A Simple Method for Fabricating Patterned Curvilinear Microstructures in Poly(dimethylsiloxane) by Selective Wetting

The fabrication of patterned microstructures in poly(dimethylsiloxane) (PDMS) is a prerequisite for soft lithography. Herein, curvilinear surface relief microstructures in PDMS are fabricated through a simple three‐stage approach combining microcontact printing (μCP), selective surface wetting/dewetting and replica molding (REM). First, using an original PDMS stamp (first‐generation stamp) with linear relief features, a chemical pattern on gold substrate is generated by μCP using hexadecanethiol (HDT) as an ink. Then, by a dip‐coating process, an ordered polyethylene glycol (PEG) polymer‐dot array forms on the HDT‐patterned gold substrate. Finally, based on a REM process, the PEG‐dot array on gold substrate is used to fabricate a second‐generation PDMS stamp with microcavity array, and the second‐generation PDMS stamp is used to generate third‐generation PDMS stamp with microbump array. These fabricated new‐generation stamps are utilized in μCP and in micromolding in capillaries (MIMIC), allowing the generation of surface micropatterns which cannot be obtained using the original PDMS stamp. The method will be useful in producing new‐generation PDMS stamps, especially for those who want to use soft lithography in their studies but have no access to the microfabrication facilities.     

Soft lithography using acryloxy perfluoropolyether composite stamps

This paper describes composite patterning elements that use a commercially available acryloxy perfluoropolyether (a-PFPE) in various soft lithographic techniques, including microcontact printing, nanotransfer printing, phase-shift optical lithography, proximity field nanopatterning, molecular scale soft nanoimprinting, and solvent assisted micromolding. The a-PFPE material, which is similar to a methacryloxy PFPE (PFPE-DMA) reported recently, offers a combination of high modulus (10.5 MPa), low surface energy (18.5 mNm(-1)), chemical inertness, and resistance to solvent induced swelling that make it useful for producing high fidelity patterns with these soft lithographic methods. The results are comparable to, and in some cases even better than, those obtained with the more widely explored material, high modulus poly(dimethylsiloxane) (h-PDMS).     

Emergent Soft Lithographic Tools for the Fabrication of Functional Polymeric Microstructures

Polymeric microstructures (PMs) are useful to a broad range of technologies applicable to, for example, sensing, energy storage, and soft robotics. Due to the diverse application space of PMs, many techniques (e. g., photolithography, 3D printing, micromilling, etc.) have been developed to fabricate these structures. Stemming from their generality and unique capabilities, the tools encompassed by soft lithography (e. g., replica molding, microcontact printing, etc.), which use soft elastomeric materials as masters in the fabrication of PMs, are particularly relevant. By taking advantage of the characteristics of elastomeric masters, particularly their mechanical and chemical properties, soft lithography has enabled the use of non-planar substrates and relatively inexpensive equipment in the generation of many types of PMs, redefining existing communities and creating new ones. Traditionally, these elastomeric masters have been produced from relief patterns fabricated using photolithography; however, recent efforts have led to the emergence of new methods that make use of masters that are self-forming, dynamic in their geometric and chemical properties, 3D in architecture, and/or sacrificial (i. e., easily removed/released using phase changes). These “next generation” soft lithographic masters include self-assembled liquid droplets, microscale balloons, templates derived from natural materials, and hierarchically microstructured surfaces. The new methods of fabrication supported by these unique masters enable access to numerous varieties of PMs (e. g., those with hierarchical microstructures, overhanging features, and 3D architectures) that would not be possible following established methods of soft lithography. This review explores these emergent soft lithographic methods, addressing their operational principles and the application space they can impact.     

薄层软刻蚀法制备PMMA微图案结构

对现有的软刻蚀方法提出了改进,让其与压印技术及毛细力刻蚀技术相结合形成一种薄层软刻蚀技术,并以这种技术制备出PMMA薄膜微图案化结构.在30 mm/h的拉膜速度以及弹性印章表面图形深度确定不变的情况下,PMMA流体能够完全填充到弹性印章的微通道中,SEM和光学显微镜照片证明得到的PMMA微图案是相互分离的.因此,薄层软刻蚀技术可以克服普通微模塑方法制备分离图形困难和纳米压印技术中需要使用巨大机械压力的缺点.     

毛细微模塑法制作聚合物微球的有序结构

用毛细微模塑法在玻璃基片上组装了聚苯乙烯微球紧密的有序阵列.扫描电镜观察了组装后的微球排列.结果表明,在毛细通道的出口端,聚苯乙烯的微球堆积得紧密有序.毛细通道的尺寸,环境温度和聚合物微球乳液的浓度是毛细微模塑法的主要影响因素.     

Green Precursors and Soft Templating for Printing Porous Carbon-Based Micro-supercapacitors

A combination of soft lithographic printing and soft templating has been used to fabricate high-resolution interdigitated micro-supercapacitors (MSC). Surfactant-assisted self-assembly produces high surface area ordered mesoporous carbons (490 m² g⁻¹). For the first time, such precursors have been printed by nano-imprint lithography as microdevices with a line width of only 250 nm and a spacing of only 1 μm. The devices are crack-free with low specific resistance (1.2×10⁻⁵ Ωm) and show good device capacitance up to 0.21 F cm⁻³.     

Biocatalytic microcontact printing

Immobilized biocatalytic lithography is presented as an application of soft lithography. In traditional microcontact printing, diffusion limits resolution of pattern transfer. By using an immobilized catalyst, the lateral resolution of microcontact printing would depend only on the length and flexibility of the tether (<2 nm) as opposed to diffusion (>100 nm). In the work, exonuclease reversibly immobilized on a relief-patterned stamp is used to ablate ssDNA monolayers Percent of ablation was determined via confocal fluorescence microscopy to be approximately 70%.     

Photopatternable silicon elastomers with enhanced mechanical properties for high-fidelity nanoresolution soft lithography

Soft lithography has been widely used in stamping and printing processes for microfabrication as a low cost alternative to photolithography. However, conventional poly(dimethyl)siloxane (PDMS) stamp materials have limitations, especially in the submicrometer range, due to their low physical toughness and requirements for thermocuring. A new version of functional stamp materials with adjustable physical toughness has been developed for advanced soft lithography. We thus demonstrate here its photopatternability and nanoresolution soft lithography, which have proven to be difficult using commercial stamp materials.     

Patterned polymer brushes

This critical review summarizes recent developments in the fabrication of patterned polymer brushes. As top-down lithography reaches the length scale of a single macromolecule, the combination with the bottom-up synthesis of polymer brushes by surface-initiated polymerization becomes one main avenue to design new materials for nanotechnology. Recent developments in surface-initiated polymerizations are highlighted along with diverse strategies to create patterned polymer brushes on all length scales based on irradiation (photo- and interference lithography, electron-beam lithography), mechanical contact (scanning probe lithography, soft lithography, nanoimprinting lithography) and on surface forces (capillary force lithography, colloidal lithography, Langmuir-Blodgett lithography) (116 references).     

Molding of three-dimensional microstructures of gels

This Communication describes the use of patterned elastomeric stamps to mold, release, and stack hydrogels into three-dimensional microstructures. Molding of gels against stamps derivatized by a hexa(ethylene glycol)-terminated self-assembled monolayer or by an adsorbed monolayer of bovine serum albumin allowed the application of several soft lithographic techniques (replica molding, microtransfer molding, and micromolding in capillaries) to the microfabrication of gels. We describe procedures to generate coplanar or bilayered composites of gels.     

TiO2微图纹结构的制作

The representative soft lithographic techniques are used,which are micromolding and microtransfer molding methods to fabricate the micro array patterned titanium dioxide on glass substrates. Firstly titanium dioxide sol was synthesized by sol-gel method using tetrabutyl titanate as the precursor,then the pre-patterned poly（dimethylsiloxane） elastomeric stamp was used to mold the TiO2 sol on glass substrate by micromolding and microtransfer molding methods,micro patterned TiO2 sol was gelled at 70℃ with 0. 5 N pressure applied on the PDMS stamp,further heat treatment of TiO2 gel by annealing at 550℃ for 2 h produced the TiO2 microstructure. The TiO2 microstructure was observed by the optical microscope and the optical micrographs demonstrated the satisfactory yield and fidelity of pattern transfer by micromolding method and microtransfer method. The effect of gel temperature,the pressure applied on the PDMS stamp and the silicone mold on the fidelity and yield of TiO2 microstructure are discussed.     

Polymers in conventional and alternative lithography for the fabrication of nanostructures

This review provides a survey of lithography techniques and the resist materials employed with these techniques. The first part focuses on the conventional lithography methods used to fabricate complex micro- and nano-structured surfaces. In the second part, emphasis is placed on patterning with unconventional lithography techniques such as printing, molding, and embossing, and on their development into viable, high-resolution patterning technologies.     

Study on intelligent deformation characteristics of temperature‐driven hydrogel actuators prepared via molding and 3D printing

The poly‐N‐isopropylacrylamide intelligent hydrogel actuators with high mechanical strength and efficient temperature responses were successfully prepared via molding and three‐dimensional (3D) printing. Addition of nanofibrillated cellulose (NFC) effectively improved the crosslinking density and viscosity of hydrogels, enhancing the mechanical strength and 3D printable property. Based on sufficient polymerization on interface, bilayer hydrogel actuator prepared via molding exhibited efficient bending/unbending deformations. Bending degree in poikilothermy temperature ranging from 25°C to 55°C was higher than that in constant temperature of 55°C. Inspired by the rheology regulation of NFC, 3D printing intelligent hydrogel actuators with NFC content of 10 mg/mL were polymerized efficiently by ultraviolet irradiation. Self‐driven deformation characteristics of 3D printed intelligent hydrogels actuators were regulated via printing parameters including angle, width and length ratio and filling rate of the layered network structure model. The prepared hydrogel material system with molding and 3D printing ability provided material candidates for design and preparation of intelligent soft actuator and robot.     

3D‐Printed Microfluidics

The advent of soft lithography allowed for an unprecedented expansion in the field of microfluidics. However, the vast majority of PDMS microfluidic devices are still made with extensive manual labor, are tethered to bulky control systems, and have cumbersome user interfaces, which all render commercialization difficult. On the other hand, 3D printing has begun to embrace the range of sizes and materials that appeal to the developers of microfluidic devices. Prior to fabrication, a design is digitally built as a detailed 3D CAD file. The design can be assembled in modules by remotely collaborating teams, and its mechanical and fluidic behavior can be simulated using finite‐element modeling. As structures are created by adding materials without the need for etching or dissolution, processing is environmentally friendly and economically efficient. We predict that in the next few years, 3D printing will replace most PDMS and plastic molding techniques in academia.     

Microcontact printed poly(amidoamine) dendrimer monolayers on silicon oxide surface

Patterning of silicon substrates with poly(amidoamine) generation 5 (PAMAM-G5) dendrimers using soft lithographic microcontact printing (μCP) is presented. μCP is shown to yield monolayers of dendrimers patterned with high level of definition over μm² to mm² areas. The patterns are stable over a period of weeks, which is attributed to the suppressed diffusion of partially charged G5 PAMAM on oxidized silicon. However, the dendrimers studied were shown to be relatively weakly bound to the substrate when subjected to lateral stresses. In aqueous conditions most of the dendrimers desorbed from the substrate.     

PDMS微流体系统的加工制作

目前,微流体装置越来越多地应用到分析系统、生物医学、化学等基础研究领域。传统的微流体系统制作方法是对玻璃和硅片进行刻蚀。用软刻法制作PDMS(Poly(dimethylsiloxane)：聚二甲基硅氧烷)微流体装置比传统的制作方法更快速,成本更低廉,并且对于通道的密封也不需要玻璃或硅芯片键合密封等复杂工艺。这类软刻法的核心技术是快速原样制作法和复制压模技术。相对于微电子加工工艺,软刻法制作过程不需要超静环境,化学家和生物学家可在普通的实验室实现加工制作。本文介绍了PDMS微装置在分离和生物材料模式化等方面的应用。     

Fabrication of microfluidic systems in poly(dimethylsiloxane)

Microfluidic devices are finding increasing application as analytical systems, biomedical devices, tools for chemistry and biochemistry, and systems for fundamental research. Conventional methods of fabricating microfluidic devices have centered on etching in glass and silicon. Fabrication of microfluidic devices in poly(dimethylsiloxane) (PDMS) by soft lithography provides faster, less expensive routes than these conventional methods to devices that handle aqueous solutions. These soft-lithographic methods are based on rapid prototyping and replica molding and are more accessible to chemists and biologists working under benchtop conditions than are the microelectronics-derived methods because, in soft lithography, devices do not need to be fabricated in a cleanroom. This paper describes devices fabricated in PDMS for separations, patterning of biological and nonbiological material, and components for integrated systems.     

Inverted microcontact printing on polystyrene-block-poly(tert-butyl acrylate) films: a versatile approach to fabricate structured biointerfaces across the length scales

The combination of the recently introduced soft lithographic technique of inverted microcontact printing (i-muCP) and spin-coated films of polystyrene- block-poly( tert-butyl acrylate) (PS 690- b-P tBA 1210) as a reactive platform is shown to yield a versatile approach for the facile fabrication of topographically structured and chemically patterned biointerfaces with characteristic spacings and distances that cross many orders of magnitude. The shortcomings of conventional muCP in printing of small features with large spacings, due to the collapse of small or high aspect ratio stamp structures, are circumvented in i-muCP by printing reactants using a featureless elastomeric stamp onto a topographically structured reactive polymer film. Prior to molecular transfer, the substrate-supported PS 690- b-P tBA 1210 films were structured by imprint lithography resulting in lateral and vertical feature sizes between >50 microm-150 nm and >1.0 microm-18 nm, respectively. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) and water contact angle measurements provided evidence for the absence of surface chemical transformations during the imprinting step. Following the previously established hydrolysis and activation protocol with trifluoroacetic acid and N-hydroxysuccinimide, amino end-functionalized poly(ethylene glycol) (PEG-NH 2), as well as bovine serum albumin and fibronectin as model proteins, were successfully transferred by i-muCP and coupled covalently. As shown, i-muCP yields increased PEG coverages and thus improved performance in suppressing nonspecific adsorption of proteins by exploiting the high local concentrations in the micro- and nanocontacts during molecular transfer. The i-muCP strategy provides access to versatile biointerface platforms patterned across the length scales, as shown for guided cancer cell adhesion, which opens the pathway for systematic cell-surface interaction studies.     

Spacers-directed structural diversity of Co(II)/Zn(II) complexes based on S-/O-bridged dipyridylamides: electrochemical,fluorescent recognition behavior and photocatalytic properties

To investigate the effect of the spacers of S-/O-bridged dipyridylamides on the structures of Co(II)/Zn(II) complexes, [Co(L¹)(chda)]·1.5H₂O (CP1), [Co(L²)(chda)] (CP2), [Zn(L¹)(hip)]·DMA·2H₂O (CP3), and [Zn(L²)(hip)]·2.8H₂O (CP4) [L¹ = N,N′-bis(pyridine-3-yl)thiophene-2,5-dicarboxamide, H₂chda = trans-1,4-cyclohexanedicarboxylic acid, L² = N,N′-bis(pyridine-3-yl)-4,4′-oxybis(benzoic) dicarboxamide, H₂hip = 5-hydroxyisophthalic acid, DMA = N,N-dimethylacetamide], have been solvothermally synthesized. X-ray single-crystal diffraction shows that CP1 is a 2-D 3,5-connected network based on Co-L¹ linear chains and (Co-chda)₂ double chains. CP2 features a 1-D structure derived from 1-D wave-like (Co-chda)₂ double chains decorated by terminal L² ligands. CP3 and CP4 show wave-like (4,4) networks constructed by 1-D Zn-L¹ zigzag and Zn-hip zigzag (for CP3)/linear (for CP4) chains. The effect of the spacers of S-/O-bridged dipyridylamides on the structures of the title complexes was discussed. Electrochemical behaviors of CP1–CP2 and solid-state luminescent properties of CP3–CP4 were studied. The luminescence investigations show that CP3 and CP4 are recycled fluorescent probes for environmentally relevant Fe³⁺ ions. The photocatalytic properties for the degradation of methylene blue (MB) under ultraviolet light irradiation of CP3–CP4 and the recyclable materials after fluorescent sensing Fe³⁺ ions (named CP3@Fe³⁺ and CP4@Fe³⁺) have also been investigated.     

Parylene C coating for high-performance replica molding

This paper presents an improvement to the soft lithography fabrication process that uses chemical vapor deposition of poly(chloro-p-xylylene) (parylene C) to protect microfabricated masters and to improve the release of polymer devices following replica molding. Chemical vapor deposition creates nanometre thick conformal coatings of parylene C on silicon wafers having arrays of 30 μm high SU8 pillars with densities ranging from 278 to 10,040 features per mm(2) and aspect ratios (height : width) from 1 : 1 to 6 : 1. A single coating of parylene C was sufficient to permanently promote poly(dimethyl)siloxane (PDMS) mold release and to protect masters for an indefinite number of molding cycles. We also show that the improved release properties of parylene treated masters allow for fabrication with hard polymers, such as poly(urethane), that would otherwise not be compatible with SU8 on silicon masters. Parylene C provides a robust and high performance mold release coating for soft lithography microfabrication that extends the life of microfabricated masters and improves the achievable density and aspect ratio of replicated features.