Temperature-dependent capacitance–voltage biasing of the highly tunable TlGaTe2 crystals

The temperature effects on the capacitance–voltage characteristics as well as the room temperature capacitance–frequency characteristics of TlGaTe₂ crystals are investigated. A very wide range of linearly varying tunable capacitance from 6.0 μF to 60 pF was recorded. The capacitance–voltage characteristics, being recorded in the temperature range of 290–380 K, revealed a linear increase in the build in voltage associated with exponential decrease in the density of non-compensated ionized carriers with increasing temperature. The high temperature (up to 380 K) biasing ability, the linear tunability and the high dielectric constant values (∼10³) make the TlGaTe₂ crystals applicable in microelectronic components.     

Preparation and characterization of semiconductor GNR-CNT nanocomposite and its application in FET

So far, little is known about the experimental potential of graphene nanoribbon-carbon nanotube (GNR-CNT) heterostructure as a semiconductor nanocomposite. The present work examined the structural features, topography and electronic properties of GNR-CNT nanocomposite by using Raman spectroscopy, transmission electron microscopy, scanning tunneling microscopy and spectroscopy (STS). The homogenous semiconductor GNR-CNT nanocomposites were produced under optimized synthesis conditions. The narrow band gap was exhibited by optimization of the reduction step. The STS of the micro-scale surface of the nanocomposite shows local density of state in selected areas that represent the 0.08 eV band gap of a homogenous nanocomposite. The potential of the semiconductor nanocomposite was considered for application in stacked graphene nanoribbon-field effect transistors (SGNR-FETs). A simple method of device fabrication is proposed based on a semiconductor stacked GNR nanocomposite. The high hole mobility and rectifying effect of the p–n junction of the SGNR nanocomposite on TiO₂ are demonstrated. The optimal thickness for the back gate TiO₂ dielectric for the tested devices was 40 nm. This thickness decreased leakage current at the p–n junction of the SGNR/TiO₂ interface, which is promising heterojunction for optoelectronics. The thickness of gate dielectric and quantum capacitance of the gate was investigated at the low 40 nm thickness by calculating the mobility. In the proposed SGNR-FET, holes dominate electrical transport with a high mobility of about 1030 cm²/V s.     

Quantum capacitance in monolayers of silicene and related buckled materials

Silicene and related buckled materials are distinct from both the conventional two dimensional electron gas and the famous graphene due to strong spin orbit coupling and the buckled structure. These materials have potential to overcome limitations encountered for graphene, in particular the zero band gap and weak spin orbit coupling. We present a theoretical realization of quantum capacitance which has advantages over the scattering problems of traditional transport measurements. We derive and discuss quantum capacitance as a function of the Fermi energy and temperature taking into account electron–hole puddles through a Gaussian broadening distribution. Our predicted results are very exciting and pave the way for future spintronic and valleytronic devices.     

非简谐振动对石墨烯量子电容和热稳定性的影响

采用固体物理理论和方法,研究了单层石墨烯的量子电容和它的温度稳定性随温度和电压的变化规律,探讨原子非简谐振动对它的影响.结果表明:(1)当电压一定时,单层石墨烯的量子电容和温度稳定性系数均随温度升高发生非线性变化,电压小于2.3 V时,量子电容随温度升高而增大,温度稳定性系数随温度升高由缓慢变化到很快增大,电压高于2.3 V时,量子电容随温度升高先增大后减小,而其温度稳定性系数随温度升高由缓慢变化到很快减小.温度一定时,量子电容只在电压值为0.4～2.8 V范围内才变化较小,而电压值大于2.8 V时,量子电容迅速减小并趋于0;(2)与简谐近似相比,非简谐项会使石墨烯量子电容有所增大,且温度愈高,两者的差愈大,非简谐效应愈显著,温度为300 K时,非简谐的量子电容要比简谐近似的值大0.33%,而温度为1 000 K时,差值增大到1.47%;(3)电压在1.5～1.8 V之间,而温度低于800 K时,石墨烯量子电容的温度稳定性系数最小且不随温度而变,储能性能的温度稳定性最好;(4)非简谐项会使它的量子电容热稳定性系数比简谐近似的值增大,且增大的情况与温度有关,当温度为400 K时量子电容热...     

Effect of dielectric layer on ferroelectric responses of P(VDF-TrFE) thin films

The dielectric layer in the sandwich structural device plays a very important role in determining the electrical properties of the ferroelectric film. In this paper, we investigate the effect of the dielectric layers with different thicknesses on switching performance of ferroelectric P(VDF-TrFE) thin films. The hysteresis loops become slanting with increasing thickness of the dielectric layer. A negative slope of the ‘real’ hysteresis loop is apparently observed which demonstrates negative capacitance effect caused by the dielectric layer. This behavior is simulated qualitatively by the Weiss mean field model considering an interfacial dielectric layer in series with a ferroelectric layer. The agreement between experiments and simulations supports that negative capacitance results from the positive feedback among electric dipoles. Furthermore, the switching time of the ferroelectric film increases with the increase of dielectric layer thickness. This study shows that the ferroelectric sandwich structure provides great potential towards low power negative capacitance devices.     

Bipolaron in a quasi-0D quantum dot

Bipolaron states in a quasi-0D quantum dot with a spherical parabolic confinement potential are investigated by applying the Feynman variational principle. The bipolaron coupling energy and self-action potential energy are found to increase with an increase in the Fröhlich electron–phonon-coupling constant. There is also a non-monotonic dependence of the bipolaron coupling energy on the quantum dot radius. With decreasing structure radius the bipolaron coupling energy increases. However, from a critical radius it starts decreasing as the radius decreases, due to the dominance of the coulomb-to-phonon mediated interaction. When electrons in the bipolaron are forcefully neighboured, the polarization of the structure is intensified and consequently there is Coulomb repulsion. The possibility of bipolaron formation depends on the strength of the direct Coulomb repulsion which, in turn, depends on the quantum dot radius. The main contribution to the bipolaron coupling energy comes from the self-action potential. This self-action potential energy influences the energy state of the bipolaron considerably. The ratio of optical-to-static dielectric constants significantly affects the bipolaron coupling energy.     

Capacitance method for determination of basic parameters of porous silicon

Microstructure and physical characteristics of porous silicon (PS), such as thickness, bulk porosity, dielectric permittivity, and refractive index depend directly on the production conditions, e.g., on the electrolyte composition, anodizing current density, duration of etching, etc. Various possibilities of applications of PS generate high interest towards elaboration of new or modified operative nondestructive methods for testing the microstructure characteristics of PS layer for the adjustment of its processing regimes.According to the mechanism of formation of PS and experimental data on the morphology of PS layers, a porous layer is represented as a structure with cylindrical pores of equal lengths piercing the silicon frame. This approximation allows considering the structure using the parallel plate model within parallel-connected capacitances of the silicon frame and the air or liquid dielectric-filled pores.A method for obtaining information on the volume porosity, thickness, and dielectric permittivity of a PS layer by means of two measurements of the structure capacitance—in dry air and when the pores are filled by a condensed medium having a dielectric permittivity strongly differing from that of air (e.g., methanol)—is described.Sufficiently good agreement has been revealed between the data calculated from the capacitance measurements and obtained by other methods.     

微量子腔结边电荷极化结构中的线性和二阶非线性动态电导性质的研究

采用有效哈密顿量和有相互作用的分立势模型，利用格林函数和耦合参量得出了量子点(腔)在有结边电荷积累极化时的线性和二阶非线性交流电导虚部(emittance)的明确表达式.发现在经典情况下，电导虚部和电化学电容都等于经典的几何电容.在非经典情况下，如果发生全反射，电导虚部和电化学电容相等，但两者皆不等于经典的几何电容.在有隧穿的情况下，电导虚部和电化学电容以及经典电容三者都不相等.该结果对于量子器件中的电容测量具有指导作用. 关键词： 格林函数 交流电导 电化学电容     

等离子体浸没离子注入非导电聚合物的适应性及栅网诱导效应的研究

本文建立了绝缘材料等离子体浸没离子注入过程的动力学Particle-in-cell(PIC)模型, 将二次电子发射系数直接与离子注入即时能量建立关联, 研究了非导电聚合物厚度、介电常数和二次电子发射系数对表面偏压电位的影响规律以及栅网诱导效应. 研究结果表明: 非导电聚合物较厚时, 表面自偏压难以实现全方位离子注入, 栅网诱导可以间接为非导电聚合物提供偏压, 并抑制二次电子发射, 为厚大非导电聚合物表面等离子体浸没离子注入提供了有效途径.     

Discharge mechanisms modeling in LPCVD silicon nanocrystals usingC–Vand capacitance transient techniques

Charging and discharging phenomena from silicon nanocrystals have been studied by means of capacitance–voltage characteristics on P-type metal-oxide-semiconductor (P-MOS) capacitors with embedded self-assembled silicon quantum dots. The dots have a floating gate behavior as shown by the hysteresis onC –V curves. The Si-dots are charged or discharged by direct tunneling of carriers through a 3 nm thick oxide. The nanocrystals could be charged by electrons or holes, depending on the charging bias conditions. The discharge is studied by constant bias method and shows a logarithmic variation with time. Retention times higher than several hours are observed. A simple model is developed in order to evaluate the electric field within the tunneling oxide layer. Then, complete simulations are done for the different discharge paths. The barrier heights are extracted from the discharge data and possible confinement effects are discussed. The results confirm the high potentiality of silicon nanocrystal-floating gates for memory applications.     

聚合物物理属性对离子注入效应的影响

聚合物导电性能差, 表面电荷积聚所产生的电容效应致使其表面电位衰减, 采用等离子体浸没离子注入对其表面改性是非常困难的. 建立了绝缘材料等离子体浸没离子注入过程的粒子模拟(PIC)模型, 实时跟踪离子在等离子体鞘层中的运动形态及特性并进行统计分析. 并基于PIC模型, 将聚合物表面的二次电子发射系数直接与离子注入即时能量建立关联, 研究了聚合物厚度、介电常数和二次电子发射系数等物理量对鞘层演化、离子注入能量和剂量的影响规律. 研究结果表明: 当聚合物厚度小于200 μ m, 相对介电常数大于7, 二次电子发射系数小于0.5时, 离子注入剂量和高能离子所占的份额与导体离子注入情况相当. 通过对聚合物表面离子注入剂量和高能离子所占份额的研究, 为绝缘材料和半导体材料表面等离子体浸没离子注入的实现提供了理论和实验依据.     

On the interfacial capacitance of an electrolyte at a metallic electrode around zero surface charge

The behaviour of the capacitance of a planar double layer containing a restricted primitive model electrolyte (equi-sized rigid ions moving in a continuum dielectric) at and around zero surface charge is examined for a polarizable electrode with particular emphasis on a metallic surface. Capacitance results are reported for symmetric valency (1:1) salts encompassing a range of concentrations and temperatures covering both electrolyte solution and ionic liquid regimes. Although the modified Poisson–Boltzmann theory is principally employed, at higher concentrations the theoretical calculations have been supplemented by Monte Carlo simulations. Capacitance anomaly, that is, increase of capacitance with temperature at low temperatures, is seen to occur when the electrode is an insulator with a low dielectric constant or when it is unpolarized. No capacitance anomaly is, however, seen for a metallic electrode with an infinite dielectric constant and in this situation the capacitance increases (a) dramatically at low temperatures (strong coupling) at a given concentration, and (b) as concentration increases at a given temperature. These capacitance trends are consistent with earlier works in the presence or absence of surface polarization and, in particular, the results for a conducting electrode at ionic liquid concentrations are consistent with that recently reported by Loth et al. [Phys. Rev. E, 82, 056102 (2010)]. Overall the theoretical predictions are qualitative to semi-quantitative with the simulations.     

Hydrogen interaction with GaN metal–insulator–semiconductor diodes

Interaction mechanism of hydrogen with GaN metal–insulator–semiconductor (MIS) diodes is investigated, focusing on the metal/semiconductor interfaces. For MIS Pt-GaN diodes with a SiO₂ dielectric, the current–voltage (I–V) characteristics reveal that hydrogen changes the conduction mechanisms from Fowler–Nordheim tunneling to Poole–Frenkel emission. In sharp contrast, Pt-Si_xN_y-GaN diodes exhibit Poole–Frenkel emission in nitrogen and do not show any change in the conduction mechanism upon exposure to hydrogen. The capacitance–voltage (C–V) study suggests that the work function change of the Schottky metal is not responsible mechanism for the hydrogen sensitivity.     

Differential capacitance between circular stacked quantum dots

We have investigated the differential capacitance between two stacked, circular quantum dots. An expression defining such differential capacitance has been derived on the basis of that for the self-capacitance of a single quantum dot. By means of a self-consistent simulation we have obtained numerical results showing that the differential capacitance between the two dots is strongly influenced by shell-filling effects, and that the classical limit of the parallel-plate capacitor is retrieved when the two dots are in close proximity. Our results represent a contribution to the effort for the definition of a capacitance matrix for a complex system of quantum dots.     

Effect of substrate bias voltage on the structure, electric and dielectric properties of TiO2 thin films by DC magnetron sputtering

Titanium dioxide (TiO₂) films have been deposited on glass and p-silicon (1 0 0) substrates by DC magnetron sputtering technique to investigate their structural, electrical and optical properties. The surface composition of the TiO₂ films has been analyzed by X-ray photoelectron spectroscopy. The TiO₂ films formed on unbiased substrates were amorphous. Application of negative bias voltage to the substrate transformed the amorphous TiO₂ into polycrystalline as confirmed by Raman spectroscopic studies. Thin film capacitors with configuration of Al/TiO₂/p-Si have been fabricated. The leakage current density of unbiased films was 1 × 10⁻⁶ A/cm² at a gate bias voltage of 1.5 V and it was decreased to 1.41 × 10⁻⁷ A/cm² with the increase of substrate bias voltage to −150 V owing to the increase in thickness of interfacial layer of SiO₂. Dielectric properties and AC electrical conductivity of the films were studied at various frequencies for unbiased and biased at −150 V. The capacitance at 1 MHz for unbiased films was 2.42 × 10⁻¹⁰ F and it increased to 5.8 × 10⁻¹⁰ F in the films formed at substrate bias voltage of −150 V. Dielectric constant of TiO₂ films were calculated from capacitance–voltage measurements at 1 MHz frequency. The dielectric constant of unbiased films was 6.2 while those formed at −150 V it increased to 19. The optical band gap of the films decreased from 3.50 to 3.42 eV with the increase of substrate bias voltage from 0 to −150 V.     

GaN发光二极管表观电容极值分析

利用正向交流(ac)小信号方法对GaN发光二极管的电容-电压特性进行测量,可以观察到GaN发光二极管中的负电容现象。正向偏压越大,测试频率越低,负电容现象越明显。测量到的负电容现象是表象,不存在负电容;提出GaN发光二极管p-n结的结电容在特定的正向电压范围内等效于可变电容。分析可变电容对正向交流小信号响应得到:特定参数的可变电容使结电容电流相位落后于交流小信号电压相位π/2,使得在测量中表现为负电容。发现表观电容-正向电压曲线的极值点与理论模型相吻合,证明了该理论模型的正确性。     

Al2O3介质层厚度对AlGaN/GaN金属氧化物半导体-高电子迁移率晶体管性能的影响

在蓝宝石衬底上采用原子层淀积法制作了三种不同Al₂O₃介质层厚度的绝缘栅高电子迁移率晶体管.通过对三种器件的栅电容、栅泄漏电流、输出和转移特性的测试表明：随着Al₂O₃介质层厚度的增加,器件的栅控能力逐渐减弱,但是其栅泄漏电流明显降低,击穿电压相应提高.通过分析认为薄的绝缘层能够提供大的栅电容,因此其阈值电压较小,但是绝缘性能较差,并不能很好地抑制栅电流的泄漏;其次随着介质厚度的增加,可以对栅极施加更高的正偏压,因此获 关键词： 2O₃')" href="#">Al₂O₃ 金属氧化物半导体-高电子迁移率晶体管 介质层厚度 钝化     

Parasitic effects of air-gap through-silicon vias in high-speed three-dimensional integrated circuits

In this paper,ground-signal-ground type through-silicon vias(TSVs) exploiting air gaps as insulation layers are designed,analyzed and simulated for applications in millimeter wave.The compact wideband equivalent-circuit model and passive elements(RLGC) parameters based on the physical parameters are presented with the frequency up to 100 GHz.The parasitic capacitance of TSVs can be approximated as the dielectric capacitance of air gaps when the thickness of air gaps is greater than 0.75 μm.Therefore,the applied voltage of TSVs only needs to achieve the flatband voltage,and there is no need to indicate the threshold voltage.This is due to the small permittivity of air gaps.The proposed model shows good agreement with the simulation results of ADS and Ansoft's HFSS over a wide frequency range.     

Structural characterization of Mg substituted on A/B sites in $$\hbox {NiFe}_2\hbox {O}_4$$ nanoparticles using autocombustion method

A compact quantitative model based on oxide semiconductor interface density of states (DOS) is proposed for Al_0.25Ga_0.75N/GaN metal oxide semiconductor high electron mobility transistor (MOSHEMT). Mathematical expressions for surface potential, sheet charge concentration, gate capacitance and threshold voltage have been derived. The gate capacitance behaviour is studied in terms of capacitance–voltage (CV) characteristics. Similarly, the predicted threshold voltage (V _T) is analysed by varying barrier thickness and oxide thickness. The positive V _T obtained for a very thin 3 nm AlGaN barrier layer enables the enhancement mode operation of the MOSHEMT. These devices, along with depletion mode devices, are basic constituents of cascode configuration in power electronic circuits. The expressions developed are used in conventional long-channel HEMT drain current equation and evaluated to obtain different DC characteristics. The obtained results are compared with experimental data taken from literature which show good agreement and hence endorse the proposed model.     

高k栅介质应变Si SOI MOSFET的阈值电压解析模型

在结合应变Si,高k栅和SOI结构三者的优点的基础上,提出了一种新型的高k栅介质应变Si全耗尽SOI MOSFET结构.通过求解二维泊松方程建立了该新结构的二维阈值电压模型,在该模型中考虑了影响阈值电压的主要参数.分析了阈值电压与弛豫层中的Ge组分、应变Si层厚度的关系.研究结果表明阈值电压随弛豫层中Ge组分的提高和应变Si层的厚度增加而降低.此外,还分析了阈值电压与高k栅介质的介电常数和应变Si层的掺杂浓度的关系.研究结果表明阈值电压随高k介质的介 关键词： 应变Si k栅')" href="#">高k栅 短沟道效应 漏致势垒降低