Optimisation of cold cathode ion source model

This paper represents the results of the optimisation of cold cathode ion source model with 5 cm extraction aperture diameter. In this model, the glow discharge is utilised for generation of electrons in the cathode of the ion source. The various models with different lengths of cathode and anode are tested. The shortest model with 4.5 cm in length of cathode and anode each shows satisfactory operation and can be used in cases when the high values of extracted ion current are not required. The best model from the point of view of ion beam current value and efficiency of the discharge is the model with cathode length of 7 cm and anode length of 7 cm. In this case, the obtained maximum ion beam current is 110 mA when the discharge current is 1000 mA. In case when moderate values of extracted ion beam current are necessary, it is possible to operate the ion source even without the anode magnetic system.     

RF离子源引出特性的研究

 为了使RF离子源具有良好的引出特性，测试了吸极几何参数、振荡器板压和引出电压对离子源聚焦度的影响，对实验结果进行了分析。在其它参数不变的情况下，吸极的外径D与内径d之比存在最佳值，增加D/d，有利于过聚焦的离子束恢复聚焦状态。吸极的长度为L，石英套管比吸极长l。当l/D增大时，聚焦度上升，引出束流下降。L/d之比减小时，聚焦度增大。当L/d小于4时，聚焦度增加趋势变缓。综合考虑聚焦度、引出束流和气压，D/d，l/D，L/d适宜的选择范围分别为1.6～2.1，0.7～1.1,4～7。增加振荡器功率会使离子束呈弱聚焦，而增加引出电压会使离子束呈过聚焦。振荡器功率和引出电压都存在最佳值。     

Multi-element focused ion beams using compact microwave plasma ion source

Focused ion beams (FIB) are widely used for research and applications in nanoscience and technology. We have developed a compact microwave plasma based multi element FIB (MEFIB) system in order to widen the applications and overcome the limitations faced by conventional Liquid Metal Ion Source (LMIS) based FIB systems, that provide primarily Ga ions. The MEFIB source provides high density plasmas (∼1.5 × 10¹¹ cm⁻³) in a compact cross section. Recently the ion energy spread in the plasma meniscus from where the beams are extracted is found to be small (∼5 eV) [1–3]. The beam extraction and focusing are carried out using electrostatic multi electrode assembly. AXCEL INP and SIMION simulation codes are employed for the design of electrostatic Einzel lenses for beam focusing. The beam focal point is measured using a specially designed three slit Faraday cup and the spot size is measured by the micrography of craters formed by the focused ion beams impinging on copper and aluminium substrates. The initial experimental results show a focused beam spot size of ∼ 25 micron which is in good agreement with the simulations. By further reduction of electrode apertures and operating the second Einzel lens at higher potentials, submicron focused ion beams can be expected.     

Low energy ion beams by laser interaction

We developed an ion accelerator with a double accelerating gap system supplied by two power generators of different polarity. The ions were generated by laser ion source technique. The laser plasma induced by an excimer KrF laser, freely expanded before the action of accelerating fields. After the first gap action, the ions were again accelerated by a second gap. The total acceleration can imprint a maximum ion energy up to 160 keV per charge state. We analysed the extracted charge from a Cu target as a function of the accelerating voltage at laser energy of 9, 11 and 17 mJ deposited on a spot of 0.005 cm². The peak of current density was 3.9 and 5.3 mA for the lower and medium laser energy at 60 kV. At the highest laser energy, the maximum output current was 11.7 mA with an accelerating voltage of 50 kV. The maximum ion dose was estimated to be 10¹² ions/cm². Under the condition of 60 kV accelerating voltage and 5.3 mA output current the normalized emittance of the beam measured by pepper pot method was 0.22 π mm mrad.     

基于射频功率调节的负离子源束流反馈控制研究北大核心CSCD

基于射频负离子源的中性束注入系统是高功率长脉冲(稳态)运行中性束注入系统的最佳选择。负离子源是中性束注入系统的核心部件,需要实现稳定的负离子束引出和加速。在负离子源的运行过程中引出负离子电流会发生变化,尤其在长脉冲、高能量运行条件下会更加明显,因此无法满足稳定运行的要求。为了实现引出束流的稳定引出,开展了束流反馈控制研究,研发了一套基于射频功率调节的束流反馈控制系统,并将束流反馈控制系统应用在射频负离子源测试平台,开展了束流反馈控制测试。测试结果表明束流反馈控制系统能够实现对束流的实时反馈调节以获得束流的稳定引出,验证了基于射频功率调节的束流反馈控制的可行性,为高功率射频负离子源的研制提供支持。     

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The generation and control of microwave electron cyclotron resonance (ECR) plasma cathode electron beam is studied experimentally. A complete set of discharge, electron beam extraction, focusing and measuring system was set up. The characteristics and performance of microwave ECR plasmas as electron beam extraction source were studied by measuring the current of water cooling target and the beam spot size on the target. Experimental results indicated that both microwave input power and accelerating voltage are conducive to improving electron beam current. The influence of gas pressure on the electron beam current was complex. With the increase of gas pressure, the electron beam current is characterized by decreasing first and then increasing. The extracted electron current of microwave ECR plasma cathode can reach 75mA at gas pressure of 7×10⁻⁴Pa, and the energy of the electron beam can reach 9keV. The energy utilization can reach 0.6. By adjusting the current of the focusing coil, the diameter of electron beam spot is reduced from 20mm to 13mm and the electron beam current keeps the value unchanged.     

微波电子回旋共振等离子体阴极电子束的实验研究

介绍了实验室研制的微波电子回旋共振(ECR)等离子体阴极电子束系统及初步研究结果，该系统包括微波ECR 等离子体源、电子束引出极、聚焦线圈等。通过测量水冷靶电流和靶上的束斑尺寸，实验研究了微波ECR 等离子体阴极电子束的流强、聚束性能等随电子束系统工作条件的变化。结果表明：微波输入功率越高、引出电压越高，引出电子束流强越大；工作气压对电子束流强的影响较复杂，随气压增加呈现出先降低后升高的特点；在7×10⁻⁴Pa 的极低气压下电子束流强可达75mA，引出电压9kV；能量利用率可达0.6；调整聚焦线圈的驱动电流，电子束的束斑直径从20mm 减小到13mm，电子束流强未有明显变化。     

Extraction of intense beams from ECR ion sources and electrostatic acceleration

High-space charge effects and problems related to beam transport are discussed in the context of an electron cyclotron-resonance ion sources extraction and pre-acceleration low emittance line (which works as the injector of a new superconducting Radio Frequency Quadruple (RFQ) under commissioning at Laboratori Nazionali di Legnaro (LNL)) at several values of the extracted beam current. In the extractor, both the cases of short-range magnetic fringe field (virtual source approximation) and large-range fringe field are simulated. Analytical expression of ion flow and plasma sheaths are easily incorporated in the charged fluid approach and in numerical modeling with three-dimensional simulation programs, which can treat several coupled field variables and lower space dimension (known as multiphysics codes). Advantages of flexibility and of representation of finer details are remarked. Effects of plasma potential and extraction hole thickness (0.5 mm) on the plasma meniscus can be resolved, even in the context of a simulation including 1 m long objects. An example of beam injection into an acceleration tube is also given; results are consistent with the tube-design goals and with the experimentally observed parameters.     

Characteristics of an ion source with a plasma cathode and a multipole magnetic system for confining fast electrons

Parameters and ion-emission characteristics of the plasma generated in the anode stage of an ion source with a hollow glow-discharge plasma cathode are studied. To decrease the minimum operating gas pressure to 5×10³ Pa, a multipole magnetic system was installed on the surface of the hollow cathode and the peripheral magnetic field was enhanced in the anode stage of the source. The effect of the gas pressure, the plasma-cathode current, and the voltage between the electrodes of the anode stage on the value of the ion current extracted from the plasma is investigated. It is found that the size of the exit aperture of the hollow cathode substantially affects the efficiency of ion extraction. The potential (1–5 V) and the electron temperature (1–8 eV) of the anode-stage plasma are measured by the probe method. The conditions are determined that ensure the maximum ion-emission current from the plasma at low gas pressures.     

Results of vacuum cleaning techniques on the performance of LiFfield-threshold ion sources on extraction applied-B ion diodes at 1-10TW

Uncontrolled plasma formation on electrode surfaces limits performance in a wide variety of pulsed power devices such as electron and ion diodes, transmission lines, radio frequency (RF) cavities, and microwave devices. Surface and bulk contaminants on the electrodes in vacuum dominate the composition of these plasmas, formed through processes such as stimulated and thermal desorption followed by ionization. We are applying RF discharge cleaning, anode heating, cathode cooling, and substrate surface coatings to the control of the effects of these plasmas in the particular case of applied-B ion diodes on the SABRE (1 TW) and PBFA-X (30 TW) accelerators. Evidence shows that our LiF ion source provides a 200-700 A/cm² lithium beam for 10-20 ns which is then replaced by a contaminant beam of protons and carbon. Other ion sources show similar behavior. Our electrode surface and substrate cleaning techniques reduce beam contamination, anode and cathode plasma formation, delay impedance collapse, and increase lithium energy, power, and production efficiency. Theoretical and simulation models of electron-stimulated and thermal-contaminant desorption leading to anode plasma formation show agreement with many features from experiment. Decrease of the diode electron loss by changing the shape and magnitude of the insulating magnetic field profiles increases the lithium output and changes the diode response to cleaning. We also show that the LiF films are permeable, allowing substrate contaminants to affect diode behavior. Substrate coatings of Ta and Au underneath the LiF film allow some measure of control of substrate contaminants, and provide direct evidence for thermal desorption. We have increased lithium current density by a factor of four and lithium energy by a factor of five through a combination of in situ surface and substrate cleaning, substrate coatings, and field profile modifications     

High current density ion-beam extraction

High current density (up to 700 mA/cm²) ion-beam extraction has been studied by 3D code KOBRA3-INP [INP, Junkerstr. 99, 65205 Wiesbaden, Germany]. Ion beams with such high current densities can be generated by ECR ion source driven by 37.5 GHz/100 kW gyrotron [Golubev S.V. et al. Trans. Furion Sci. Technol., 47, n. 1T, fuste 8, 345]. The influence of plasma parameters on extracted ion beam has been investigated. Different geometries of extraction system and applied potentials have been simulated to optimize extracted and transported ion beam current. KOBRA3-INP code has been applied to simulate ion-beam transport as well. The results of simulations have been compared with experimental results. Good agreement between measurements and simulations was always found by varying ion-beam space-charge compensation degree.     

Wide gas-ion beam source based on an arc discharge in a nonuniform magnetic field

The construction of an ion source based on a low-pressure arc with a screened cathode spot is described. The source is ignited by an auxiliary glow discharge in a magnetron electrode system. Ions are extracted from the plasma of the anode part of the arc, generated in a reflective electrode system. The effect of the magnetic induction and the emitter electrode potential on the parameters of the anode plasma was investigated, and the conditions required for generation of a dense uniform plasma, ion emission from which gives beams of ions of nitrogen, argon, oxygen, other gases with cross section 100 cm², current density 10 mA/cm² and nonuniformity of the plasma distribution in the beam cross section 10%, were determined. The formation of wide and converging beams with ion energies up to 50 keV by multiple-aperture ion-optic systems were examined. The source operates in the periodic-pulse mode. The repetition frequency of 1-msec pulses can be regulated from 0 to 50 sec^–1 giving an average beam current of up to 50 mA. It is intended for use in technologies for modification of the surface properties of materials and deposition of thin films. A cold cathode makes possible prolonged operation of the source with chemically active gases.Institute of Electrophysics, Ural Branch of the Russian Academy of Sciences. Translated from Izvestiya Vysshykh Uchebnykh Zavedenii, Fizika, No. 3, pp. 66–75, March, 1994.     

Analytical and simulation studies for diode and triode ion beam extraction systems

This work is concerned with ion beam dynamics and compares the emittance to aberration ratios of two-and three-electrode extraction systems. The study is conducted with the aid of Version 7 of SIMION 3D ray-tracing software. The beam dependence on various parameters of the extraction systems is studied and the numerical results lead to qualitative conclusions.     

Transient Temperature and Stress Analysis of an Electrode on 60 kV, 55 A, 2 s Ion Source

The engineering design of 60 kV, 55 A, 2 s bucket ion source for HL-2A has been finished. The current design is based on an extraction-acceldecel extraction system that is composed of plasma electrode, acceleration electrode, deceleration electrode and grounded electrode. The primary and secondary particles due to beams ionization in each region of extraction system will hit the surface of electrode. The power loads on an electrode is estimated both theoretically and experimentally to be 1%-2% of the ion beam power, which may cause serious problems, such as thermal deformation followed by ion beam distortion and melting leading to water leaks. To ensure the mechanical reliability and no plastic deformation, it is important and necessary to analysis the temperature and stress distribution.     

HL-2A装置中性束离子源引出系统束流分析

在中性束离子源引出过程中,详细分析了引出束流的产生,这有利于得到更准确的引出功率和引出电极表面的热功率沉积情况。根据HL-2A装置中性束离子源引出电极的电连接方式和束流引出的物理过程,对离子源束流引出过程进行了分析,给出抑制极电流产生的主要来源。通过分析放电气压扫描实验中的结果发现:随着放电气压的增加,不同弧放电电流情况下抑制极电流均逐渐增加,且抑制极电流与引出电流的比值近似线性增加。针对引出离子束流经过引出电极的过程建立了物理模型。计算了抑制极电流与引出电流的比值与放电气压的依赖关系,计算结果与实验结果一致,验证了引出束流分析结果的合理性。     

射频离子源离子束成分光谱测量

为HL-2A 装置中性束注入器研制了引出束功率为1MW 的射频离子源。在测试平台上,实验离子源已经成功引出了束能量和束电流分别为35keV 和12.4A、束质子比为79%、脉宽为100ms 的氢离子束,达到了设计束功率要求的44%。在射频离子源实验平台上,利用多普勒频移光谱方法测量了离子源引出束流成分比例,对比了束流成分和射频离子源引出束流之间的关系。实验数据分析表明,在10A 引出束流的情况下,离子流成分 H⁺ ₁、H⁺ ₂ 和H⁺ ₃ 分别为75%、18%和7%。并且当引出束流从3.3A 升至10.4A 时,H⁺ ₁ 从37%升至78%,而H⁺ ₃ 则从19%降至9%。     

强流磁约束金属离子注入源

设计和制造了适合工业应用的强流金属离子源。离子源的电弧阴、阳电极之间和放电室壁采用永磁体阵列形成导流、屏蔽磁场,改进了电弧的放电特性和提高等离子体密度。离子注入源在加速电压为30kV、50 Hz 条件时,平均束流流强约为30mA,调试结果表明附加磁场提高了离子源性能。     

Intense emission from a grid-stabilized plasma cathode

Intense emission from a grid-stabilized plasma cathode based on a glow discharge with an expanded anode area is studied. In the electrode system of the ion source, the potential difference between a large-mesh grid electrode (a hole diameter of 4–6 mm) and cathode and anode plasma reaches 200 V and the glow discharge current is up to 1 A. The current distribution over the electrodes of the plasma cathode is taken, and the dependences of the electron extraction efficiency and electron-emitting-plasma potential on the gas pressure and discharge parameters are obtained. A relationship between the geometric parameters of the grid, cathode plasma potential, and efficiency of electron extraction from the plasma is derived. It is shown that stable intense emission from the plasma cathode can be provided in wide ranges of gas pressure and discharge current by varying the geometry and mesh size of the plasma cathode grid. Discharge contraction in the grid plane at elevated gas pressures is explained. It is assumed that the emitting plasma becomes inhomogeneous due to variation in the thickness of near-electrode layers in the holes of the grid, which makes the distribution of the emission current from the plasma more nonuniform.     

负氢潘宁型离子源的束流引出测量

在中国工程物理研究院流体物理研究所自行研制的负氢潘宁型离子源上进行负氢束流引出测量实验,采用单电极、双电极、三电极束流引出测量方法进行初步束流引出测量,束流强度的实验测量结果远远高于空间限制流的理论计算值。因此,提出一种电屏蔽盒的直流束流引出测量方法。阐述了电屏蔽盒直流束流引出测量的基本方法、束流轨迹的CST数值模拟以及束流引出测量实验结果。研究表明:引出电压为2 kV,引出间隙为3 mm,磁感应强度为0.435 T时,得到较为精确的负氢束流引出强度约100 A。通过空间电荷限制流的V3/2定律进行拟合,推算得到引出电压为40 kV时,负氢束流强度约达到4 mA。     

等离子体离子源发射面的理论计算与数值模拟

 等离子体离子源发射面的位置和形状决定了离子束的传输特性,而发射面的位置与形状又取决于等离子体参数、引出电压、电极结构等,并自动地调节到某个平衡状态。介绍了一种2维情况下等离子体离子源发射面的位置与形状的理论计算方法,即非磁化等离子体不能扩散进入外加电场中大于一定临界值的区域,等离子体离子源发射面的位置及形状可以通过直接求解引出系统的Laplace方程而得到。利用基于PIC的OOPIC程序对不同引出结构的发射面位置及形状和引出束流进行了数值模拟,结果与理论计算的结果十分接近。