La掺杂浓度对PLZT薄膜红外光学性质的影响

采用溶胶-凝胶法在Pt/Ti/SiO2/Si衬底上制备了不同La掺杂浓度PLZT(x/40/60)薄膜- x射线衍射分析表明制备的PLZT(x/40/60)薄膜是具有单一钙钛矿结构的多晶薄膜- 通过红外椭圆偏振光谱仪测量了波长为2-5—12-6μm范围内PLZT薄膜的椭偏光谱，采用经典色 散模型拟合获得PLZT薄膜的红外光学常数，同时也拟合获得PLZT薄膜的厚度- 随着La掺杂浓 度的增大，折射率逐渐减小- 而消光系数除PLZT(4/40/60)薄膜外，呈现逐渐增大的趋势- 分析表明这些差异主要与PLZ 关键词： PLZT薄膜 红外光学性质 红外椭圆偏振光谱     

Y2O3稳定ZrO2薄膜的结构和光学特性

用电子束蒸发法制备出四种不同Y2O3含量的Y2O3稳定ZrO2（YSZ）薄膜,用X射线衍射和透射光谱测定薄膜的结构和光学性能.结果表明：随着Y2O3含量的增加,ZrO2薄膜从单斜相向高温相（四方相和立方相）转变,获得了结构稳定的YSZ薄膜;YSZ薄膜的晶粒尺寸都比ZrO2薄膜的大,但随着Y2O3加入量的增加,晶粒尺寸有减小的趋势,薄膜表面也趋向光滑平整.所有YSZ薄膜的透射谱线都与ZrO2薄膜相似,在可见光和红外光区都有较高的透过率.Y2O3的加入还可以改变薄膜的折射率,在一定范围内可得到所需的任意折射率.     

A comparative study of thin films of Zn(O;OH)S and In(O;OH)S deposited on CuInS2 by chemical bath deposition method

In this work, a study of synthesis of thin films of Zn(O;OH)S and In(O;OH)S deposited by chemical bath deposition (CBD) is presented. The thin films of Zn(O;OH)S and In(O;OH)S were deposited from different chemical bath systems on absorber layers of CuInS₂ (CIS), indium tin oxide substrates (ITO) and soda lime glass substrates (SL). The differences on the growth rate, optical, morphological and structural properties of the thin films Zn(O;OH)S and In(O;OH)S are studied. The Growth studies showed that thin films of Zn(O;OH)S and In(O;OH)S grown faster on CIS than on SL and ITO substrates. The optical and morphological studies showed that both thin films present high transmittance in visible electromagnetic spectrum and covered uniformly the surface of the substrate, furthermore it was observed that thin films of Zn(O;OH)S and In(O;OH)S were polycrystalline. Finally, the results suggest that thin films of Zn(O;OH)S and In(O;OH)S obtained in this work could be used as buffer layer to replace the thin films of CdS, which are conventionally used as buffer layer in chalcopyrite based solar cells.     

Effects of cooling rate and post-heat treatment on properties of ZnO thin films deposited by sol-gel method

Sol-gel spin-coated ZnO thin films are cooled with different rates after the pre-heat treatment. Atomic force microscopy (AFM), X-ray diffraction (XRD), Raman, and photoluminescence (PL) were carried out to investigate the effects of the cooling rate during pre-heat treatment on structural and optical properties of the ZnO thin films. The ZnO thin films cooled slowly exhibit mountain chain structure while the ones cooled rapidly have smooth surface. The ZnO thin films cooled rapidly have higher c-axis orientation compared to the ones cooled slowly. The narrower and the higher near-band-edge emission (NBE) peaks are observed in the ZnO thin films cooled rapidly.     

Infrared spectroscopic ellipsometry of (Pb, La)(Zr, Ti)O3 thin films on platinized silicon

Lead lanthanum zirconate titanate (PLZT) thin films with different La concentrations (x), whose composition is x/40/60, have been grown directly on Pt/Ti/SiO₂/Si (100) substrates by a modified sol-gel method. X-ray diffraction analysis shows that the PLZT thin films are polycrystalline. The infrared optical properties of the PLZT thin films have been investigated using the infrared spectroscopic ellipsometry in the spectral range of 2.5–12.5 μm. By fitting the measured ellipsometric spectra (Ψ and Δ) with a three-phase model (air/PLZT/Pt), and a derived classical dispersion relation for the thin films, the optical constants and thicknesses of the thin films have been obtained. The refractive index of the PLZT thin films decreases with increasing La concentrations, however, the extinction coefficient increases with increasing La concentrations except for the PLZT(4/40/60) thin films. The values of the effective static charge calculated for the PLZT thin films, which state that PLZT belongs to a mixed ionic-covalent compound, decrease with increasing La concentrations. Moreover, the refractive index at the wavelength of 2.5 μm changes linearly with the effective static charge. The plot of the calculated infrared optical absorption versus wavelength for the Ni/PLZT/Pt multilayer structures with various La concentrations is given and indicates that the PLZT thin films are excellent candidates for ferroelectric infrared detectors and focal plane arrays.     

Mechanical properties of sol-gel derived lead zirconate titanate thin films by nanoindentation

Lead zirconate titanate (PZT) thin films are deposited on platinized silicon substrate by sol-gel process. The crystal structure and surface morphology of PZT thin films are characterized by X-ray diffraction and atomic force microscopy. Depth-sensing nanoindentation system is used to measure mechanical characteristics of PZT thin films. X-ray diffraction analyses confirm the single-phase perovskite structures of all PZT thin films. Nanoindentation measurements reveal that the indentation modulus and hardness of PZT thin films are related with the grain size and crystalline orientation. The increases of the indentation modulus and hardness with grain size are observed, indicating the reverse Hall-Petch effect. Furthermore, the indentation modulus of (1 1 1)-oriented PZT thin film is higher than those of (1 0 0)- and random-oriented films. The consistency between experimental data and numerical results of the effective indentation moduli for fiber-textured PZT thin films using Voigt-Reuss-Hill model is obtained.     

Deposition of hexagonal boron nitride thin films on silver nanoparticle substrates and surface enhanced infrared absorption

Silver nanoparticle thin films with different average particle diameters are grown on silicon substrates. Boron nitride thin films are then deposited on the silver nanoparticle interlayers by radio frequency （RF） magnetron sputtering. The boron nitride thin films are characterized by Fourier transform infrared spectra. The average particle diameters of silver nanoparticle thin films are 126.6, 78.4, and 178.8 nm. The results show that the sizes of the silver nanoparticles have effects on the intensities of infrared spectra of boron nitride thin films. An enhanced infrared absorption is detected for boron nitride thin film grown on silver nanoparticle thin film. This result is helpful to study the growth mechanism of boron nitride thin film.     

The effects of thermal annealing on the obliquely deposited Ag-Ge-S thin films

Obliquely deposited thin films of ternary Ag-Ge-S glasses are characterized in this work. Thin films are fabricated in a vacuum thermal evaporator at different evaporation angles and examined by Raman spectroscopy. The Raman mode frequency of GeS₄ corner-sharing (CS) structure of the as-deposited films display a red-shift as a function of Ag content due to reduced global connectivity, and therefore decreased network stress. Film thickness of normally deposited thin films is significantly less when compared against obliquely deposited ones. Sulfur-ring (S₈) modes are observed in thin films but not in corresponding bulk material. Thermal annealing of thin films results in the disappearance of Sulfur-ring (S₈) modes, while the temperature required for this phenomenon is deposition angle dependent. Thickness of the obliquely deposited films shrinks significantly after thermal annealing, which indicates a collapse of the micro-column structure introduced by oblique deposition.     

气相沉积法制备聚酰亚胺薄膜的热环化研究

采用两种单体同时蒸发沉积聚合方法制备得到聚酰亚胺（PI）薄膜。对不同温度下和不同恒温时间的聚酰胺酸（PAA）薄膜进行了红外分析,将300 ℃恒温3 h以上的薄膜脱膜,用白光干涉仪测量了PI薄膜热环化前后表面质量。采用热重分析仪在不同升温速率条件下对薄膜进行了分析。结果表明,在热环化过程中,随着温度增加亚胺化程度逐渐增加。在300 ℃时随着恒温时间增加亚胺化程度逐渐增加,恒温3 h以上薄膜亚胺化较为完全,可以获得完整且不易破损的自支撑薄膜。在热环化过程中,升温速率较低时薄膜的亚胺化程度在低温区转化率提高,过量单体蒸发更完全,故一般选择较小的升温速率,约10 ℃/min甚至更低。采用上述热环化工艺得到了亚胺化程度较高且不易破损的PI薄膜,其表面均方根粗糙度为9.8 nm。     

不同衬底温度下PLD法制备的氧化锌薄膜的特性

利用GCR-170型脉冲激光器Nd:YAG的三次谐波(355nm),以蓝宝石Al2O3(0001)为衬底,在不同温度下采用脉冲激光沉积法制备了ZnO薄膜.通过原子力显微镜、Raman谱、光致发光谱、红外透射谱、霍尔效应和表面粗糙度分析仪对制备的ZnO薄膜进行了测试.分析了在不同衬底温度下薄膜的表面形貌、光学特性,同时进行了薄膜结构和厚度的测试.研究表明:衬底温度对ZnO薄膜的表面形貌、光学特性、结构特性都是重要的工艺参量,尤其在500℃时沉积的ZnO薄膜致密均匀,并表现出较强的紫外发射峰.     

Effect of excimer laser annealing on the properties of ZnO thin film prepared by sol-gel method

Pristine ZnO thin films have been deposited with zinc acetate [Zn(CH₃COO)₂], mono-ethanolamine (stabilizer), and isopropanol solutions by sol-gel method. After deposition, pristine ZnO thin films have been irradiated by excimer laser (λ = 248, KrF) source with energy density of 50 mJ/cm² for 30 sec. The effect of excimer laser annealing on the optical and structural properties of ZnO thin films are investigated by photoluminescence and field emission scanning electron microscope. As-grown ZnO thin films show a huge peak of visible region and a wide full width at half maximum (FWHM) of UV region due to low quality with amorphous ZnO thin films. After KrF excimer laser annealing, ZnO thin films show intense near-band-edge (NBE) emission and weak deep-level emission. The optically improved pristine ZnO thin films have demonstrated that excimer laser annealing is novel treatment process at room temperature.     

Surface roughness characterization of Al-doped zinc oxide thin films using rapid optical measurement

Transparent conductive oxide thin films have been widely investigated in photoelectric devices such as flat panel display (FPD) and solar cells. Al-doped zinc oxide (AZO) thin films have been widely employed in FPD. Measuring the surface roughness of AZO thin films is important before the manufacturing of photoelectric device using AZO thin films because surface roughness of AZO thin films will significantly affect the performance of photoelectric device. Traditional methods to measure surface roughness of AZO thin films are scanning electron microscopy and atomic force microscopy. The disadvantages of these approaches include long lead time and slow measurement speed. To solve this problem, an optical inspection system for rapid measurement of the surface roughness of AZO thin films is developed in this study. It is found that the incident angle of 60° is a good candidate to measure the surface roughness of AZO thin films. Based on the trend equation y=−3.6483x+2.1409, the surface roughness of AZO thin films (y) can be directly deduced from the peak power density (x) using the optical inspection system developed. The maximum measurement-error rate of the optical inspection system developed is less than 8.7%.The saving in inspection time of the surface roughness of AZO thin films is up to 83%.     

图谱分析退火对CdTe多晶薄膜性能影响

对近空间蒸发系统制备的同一CdTe薄膜进行分割并在不同条件下进行退火,通过XRD、SEM、电导温度关系以及XPS等研究退火后薄膜结构,各元素含量分布以及价态变化。结果表明：刚沉积的CdTe薄膜呈立方相,沿(111)明显的择优取向,退火后(111)(220)(311)等峰的强度有不同程度的增强。晶粒长大,晶界减小,降低通过晶界载流子复合概率,降低暗电导激活能,改善电池的并联电阻和漏电流。XPS测试表明样品中存在碲的氧化物,而且随着刻蚀深度的增加氧化物明显减少。通过分析,认为样品中可能存在TeClO₂的结构单元,导致薄膜性能的改变。样品表面氧元素含量较多,随着刻蚀深度的增加,氯氧2种元素的含量明显减少,而且氯元素在样品中达到了稳定的分布。     

界面对Fe65Co35薄膜微结构和软磁性的影响

用不同的材料（Co₉₃Fe₇和Fe）作衬底层,利用磁控溅射法成功制备了Fe₆₅Co₃₅（主层）/衬底层结构的双层薄膜．通过X射线衍射和磁性测量发现,在不同的衬底上沉积的Fe₆₅Co₃₅薄膜的织构不同,并且（200）取向的Fe₆₅Co₃₅薄膜的面内各向异性和软磁性优于（110）取向的Fe₆₅Co_{35关键词： 65}Co₃₅薄膜')" href="#">Fe₆₅Co₃₅薄膜 衬底层 界面各向异性 软磁性     

Effects of post-annealing on the structural and nanomechanical properties of Ga-doped ZnO thin films deposited on glass substrate by rf-magnetron sputtering

In this study, the effects of post-annealing on the structure, surface morphology and nanomechanical properties of ZnO thin films doped with a nominal concentration of 3 at.% Ga (ZnO:Ga) are investigated using X-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM) and nanoindentation techniques. The ZnO:Ga thin films were deposited on the glass substrates at room temperature by radio frequency magnetron sputtering. Results revealed that the as-deposited ZnO:Ga thin films were polycrystalline albeit the low deposition temperature. Post-annealing carried out at 300, 400 and 500 °C, respectively, has resulted in progressive increase in both the average grain size and the surface roughness of the ZnO:Ga thin film, in addition to the improved thin films crystallinity. Moreover, the hardness and Young's modulus of ZnO:Ga thin films are measured by a Berkovich nanoindenter operated with the continuous contact stiffness measurements (CSM) option. The hardness and Young's modulus of ZnO:Ga thin films increased as the annealing temperature increased from 300 to 500 °C, with the best results being obtained at 500 °C.     

Polar dependent in-plane electric transport of epitaxial ZnO thin films on SrTiO(3) substrates

Polar (001) and nonpolar (110) ZnO epitaxial thin films were grown on SrTiO(3) substrates by the pulsed laser deposition method and the in-plane electric transport was investigated. Both films display semiconducting behavior. The polar thin films have linear I-V relations with mobility increasing almost linearly with temperature. In contrast, for nonpolar ZnO thin films, the I-V curves are symmetric and nonlinear with room temperature resistivity 30 times larger than that of polar thin films. We conclude that in nonpolar ZnO thin films the bound polarization charge induced barrier limits the carrier transport. Instead, for polar thin films, the polar effect on the in-plane transport is negligible, and the charged dislocation scattering is dominant. Our observations suggest the polar effect should be considered in the design of ZnO related devices.     

The effect of heat treatment on the physical properties of sol-gel derived ZnO thin films

Zinc oxide (ZnO) thin films were deposited on microscope glass substrates by sol-gel spin coating method. Zinc acetate (ZnAc) dehydrate was used as the starting salt material source. A homogeneous and stable solution was prepared by dissolving ZnAc in the solution of monoethanolamine (MEA). ZnO thin films were obtained after preheating the spin coated thin films at 250 °C for 5 min after each coating. The films, after the deposition of the eighth layer, were annealed in air at temperatures of 300 °C, 400 °C and 500 °C for 1 h. The effect of thermal annealing in air on the physical properties of the sol-gel derived ZnO thin films are studied. The powder and its thin film were characterized by X-ray diffractometer (XRD) method. XRD analysis revealed that the annealed ZnO thin films consist of single phase ZnO with wurtzite structure (JCPDS 36-1451) and show the c-axis grain orientation. Increasing annealing temperature increased the c-axis orientation and the crystallite size of the film. The annealed films are highly transparent with average transmission exceeding 80% in the visible range (400-700 nm). The measured optical band gap values of the ZnO thin films were between 3.26 eV and 3.28 eV, which were in the range of band gap values of intrinsic ZnO (3.2-3.3 eV). SEM analysis of annealed thin films has shown a completely different surface morphology behavior.     

退火对ZnO:Al薄膜光致发光性能的影响

 采用溶胶-凝胶工艺在石英衬底上制备ZnO:Al（AZO）薄膜，通过不同温度的退火处理，研究了退火对AZO薄膜结构和光致发光特性的影响。XRD图谱表明：所制备的薄膜具有c轴高度择优取向，随着退火温度的升高，(002)峰的强度逐渐增强，同时(002)峰的半高宽逐渐减小,表明晶粒在不断增大。未退火样品的光致发光（PL）谱由361 nm附近的紫外带边发射峰和500 nm附近的深能级发射峰组成。样品经退火后，以500 nm为中心的绿带发射逐渐减弱，而带边发射强度有所增强,并且逐渐红移到366 nm附近，与吸收边移动的测试结果相吻合。对经过不同时间退火的样品分析表明，AZO薄膜的发光特性与退火时间也有很大关系，时间过短可见波段的发射较强，但时间过长会使晶粒发生团聚，导致紫外发射峰强度减弱。     

Laser direct patterning induced the tunable optical properties of indium tin oxide micro-hole arrays films

Here we introduce a facile method to fabricate patterned indium tin oxide (ITO) thin films via selective laser ablation at ambient conditions. By scanning the ITO thin films with focused Nd: YAG pulsed laser, the ITO thin films were selective ablated and patterned without using any conventional chemical etching or photolithography steps. Then we investigated the effects of scanning rate for the structure, morphology and optical properties of patterned ITO thin film. These results indicate that the epsilon-near-zero (ENZ) wavelength of ITO thin films can be tuned from 1100 nm to 1340 nm by adjusting the period of the micro-hole array in microstructure. The nonlinear absorption response of patterned ITO films was about 2.85 time than of the as-deposited ITO thin film. Additionally, the results of the Finite-Difference Time-Domain (FDTD) simulation are in good agreement with those of the experiments.     

射频磁控溅射法制备SnS薄膜及其结构和光学特性

利用射频磁控溅射法在玻璃衬底上沉积SnS薄膜并对其进行快速退火处理,利用X射线衍射(XRD)、拉曼光谱(Raman)、X射线能量色散谱(EDS)、原子力显微镜(AFM)和紫外-可见-近红外(UV-Vis-NIR)分光光度计研究了不同溅射功率(60~120 W)条件下制备的SnS薄膜的晶体结构、物相组成、化学组分、表面形貌以及有关光学特性。结果表明:经快速退火的薄膜均已结晶,提高溅射功率有利于改善薄膜的结晶质量、生长择优取向程度和化学配比,薄膜的平均颗粒尺寸呈增大趋势;溅射功率为100 W的薄膜样品的结晶质量和择优取向度高,薄膜应变最小,且为纯相SnS薄膜,Sn/S组分的量比为1∶1.09,吸收系数达10~5cm~(-1)量级,直接禁带宽度为1.54 eV。