银和铜膜中异常晶粒生长和织构变化的实验研究

用透射电子显微镜(TEM)和x射线衍射(XRD)方法对经300℃，2h退火的Ag和Cu自由膜和Si基体上的Ag和Cu附着膜的异常晶粒生长和织构变化进行了实验研究.XRD分析表明：Ag和Cu沉积膜均有(111)和(100)择优取向.但经退火处理后，Ag和Cu自由膜的(111)织构稍有加强.相反，Si基体上的Ag和Cu附着膜的(100)和(110)织构明显加强，同时用TEM在Cu附着膜中观察到了两个(110)和四个(211)取向的异常大晶粒.根据表面能和应变能的各向异性对实验结果进行了分析.     

面心立方多晶薄膜中应变能密度对晶粒取向的依赖

对附着在基体上面心立方多晶薄膜中不同取向晶粒的应变能密度进行了计算.结果表明:在屈服之前,5个最小的应变能密度对应的晶粒取向依次为(100),(510),(410),(511)和(310);在屈服膜中,5个最小的应变能密度对应的晶粒取向依次为(110),(100),(511),(411)和(211).仅考虑应变能,这些取向的晶粒将依次优先生长 关键词： 薄膜 应变能密度 晶粒生长     

纳米晶粒生长的动力学蒙特卡罗模型

给出应用于纳米晶粒生长的动力学蒙特卡罗模型,并对模拟方法做了细致的讨论.作为一个应用实例,对薄膜生长做了分类模拟研究.结果显示,改变三维Ehrlich-Schwoebel势垒将导致薄膜生长过程中多层原子岛的结构相变.     

多晶硅薄膜低温生长中晶粒大小的控制

以SiCl4H2为气源,用等离子体增强化学气相沉积(PECVD)方法低温快速沉积多晶硅薄膜.实验发现,在多晶硅薄膜的生长过程中,气相空间各种活性基团的相对浓度是影响晶粒大小的重要因素,随功率、H2/SiCl4流量比的减小和反应室气压的增加,晶粒增大.而各种活性基团的相对浓度依赖于PECVD工艺参数,通过工艺参数的改变,分析生长过程中空间各种活性基团相对浓度的变化,指出“气相结晶”过程是晶粒长大的一个重要因素. 关键词： 气相结晶 多晶硅薄膜 晶粒生长 SiCl4     

薄膜生长的随机模型

利用Monte Carlo模型研究了薄膜生长初始阶段岛的形貌与基底温度之间的关系,同时还研究了它们与汽相粒子入射剩余能量之间的关系．模型中考虑了三种动力学过程：粒子入射、吸附粒子扩散和粒子脱附,与以前薄膜生长模型的不同之一在于把入射过程看作独立于其他过程,而扩散和脱附过程是相互关联的．结果表明随基底温度的升高,岛的形貌经历了一个从分散生长、分形生长到凝聚生长的变化过程．低温下随汽相粒子入射和剩余能量增加,岛的形貌也经历了同样的变化过程. 关键词：     

由电阻率的准静态测量研究薄膜晶粒的生长动力学

提出一种用薄膜电阻率的准静态测量来进行薄膜晶粒生长动力学研究的方法。在超高真空系统中用直流溅射制备Pd膜,然后测量不同温度下Pd膜电阻率与退火时间的关系。利用二流体模型推算出对应晶粒尺寸大小的变化,并和TEM结果进行比较。在此基础上进一步分析了退火温度对薄膜中晶粒尺寸变化所起的作用,拟合出晶粒的生长曲线。实验结果表明晶粒长大是一种热激活生长过程,激活能约为0.53eV。 关键词：     

利用快速退火法从非晶硅薄膜中生长纳米硅晶粒

报道了一种从非晶硅薄膜中生长纳米硅晶粒的方法。含氢非晶硅薄膜经过快速热退火处理后，用拉曼散射和X射线衍射技术对样品进行分析。实验结果表明：纳米硅晶粒不但能在非晶硅薄膜中形成，而且所形成的纳米硅晶粒的大小随着热退火过程中升温快慢而变化。在升温过程中，若单位时间内温度变化量较大（－100℃/s），则所形成纳米硅粒较小（1．6－15nm）； 若单位时间内温度变化量较低（－1℃/s），则纳米硅粒较大（23－46nm）。根据晶体生长理论和计算机模拟，讨论了升温快慢与所形成的纳米硅颗粒大小的关系。     

体心立方多晶膜中应变能密度的各向异性分析

根据弹性理论和多晶膜的屈服强度公式，计算了附着在基体上体心立方多晶薄膜中不同取向晶粒中的应变能密度.结果表明：1）在屈服之前，对Fe和Ta两种薄膜，4个最小的应变能密度对应的晶粒取向依次为（100），（510），（410）和（511）；对Cr，Mo，Nb和V四种薄膜，4个最小的应变能密度对应的晶粒取向依次为（111），（332），（322）和（221）；对W膜，应变能密度与晶粒取向无关.2）在屈服的体心立方多晶膜中，4个最小的应变能密度对应的晶粒取向依次为（100），（111），（110）和（411）.从 关键词： 体心立方多晶薄膜 晶粒取向 应变能密度 织构     

水热条件下钛酸钡晶粒生长基元模型研究(Ⅱ)——生长基元稳定能计算及晶粒的成核与生长

报道了BaTiO₃晶粒生长基元稳定能计算的结果，并以此说明了水热条件下BaTiO₃晶粒成核及生长过程 关键词：     

晶粒尺寸及衬底应力对铁电薄膜特性的影响

考虑衬底应力、畴壁运动和畴结构变化, 建立了修正的Landau-Devonshire热力学模型, 计算了生长在不同衬底上的含有纳米晶粒的PbZr_0.4Ti_0.6O₃(PZT)薄膜的电滞回线, 研究了矫顽场、剩余极化强度和相对介电常数对晶粒尺寸以及薄膜厚度的依赖关系. 结果表明, 矫顽场和相对介电常数对晶粒尺寸的依赖关系呈类抛物线状;衬底压应力使矫顽场和剩余极化强度增大, 使相对介电常数减小;随着厚度增加, 矫顽场先缓慢增加, 到200 nm 关键词： 铁电体 晶粒尺寸 衬底应力 薄膜厚度     

Abnormal grain growth in Ni-5at.%W

The growth of abnormally large grains in textured Ni-5at.%W substrates for high-temperature superconductors deteriorates the sharp texture of these materials and thus has to be avoided. Therefore the growth of abnormal grains is investigated and how it is influenced by the grain orientation and the annealing atmosphere. Texture measurements and grain growth simulations show that the grain orientation only matters so far that a high-angle grain boundary exists between an abnormally growing grain and the Cube-orientated matrix grains. The annealing atmosphere has a large influence on abnormal grain growth which is attributed to the differences in oxygen partial pressure.     

Analytical model of transient compressive stress evolution during growth of high diffusivity thin films on substrates

We present an analytical model of transient compressive stress evolution during growth of thin films with high surface and grain boundary diffusivities on substrates. The model provides a closed-form analytical solution which compares well with numerical analysis as well as recent experimental data on transient stress evolution during electrodeposition of Sn films on substrates.     

小角x射线散射确定TiNi薄膜中晶化粒子的长大激活能

用小角x射线散射技术研究以直流磁控溅射方法制备TiNi合金薄膜其退火生成的晶化粒子的长大行为.发现在室温下溅射的TiNi合金薄膜存在小于1nm尺寸的微空洞,将退火后薄膜的小角x射线散射强度扣除退火前微空洞产生的小角x射线散射强度,用这种方法得到的散射强度遵从Porod定律;而用通常方法扣除背底得到的散射强度结果不满足Porod定律.TiNi合金薄膜在733—793K之间退火晶化粒子的长大激活能Eg=301kJmol. 关键词： TiNi薄膜 晶化粒子 长大激活能     

Investigation of fabrication and hetero-epitaxy relationship of CoCrPt thin films grown on CrW underlayer

This paper reports that longitudinally oriented CoCrPt thin films with Cr₈₅W₁₅ underlayer and CoCr intermediate layer for use of giant magnetoresistance heads were fabricated by magnetron sputtering. Without CoCr intermediate layer, CoCrPt layer deposited directly on Cr₈₅W₁₅ underlayer which has a dominant (200) texture exhibits unexpected (10\bar {1}1) texture. After introducing CoCr intermediate layer, the CoCrPt layer shifts into (11\bar {2}0) texture. This article studies the crystallographic hetero-epitaxy relationship between magnetic layer and underlayer in order to understand the appearance of CoCrPt (10\bar {1}1) texture on (200) textured Cr underlayer and the influence of CoCr intermediate layer on the inducement of CoCrPt (11\bar {2}0) texture. The CoCr intermediate layer plays a crucial role in controlling the microstructure and consequently the magnetic properties of the overlying magnetic layer.     

Microstructure and transport properties of various 90° grain boundaries in YBa2Cu3O7 thin films

The microstructure and transport properties of various 90° grain boundaries in (103) oriented YBa₂Cu₃O₇(YBCO) thin films grown epitaxially in situ by 90° off-axis sputtering are compared. The (103) films grown on (101) LaAlO₃ and (101) SrTiO₃ substrates have specific sets of 90° grain boundaries in both principal in-plane directions: 90° [010] twist boundaries along the [101] direction, and 90° [010] symmetrical tilt boundaries and 90° [010] basal-plane-faced tilt boundaries along the (301) direction. No weak-link behavior is observed across some of these boundaries by transport critical current density and normalized magnetic field dependence of J _c measurements along both those in-plane directions. High-resolution transmission electron microscopy reveals variations in the structure and microfaceting of the 90° boundaries, which may contribute to the absence of weak-link behavior. These results have important implications for understanding the behavior of step-edge Josephson junctions.     

Hematite thin films: growth and characterization

We have grown hematite (α–Fe ₂ O ₃) thin films on stainless steel and (001)-silicon single-crystal substrates by RF magnetron sputtering process in argon atmosphere at substrate temperatures from 400 to 800°C. Conversion Electron Mössbauer (CEM) spectra of the sample grown on stainless steel at 400°C exhibit values for hyperfine parameter characteristic of bulk hematite phase in the weak ferromagnetic state. Also, the relative line intensity ratio suggests that the magnetization vector of the polycrystalline film is aligned preferentially parallel to the surface. The X-ray diffraction (XRD) pattern of the polycrystalline thin film grown on steel substrates also corresponds to α–Fe ₂ O ₃. The samples were also analyzed by Atomic Force Microscopy (AFM), those grown on stainless steel reveal a morphology consisting of columnar grains with random orientation, given the inhomogeneity of the substrate surface.     

Monte Carlo study on bilayer thin films magnetic properties dependence with discontinouos anisotropy parameters

In the last few years there has been significant interest in the field of thin films, due to numerous specific phenomena related to the low dimension of these systems, and to the large opportunities in development of high technologies based on their specific magnetic and electronic properties. When dealing with systems of reduced dimensionality it is important to take into account the influence of magnetic anisotropies. In this paper we investigate the magnetic properties of bilayer thin film. This behavior is modeled using Monte Carlo simulations, in the Extended Anisotropic Heisenberg Model. The magnetization, out-of-plane and in-plane magnetic susceptibilities, and also the specific heat bearings according to temperature are investigated in order to find the potential magnetic ordering phases and the critical temperatures, for two sets parameter assignments. For quasi-uniform anisotropy parameters of the film we detect the ferromagnetism-paramagnetism transition and then, by changing the model parameters values, we relieve a short range ferromagnetic ordering phase arising from the antiferromagnetic base layer coupling influence and from easy-plane anisotropy discontinuity on the layers interface.      

Structural characterization and magnetoresistance of manganates thin films and Fe-doped manganates thin films

Perovskites thin films with the composition La_0.6Ca_0.4MnO₃ doped with 20% Fe, were prepared by pulsed reactive crossed beam laser ablation, where a synchronized reaction gas pulse interacts with the ablation plume. The films were grown on various substrates and the highest colossal magnetoresistance ratio (CMR) was detected by Hall measurements for films grown on LaAlO₃ (1 0 0), which was selected as substrate for further investigations.Several growth parameters, such as substrate temperature and target to substrate distance were varied to analyze their influence on the film properties.The structure of the deposited thin films was characterized by X-ray diffraction and atomic force microscope, while Rutherford backscattering (RBS) was used to determine the film stoichiometry. The electrical properties were determined by Hall effect measurements in a magnetic field of 0.51 T.These measurements reveal that the amplitude of the CMR ratio depends strongly on the substrate and that the oxygen content influences the temperature where the transition from semiconductor to metal is observed.     

Electric dipolar interaction assisted growth of single crystalline organic thin films

We report on a forest-like-to-desert-like pattern evolution in the growth of an organic thin film observed by using an atomic force microscope. We use a modified diffusion limited aggregation model to simulate the growth process and are able to reproduce the experimental patterns. The energy of electric dipole interaction is calculated and determined to be the driving force for the pattern formation and evolution. Based on these results, single crystalline films are obtained by enhancing the electric dipole interaction while limiting effects of other growth parameters.