了34.6%.电池转换效率从6.02%提升至8.76%, 增长了45.5%. 相似文献
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提出了用一种新的有机物-聚合物复合体薄膜制备受体给体聚合物光伏电池的思路,用于克服由于激子或极化子扩散范围短而熄灭造成的电荷分离与传输效率低的缺陷.在采用对称N,N′-二苯并咪唑3,4,9,10-四羧酸二亚酰胺和聚(2,5-二十五烷氧基对-苯撑乙烯)(ROPPV)为原材料制备成复合体薄膜,对其电学、光学及用其制作的光伏电池的性能进行了讨论.结果显示了导电聚合物-有机物复合体可代表一类新的有机半导体材料用于制造光伏电池
关键词:
有机光伏电池
有机染料
共轭聚合物
异质结 相似文献
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GaN基半导体在光电子、电子器件已具有重要应用,如何结合其良好的电学特性进行其他应用方面的理论或实验探索,是当前新的研究课题.本文利用SCAPS-1D软件从理论上计算了GaN在FTO/GaN/(FAPbI3)0.85(MAPbBr3)0.15/HTL电池结构中电子传输的理论机制.结果表明,引入GaN后,电池的开路电压,转换效率明显提高.通过进一步分析准费米能级分裂、界面电场、界面复合率、耗尽层厚度等因素的变化规律,分析了GaN的厚度和掺杂浓度对电池开路电压等器件参数的影响,并从GaN作为电子传输层的物理机制方面进行了讨论. 相似文献
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利用斯蒂尔偶联反应合成了两种基于咔唑和噻吩的有机共轭单体,通过电化学方法聚合成导电聚合物,并对其进行了结构表征和光电性能研究. 核磁共振1H谱和13C谱验证了单体与理论结构一致,红外测试验证了电化学聚合位点为噻吩的α位. 光滑、均质且分布小孔的表面形貌有利于提高聚合物的电导率和电子传输性能. 在-0.1 V到1.2 V电压范围内,两种聚合物膜都表现出良好的电致变色特性. 循环伏安法和热重表明,相比于聚合物P1,共平面性更好的聚合物P2的电化学和热稳定性更优. 相似文献
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合成了一种侧链共轭的聚噻吩衍生物聚3-(5′辛基-噻吩乙烯基)噻吩(POTVTh),并通过溶液旋涂制备了聚合物薄膜.吸收光谱显示该聚合物薄膜具有较小的禁带宽度和宽的光谱响应.采用Z扫描技术在800 nm下用飞秒激光器研究了该聚合物薄膜的三阶非线性光学特性,非线性吸收系数为5.63×10-7cm/W,非线性折射率为-6.38×10-11 cm2/W,三阶非线性极化率为4.21×10-9esu,比侧链未共轭的
关键词:
聚噻吩衍生物
侧链共轭
三阶非线性极化率
非线性折射率 相似文献
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目前有机光伏电池的吸光活性层电学传输特性和光学吸收特性的不匹配是制约其能量转换效率提升的主要原因之一. 通过陷光结构对入射光进行调控, 提高电池对光的约束和俘获能力从而达到“电学薄”和“光学厚”的等效作用, 是解 决有机光伏电池电学和光学不匹配的有效手段. 本文采用湿法刻蚀技术获得了系列时间梯度的绒面氧化锌掺铝薄膜, 并将其作为有机光伏电池的入射陷光电极, 显著增强了电池的光学吸收. 研究发现, 当使用浓度0.5%的稀HCL腐蚀30 s后的氧化锌掺铝薄膜作为入射电极后, 电池的光电性能和效率显著增强. 基于此绒面电极电池的电流密度比平面结构的电池提高了8.17%, 效率改善了11.29%. 通过对绒面电极表面的修饰处理, 实现了电极与光活性层之间良好的界面接触, 从而减小了对电池的开路电压和填充因子的影响. 相似文献
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Hybrid film of zinc oxide (ZnO) and tetrasulfonated copper phthalocyanine (TSPcCu) was grown on an indium tin oxide (ITO) glass by one-step cathodic electrodeposition from aqueous mixtures of Zn(NO3)2, TSPcCu and KCl. The addition of TSPcCu strongly influences the morphology and crystallographic orientation of the ZnO. The nanosheets stack of ZnO leads to a porous surface structure which is advantageous to further adsorb organic dyes. The photovoltaic properties were investigated by assembling the DSSC device based on both the only ZnO film and the ZnO/TSPcCu hybrid films. Photoelectrochemical analysis revealed that the optimized DSSC device with TSPcCu represented a more than three-fold improvement in power conversion efficiency than the device without TSPcCu. The DSSC based on ZnO/TSPcCu hybrid films demonstrates an open circuit voltage of 0.308 V, a short circuit current of 90 μA cm−2, a fill factor of 0.26, and a power conversion efficiency of 0.14%. 相似文献
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Zengtao LiuHaibo Wang Qingdan YangT.W. Ng M.F. LoN.B. Wong S.T. LeeC.S. Lee 《Applied Surface Science》2011,257(20):8462-8464
Rubrene mixing has been shown to be an effect mean for enhancing both the open circuit voltage (Voc) and the short-circuit current (Jsc) of copper-phthalocyanine (CuPc)/fullerene (C60) based solar cell. While the increase in Jsc can be readily explained by the additional rubrene absorption and the introduction of a bulk heterojunction; causes for Voc increase are still not clear. The energy offset between the highest occupied molecular orbital (HOMO) level of donor and the lowest unoccupied molecular orbital (LUMO) level of acceptor (HOMOD-LUMOA) at the CuPc/C60 interface was found to increase substantially upon rubrene mixing in either side of the interface. As the HOMOD-LUMOA is generally considered to limit the Voc, its increase agrees well with the device results. Energy level bending and associated built-in electric fields were also observed and their possible implications to device performance are discussed. 相似文献
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The nanocrystalline Ni films were grown on n-Si(1 1 1) substrate by pulsed electrodeposition in non-aqueous NiCl2 + methanol solution. The frequency of potential pulse was modulated during the deposition of Ni onto Si substrates. When the frequency varies from 20 to 900 Hz, the average size of Ni nanocrystallites varied in the ranges from 48 to 130 nm. In these cases, all Ni films have grown through a three-dimensional instantaneous nucleation followed by diffusion-limited growth. From X-ray diffraction measurement, it has been found that Ni(1 1 1) grows preferentially on the Si(1 1 1) substrates. The magnetic hysteresis loops for as-deposited films were measured by using VSM. As the angle θ between film plane and applied magnetic field varies from 0 to 90, the coercivity (Hc) and squareness (S) obtained from the magnetic hysteresis loops showed an opposite behavior. With the increase in θ, Hc increased but S decreased near linearly. We have also investigated the variation of Hc as a function of Ni nanocrystallite’s size. From VSM measurement, we could observe that the coercivities for the magnetic field applied perpendicular and parallel to the film plane increase up to the average size of 86 nm but begin to decrease over this size. 相似文献
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Thin film solar cells have the potential to significantly reduce the cost of photovoltaics. Light trapping is crucial to such a thin film silicon solar cell because of a low absorption coefficient due to its indirect band gap. In this paper, we investigate the suitability of surface plasmon resonance Ag nanoparticles for enhancing optical absorption in the thin film solar cell. For evaluating the transmittance capability of Ag nanoparticles and the conventional antireflection film, an enhanced transmittance factor is introduced. We find that under the solar spectrum AM1.5, the transmittance of Ag nanoparticles with radius over 160 nm is equivalent to that of conventional textured antireflection film, and its effect is better than that of the planar antireflection film. The influence of the surrounding medium is also discussed. 相似文献
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《Current Applied Physics》2020,20(2):282-287
Thin-film solar cells have attracted worldwide attention due to their high efficiency and low cost. Antimony selenide (Sb2Se3) is a promising light absorption material candidate for thin-film solar cells due to its suitable band gap, abundance, low toxicity, and high chemical stability. Herein, we fabricate an Sb2Se3 thin film solar cell using a simple hydrazine solution process. By controlling the thickness of the photoactive layer and inserting a poly(3-hexylthiophene) hole-transporting layer, an Sb2Se3 solar cell with a power conversion efficiency of 2.45% was achieved. 相似文献
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这种脉冲电源的设计不同于市售的脉冲电源,它具有电路结构简单,体积小,电压高,正负脉冲叠加,具有快的上升时间,稳定性能好等特点。最适合于做为电致发光屏和电致发光薄膜屏的激发源。是测量发光屏的强度、寿命、时间分辨光谱的非常适用的激发源。 相似文献
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A new analytical model of high voltage silicon on insulator (SOI) thin film devices 总被引:2,自引:0,他引:2 下载免费PDF全文
A new analytical model of high voltage silicon on insulator (SOI)
thin film devices is proposed, and a formula of silicon critical
electric field is derived as a function of silicon film thickness by
solving a 2D Poisson equation from an effective ionization rate,
with a threshold energy taken into account for electron multiplying.
Unlike a conventional silicon critical electric field that is
constant and independent of silicon film thickness, the proposed
silicon critical electric field increases sharply with silicon film
thickness decreasing especially in the case of thin films, and can
come to 141V/μm at a film thickness of 0.1μm which is
much larger than the normal value of about 30V/μm. From the
proposed formula of silicon critical electric field, the expressions
of dielectric layer electric field and vertical breakdown voltage
(VB,V) are obtained. Based on the model, an ultra thin film
can be used to enhance dielectric layer electric field and so
increase vertical breakdown voltage for SOI devices because of its
high silicon critical electric field, and with a dielectric layer
thickness of 2μm the vertical breakdown voltages reach 852
and 300V for the silicon film thicknesses of 0.1 and 5μm,
respectively. In addition, a relation between dielectric layer
thickness and silicon film thickness is obtained, indicating a
minimum vertical breakdown voltage that should be avoided when an
SOI device is designed. 2D simulated results and some experimental
results are in good agreement with analytical results. 相似文献
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