ZnO电子结构和p型传导特性的第一性原理研究

基于密度泛函理论(DFT)框架下的第一性原理平面波超软赝势方法(USPP)，对不同掺杂情况的ZnO晶体几何结构分别进行了优化计算，从理论上给出了ZnO的晶胞参数，得到了ZnO的总体态密度(TDOS)和氮原子2p态的分波态密度(PDOS).计算结果表明：原胞体积随着掺杂比例的提高而逐渐减小；将氮铝按照2∶1的原子比例共掺可以使氮的掺杂浓度比只掺杂氮时明显提高，且随着铝在锌靶中掺入比例的增加，载流子迁移率提高，浓度增大，使得p型ZnO电导率提高，传导特性增强. 关键词： 共掺 p型传导 态密度 第一性原理     

Li-N, Li-2N共掺p型ZnO的第一性原理研究

利用密度泛函理论, 计算了本征ZnO, Li-N共掺杂ZnO及Li-2N共掺杂ZnO的电子结构. 计算结果表明, Li-N及Li-2N共掺杂ZnO体系的Fermi能级均不同程度地进入价带顶, 并在Fermi能级附近形成浅的受主能级, 这说明, Li, N原子共掺杂可获得稳定的p型ZnO;与Li-N掺杂ZnO体系相比, Li-2N掺杂ZnO体系进一步提高了体系的载流子浓度, 更有利于获得p型ZnO.     

C-Cu共掺杂ZnO的p型导电性研究

近年来,C、Cu单掺杂ZnO获得p型化的相关研究甚多,然而对于C-Cu共掺杂ZnO却鲜有研究.本文采用基于密度泛函理论的第一性原理方法,计算分析比较了C、Cu单掺杂、C-Cu分别以1:1、1:2、2:1比例共掺杂ZnO体系的晶格结构、电子态密度、空穴有效质量和形成能.研究结果表明:在本文的计算方法和模型下,各掺杂体系均能获得p型ZnO;当C-Cu以1:2比例掺入ZnO时,容易获得p型化水平更高、电子迁移效应更优、导电性更好、形成能低掺杂更稳定的半导体新材料.     

表面效应对Li掺杂的ZnO薄膜材料p型电导的影响

利用第一性原理的方法研究了在ZnO非极性表面和极性表面的不同原子层中, 分别用Li原子去替位Zn原子(记为Li_Zn)后的相对稳定性和热离化能. 计算结果表明Li_Zn处于ZnO表面区域时的稳定性优于在ZnO体中时的稳定性, 并且Li_Zn在表面区域的热离化能要比它在体结构中的热离化能大很多, 于是, ZnO表面效应的存在会使Li掺杂的ZnO薄膜材料的p型导电能力大幅度降低. 这个结果对低维ZnO体系p型掺杂有着重要的指导意义. 我们进一步发现, 在不同的ZnO表面区域里Li_Zn的热离化能会表现出很大的差异是源于不同的表面具有不同的静电势分布.     

Mn-N共掺p型ZnO的第一性原理计算

基于密度泛函理论的第一性原理平面波超软赝势法对ZnO(Mn,N)体系的晶格结构、形成能、态密度以及电荷密度进行了计算和理论研究.研究结果表明,Mn和N共掺杂ZnO体系具有更低的杂质形成能和更高的化学稳定性,更加适合p型掺杂.Mn和N以1:2的比例掺杂时,体系的形成能降低,体系更稳定;同时,体系中形成双受主能级缺陷,使得杂质固溶度增大,体系中载流子数增多,p型化特征更明显.此外,研究发现相比于N单掺杂ZnO体系,Mn和N原子共掺杂ZnO体系有更多的杂质态密度穿越费米能级,在导带与价带之间形成更宽的受主N 2p的杂质态,同时空穴有效质量变小.与Mn-N共掺杂体系相比,Mn-2N共掺杂体系的受主杂质在费米能级附近的态密度更加弥散,非局域化特征明显.因此,Mn-N共掺杂有望成为p型掺杂的更有效的手段.     

GGA+U方法研究ZnO孪晶界对V_(Zn)-N_O-H复合体对p型导电性的影响

采用基于密度泛函理论的广义梯度近似平面波赝势方法,探究四种ZnO-Σ7(1230)孪晶界中V_(Zn)-N_O-H复合体的电子结构和p型导电机理.计算结果表明,在ZnO-Σ7(1230)孪晶界中,N掺杂后会与锌空位(V_(Zn))、氢填隙(Hi)等点缺陷结合,进而形成V_(Zn)-N_O-H复合体,并出现在孪晶中的晶格应变集中区.此外,四种孪晶界中孪晶GB7a有利于V_(Zn)-N_O-H离化能降低,从而使其表现出浅受主特征.分析显示特殊的孪晶结构导致了氮替位(N_O)与近邻的O原子间距离缩短,阴离子之间发生相互作用,导致禁带中的空带能级下降,降低了电子跃迁所需能量.这一结果也说明GB7a孪晶界中的V_(Zn)-N_O-H可能成为N掺杂ZnO材料的p型导电的来源之一.     

掺Ga对ZnO电子态密度和光学性质的影响

采用密度泛函理论下的第一性原理平面波赝势方法,研究了掺Ga对纤锌矿ZnO电子态密度和光学性质的影响.从晶体配位场理论分析了掺Ga前后ZnO的成键情况及态密度的变化.计算得到掺Ga后电子浓度为2.42×10²¹ cm^-3,ZnO的载流子浓度提高了10⁴倍.比较分析掺Ga前后ZnO的介电函数、复折射率、吸收光谱和反射光谱可得,ZnO光吸收边向高能端移动,光学带隙增大.在可见光区,ZnO光吸收系数与反射率减小,光透过率显著提高,使ZnO:Ga成为 关键词： 密度泛函理论 态密度 光学性质 ZnO:Ga     

An alternative approach to calculate the density of states in nonextensive statistical mechanics

A relation between the generalized partition function (Tsallis) and density of states is established by using the method of integral transform which enables reducing some integral equations into the algebraic equations. Inverse Mellin transformation of this equation gives the density of states. Similar relation is also hold the for standard partition function (Boltzmann-Gibbs) and the density of states. Using these relations, we recover the density of states for the classical ideal gas within both statistics.     

Al，Ga掺杂ZnO电子结构和光电特性的第一性原理计算

采用基于密度泛函理论(DFT)框架下广义梯度近似(GGA)的PBE平面波超软赝势方法,计算了本征ZnO,Al掺杂ZnO(ZnAlO)和Ga掺杂ZnO(ZnGaO)的能带结构、态密度、复介电函数和复电导率. 其中Al或Ga是以替位杂质的形式进入ZnO晶格. 计算结果表明纤锌矿型ZnO,ZnAlO和ZnGaO都是直接带隙半导体材料,掺杂后ZnO的带隙变小,且ZnAlO的带隙略大于ZnGaO. 掺杂后ZnO的电子结构发生变化,费米能级由本征态时位于价带顶上移进入导带,ZnO表现为n型掺杂半导体材料,掺杂后在导带底出现大量由掺杂原子贡献的自由载流子—电子,明显提高了电导率和介电函数,改善了ZnO的导电性能,并且ZnAlO的导电性能要略好于ZnGaO.     

Al，Ga掺杂ZnO电子结构和光电特性的第一性原理计算

采用基于密度泛函理论(DFT)框架下广义梯度近似(GGA)的PBE平面波超软赝势方法,计算了本征ZnO,Al掺杂ZnO(ZnAlO)和Ga掺杂ZnO(ZnGaO)的能带结构、态密度、复介电函数和复电导率. 其中Al或Ga是以替位杂质的形式进入ZnO晶格. 计算结果表明纤锌矿型ZnO,ZnAlO和ZnGaO都是直接带隙半导体材料,掺杂后ZnO的带隙变小,且ZnAlO的带隙略大于ZnGaO. 掺杂后ZnO的电子结构发生变化,费米能级由本征态时位于价带顶上移进入导带,ZnO表现为n型掺杂半导体材料,掺杂后在导带底出现大量由掺杂原子贡献的自由载流子—电子,明显提高了电导率和介电函数,改善了ZnO的导电性能,并且ZnAlO的导电性能要略好于ZnGaO.     

Atomic and electronic structures of p-type dopants in 4H-SiC

Using hybrid density functional calculation,we study the atomic and electronic structures of p-type dopants,B,Al and Ga,in 4 H-SiC.For B,depending on the growth condition,it can occupy both Si and C sites.In contrast,Al and Ga on the C sites exhibit too high formation energy to exist in a significant amount.In 4 H-SiC,there exist two types of Si sites in wurtzite-like and zincblende-like local coordination,respectively.Our calculations suggest that the dopant atoms have negligible preference occupying the two sites.In neutral charge state,all the dopants exhibit significant distortions from the structure in the negatively charged state.For most cases,our calculations yield three distorted structures,in which the most stable one has the dopant atom displaced along its bond with one of the surrounding equatorial Si or C atoms,lowering the C_(3 v) symmetry to Cs symmetry(i.e.,a mirror symmetry only).Among the three dopant elements,Al on Si sites exhibits overall the lowest formation energy and the shallowest acceptor level.Nevertheless,it is not a hydrogenic dopant with the acceptor level 0.12 eV above the valence band maximum based on calculation using a 400-atom supercell.Its corresponding defect state exhibits apparent localization along the [0001] direction,but it is relatively delocalized in the(0001) plane.     

团簇LaO的理论研究

采用密度泛函理论研究LaO团簇体系。中性分子LaO的基态是两重态(2Σ),阴离子LaO-和阳离子LaO 的基态都是单重态(1Σ)。使用不同的方法计算团簇LaO的电子亲和能和电离能。计算结果表明用BLYP方法和弥散极化基组计算结果和实验数据吻合较好。用含时密度泛函理论计算团簇LaO的低能激发态,从理论上归属LaO-的光电子能谱的谱峰和LaO的吸收光谱的谱峰。计算得到与实验一致的结果。     

Mg掺杂ZnO所致的禁带宽度增大现象研究

采用第一性原理的超软赝势方法，研究了纤锌矿ZnO及不同量Mg掺杂ZnO合金的电子结构.理论计算表明，Mg的掺杂导致ZnO晶体的禁带宽度增大.研究发现，Zn 4s态决定导带底的位置，Mg的掺入导致Zn 4s态向高能端的偏移是导致禁带宽度增大的根本原因. 关键词： 密度泛函理论 赝势 Mg掺杂ZnO     

The effects of thermal annealing in NH3 -ambient on the p-type ZnO films

Thermal annealing in NH₃-ambient was carried out to form p-type ZnO films. The properties were examined by X-ray diffraction (XRD), Hall-effect measurement, photoluminescence (PL), and secondary ion mass spectrometry (SIMS). Electron concentrations in ZnO films were in the range of 10¹⁵–10¹⁷/cm³ with thermal annealing in NH₃-ambient. The activation thermal annealing process was needed at 800 C under N₂-ambient to obtain p-type ZnO. The electrical properties of the p-type ZnO showed a hole concentration of 1.06×10¹⁶/cm³, a mobility of 15.8 cm²/V s, and a resistivity of 40.18 Ω cm. The N-doped ZnO films showed a strong photoluminescence peak at 3.306 eV at 13 K, which is closely related to neutral acceptor bound excitons of the p-type ZnO. The incorporation of nitrogen was confirmed in the SIMS spectra.     

Conversion of p-type to n-type conductivity in undoped ZnO films by increasing operating temperature

ZnO thin films with the thickness of about 15 nm on (0 0 0 1) sapphire substrates were prepared by pulsed laser deposition. X-ray photoelectron spectroscopy indicated that both as-grown and post-annealed ZnO thin films were oxygen-rich. H₂ sensing measurements of the films indicated that the conductivity type of both the unannealed and annealed ZnO films converted from p-type to n-type in process of increasing the operating temperature. However, the two films showed different conversion temperatures. The origin of the p-type conductivity in the unannealed and annealed ZnO films should be attributed to oxygen related defects and zinc vacancies related defects, respectively. The conversion of the conductivity type was due to the annealing out of the correlated defects. Moreover, p-type ZnO films can work at lower temperature than n-type ZnO films without obvious sensitivity loss.     

First-principles study of the electronic and optical properties of ZnO nanowires

The geometric, energetic, electronic structures and optical properties of ZnO nanowires (NWs) with hexagonal cross sections are investigated by using the first-principles calculation of plane wave ultra-soft pseudo-potential technology based on the density functional theory (DFT). The calculated results reveal that the initial Zn-O double layers merge into single layers after structural relaxations, the band gap and binding energies decrease with the increase of the ZnO nanowire size. Those properties show great dimension and size dependence. It is also found that the dielectric functions of ZnO NWs have different peaks with respect to light polarization, and the peaks of ZnO NWs exhibit a significant blueshift in comparison with those of bulk ZnO. Our results gives some reference to the thorough understanding of optical properties of ZnO, and also enables more precise monitoring and controlling during the growth of ZnO materials to be possible.     

Structure, stability and magnetic properties of the Fe3O4(1 1 0) surface: Density functional theory study

Six surface models for the Fe₃O₄(1 1 0) surface were studied using the density functional theory (DFT), namely the AB-terminated surface (AB model), the AB-terminated with Fe_A vacancy (AB-Fe_A vac model), the AB-terminated with Fe_B vacancy (AB-Fe_B vac model), the B-terminated surface (B model), the B-terminated surface with Fe_B vacancy (B-Fe_B vac model), and the B-terminated surface with O vacancy (B-O vac model). Here, A and B denoted the Fe cations in tetrahedrally (Fe_A) and octahedrally (Fe_B) coordinated interstices. The stability, the electronic structure and the magnetic properties of the six surface models were also calculated. The results predict that the B-O vac model is more stable than other surface models. The half-metallic property remains in the AB and B models, while the other four surface models exhibit metallic properties. At the same time, the AB, AB-Fe_A vac, AB-Fe_B vac, B and the B-Fe_B vac models have ferrimagnetic properties, while the B-O vac model has antiferromagnetic property.     

Ga/N高共掺浓度对ZnO导电性能和红移影响的第一性原理研究

采用密度泛函理论框架下的第一性原理平面波超软赝势方法, 建立了未掺杂ZnO单胞和两种不同浓度的Ga/N高共掺ZnO超胞模型, 分别进行了几何结构优化、总态密度分布和能带分布的计算. 研究表明, ZnO高共掺Ga/N的条件下, Ga/N高共掺浓度越大, 导电性能越弱, 并且高掺杂后高能区红移效应显著, 计算得到的结果与实验结果的变化趋势一致. 关键词： Ga/N高共掺ZnO 电导率 红移 第一性原理