Structure,Composition, Mechanical,and Tribological Properties of BCN Films Deposited by Plasma Enhanced Chemical Vapor Deposition

In this work thin BCN films were deposited by plasma enhanced chemical vapor deposition (PECVD) using chloridic precursors. Through adjusting the BCl₃ content in the inlet gas mixture the chemical composition of the deposited films was changed from carbon rich to boron rich. Based on optical emission spectroscopy (OES) measurements, a correlation between film composition and precursor species concentration in the plasma was established. The films were amorphous as detected by grazing incidence X-ray diffraction (GIXRD). The hardness and the elastic modulus have maximal values of 25.5±1.2 and 191±6 GPa, respectively, for the films with a boron concentration of 45.2 at.%. GIXRD data suggest that a depletion in boron content may initiate the formation of graphitic domains in the amorphous matrix. The observed degradation of the mechanical properties is associated with the graphitization. The tribological behavior was studied with a tribometer operated in pin-on-plate configuration at the temperatures 25 and 400°C. The wear mechanisms were discussed with respect to the formation of a boric acid surface layer which was detected by reflection electron energy loss spectroscopy (REELS) analysis.     

The Application of Nano-SiOx Coatings as Migration Resistance Layer by Plasma Enhanced Chemical Vapor Deposition

Accumulative intake of plasticizers that are generally used to produce flexibility of webs in plastics has been proven to cause reproductive system problems and women??s infertility, and long-term consumption may even cause cancer. Hence a nano-scale layer, named as functional barrier layer, was deposited on the plastic surface to prevent plasticizer diethylhexyl phthalate (DEHP) migration from food-contact materials to foods. The feasibility of a functional barrier layer, i.e. SiO_x coating through plasma enhanced chemical vapor deposition process was then described in this paper. In this research we used Fourier transform infrared spectroscope to analyze the chemical composition of the coatings, scanning electron microscope to explore the topography of the coating surfaces, surface profilemeter to measure coating thickness in plastics, and high-performance liquid chromatography to evaluate the barrier properties of coatings. The results have clearly shown that the coatings can perfectly block the migration of the DEHP from plastics to their containers. It is to be noted that process parameters had a critical influence on the block properties of coatings. When the deposition conditions of SiO_x coatings were optimized, i.e. the discharge power of 50?W, 4:1 of O₂: HMDSO ratio and the thickness of 100?nm, the 71.2?% DEHP was effectively blocked in the plastic film.     

水热法合成羟基磷灰石的结构和形貌

羟基磷灰石是一种微溶于水的弱碱性磷酸钙盐 (Ｃａ10 (ＰＯ4 ) 6 (ＯＨ) 2 ,ＨＡ) [1] ,多用于人体硬组织(骨、牙 )的修复替换[2 ] 。与人类骨骼相比 ,致密羟基磷灰石仍然表现出较低的力学性能[3] 。由于针棒状的晶体具有较低的位错密度 ,较高的抗拉性能[4 ] 。近年来 ,针状或棒状羟基磷灰石的合成已引起广泛关注。合成ＨＡ的方法有固态反应法[5] 、液相沉淀法[6 ] 、溶胶 凝胶法[7,8] 及溅射法[9] 等 ,但只有少数几种方法能够对产物的形貌进行控制。虽然采用水热法在 2 0 0℃和 2ＭＰａ下合成了羟基磷灰石晶须[10 ] ,但实验步骤较为复杂 ,…     

等离子喷涂羟基磷灰石涂层的晶化及其结构特征

Phase compositions, function group and surface morphology of recrystallized plasma sprayed hydroxyapatite (HA) coatings were examined by means of X-ray diffraction (XRD), Fourier transform infrared spectra (FTIR), Raman spectra, scanning electron microscope (SEM) and electron probe microanalyzer (EPMA). The results show that the structural integrity of HA was almost completely restored after the heat treatment of (600～700℃)×2h. Temperatures above this value were unfavorable to the restoration of OH^- and crystallinity. The recrystallizing treatment caused amorphous and decomposed phases transform into crystalline HA with a very small amount of CaO retained in coating. Under 500℃, longer keeping time led to a gradual increase of crystallinity, however, under 600℃, the crystallinity showed no obvious changes with decreased CaO content. Meanwhile, nanometer hydrox-yapatite crystals with dot-like, polyhedral, acerous and effloresent shapes and a average size of 100nm originated in the coatings.     

Alteration of Structure and Properties of Thin Polyimide Films and Coatings by Plasma and Thermal Treatment

The influence of alternating radiofrequency-plasma and heat treatment on the structure and bulk properties of polyimide films and coatings with a thickness of 3.5 m was studied. It was shown that plasma treatment leads to the enhancement of the specific surface energy due to the polar component and to an increase in the diffusion coefficient and in the amount of sorbed water. The subsequent thermal treatment leads to the recovery of the polyimide surface and bulk properties to almost their initial magnitudes. It was assumed that these effects are caused by a change in the structure of thin films and coatings and by the buildup of negatively charged particles at the surface and in mesopores of the polymer upon RF plasma treatment and due to annealing upon thermal treatment.     

羟基磷灰石/氧化锆复合涂层的水热电沉积及其性能

羟基磷灰石/氧化锆复合涂层的水热电沉积及其性能;水热电沉积;羟基磷灰石;ZrO2;结合强度;生物活性     

Electrophoretic Deposition of Hydroxyapatite Coatings on Metal Substrates: A Nanoparticulate Dual-Coating Approach

Hydroxyapatite coatings can be readily deposited on metal substrates by electrophoretic deposition. However, subsequent sintering is highly problematic owing to the fact that temperatures in excess of 1100°C are required for commercial hydroxyapatite powders to achieve high density. Such temperatures damage the metal and induce metal-catalysed decomposition of the hydroxyapatite. Furthermore, the firing shrinkage of the hydroxyapatite coating on a constraining metal substrate leads to severe cracking. The present study has overcome these problems using a novel approach: the use of aged nanoparticulate hydroxyapatite sols (lower sintering temperature) and a dual coating strategy that overcomes the cracking problem. Dual layers of uncalcined hydroxyapatite (HAp) powder were electrophoretically coated on Ti, Ti6Al4V and 316L stainless steel metal substrates, sintered at 875–1000°C, and characterised by SEM and XRD, and interfacial shear strength measurement. Dual coatings on stainless steel had an average high bond strength (about 23 MPa), and dual coatings on titanium and titanium alloy had moderate strengths (about 14 and 11 MPa, respectively), in comparison with the measured shear strength of bone (35 MPa). SEM and XRD demonstrated that the second layer blended seamlessly with the first and filled the cracks in the first. The superior result on stainless steel is attributed to a more appropriate thermal expansion match with hydroxyapatite, the thinner oxide layer, or a combination of these factors.     

The Radiation Resistance of Films Obtained by Plasma Deposition of Polypropylene Electric-Discharge and Thermal Degradation Products

By means of the ESR technique, it was shown that paramagnetic species with polyconjugated carbon–carbon bonds are stabilized in the films produced in a plasma from polypropylene (PP) electric-discharge and thermal degradation products. A high radiation resistance of the film material was revealed, which was manifested as a 160-fold lower radiation-chemical yield of radicals relative to that from parent polypropylene (G _R 0.4 for precursor PP and G _R 0.0025 for the plasma-deposited film). The obtained films were insoluble in common organic solvents and resistant to acid and alkali solutions. The film density was 1.4 g/cm³.     

Study of PET Surfaces After Laser or Plasma Treatment: Surface Modifications and Adhesion Properties Towards Al Deposition

The modifications induced on poly (ethylene terephthalate) (PET) by an excimer laser radiation or a low pressure plasma as well as their ability to improve Al–PET adhesion were investigated. For this purpose, surface roughness, chemical composition, surface wettability, and adhesion properties of PET were studied depending on the process parameters. Both treatments can significantly enhance the adhesion but the surface change responsible for the improvement was different for each pretreatment.     

沉积温度对等离子增强化学气相沉积法制备的SiNx:H薄膜特性的影响

利用Centrotherm公司生产的管式等离子增强化学气相沉积(PECVD)设备在p型抛光硅片表面沉积SiN_x:H薄膜, 研究沉积温度对SiN_x:H薄膜的组成及光学特性、结构及表面钝化特性的影响. 然后采用工业化的单晶硅太阳电池制作设备和工艺制作太阳电池, 研究不同温度制备的薄膜对电池电性能的影响. 测试结果表明: SiN_x:H薄膜的折射率随着沉积温度的升高而变大, 分布在1.926-2.231之间, 这表明Si/N摩尔比随着沉积温度的增加而增加; 当沉积温度增加时, 薄膜中Si－H键和N－H键浓度呈现减小趋势, 而Si－N键浓度逐渐升高, 薄膜致密度增加; 随着沉积温度的升高, SiN_x:H薄膜中的氢析出导致了钝化硅片的有效少子寿命先升高后降低, 并且有效少子寿命出现明显的时间衰减特性. 当沉积温度为450 °C时, 薄膜具有最优的减反射和表面钝化效果. 采用不同温度PECVD制备的5组电池的电性能测试结果也验证了这一结果.     

Low Temperature Sintering and Characterization of YSZ/Al Composite Coatings by Electrophoretic Deposition and Reaction Bonding Process

In practice, low temperature sintering is always the most desirable route to fabricate ceramic composites for industrial manufacturers and an economic way to produce ceramics with unique microstructure for technological applications. Normally the sintering temperature for dense YSZ coating is about 1500℃. Recently many studies have experimentally found that dense ceramic composites can be achieved at a sintering temperature lower by several hundred degrees Celsius for nano-sized powders than for coarse powders^[1-2]. Electrochemical processing is an attractive method for making ceramic films and powders because it offers the advantages of low temperature sintering, low cost and good control of the green forms^[3-4].     

气流超微粉碎对蜡质玉米淀粉结构及理化性质的影响

为探究气流超微粉碎对蜡质玉米淀粉结构及性质的影响,采用扫描电镜、激光粒度分析仪、X-射线衍射仪、红外光谱仪、差示扫描量热仪、快速黏度分析仪等分析手段研究经微细化处理后蜡质玉米淀粉颗粒形貌、晶体结构和理化性质。结果表明,淀粉粒径明显变小,微细化蜡质玉米淀粉粒度中位径减小到6.43μm,粉碎后淀粉颗粒仍为A型结构,颗粒结晶结构被破坏,由多晶态向无定形态转变,粉碎过程淀粉无新的基团产生;热焓值、糊化温度均降低,热糊稳定性好;持水能力增加,冻融稳定性好,微细化蜡质玉米淀粉具有较好的热糊稳定性和冷糊力学稳定性。     

TiOx Films Deposited by Plasma Enhanced Chemical Vapour Deposition Method in Atmospheric Dielectric Barrier Discharge Plasma

The plasma enhanced chemical vapour deposition method applying atmospheric dielectric barrier discharge (ADBD) plasma was used for TiO_x thin films deposition employing titanium (IV) isopropoxide and oxygen as reactants, and argon as a working gas. ADBD was operated in the filamentary mode. The films were deposited on glass. The films?? chemical composition, surface topography, wettability and aging were analysed, particularly the dependence between precursor and reactant concentration in the discharge atmosphere and its impact on TiO_x films properties. Titanium in films near the surface area was oxidized, the dominating species being TiO₂ and substoichiometric titanium oxides. The films exhibited contamination with carbon, as a result of atmospheric oxygen and carbon dioxide reactions with radicals in films. No relevant difference of the film surface due to oxygen concentration inside the reactor was determined. The films were hydrophilic immediately after deposition, afterwards their wettability diminished, due to chemical reactions of the film surface and chemical groups involved in the atmosphere.     

等离子体增强磁控溅射沉积碳化硅薄膜的化学结构与成膜机理

以CH4和Ar为工作气体,单晶硅为溅射靶,通过微波电子回旋共振(MW-ECR)等离子体增强非平衡磁控溅射方法在不同的CH4流量和沉积温度下制备了a-Si1-xCx∶H薄膜.利用傅里叶变换红外(FT-IR)光谱,X光电子能谱(XPS)和纳米硬度仪等表征方法研究不同沉积参数下薄膜的化学结构、化学配比和硬度的变化.结果表明:室温(25℃)下随CH4流量由5cm·3min-1增加到45cm3·min-1(标准状态)时,薄膜中Si—CH2键,C—H键含量逐渐增加,Si—H键变化不明显;膜中C原子百分比由28%增至76%,Si原子百分比由62%降至19%.当CH4流量为15cm3·min-1时,随沉积温度的升高,薄膜中Si和C原子百分比含量分别为52%和43%,且基本保持不变;膜中Si—H键和C—H键转化为Si—C键,薄膜的显微硬度显著提高,在沉积温度为600℃时达到29.7GPa.根据分析结果,提出了室温和高温下a-Si1-xCx:H薄膜生长模型.     

Molecular Design of Fluorocarbon Film Architecture by Pulsed Plasma Enhanced and Pyrolytic Chemical Vapor Deposition

Pulsed plasma enhanced chemical vapor deposition (pulsed PECVD) and pyrolytic chemical vapor deposition (pyrolyric CVD) of fluorocarbon films from hexafluoropropylene oxide (HFPO) have demonstrated the ability to molecularly design film architecture. Film structures ranging from highly amorphous crosslinked matrices to linear perfluoroalkyl chain crystallites can be established by reducing the modulation frequency of plasma discharge in plasma activated deposition and by eventually shifting mechanistically from an electrically activated to a thermally activated process. X-ray photoelectron spectroscopy (XPS) showed CF₂ content increasing from 39–65 mol%. Fourier transform infrared spectroscopy (FTIR) showed an increasing resolution between the symmetric and asymmetric CF₂ stretches, and a reduction in the intensity of the amorphous PTFE and CF₃ bands. High-resolution solid-state ¹⁹F nuclear magnetic resonance spectroscopy (NMR) revealed an increasing CF₂CF₂CF₂ character, with the pyrolytic CVD film much like bulk poly(tetrafluoroethylene) (PTFE). X-ray diffraction (XRD) patterns evidenced an increase in crystallinity, with the pyrolytic CVD film showing a characteristic peak at 2 = 18° representing the (100) plane of the hexagonal structure of crystalline PTFE above 19°C.     

电诱导牙釉质表面羟基磷灰石涂层形成的研究

以含Ca(NO₃)₂、NH₄H₂PO₄和NaNO₃组成的溶液作为电解液,在人牙釉质表面电诱导制备了羟基磷灰石(HA)涂层。应用X射线衍射(XRD)﹑扫描电镜(SEM)和能谱分析(EDS)对形成涂层后的牙釉质样品进行分析和表征,研究了电解液初始pH值﹑电流密度和温度的变化对涂层的组成﹑结构和形貌的影响。研究结果表明这些因素对涂层的组分(HA)没有显著影响,而对涂层中HA晶体c轴的择优取向度的影响则较显著。当控制电解液的初始pH值为6﹑电流密度为0.5 mA·cm^-2﹑温度为55 ℃的时候,涂层中HA晶体沿c轴方向择优取向生长,且择优取向度和牙釉柱的HA较为接近。     

LC4铝合金表面电泳沉积硅锆有机-无机杂化涂层的制备及性能

采用阴极电泳沉积的方法在LC4铝合金表面制备硅锆有机-无机杂化涂层, 并探讨了电泳沉积条件对涂层形貌、结构以及耐蚀性的影响. 采用纳米粒度仪检测了不同硅锆杂化溶胶的zeta电位; 采用扫描电子显微镜(SEM)和原子力显微镜(AFM)观察了涂层的表面微观形貌和粗糙程度; 采用傅里叶红外光谱(FTIR)研究了涂层的化学结构; 采用电化学方法研究了沉积电压对涂层耐蚀性能的影响, 进而探讨了电泳沉积增强杂化涂层耐蚀性的机理. 结果显示沉积体系的pH为1.6、沉积电压为5 V时为最佳的沉积条件, 所获得的硅锆有机-无机杂化涂层表面均匀致密性最好, 粗糙程度和耐蚀性都得到了明显的改善, 在3.5% NaCl溶液中体现出较好的耐蚀作用.     

Microstructure and Chemical Bonding in Silicon Carbonitride Films Synthesized by Plasma Enhanced Chemical Vapor Deposition

Silicon carbonitride films were synthesized by plasma enhanced chemical vapor deposition using silyl derivatives of asymmetric dimethylhydrazine, (CH₃)₂HSiNHN(CH₃)₂ and (CH₃)₂Si[NHN(CH₃)₂]₂, as molecular precursors. The film material consists of an amorphous matrix with nanocrystalline inclusions. Indexing of synchrotron radiation Xray diffraction patterns suggests that the structure of the nanocrystals is tetragonal with lattice parameters a = 9.6 and c = 6.4. Xray photoelectron spectra indicate that Si—N and C—N sp ³ hybrid bonds are predominant. The absence of G or Dmodes in Raman spectra, which are otherwise typical of structures possessing sp ² bonding, provides further support for the tetragonal structure of the nanocrystals.