金刚石镶嵌非晶碳膜表面形貌对场致电子发射的影响

用微波等离子体化学气相沉积设备，在经过不同研磨预处理的金属钼衬底上沉积出了表面形貌有较大差异的金刚石镶嵌非晶碳膜，分别用扫描电子显微镜（ＳＥＭ）、金相显微镜和Ｘ射线衍射谱（ＸＲＤ）以及Ｒａｍａｎ光谱对样品进行了分析测试．研究了各样品的场致电子发射特性，结果发现薄膜表面由大量镶嵌有金刚石小晶粒的非晶碳球组成，在我们的实验范围内，薄膜表面非晶碳球尺寸越小，场致电子发射效果越好     

Mo衬底生长金刚石薄膜表面晶形研究

 用HFCVD方法在Mo衬底上进行了金刚石薄膜生长研究，观察到在不同的反应压强条件下，金刚石薄膜晶粒的三种形貌，并且讨论了反应条件对晶粒形貌的影响以及菜花状大晶粒的构成机理。     

Synthesis of Diamond from a High-Velocity Microwave Plasma Flow

Doklady Physics - A new method of gas-phase diamond deposition with a high-velocity jet used to transport gases activated in microwave plasma to a substrate is developed. Diamond was synthesized...     

The phase and morphological inhomogeneity of the Ti-C system deposits formed at the plasma-titanium substrate interface

We have studied the mechanism of structure formation and the local chemical composition of the Ti-C system deposits formed at the interface between a carbon-argon-titanium plasma and a titanium substrate under conditions of the titanium content in the plasma decreasing with time. The deposits were studied in a scanning electron microscope (SEM) equipped with an energy-dispersive X-ray (EDX) analyzer. The spatially distributed growth of various structural modifications of carbon in the deposit is related to the mass transfer redistribution at the substrate surface and to the selective deposition of adatoms forming sufficiently stable chemical bonds to the growth surface in the thermal accommodation stage.     

Growth and Characteristics of Freestanding Hemispherical Diamond Films by Microwave Plasma Chemical Vapor Deposition

Freestanding hemispherical diamond films have been fabricated by microwave plasma chemical vapor deposition using graphite and molybdenum （Mo） as substrates. Characterized by Raman spectroscopy and scanning electron microscopy, the crystalline quality of the films deposited on Mo is higher than that on graphite, which is attributed to the difference in intrinsic properties of the two substrates. By decreasing the methane concentration, the diamond films grown on the Mo substrate vary from black to white, and the optical transparency is enhanced. After polishing the growth side, the diamond films show an infrared transmittance of 35-60% in the range 400-4000 cm^- 1.     

热丝辅助双偏压氢等离子体制造金刚石锥状表面研究

利用热丝辅助双偏压氢等离子体对化学气相沉积金刚石薄膜进行了纳米尺度上的表面改装,制造出锥状金刚石列阵.金刚石薄膜内在的柱状结构使氢离子在刻蚀薄膜时产生非均匀的刻蚀速率,对锥状表面的形成起着重要作用.另一方面,溅射出的含碳粒子会发生二次沉积,最终的特征表面形貌取决于刻蚀与含碳基团再沉积之间的相互竞争.栅极的使用影响基底区域放电的伏安特性,改变栅极电流可以对形成的金刚石特征表面结构进行有效调节.在处理过程中少量掺入甲烷,提高了金刚石表面附近的含碳基团浓度,促进二次成核,进而诱发均匀分布的锥状列阵. 关键词： 等离子体 表面 金刚石薄膜     

直流电弧等离子体射流CVD制备多种碳膜

本文报道了在同一直流电弧等离子体射流ＣＶＤ装置上，采用不同的沉积条件高速合成金刚石，类金刚石，高取向热解石墨以及无定形碳等四种碳膜。经Ｘ射线衍射（ＸＲＤ），拉曼散射谱（Ｒａｍａｎ），扫描电镜（ＳＥＭ）形貌分析以及显微硬度测试表明，该方法制得的金刚石膜和高取向热解石墨膜具有很高的纯度和良好的晶性，类金刚石具有独特的形貌和Ｒａｍａｎ散射特征以及可与金刚石膜比拟的硬度。     

Study of diamond film nucleation by ultrasonic seeding in different solutions

In this study we have investigated diamond nucleation on Si substrates by ultrasonic seeding with different liquid solutions of Ultradispersed Detonation Diamond (UDD) powder in a mixture of metal nano- or microparticles (Ni, Co, Y). The influence of different solutions on nucleation efficiency was investigated. For highlighting nucleation centers and better evaluation of the nucleation process the nucleated samples were moved into a Microwave Plasma Enhanced Chemical Vapor Deposition (MW CVD) reactor and a ”short-time” (10 min), then followed by a ”long-time” (+1 hour), diamond deposition was performed. The morphology of samples was characterized by Scanning Electron Microscopy (SEM) and the chemical composition of grown diamond layer was investigated by Raman Spectroscopy. From the measurements we found out that microsized metal particles positively influenced nucleation and the uniformity of the deposited diamond thin film. The lowest surface roughness was achieved in the case of nanodiamond powder mixed with Co and Y metal powder. The influence of Ni, Co and Y to the nucleation and early growth stage are discussed.     

微波ECR全方位离子注入制备类金刚石碳膜的结构及摩擦学性能研究

利用微波ECR全方位离子注入技术，在单晶硅（100）衬底上制备类金刚石薄膜.分析结果表明，所制备的类金刚石碳膜具有典型的类金刚石结构特征，薄膜均匀、致密，表面粗糙度小，摩擦系数小.其中，薄膜的结构和性能与氢流量比关系密切，随氢流量比的增加，薄膜的沉积速率减小，表面粗糙度降低，且生成sp³键更加趋向于金刚石结构，表面能 更低，从而使摩擦系数大幅降低. 关键词： 全方位离子注入 类金刚石碳膜 拉曼光谱 摩擦磨损     

沉积时间对球状微米金刚石聚晶结构的生长及其场发射特性影响

利用微波等离子体化学气相沉积法,在覆盖金属钛层的陶瓷衬底上,通过改变沉积时间制备出不同结构的类球状微米金刚石聚晶碳膜.通过扫描电子显微镜、喇曼光谱、X射线衍射谱对碳膜进行了分析测试,并研究了不同沉积时间下沉积的类球状微米金刚石聚晶薄膜的场致电子发射特性,结果显示:不同的沉积时间所制备的碳膜形貌有很大变化,场致电子发射的...     

Pulsed laser deposition of hard coatings in atmospheric air

A new laser plasma technique for non-vacuum deposition of thin films has been proposed and experimentally realized. It is based on the fact that the plasma plume, which occurs under ablation of a target in air by high-intensity short laser pulses, can penetrate through a dense gas environment without significant cooling at the distance of about 1 mm. The technique has been applied to deposit diamond-like carbon (DLC) coatings on stainless steel substrates using four different values of pulse duration: 10 ns, 300 ps, 5 ps and 130 fs. Optimization of different experimental parameters including distance between the target and the substrate, laser intensity and gases (He, Ar, N₂, compressed air) blown in the deposition zone, has been performed. The deposition rate in the experiments was estimated as 2–5×10^-4 nm/(cm²pulse) for the pulse energy of 1–4 mJ. The deposited amorphous carbon films with thickness of several hundred nanometers have shown high average nanohardness (10–25 GPa depending on the irradiation conditions) and good adhesion to substrates (60 MPa). According to X-ray electron spectroscopy analysis the films consist of both sp²- and sp³-bonded carbon and contain 3–7% of free oxygen in bulk. The mechanisms of DLC non-vacuum laser deposition are discussed. To demonstrate the large potential of this technique, the first results on deposition of titanium nitride using ablation of titanium in air with nitrogen jet assistance are also presented. PACS 52.38.Mf; 81.15.Fg; 81.05.Uw     

氧化铝基片上沉积金刚石薄膜的Raman光谱分析

分别采用微波等离子体化学汽相沉积法和热丝化学汽相沉积法在氧化铝陶瓷基片上沉积金刚石薄膜．通过谱线拟合，定量比较了不同沉积方法、不同基片上沉积金刚石薄膜的质量，计算了沉积膜的结构完整性及沉积层的应变，其结果与X射线衍射的结果符合良好 关键词：     

沉积时间对球状微米金刚石聚晶结构的生长及其场发射特性影响

利用微波等离子体化学气相沉积法,在覆盖金属钛层的陶瓷衬底上,通过改变沉积时间制备出不同结构的类球状微米金刚石聚晶碳膜.通过扫描电子显微镜、喇曼光谱、X射线衍射谱对碳膜进行了分析测试,并研究了不同沉积时间下沉积的类球状微米金刚石聚晶薄膜的场致电子发射特性.结果显示:不同的沉积时间所制备的碳膜形貌有很大变化,场致电子发射的效果也有很大不同,从而得出了场增强因子的降低和导电通道的增长是场发射效果变差的主要原因.     

Ion beam formation of the catalytically active surface of titanium electrodes

Ion beam assisted deposition (IBAD) of platinum with a rare earth metal on titanium substrates is carried out from a neutral fraction of vapor and ionized plasma of a pulsed electric arc. Ions of the metal being deposited serve as assisting ions in the process. The deposited coatings are analyzed by RBS, SEM, and EMA methods. The electrocatalytic activity of titanium electrodes with the coatings is studied in the electrochemical reactions of hydrogen and oxygen evolution, as well as methanol and ethanol oxidation. Electrodes with coatings containing platinum are found to exhibit a high level of electrocatalytic activity in all test reactions.     

Fabrication and characteristics of ta-C biomaterial coatings on Ti–6Al–4V using metal plasma immersion ion implantation and deposition

We have formed amorphous diamond (ta-C) coatings on Ti–6Al–4V substrates using a metal plasma immersion ion implantation and deposition (MEPIIID) technique, and characterized the mechanical properties and biological compatibility of the coating material. The hemocompatibility of the coating compared favorably with that of low temperature isotropic (LTI) carbon, with kinetic clotting time and hemolysis rate approximately the same as for LTI carbon, and platelet consumption about twice that of the latter. The mechanical properties were good, with a microhardness greater than that of the uncoated metal substrates, and high adhesion of >0.75 GPa (interface shear stress) as estimated from a thermal quench method. Glancing-angle X-ray diffraction measurements indicated the presence of a TiC transition layer, suggesting the formation of a Ti/TiC/ta-C multilayer structure, leading in turn to good film–substrate adhesion. We conclude that this kind of amorphous diamond coating could provide benefit as a biocompatible hard coating for Ti–6Al–4V substrate material.     

氢的强化刻蚀对金刚石薄膜品质的影响与sp2杂化碳原子的存在形态

用化学气相沉积方法制备了金刚石薄膜.在制备过程中，通过间歇式关闭甲烷气体，强化了氢对sp2杂化碳原子的刻蚀.用拉曼光谱和金相显微镜对薄膜进行了分析表征.结果表明，氢对sp2杂化碳原子的强化刻蚀并未影响金刚石薄膜的品质和微观结构.这一结论说明，在金刚石薄膜中，sp2杂化碳原子主要存在于金刚石晶粒表面和晶界碳原子之间,而不是以石墨或无定形碳颗粒为主要存在方式. 关键词： 化学气相沉积 金刚石薄膜 拉曼光谱 强化刻蚀     

沉积工艺条件对金刚石薄膜红外椭偏光学性质的影响

采用红外椭圆偏振光谱仪对不同工艺条件下制备的CVD金刚石薄膜在红外波长范围内的光学参量进行了测量，分析了工艺条件对金刚石薄膜红外光学性质的影响.获得了最佳的沉积工艺参数，优化了薄膜的制备工艺.结果表明薄膜的折射率和消光系数与薄膜质量密切相关，当温度为750℃，碳源浓度为0.9%和压强为4.0 kPa时，金刚石薄膜的红外椭偏光学性质最佳，折射率平均值为2.385，消光系数在10^-4范围内，在红外波段具有良好的透过性. 关键词： 薄膜光学 红外光学性质 工艺条件 金刚石薄膜     

Mo离子注入对金刚石涂层附着性能的影响

采用Mo离子注入工艺对YG6硬质合金基体表面进行处理,用微波等离子体CVD(MPCVD)法沉积金刚石涂层,研究了Mo离子注入工艺对金刚石涂层附着性能的影响.结果表明,Mo离子注入后,硬质合金基体表面的化学成分发生了明显变化;采用适当剂量的Mo离子注入基体,可使CVD金刚石涂层的附着性能显著提高. 关键词： 金刚石涂层 Mo离子注入 硬质合金基体 附着性能     

氮离子注入对类球状微米金刚石聚晶膜的影响

利用微波等离子体化学气相沉积法,在覆盖金属钛层的陶瓷衬底上制备出类球状微米金刚石聚晶膜,后对膜的表面进行氮离子的注入.通过扫描电子显微镜、拉曼光谱、X射线衍射谱及二级结构场发射测试,对膜进行了注入前后的分析.氮离子注入后场致电子发射的效果变强,这可能是氮离子的注入增加了类球状微米金刚石聚晶膜表面的缺陷度,从而增加了价带和导带间的缺陷能级,使电子更容易跃迁到高能级上,提高了场致电子的发射效果.     

MOCVD法生长SAWF用ZnO/Diamond/Si多层结构

使用等离子体辅助MOCVD系统在金刚石,硅衬底上成功地制备了氧化锌多层薄膜材料,通过两步生长法对薄膜质量进行了优化。XRD测试显示优化后的样品具有c轴的择优取向生长,PL谱测试表明样品经优化后不仅深能级发射峰消失,同时紫外发射峰增强。对优化后的样品的表面测试显示出较低的表面粗糙度。比较氧化锌多层薄膜结构的声表面波频散曲线,ZnO薄膜声表面滤波器受膜厚和衬底材料的影响较大。当ZnO薄膜较薄时,在它上面的传播速度将与衬底上的传播速度接近,与其他衬底上生长的薄膜相比,以金刚石这种快声速材料为衬底的ZnO多层薄膜结构,声表面波滤波器的中心频率将提高1倍左右。