Oxidation‐induced nanostructures on Cu{100}, Cu(Ag) and Ag/Cu{100} studied by photoelectron spectroscopy

Initial surface oxidation and nanoscale morphology on Cu{100}, Cu(Ag) and Ag/Cu{100} have been investigated in situ by X‐ray photoelectron spectroscopy (XPS), X‐ray induced Auger electron spectroscopy (XAES) and the inelastic electron background analysis as a function of oxygen exposure at 3.7 × 10^?2 and 213 mbar pressures at a surface temperature of 373 K. Relative Cu₂O concentrations have been quantified by analysis of the peak shape of the XAES Cu LMM transition. The surface morphology of Cu₂O islands and the Ag layer has been characterized by inelastic electron background analysis of XAES O KLL and Ag 3d transitions. Oxygen‐induced segregation of Cu, as well as the subsequent Cu₂O island formation on Cu(Ag) and Ag/Cu{100} surfaces, has been investigated quantitatively. Our results indicate that Ag has a clear inhibitive effect on the initial oxidation and Cu₂O island formation on Cu(Ag) and Ag/Cu{100} surfaces. The Cu₂O islands are also observed to remain highly strained on Ag/Cu{100} even at higher O₂ exposures. The results suggest that strained Cu₂O islands eventually penetrate through the buried Ag layer, and in conjunction with segregating Cu atoms enable the oxidation to proceed at a similar rate to or even faster than on the unalloyed Cu surface. Copyright © 2007 John Wiley & Sons, Ltd.     

X‐ray photoelectron spectroscopy and the pattern recognition method—their application to surface studies in CoPd alloys

In the present work, polycrystalline CoPd alloys in varying range of bulk atomic percent composition (Co30Pd70, Co50Pd50 and Co70Pd30) are investigated by means of X‐ray photoelectron spectroscopy (XPS). The results of conventional XPS quantitative multiline (ML) approach are compared to the results obtained on the basis of XPS lines shape analysis, where the selected XPS or X‐ray induced Auger electron (XAES) transitions, are processed using the pattern recognition method known as the fuzzy k‐nearest neighbour (fkNN) rule. The fkNN rule is applied to the following spectra line shapes: Pd MNV, Co 2p, Co LMM, Pd 3d and valence band, analysing electrons in a varying range of selected kinetic energies. Both methods showed the surface segregation of Pd in Co30Pd70 and Co50Pd50 alloys. The results of the ML, the binding energy shift (ΔBE) analysis and the fkNN rule remained in agreement. Discrepancies in quantitative results obtained using different approaches are discussed within the accuracy of the applied methods, differences due to mean escape depth (MED) of electrons in considered transitions, their depth distribution function, the sensitivity of electron transition line shape on the environmental change (weaker effect for the inner shell transitions, and stronger effect for the outer shell transitions and Auger electron spectroscopy (AES) electrons transitions) and the non‐uniform depth profile concentrations. Copyright © 2005 John Wiley & Sons, Ltd.     

State of the Cu electrode surface studied by X-ray photoelectron and Auger spectroscopies

Annealing of the copper plate in flame was found (by XPS and X-ray Auger spectroscopy) to enrich the surface copper layers in oxygen in the forms of Cu₂O and adsorbed oxygen. The changes in the surface layers of the copper cathode due to annealing can be the origin of the earlier found enhancement of its activity in the electrocatalytic hydrogenation of citral and trans-2-allyl-6-R-1,2,3,6-tetrahydropyridines (R = Me, All, Ph). This method of the copper electrode pre-treatment provides its long durability, an insignificant decrease in the electrocatalytic activity in time, and the reproducibility of the electrocatalytic hydrogenation of unsaturated organic compounds.     

Photoelectron core levels for enargite,Cu3AsS4

The mineral chemistry of enargite surfaces and near‐surfaces prepared by fracture within an ultrahigh vacuum are investigated using XPS and synchrotron radiation XPS (SRXPS). The purpose of the study is to identify surface core‐level line positions in high‐resolution photoelectron spectra. The XPS spectra obtained using monochromatic Al Kα radiation show that there are near‐identical monosulphide line positions in S 2p spectra for the As–S and Cu–S bonds in enargite. The SRXPS spectra for sulphur are remarkably similar to the XPS spectra for sulphur, showing that there is minimal difference in the chemical environment between sulphur atoms at the surface and in the mineral matrix. The Cu 2p XPS data have only cuprous contributions and a minor surface contribution. The surface Cu contribution is observed as a high‐binding‐energy tail in the Cu 2p_3/2 spectrum. The As 3d data for both XPS and SRXPS show contributions from arsenic atoms at the surface and in the bulk mineral matrix. The surface contribution is distinct and is found 1 eV below the bulk contribution. The results of the study suggest that, following fracture, the enargite surface is reorganized in such a manner that the surface is characterized by protrusions of individual arsenic atoms. Copyright © 2004 John Wiley & Sons, Ltd.     

Formation and characterization of Cu<Subscript>x</Subscript>S layers on polyethylene film using the solutions of sulfur in carbon disulfide

Results of the formation of copper sulfide layers using the solutions of elemental sulfur in carbon disulfide as precursor for sulfurization are presented. Low density polyethylene film can be effectively sulfurized in the solutions of rhombic (α) sulfur in carbon disulfide. The concentration of sulfur in polyethylene increases with the increase of the temperature and concentration of sulfur solution in carbon disulfide and it little depends on the duration of sulfurization. Electrically conductive copper sulfide layers on polyethylene film were formed when sulfurized polyethylene was treated with the solution of copper (II/I) salts. Cu_xS layer with the lowest sheet resistance (11.2 Ω cm⁻²) was formed when sulfurized polyethylene was treated with copper salts solution at 80°C. All samples with formed Cu_xS layers were characterized by X-ray photoelectron spectroscopy. XPS analysis of obtained layers showed that on the layer’s surface and in the etched surface various compounds of copper, sulfur and oxygen are present: Cu₂S, CuS, CuO, S₈, CuSO₄, Cu(OH)₂ and water. The biggest amounts of CuSO₄ and Cu(OH)₂ are present on the layer’s surface. Significantly more copper sulfides are found in the etched layers.     

Surface properties of the Ni-Cu-Cr oxide catalyst for dehydrogenative hydrolysis of amines

Catalysts for dehydrogenative hydrolysis of amines, prepared by sorption of copper ions from a solution on a preformed Ni-Cr oxide system, were studied by Auger electron spectroscopy, X-ray photoelectron spectroscopy, and IR spectroscopy of adsorbed CO and NH₃ probe molecules. It was shown that on adsorption copper blocked the chromium ions in the Ni-Cr catalyst with concomitant stabilization as Cu⁺. The incorporation of copper into the Ni-Cr system increased the ability of nickel to reduce water with the formation of oxygen-containing complexes.Translated fromIzvestiya Akademii Nauk. Seriya Khimicheskaya, No. 2, pp. 288–291, February, 1993.     

XPS and ToF‐SIMS characterization of a Finemet surface: effect of heating

X‐ray photoelectron spectroscopy (XPS) and time‐of‐flight secondary ion mass spectrometry (ToF‐SIMS) were used to study the surface composition and electronic structure of Finemet, Fe₇₃Si_15.8B_7.2Cu₁Nb₃, in the original amorphous state and after gradual heating in vacuum to a temperature of 400 °C and cooling back to room temperature. It was found that relaxation processes occurring during heat treatment well below the crystallization onset caused the physico‐chemical state of Finemet surface to change irreversibly. In the relaxed alloy, the surface originally covered with the native air‐formed oxide was significantly enriched with elemental iron and depleted of other alloy constituents compared with the original state. Yet in the as‐quenched state, clustering of copper atoms on the Finemet surface was detected which was enhanced by heating. The thermal treatment resulted in the selective reduction of iron oxides and caused noticeable changes in the valence band structure and the Fe L₃VV Auger spectrum associated with atomic redistribution. Copyright © 2009 John Wiley & Sons, Ltd.     

Growth and characterization of ultrathin carbon films on electrodeposited Cu and Ni

Ultrathin carbon films were grown on different types of metallic substrates. Free‐standing foils of Cu and Ni were prepared by electroforming, and a pure Ni film was obtained by galvanic displacement on a Si wafer. Commercial foil of Ni 99.95% was used as a reference substrate. Carbon films were grown on these substrates by chemical vapour deposition in a CH₄‐H₂ atmosphere. Obtained films were characterized by Raman spectroscopy, X‐ray photoelectron spectroscopy (XPS), Auger electron spectroscopy, and ultraviolet photoemission spectroscopy. The XPS at grazing collection angle was used to determine the thickness of carbon films. Depending on the deposition parameters, the films of graphene or graphite were obtained on the different substrates. The uniformity of graphene and its distribution over the sample area were investigated from Raman data, optical images, and XPS chemical maps. The presence of graphene or graphite in the films was determined from the Raman spectra and Auger peak of C KVV. For this purpose, the D parameter, which is a fingerprint of carbon allotropes, was determined from C KVV spectra acquired by using X‐rays and electron beam. A formation of an intermediate layer of metal hydroxide was revealed in the samples with graphene overlayer.     

Concepts for chemical state analysis at constant probing depth by lab-based XPS/HAXPES combining soft and hard X-ray sources

The greater information depth provided in hard X-ray photoelectron spectroscopy (HAXPES) enables nondestructive analyses of the chemistry and electronic structure of buried interfaces. Moreover, for industrially relevant elements like Al, Si, and Ti, the combined access to the Al 1s, Si 1s, or Ti 1s photoelectron line and its associated Al KLL, Si KLL, or Ti KLL Auger transition, as required for local chemical state analysis on the basis of the Auger parameter, is only possible with hard X-rays. Until now, such photoemission studies were only possible at synchrotron facilities. Recently, however, the first commercial XPS/HAXPES systems, equipped with both soft and hard X-ray sources, have entered the market, providing unique opportunities for monitoring the local chemical state of all constituent ions in functional oxides at different probing depths, in a routine laboratory environment. Bulk-sensitive shallow core levels can be excited using either the hard or soft X-ray source, whereas more surface-sensitive deep core-level photoelectron lines and associated Auger transitions can be measured using the hard X-ray source. As demonstrated for thin Al₂O₃, SiO₂, and TiO₂ films, the local chemical state of the constituting ions in the oxide may even be probed at near-constant probing depth by careful selection of sets of photoelectron and Auger lines, as excited with the combined soft and hard X-ray sources. We highlight the potential of lab-based HAXPES for the research on functional oxides and also discuss relevant technical details regarding the calibration of the kinetic binding energy scale.     

Summary of ISO/TC 201 Standard: XX ISO 18118: 2004 – Surface chemical analysis – Auger electron spectroscopy and X‐ray photoelectron spectroscopy – Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials

ISO 18118 provides guidance on the measurement and use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials by Auger electron spectroscopy (AES) and X‐ray photoelectron spectroscopy (XPS). This article provides a brief summary of this International Standard. Copyright © 2005 John Wiley & Sons, Ltd.     

Investigation on Electronic Property of Passive Film on Nickel in Bicarbonate/Carbonate Buffer Solution

The electronic properties of passive film formed on nickel in bicarbonate/carbonate buffer solution were studied by electrochemical impedance spectra (EIS) and Mott‐Schottky plot. The film composition was analyzed by X‐ray photoelectron spectroscopy (XPS). The results showed that passive film exhibited p‐type semi‐conductive character, and the acceptor density (N_A) decreased with increasing potential, prolonging time, decreasing temperature, increasing pH value and decreasing chloride/sulfur ions concentration. The transfer resistance and film resistance increased with the above factors changing. XPS results showed that passive film was composed of NiO and a little amount of Ni₂O₃.     

XPS investigations of ink‐jet printed paper

Different ink‐jet printed paper materials were investigated using X‐ray photoelectron spectroscopy (XPS) yielding the elemental composition of the near‐surface region of the papers. We found significant differences with respect to the detected elements and their atomic concentrations in the different inks studied here. Two different groups of inks could be identified by means of a lower ratio of the O and C atomic concentrations and lower concentrations in specific trace elements like Mg, Na and Si. High‐resolution spectra of C 1s and O 1s core levels allowed a detailed determination of the chemical state of the respective elements. On the basis of a detailed deconvolution of these XPS signals, significant differences between all the investigated ink‐jet printed papers were found, thereby allowing their discrimination. The applicability of the measurements and, more generally, the XPS technique for forensic investigations of paper are discussed. Copyright © 2007 John Wiley & Sons, Ltd.     

Study of the first nucleation steps of thin films by XPS inelastic peak shape analysis

The initial steps in the formation of thin films have been investigated by analysis of the peak shape (both inelastic background and elastic contributions) of X‐ray photoelectron spectra. Surface coverage and averaged height of the deposited particles have been estimated for several overlayers (nanometre range) after successive deposition cycles. This study has permitted the assessment of the type of nucleation and growth mechanisms of the films. The experiments have been carried out in situ in the preparation chamber of an XPS spectrometer. To check the performance of the method, several materials (i.e. cerium oxide, vanadium oxide and cadmium sulfide) have been deposited on different substrates using a variety of preparation procedures (i.e. thermal evaporation, ion beam assisted deposition and plasma enhanced chemical vapour deposition). It is shown that the first deposited nuclei of the films are usually formed by three‐dimensional particles whose heights and degree of surface coverage depend on the chemical characteristics of the growing thin film and substrate materials, as well as the deposition procedure. It is concluded that XPS peak shape analysis can be satisfactorily used as a general method to characterize morphologically the first nanometric moieties that nucleate a thin film. Copyright © 2006 John Wiley & Sons, Ltd.     

Effect of phosphorus concentration on the electronic structure of nanocrystalline electrodeposited Ni–P alloys: an XPS and XAES investigation

A surface analysis has been conducted on a series of electrodeposited nickel‐phosphorus (Ni–P) alloys containing from 6 to 29 at.% phosphorus, using X‐ray photoelectron spectroscopy (XPS) and X‐ray excited Auger electron spectroscopy (XAES). No changes in core‐level binding energies, Ni2p3/2 and Ni2p1/2, P2p, P2s, or X‐ray excited NiLMM and PKLL Auger lines were observed regardless of phosphorus concentration. The only systematic differences observed concerned: (i) the binding energy of the Ni2p satellite peak, (ii) the fine structure of the NiLMM Auger lines, (iii) the percentage of the satellite in the total Ni2p3/2 spectrum and (iv) the valence band density of states in the Ni3d electrons region, all related to the electronic structure of the Ni–P alloys. For the first time, it has been possible to describe and rationalise the influence of (phosphorus) ligand concentration on the electronic structure of nickel‐based alloys, using a screening model proposed in the literature for clarifying the role of substituents on the electronic structure of conductor compounds of nickel. As the phosphorus content increases, the number of non‐bonding Ni3d electrons decreases. Thus the d‐type core‐hole screening is less pronounced and the binding energy of the satellite for the final state with a filled Ni4s shell increases. Copyright © 2008 John Wiley & Sons, Ltd.     

The chemical state of arsenic in minerals of environmental interest--an XPS and an XAES study

A systematic analytical study using X-ray photoelectron spectroscopy (XPS) and X-ray induced Auger electron spectroscopy (XAES) has been carried out to characterize the chemical state of arsenic in complex environmental samples. The conventional approach, which relies on the chemical shift of the core levels As3d, provides ambiguous results in determining the chemical environment of arsenic. A more accurate approach, based on the Auger parameter and on the Wagner (Chemical State) plot, which combines AsLMM kinetic energy and As3d binding energy, was adopted. This novel method for determining the chemical state of arsenic was employed to completely characterize arsenic in complex environmental samples.     

Core level studies of calcite and dolomite

Conventional X‐ray photoelectron spectroscopy (XPS) and synchrotron‐based X‐ray photoelectron spectroscopy (HRXPS) have been used to study Iceland spar calcite (CaCO₃) and dolomite (CaMg(CO₃)₂). The obtained full widths at half maximum (FWHMs) are mostly narrower than in the previous results, which together with the symmetry of the fitted peaks indicate effective neutralisation of surface charging. Some previously unidentified features observed in the Ca 2p, C 1s and O 1s spectra of calcite have been suggested to be bulk plasmons. Also, surface core level shifts in Ca 2p (in calcite) and Mg 2p (in dolomite) spectra have been obtained and found to be consistent between XPS and HRXPS measurements. A peak attributed to carbide (CaC₂) has been suggested to indicate beam‐assisted interaction with hydrocarbons found on the surface. Copyright © 2014 John Wiley & Sons, Ltd.     

Copper passivity and its breakdown in sodium bicarbonate solutions: A scanning electron microscopy and x-ray photoelectron and auger spectroscopy study

Effect of bicarbonate ions on the copper passivity and its local breakdown is studied by cyclic voltammetry, Auger spectroscopy, x-ray photoelectron spectroscopy, and scanning electron microscopy. Comparing data for solutions with various sodium bicarbonate concentrations shows copper to undergo pitting in 0.02 M NaHCO₃, whereas it remains stably passive in 0.10 M NaHCO₃. Independent studies suggest that carbonates play a protective role in stabilization of the oxide-hydroxide passive film on copper.     

Relationship between the Auger parameter and the ground state valence charge of the core-ionized atom: The case of Cu(I) and Cu (II) compounds

We develop a simple semiempirical model that correlates the Auger parameter to the ground state valence charge of the core-ionized atom with closed shell electron configuration. Until now, the Auger parameter was employed to separate initial and final state effects that influence the core electron binding energy. The model is applied to Cu(I) and Cu (II) compounds with the Auger parameter defined as α' = E_b^FL (2p_3/2) + E_k^FL (L₃M₄₅M₄₅;¹G). The Auger parameter shift for Cu(I) ion in CuI, CuBr, CuFeS₂, Cu₂S, and Cu₂O compounds—with respect to the copper free atom—increases with the electronic polarizability of the nearest-neighbour ligands suggesting a nonlocal screening mechanism. This relaxation process is interpreted as due to an electron transfer from the nearest-neighbour ligands toward the spatially extended 4sp valence orbitals of the core-ionized Cu(I) ion. In agreement with our model, a linear relationship is found between the Auger parameter shift and the ground state Bader valence charge obtained by density functional theory calculations. The Auger parameter shift for the Cu (II) ion in CuF₂, CuCl₂, CuBr₂, CuSO₄, Cu (NO₃)₂•3H₂O, Cu₃(PO₄)₂, Cu (OH)₂, and CuO compounds is very close to the Auger parameter of metallic copper, and therefore, it is not related to the calculated ground state Bader valence charge. The relaxation process in the final state is dominated by the local screening mechanism, which involves an electron transfer from the nearest-neighbour ligands toward the spatially contracted 3d orbitals of the core-ionized Cu (II) ion.     

XPS calibration study of thin‐film nickel silicides

This paper presents a systematic X‐ray photoelectron spectroscopy (XPS)study of the Ni silicides Ni₃Si, Ni₃₁Si₁₂, Ni₂Si, NiSi and NiSi₂ produced by annealing of sputtered thin films. The in situ XPS study focuses on both the core level peaks and Auger peaks. The peak positions, shapes, satellites as well as Auger parameters are compared for different silicides. The factors that influence the Ni core level peak shifts are discussed. The Ni 2p_3/2 peak shape and satellites are correlated with the valence band structure. The effect of argon ion etching on surface composition and chemical states is also investigated. Copyright © 2009 John Wiley & Sons, Ltd.     

Functional membranes prepared by layer‐by‐layer assembly and its metal ions adsorption property

PVDF/(PEI‐C/PAA)_n functional membranes were prepared by layer‐by‐layer (LbL) assembly, and their heavy metal ions adsorption capability was investigated. The changes in the chemical compositions of membrane surfaces were determined by X‐ray photoelectron spectroscopy (XPS). XPS results show that the surface of the PVDF membrane can be alternatively functionalized by PEI‐C and PAA. The membrane surface hydrophilicity was evaluated through water contact angle measurement. Contact angle results show that the surface hydrophilicity of the membrane surface depends on the outermost deposited layer. Morphological changes of membrane surfaces were observed by scanning electron microscopy (SEM). The water fluxes for these membranes were elevated after modification. The performances of the PVDF/(PEI‐C/PAA)_n membranes on the adsorption of copper ions (Cu²⁺) from aqueous solutions were investigated by inductively coupled plasma (ICP). The results indicate that the PVDF/(PEI‐C/PAA)_n functional membranes show high copper ions adsorption ability. Copyright © 2010 John Wiley & Sons, Ltd.