ITO-free inverted organic solar cells fabricated with transparent and low resistance ZnO/Ag/ZnO multilayer electrode

Inverted organic solar cells (OSCs) based on poly (3-hexylthiophene) (P3HT):[6,6]-phenyl-C61 butyric acid methyl ester (PCBM) bulk heterojunctions (BHJ) were fabricated with optimized ZnO/Ag/ZnO multilayer and conventional indium–tin oxide (ITO) cathode electrodes and their performance was compared. The ZnO/Ag/ZnO multilayer films showed sheet resistances in the range 3.6–3.9 Ω/sq, while ITO exhibited 14.2 Ω/sq. On the one hand, the carrier concentration gradually decreased from 1.74 × 10²² to 4.33 × 10²¹ cm⁻³ as the ZnO thickness increased from 8 to 80 nm, respectively. The transmittance of the ZnO(40 nm)/Ag(19 nm)/ZnO(40 nm) films was ∼95% at 550 nm, which is comparable to that of ITO (∼96%). The multilayer films were smooth with a root mean square (RMS) roughness of 0.81 nm. OSCs fabricated with the ZnO(40 nm)/Ag(19 nm)/ZnO(40 nm) film showed a power conversion efficiency (2.63%) comparable to that of OSCs with a conventional ITO cathode (2.71%).     

高迁移率非晶铟镓锌氧化物薄膜晶体管的制备与特性研究

由于铟镓锌氧化物(IGZO) 薄膜具有高迁移率和高透过率的特点, 它作为有源层被广泛的应用于薄膜晶体管(TFT). 本文利用磁控溅射方法制备了TFT的有源层IGZO和源漏电极, 用简单低成本的掩膜法控制沟道的尺寸, 制备了具有高迁移率、底栅结构的n型非晶铟镓锌氧化物薄膜晶体管 (IGZO-TFT). 利用X 射线衍射仪(XRD) 和紫外可见光分光光度计分别测试了IGZO薄膜的衍射图谱和透过率图谱, 研究了IGZO薄膜的结构和光学特性. 通过测试IGZO-TFT的输出特性和转移特性曲线, 讨论了IGZO有源层厚度对IGZO-TFT特性的影响. 制备的IGZO-TFT器件的场效应迁移率高达15.6 cm²·V^-1·s^-1, 开关比高于10⁷. 关键词： 非晶铟镓锌氧化物 薄膜晶体管 有源层     

Investigation of ultra-thin and flexible Au–Ag–Au transparent conducting electrode

The performance of ultra-thin Au–Ag–Au tri-layer film deposited thermally over a flexible substrate is investigated using structural, optical, mechanical and electrical-transport measurements. The optimum total thickness of the tri-layer for high transparency and conductivity is determined to be around 8 nm using a theoretical model. The Au–Ag–Au tri-layer shows maximum transmittance (≅ 62%) at wavelength 500 nm. XRD pattern shows peak corresponding to (111) plane of Au and/or Ag. Sheet resistance (≅ 10.42 Ω/□) measured at 300 K using four probe technique is stable up to 150 °C. Hall effect measurements show high conductivity (1.34 × 10⁵ (Ω cm)⁻¹), carrier concentration (2.48 × 10²³/cm³), and mobility (3.4 cm²/Vs). Scotch tape test confirms good adhesion of the film onto PET substrate. Bending-twisting tests using an indigenous apparatus indicate high resistance-stability even after 50,000 cycles. These results imply the viability of Au–Ag–Au tri-layer film as a transparent conducting electrode worth exploring for optoelectronic applications.     

Effect of GZO thickness and annealing temperature on the structural,electrical and optical properties of GZO/Ag/GZO sandwich films

The GZO/Ag/GZO sandwich films were deposited on glass substrates by RF magnetron sputtering of Ga-doped ZnO (GZO) and ion-beam sputtering of Ag at room temperature. The effect of GZO thickness and annealing temperature on the structural, electrical and optical properties of these sandwich films was investigated. The microstructures of the films were studied by X-ray diffraction (XRD). X-ray diffraction measurements indicate that the GZO layers in the sandwich films are polycrystalline with the ZnO hexagonal structure and have a preferred orientation with the c-axis perpendicular to the substrates. For the sandwich film with upper and under GZO thickness of 40 and 30 nm, respectively, it owns the maximum figure of merit of 5.3 × 10⁻² Ω⁻¹ with a resistivity of 5.6 × 10⁻⁵ Ω cm and an average transmittance of 90.7%. The electrical property of the sandwich films is improved by post annealing in vacuum. Comparing with the as-deposited sandwich film, the film annealed in vacuum has a remarkable 42.8% decrease in resistivity. The sandwich film annealed at the temperature of 350 °C in vacuum shows a sheet resistance of 5 Ω/sq and a transmittance of 92.7%, and the figure of merit achieved is 9.3 × 10⁻² Ω⁻¹.     

Structural and electrical properties of fluorine-doped zinc tin oxide thin films prepared by radio-frequency magnetron sputtering

Transparent and conductive thin films of fluorine doped zinc tin oxide (FZTO) were deposited on glass substrates by radio-frequency (RF) magnetron sputtering using a 30 wt% ZnO with 70 wt% SnO₂ ceramic targets. The F-doping was carried out by introducing a mixed gas of pure Ar, CF₄, and O₂ forming gas into the sputtering chamber while sputtering ZTO target. The effect of annealing temperature on the structural, electrical and optical performances of FZTO thin films has been studied. FZTO thin film annealed at 600 °C shows the decrease in resistivity 5.47 × 10⁻³ Ω cm, carrier concentration ∼10¹⁹ cm⁻³, mobility ∼20 cm² V⁻¹ s⁻¹ and an increase in optical band gap from 3.41 to 3.60 eV with increasing the annealing temperatures which is well explained by Burstein–Moss effect. The optical transmittance of FZTO films was higher than 80% in all specimens. Work function (ϕ) of the FZTO films increase from 3.80 eV to 4.10 eV through annealing and are largely dependent on the amounts of incorporated F. FZTO is a possible potential transparent conducting oxide (TCO) alternative for application in optoelectronics.     

AZO/Ag/AZO multilayer films prepared by DC magnetron sputtering for dye-sensitized solar cell application

Ag films were deposited on Al-doped ZnO (AZO) films and coated with AZO to fabricate AZO/Ag/AZO multilayer films by DC magnetron sputtering on glass substrates without heating of glass substrates. The best multilayer films have low sheet resistance of 19.8 Ω/Sq and average transmittance values of 61% in visible region. It was found that the highest figure of merit (F_TC) is 6.9 × 10⁻⁴ Ω⁻¹. For the dye-sensitized solar cell (DSSC) application, the multilayer films were used as transparent conductive electrode (multilayer films/ZnO + Eosin-Y/LiI + I₂/Pt/FTO). The best DSSC based on the multilayer films showed that open circuit voltage (V_oc) of 0.47 V, short circuit current density (J_sc) of 2.24 mA/cm², fill factor (FF) of 0.58 and incident photon-to-current conversion efficiency (η) of 0.61%. It was shown that the AZO/Ag/AZO multilayer films have potential for application in DSSC.     

The effect of Ag layer thickness on the properties of WO3/Ag/MoO3 multilayer films as anode in organic light emitting diodes

Transparent conductive WO₃/Ag/MoO₃ (WAM) multilayer electrodes were fabricated by thermal evaporation and the effects of Ag layer thickness on the optoelectronic and structural properties of multilayer electrode as anode in organic light emitting diodes (OLEDs) were investigated using different analytical methods. For Ag layers with thickness varying between 5 and 20 nm, the best WAM performances, high optical transmittance (81.7%, at around 550 nm), and low electrical sheet resistance (9.75 Ω/cm²) were obtained for 15 nm thickness. Also, the WAM structure with 15 nm of Ag layer thickness has a very smooth surface with an RMS roughness of 0.37 nm, which is suitable for use as transparent conductive anode in OLEDs. The current density?voltage?luminance (J?V?L) characteristics measurement shows that the current density of WAM/PEDOT:PSS/TPD/Alq₃/LiF/Al organic diode increases with the increase in thickness of Ag and WO₃/Ag (15 nm)/MoO₃ device exhibits a higher luminance intensity at lower voltage than ITO/PEDOT:PSS/TPD/Alq₃/LiF/Al control device. Furthermore, this device shows the highest power efficiency (0.31 lm/W) and current efficiency (1.2 cd/A) at the current density of 20 mA/cm², which is improved 58% and 41% compared with those of the ITO-based device, respectively. The lifetime of the WO₃/Ag (15 nm)/MoO₃ device was measured to be 50 h at an initial luminance of 50 cd/m², which is five times longer than 10 h for ITO-based device.     

Growth and characterization of indium oxide films

In₂O₃ films have been deposited using chemical spray pyrolysis technique at different substrate temperatures that varied in the range, 250–450 °C. The structural and morphological properties of the as-deposited films were studied using X-ray diffractometer and scanning electron microscope as well as atomic force microscope, respectively. The films formed at a temperature of 400 °C showed body-centered cubic structure with a strong (2 2 2) orientation. The structural parameters such as the crystallite size, lattice strain and texture coefficient of the films were also calculated. The films deposited at a temperature of 400 °C showed an optical transmittance of >85% in the visible region. The change of resistivity, mobility, carrier concentration and activation energies with the deposition temperature was studied. The highest figure of merit for the layers grown at 400 °C was 1.09 × 10⁻³ Ω⁻¹.     

Transparent conducting molybdenum-doped zinc oxide films deposited by RF magnetron sputtering

A new transparent conducting oxide (TCO) film with low resistivity and high transmittance in the visible range, molybdenum-doped zinc oxide (MZO), was successfully prepared by RF magnetron sputtering method on glass substrates at room temperature. The structural, electrical, and optical properties as a function of film thickness were investigated. All the samples have a preferred orientation with the (0 0 2) planes parallel to the substrates. The resistivity initially decreases and then shows an increase with the increase of the film thickness. When the thickness is 400 nm, the film has its best crystallinity and lowest resistivity 9.2 × 10⁻⁴ Ω cm with a Hall mobility of 30 cm² V⁻¹ s⁻¹ and a carrier concentration of 2.3 × 10²⁰ cm⁻³. The average transmittance in the visible range exceeds 84% for all thickness films.     

Investigating gate metal induced reduction of surface donor density in GaN/AlGaN/GaN heterostructure by electroreflectance spectroscopy

The internal field of GaN/AlGaN/GaN heterostructure on Si-substrate was investigated by varying the thickness of an undoped-GaN capping layer using electroreflectance spectroscopy. The four samples investigated are AlGaN/GaN heterostructure without a GaN cap layer (reference sample) and three other samples with GaN/AlGaN/GaN heterostructures in which the different thickness of GaN cap layer (2.7 nm, 7.5 nm, and 12.4 nm) has been considered. The sheet carrier density (n_s) of a two-dimensional electron gas has decreased significantly from 4.66 × 10¹² cm⁻² to 2.15 × 10¹² cm⁻² upon deposition of a GaN capping layer (12.4 nm) over the reference structure. Through the analysis of internal fields in each GaN capping and AlGaN barrier layers, it has been concluded that the undiminished surface donor states (n_s) of a reference structure and the reduced n_s caused by the Au gate metal are approximately 5.66 × 10¹² cm⁻² and 1.08 × 10¹² cm⁻², respectively.     

Superior tolerance of Ag/Ni multilayers against Kr ion irradiation: an in situ study

Monolithic Ag and Ni films and Ag/Ni multilayers with individual layer thickness of 5 and 50?nm were subjected to in situ Kr ion irradiation at room temperature to 1 displacement-per-atom (a fluence of 2?×?10¹⁴?ions/cm²). Monolithic Ag has high density of small loops (4?nm in diameter), whereas Ni has fewer but much greater loops (exceeding 20?nm). In comparison, dislocation loops, ～4?nm in diameter, were the major defects in the irradiated Ag/Ni 50?nm film, while the loops were barely observed in the Ag/Ni 5?nm film. At 0.2?dpa (0.4?×?10¹⁴?ions/cm), defect density in both monolithic Ag and Ni saturated at 1.6 and 0.2?×?10²³/m³, compared with 0.8?×?10²³/m³ in Ag/Ni 50?nm multilayer at a saturation fluence of ～1?dpa (2?×?10¹⁴?ions/cm²). Direct observations of frequent loop absorption by layer interfaces suggest that these interfaces are efficient defect sinks. Ag/Ni 5?nm multilayer showed a superior morphological stability against radiation compared to Ag/Ni 50?nm film.     

Structural,optical and electrical properties of CuSCN nano-powders doped with Li for optoelectronic applications

Pure and Li-doped CuSCN nano-powders were prepared using an in situ method. Structural, optical and electrical properties of the prepared samples were investigated using X-ray diffraction (XRD), UV–Visible spectrophotometer and simple electrical circuit. XRD measurements showed that all pure and doped samples with 1%–7% Li have the hexagonal structures. The crystallite size of CuSCN decreased from 39.46 nm to 36.42 nm with increasing Li concentration from 0 to 7%. The values of direct and indirect optical band gap energies of pure and Li-doped CuSCN nano-powders were calculated. Direct optical band gap energy increased from 3.60 eV to 4.20 eV and indirect optical band gap energy increased from 2.36 eV to 3.20 eV by doping CuSCN with Li. The dc electrical conductivity was calculated at room temperature for all prepared CuSCN samples. Electrical conductivity decreased from 6.04 × 10⁻⁸ (Ω.cm)⁻¹ to 2.82 × 10⁻⁸ (Ω.cm)⁻¹ with increasing Li concentration from 0 to 7%. The optoelectronic performance of CuSCN was improved by doping with Li. As a result, Li-doped CuSCN could be a good candidate material as a window layer and as a hole transport layer (HTL) for producing more efficient solar cells.     

Use of graphene for forming Al-based p-type reflectors for near ultraviolet InGaN/AlGaN-based light-emitting diode

We demonstrated the improved performance of near UV (365 nm) InGaN/AlGaN-based LEDs using highly reflective Al-based p-type reflectors with graphene sheets as a diffusion barrier. The use of graphene sheets did not degrade the reflectance of ITO/Al contacts, viz. ∼81% at 365 nm. The ITO/graphene/Al contacts annealed at 300 °C exhibited better ohmic behavior with a specific contact resistance of 1.5 × 10⁻³ Ωcm² than the ITO/Al contact (with 9.5 × 10⁻³ Ωcm²). Near UV LEDs fabricated with the ITO/graphene/Al contact annealed at 300 °C showed a 7.2% higher light output (at 0.1 W) than LEDs with the ITO/Al reflector annealed at 300 °C. The SIMS results exhibited that, unlike the ITO/graphene/Al, the ITO/Al contacts undergo a significant indiffusion of Al atoms toward the GaN after annealing. Furthermore, both Ga and Mg atoms were also more extensively outdiffused in the ITO/Al contacts after annealing. On the basis of the SIMS and electrical results, the possible explanations for the annealing-induced degradation of the ITO/Al contacts are described and discussed.     

MoO3/Ag/MoO3 top anode structure for semitransparent inverted organic solar cells

In this study, we fabricated semitransparent polymeric solar cells with an inverted structure, with the structure being indium tin oxide (ITO)/cesium carbonate (Cs₂CO₃)/poly(3-hexylthiophene) (P3HT):1-(3-methoxycarbonyl)propyl-1-phenyl[6,6]C61(PCBM)/transparent multilayer. The structure of the transparent multilayer (DMD multilayer), which acted as the anode, was MoO₃ (1–40 nm)/Ag (10 nm)/MoO₃ (0–80 nm). The inner MoO₃ layer showed a great performance changes depending on the variation of thickness, while the outer MoO₃ layer showed relatively slight changes. The best performance was observed with the of anode DMD multilayer thickness of 6/10/40 nm and with the illumination from the ITO side in organic solar cell devices. High performance result was observed in high reflectance and low transmittance of the DMD layer.     

Al-doped zinc oxide films grown by successive chemical solution deposition

Films of ZnO were grown and doped by the successive chemical solution deposition technique from a zincate solution containing aluminum (Al/Zn molar ratio in the range 2–10%). To our knowledge, this is the first report of its kind. A post-deposition heat treatment in argon (500 °C, 20 min) was performed for the activation of incorporated Al donors. Films were characterized by using scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, optical transmittance, photoluminescence and Hall-effect measurement. Films with a resistivity 0.2 Ω cm, carrier concentration 1.2×10¹⁸ cm^-3 and mobility 26 cm²/V s can be grown from a solution with Al/Zn = 10%. Further reduction in resistivity is plausible by using more heavily doped solutions and by the optimization of annealing parameters. Although the doping process does not change the films’ structure and surface morphology, it slightly lowers the optical transparency in the visible region and blue shifts the room-temperature photoluminescence peak to 378 nm. PACS  81.16.Be; 73.61.Ga; 78.55.Et; 79.60.-i; 68.55.Jk     

Influence of Ag thickness on the structural,optical, and electrical properties of the SnS/Ag/SnS trilayer films for solar cell application

We fabricated the SnS/Ag/SnS (SAS) trilayer thin films by a sputtering method at 200 $°C$. The structural, optical, and electrical properties of the films were studied by varying the Ag interlayer thickness from 9 to 27 nm. The EDS analysis revealed that all SAS trilayer films showed an increase in the atomic percentage of Ag from 1.87 to 6.18. The X-ray diffraction studies confirmed that SAS films with Ag-18 nm thickness showed a preferred (111) peak of the SnS with improved crystallinity. The optical absorption coefficient of the SAS films increased by a factor of 18 when compared to the SnS films without Ag. Also, the optical band gap decreased from 1.53 to 1.28 eV with Ag thickness. All SAS films exhibited the p-type conductivity with increased hole-concentration from 1.94 $\times$ ${10}^{14}$ to 4.15 $\times$${10}^{18}$cm⁻³ and also the mobility from 1.31 to 81.6 cm². V⁻¹s⁻¹.     

Effects of Ag layer and ZnO top layer thicknesses on the physical properties of ZnO/Ag/Zno multilayer system

Two groups of transparent conductive ZnO/Ag/ZnO, ZAZ, multilayer coatings were successively deposited by direct current (DC) magnetron sputtering. Sputtering was carried out from zinc (Zn) and silver (Ag) metallic targets. The effects of Ag layer thickness and ZnO top layer thickness on the properties of the ZAZ multilayer system were examined using different analytical methods. The influences of the Ag layer thickness and ZnO top layer thickness on structural properties were studied using X-ray diffraction. The thicknesses of ZAZ multilayer system were determined using X-ray reflectometry. A sheet resistance of 2.3 Ω/sq at an Ag layer thickness of 17.7 nm was obtained. The sheet resistance changes slightly with ZnO top layer thickness. The optical properties of the films were analyzed. Both Ag layer thickness and ZnO top layer thickness affect transmittance. The optical constants of the ZAZ multilayer system were calculated from transmittance and reflectance measurements. The figure of merit was applied on the ZAZ coatings and the most suitable films for the application as transparent conductive electrodes were determined.     

Transparent conductive ITO/Ag/ITO multilayer electrodes deposited by sputtering at room temperature

ITO/Ag/ITO multilayers have been prepared onto conventional soda lime glass substrates by sputtering at room temperature. The optical and electrical characteristics of single layer and multilayer structures have been investigated as a function of the Ag and ITO film thicknesses. Transmittance and sheet resistance values are found mainly dependent on the Ag film thickness; whereas the wavelength range at which the maximum transmittance is achieved can be changed by adjusting the ITO films thickness. ITO/Ag/ITO electrodes with sheet resistance below 6 Ω/sq have been obtained for Ag film thickness above 10 nm and ITO layers thickness in the 30-50 nm range. These multilayers also show high transmittance in the visible spectral region, above 90% by discounting the glass substrate, with a maximum that is located at higher wavelengths for thicker ITO.     

Structural,optical and electrical properties of tin oxide thin films by electrostatic spray deposition

Tin oxide (SnO₂) thin films were deposited by electrostatic spray deposition (ESD). The structural, optical and electrical properties of the films for different solvents were studied. The morphology of the deposited thin films was investigated by scanning electron microscopy. The optical transmission spectra of the films showed 66–75% transmittance in the visible region of spectrum. The electrical resistivity of thin films deposited using the different solvents ranged 1.08 × 10^?3–1.34 × 10^?3 Ω-cm. Overall, EG and PG were good solvents for depositing SnO₂ thin films by the ESD technique with stable cone jet.     

Effect of nitrogen ions on the structural,optical, and thermal properties of polyvinyl alcohol/starch blend

This work examines the properties of polyvinyl alcohol (PVA)/starch film containing glycerol as a plasticizer under exposure to different nitrogen ion fluence. The prepared PVA/starch blend was irradiated with ion fluence from 3 × 10¹⁷ to 12 × 10¹⁷ ions.cm⁻². From FTIR, the ion beam irradiation attack and weakens the C–H bond in PVA/starch blend. From XRD findings, the crystallite size of the blend decreased at 3 × 10¹⁷ ions/cm² while it increased at higher fluence up to 9 × 10¹⁷ ions/cm². This indicates the degradation of the blend at low ion fluence compared to crosslinking at high ion fluence. Also, the optical bandgap of the blend was decreased with an increase in ion fluence. Furthermore, the effect of N⁺ ions on some optical dispersion parameters is studied. The thermal stability of the PVA/starch blend shows a decrease in thermal stability upon irradiation with 3 × 10¹⁷ ions/cm² compared to higher thermal stability at higher doses up to 9 × 10¹⁷ ions/cm².