低介电常数聚喹啉衍生物薄膜的合成与表征

采用等离子体聚合技术合成了一种新型的低介电常数聚喹啉衍生物薄膜: 聚3-氰基喹啉(PP3QCN)薄膜. 借助于傅里叶变换红外光谱(FT-IR)、紫外-可见(UV-Vis)吸收光谱、X光电子能谱(XPS)和原子力显微镜(AFM)对薄膜结构进行了系统表征. 结果表明, 等离子体聚合条件对沉积膜的化学结构、表面组成、膜形态以及介电性能均有影响. 在较低的等离子体放电功率(10 W)条件下, 可得到具有较高芳环保留率和较大π-共轭体系的高质量聚3-氰基喹啉薄膜材料; 而在较高功率(25 W)条件下, 聚合过程中会出现比较严重的单体分子破碎, 形成较多非π-共轭体系的聚合物, 从而导致聚3-氰基喹啉的共轭度降低. 聚3-氰基喹啉薄膜的介电性能测试结果表明, 低放电功率(10 W)条件下制得的聚3-氰基喹啉薄膜具有比较低的介电常数值, 仅为2.45.     

Instabilities during the formation of electroactive polymer thin films

The solvent-induced film structure of poly(n-vinyl carbazole) (PVK) thin films on indium tin oxide (ITO)-coated glass was examined. PVK thin films were prepared via spin-coating using five different solvents. We investigated the relationship between the solvent characteristics and film properties, including surface roughness and structure, film thickness, and density. The spin-coated polymer thin films are not in thermodynamic equilibrium; rather, the film properties are affected by the dynamics of the spin-coating process. We found that water present in tetrahydrofuran (THF) induces dewetting of PVK films during the spin-coating process. Solvents with a high evaporation rate lead to high surface roughness due to Marangoni convection. The results show that the surface roughness and structure of the films are dominated by the dynamics of the film formation process, rather than thermodynamic interactions between the polymer and solvents.     

掺硼p型非晶硅薄膜的制备及光学性能的表征

以高氢稀释的硅烷(SiH₄ )为反应气体,硼烷(B₂H₆)为掺杂气体,利用RF-PECVD方法,在玻璃衬底上制备出掺硼的氢化非晶硅(a-Si:H)薄膜,研究了硼掺杂量对氢化非晶硅(a-Si:H)薄膜的光学性能的影响.利用NKD-7000 W光学薄膜分析系统测试薄膜的透射谱和反射谱,并利用该系统的软件拟合得出薄膜的折射率、消光系数、吸收系数等光学性能参数,利用Tauc法计算掺硼的非晶硅薄膜的光学带隙.实验结果表明,随着硼掺杂量的增加,掺杂非晶硅薄膜样品在同一波长处的折射率先增大后减小,而且每一样品均随着入射光波长的增加而减小,在波长500 nm处的折射率均达到4.3以上;薄膜的消光系数和吸收系数随着硼掺杂量的增大而增大,在500 nm处的吸收系数可高达1.5×10⁵cm^-1.在实验的硼掺杂范围内,光学带隙从1.81 eV变化到1.71 eV.     

Crack‐Free Periodic Porous Thin Films Assisted by Plasma Irradiation at Low Temperature and Their Enhanced Gas‐Sensing Performance

Homogenous thin films are preferable for high‐performance gas sensors because of their remarkable reproducibility and long‐term stability. In this work, a low‐temperature fabrication route is presented to prepare crack‐free and homogenous metal oxide periodic porous thin films by oxygen plasma irradiation instead of high temperature annealing by using a sacrificial colloidal template. Rutile SnO₂ is taken as an example to demonstrate the validity of this route. The crack‐free and homogenous porous thin films are successfully synthesized on the substrates in situ with electrodes. The SnO₂ porous thin film obtained by plasma irradiation is rich in surface OH groups and hence superhydrophilic. It exhibits a more homogenous structure and lower resistance than porous films generated by annealing. More importantly, such thin films display higher sensitivity, a lower detection threshold (100 ppb to acetone) and better durability than those that have been directly annealed, resulting in enhanced gas‐sensing performance. The presented method could be applied to synthesize other metal oxide homogenous thin films and to fabricate gas‐sensing devices with high performances.     

脉冲激光沉积LiFePO4阴极薄膜材料及其电化学性能

采用脉冲激光沉积结合高温退火的方法在不锈钢基片上制备了LiFePO₄薄膜电极. XRD谱图显示, 经650 ℃退火制得的是具有橄榄石结构的LiFePO₄薄膜. 充放电测试表明, LiFePO₄薄膜具有3.45/3.40 V的充放电平台, 与LiFePO₄粉体材料相当. 首次放电容量约为27 mAh•g^－1, 充放电循环100次后容量衰减51%.     

Effect of surface modification on the properties of plasma-polymerized hexamethyldisiloxane thin films

Plasma-polymerized hexamethyldisiloxane (pp-HMDSO) thin films have been deposited in a radiofrequency (RF) remote plasma-enhanced chemical vapor deposition (PECVD) system, on different types of substrates: silicon wafers, glass, quartz crystals, and chemiresistor structure. The as-grown thin films have been post treated in two types of reactive plasmas produced in SF₆ and O₂ gases. The effect of this surface modification on different properties of the as-grown pp-HMDSO thin film (chemical structure, elemental composition, surface morphology, film density and thickness, optical bandgap, and electrical resistivity) has been investigated. It is found that SF₆ plasma and O₂ plasma surface modifications of the as-grown pp-HMDSO thin film induce property changes different from each other. SF₆ plasma converted the as-grown pp-HMDSO film to a more porous material and caused a narrowing of its optical band gap of about 33%, while O₂ plasma induced a lowering of film electrical resistivity of about two orders of magnitude.     

Behavior and surface energies of polybenzoxazines formed by polymerization with argon,oxygen, and hydrogen plasmas

Polybenzoxazine (PBZZ) thin films can be fabricated by the plasma‐polymerization technique with, as the energy source, plasmas of argon, oxygen, or hydrogen atoms and ions. When benzoxazine (BZZ) films are polymerized through the use of high‐energy argon atoms, electronegative oxygen atoms, or excited hydrogen atoms, the PBZZ films that form possess different properties and morphologies in their surfaces. High‐energy argon atoms provide a thermodynamic factor to initiate the ring‐opening polymerization of BZZ and result in the polymer surface having a grid‐like structure. The ring‐opening polymerization of the BZZ film that is initiated by cationic species such as oxygen atoms in plasma, is propagated around nodule structures to form the PBZZ. The excited hydrogen atom plasma initiates both polymerization and decomposition reactions simultaneously in the BZZ film and results in the formation of a porous structure on the PBZZ surface. We evaluated the surface energies of the PBZZ films polymerized by the action of these three plasmas by measuring the contact angles of diiodomethane and water droplets. The surface roughness of the films range from 0.5 to 26 nm, depending on the type of carrier gas and the plasma‐polymerization time. By estimating changes in thickness, we found that the PBZZ film synthesized by the oxygen plasma‐polymerization process undergoes the slowest rate of etching in CF₄ plasma. © 2004 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys 42: 4063–4074, 2004     

Deposition of π-Conjugated Polycyanate Ester Thin Films and Their Dielectric Properties

Two kinds of novel π-conjugated polycyanate esters, namely the plasma-polymerized 4-methoxyphenol cyanate ester (PPMPCE) and the plasma-polymerized 4-phenylphenol cyanate ester (PPPPCE), were successfully prepared by plasma polymerization for the first time. The structure and compositions of both plasma polycyanate esters were investigated by Fourier Transform Infrared (FT-IR), X-ray Photoelectron Spectroscopy (XPS) and UV–Visible Absorption Spectra (UV–Vis). The results show that extensively conjugated C=N double bonds were formed in the plasma-deposited cyanate ester thin films, the plasma polymerization of both monomers proceeded mainly via the opening of π-bonds of the O–C≡N functional groups which are further on being formed into a large π-conjugated system, this unique process is noticeably different from the conventional thermal polymerization reaction of cyanate ester monomers. Further dielectric measurement shows that PPPPCE thin film gives a lower dielectric constant comparing to that of the PPMPCE film, and the dielectric constant of both plasma deposited thin films decreased with an increase in measurement frequency.     

激光刻蚀模板中电沉积特殊结构CIGS薄膜

本文利用激光刻蚀模板,在水溶液中电沉积制备金属铜薄膜,讨论了温度、电流、硫酸铜浓度对薄膜形貌的影响. 采用SEM对制备的铜薄膜进行表征,结果表明在沉积温度为30 ℃,沉积电流为4 A·dm^-2(表观工作电流密度),硫酸铜浓度在20 ~ 50 g·L^-1的水溶液中电沉积可以得到中空馒头状和开口碗状结构的铜薄膜. 利用激光刻蚀模板,在离子液体1-丁基-3-甲基咪唑三氟甲磺酸盐([BMI][TfO]) - 30 Vol%丙醇混合电解质中电沉积CIGS薄膜,研究了沉积电势、沉积时间对薄膜形貌的影响. SEM观察发现,在沉积电势为-1.8 V,沉积时间为1.5 h条件下电沉积可以得到近似柱状的簇状花束样的CIGS薄膜, 电沉积铜后再进一步电沉积CIGS,得到了均匀有序的鼓包柱状结构的Cu/CIGS复合薄膜. 用恒电势方波法对制备的薄膜真实表面积进行测试,计算结果表明,与无模板电沉积制备的CIGS薄膜相比,激光刻蚀模板法制备的Cu/CIGS复合薄膜的表面积提高了约8倍.     

Atmospheric Pressure Plasma Deposition of Polyfuran

The atmospheric pressure radiofrequency (RF) plasma polymerization of furan was carried out with the objective of synthesizing polyfuran thin film. The structure, compositions and morphology of the plasma deposited polyfuran film were investigated by Fourier transform infrared (FTIR), atomic force microscopy (AFM), ultraviolet‐visible absorption spectroscopy (UV‐vis) and thermogravimetric analysis (TGA). The formation of polyfuran was confirmed using FTIR and UV‐visible analysis. The properties of plasma‐deposited polyfuran were compared with those of chemically synthesized polyfuran. Although the plasma deposited thin film polyfuran shows lower thermal stability than that of chemically synthesized polyfuran. It has better solubility in CHCl₃, also. Thin uniform polyfuran films are obtained in plasma assisted polyfuran deposition, while particles are obtained in chemical polyfuran polymerization.     

Electroluminescence and Photoluminescence of Conjugated Polymer Films Prepared by Plasma Enhanced Chemical Vapor Deposition of Naphthalene

Polymer light-emitting devices were fabricated utilizing plasma polymerized thin films as emissive layers. These conjugated polymer films were prepared by RF plasma enhanced chemical vapor deposition using naphthalene as monomer. The effect of different applied powers on the chemical structure and optical properties of the conjugated polymers was investigated. Fourier transform infrared (FTIR) and Raman spectroscopies confirmed that a conjugated polymer film with a 3-D cross-linked network was developed. By increasing the power, products tended to form as highly cross-linked polymer films. The fabricated devices showed broadband Electroluminescence (EL) emission peaks with center at 535–550 nm. Photoluminescence (PL) spectra of plasma polymers showed different excimeric emissions, resulted from crosslinked architecture. As the plasma power increased, the optical properties showed two different domains; up to 200 W, EL, PL and UV–Vis spectra red-shifted and broadened significantly. At higher powers, a reverse behavior was observed. Also, the relation between the film structure and plasma species was investigated using optical emission spectroscopy.     

Surface chemistry and optical property of TiO2 thin films treated by low-pressure plasma

The low temperature RF plasma treatment was used to control the surface chemistry and optical property of TiO₂ thin films deposited by RF magnetron sputtering with a very good uniformity at 300 °C substrate heating temperature. The XRD pattern indicates the crystalline structure of the film could be associated to amorphous structure of TiO₂ in thin film. The plasma treatment of TiO₂ film can increase the proportion of Ti³⁺ in Ti2p and decrease in carbon atoms as alcohol/ether group in C1s at the surface. The optical transmittance of the film was enhanced by 50% after the plasma treatment. The surface structure and morphology remain the same for untreated and low-pressure plasma-treated films. Therefore, increase in the optical transmission could be due to change in surface chemistry and surface cleaning by plasma treatment.     

Multi-electron transfer in composite phthalocyanine thin films: structure and electrochromic properties

Both sequentially deposited double-layered and codeposited composite thin films were prepared by using two kinds of phthalocyanines. The structure and the electrochromic property of these thin films were compared with those of simple phthalocyanine films. The structures of the films were analyzed by scanning electron microscopy (SEM), X-ray diffrction (XRD) and electron spin resonance (ESR) spectra. From the viewpoint of morphology and crystallinity, codeposited thin films have the same structure as the simple one, having sharp peaks at ca. 2θ=7.0° in the XRD pattern and narrow crystal grains in SEM photographs. ESR measurements have revealed that phthalocyanine molecules disperse very well in the codeposited thin films in a molecular level in comparison with the physical mixture of phthalocyanine powders. This high dispersibility of the molecules in the codeposited thin films can play a role to improve the reversibility in the electrochromism. Thus, the reversibility of the phthalocyanine, which shows irreversible electrochromism in the simple film form, can be improved by the codeposition with another phthalocyanine with reversible electrochromism. In contrast, sequentially deposted double-layered thin film gives completely different results. The electrochromism of the double-layered film depends on the property of the simple phthalocyanine thin film which is in contact with the substrate.     

Ag3PO4/Ni薄膜的制备及其光催化降解罗丹明B的性能和机理

用电化学方法制备Ag₃PO₄/Ni薄膜,以扫描电子显微镜(SEM)、X射线衍射(XRD)和紫外-可见漫反射光谱(UV-Vis DRS)对薄膜的表面形貌、晶相结构、光谱特性及能带结构进行了表征,以罗丹明B为模拟污染物对薄膜的光催化活性和稳定性进行了测定,采用向溶液中加入活性物种捕获剂的方法对薄膜光催化降解机理进行了探索.结果表明:最佳工艺下制备的Ag₃PO₄/Ni薄膜具有致密的层状表面结构,是由多晶纳米颗粒构成的薄膜.薄膜具有较高的光催化活性和突出的光催化稳定性,可见光下催化作用60 min,薄膜光催化罗丹明B的降解率是多孔P25 TiO₂/ITO纳米薄膜(自制)的2.3倍;在保持薄膜光催化活性基本不变的前提下可循环使用6次.给出了可见光下薄膜光催化降解罗丹明B的反应机理.     

Ag_3PO_4/Ni薄膜的制备及其光催化降解罗丹明B的性能和机理

用电化学方法制备Ag3PO4/Ni薄膜,以扫描电子显微镜(SEM)、X射线衍射(XRD)和紫外-可见漫反射光谱(UV-Vis DRS)对薄膜的表面形貌、晶相结构、光谱特性及能带结构进行了表征,以罗丹明B为模拟污染物对薄膜的光催化活性和稳定性进行了测定,采用向溶液中加入活性物种捕获剂的方法对薄膜光催化降解机理进行了探索。结果表明:最佳工艺下制备的Ag3PO4/Ni薄膜具有致密的层状表面结构,是由多晶纳米颗粒构成的薄膜。薄膜具有较高的光催化活性和突出的光催化稳定性,可见光下催化作用60 min,薄膜光催化罗丹明B的降解率是多孔P25 Ti O2/ITO纳米薄膜(自制)的2.3倍;在保持薄膜光催化活性基本不变的前提下可循环使用6次。给出了可见光下薄膜光催化降解罗丹明B的反应机理。     

Effect of annealing temperature on the quality of Al-doped ZnO thin films prepared by sol–gel method

The different thermal expansion coefficients and lattice mismatch between ZnO and Al may produce residual stress in Al-ZnO (AZO) thin films. Annealing processes can be applied to modulate this residual stress. In this study, three different rapid thermal annealing (RTA) temperatures (350, 450, and 600 °C) were applied to an AZO thin film, prepared using sol–gel method. The mechanical properties, optical properties, and structure of the AZO thin film were investigated experimentally. The results show that increasing the RTA temperature increased the Young’s modulus and hardness of the films. The grain size of the films also increased with increasing RTA temperature. However, the film thickness and shear stress component decreased with increasing RTA temperature. Both compressive and tensile stress decreased gradually with increasing film thickness after RTA treatment. It was demonstrated that the use of a relatively high RTA temperature can effectively relax the residual stress in AZO thin films.     

Stoichiometric and structural analyses of thin high-Tc superconducting Bi-Sr-Ca-Cu-O films on silicon

Summary For the analyses of stoichiometry and structure of laser deposited Bi-Sr-Ca-Cu-O thin films and yttria stabilized zirconia buffer layers on silicon, the methods XRF, PIXE with low incidence energy, RBS and XRD were used. In the results a change of stoichiometry from target into the thin film was observed and the spatial intensity distribution of the laser plasma was measured. The degree of interdiffusion of thin film and substrate and the formation of the perovskite-structure during post annealing were determined. The Bi-Sr-Ca-Cu-O films are highly c-axis oriented perpendicular to the surface and mainly consist of the low-T_c phase with c=30.8 A.     

Ag2S/Ag3PO4/Ni复合薄膜的制备及其光催化性能

采用电化学方法制备Ag_2S/Ag_3PO_4/Ni复合薄膜,以扫描电子显微镜(SEM)、X射线衍射(XRD)、紫外-可见漫反射光谱(UVVis DRS)对薄膜的表面形貌、晶相结构、光谱特性及能带结构进行了表征,以罗丹明B为模拟污染物对薄膜的光催化活性和稳定性进行了测定,采用向溶液中加入活性物种捕获剂的方法对薄膜的光催化机理进行了探索。结果表明:最佳工艺制备的Ag_2S/Ag_3PO_4/Ni是由均匀的球形纳米颗粒构成的薄膜,其光催化活性明显优于纯Ag_3PO_4/Ni薄膜和纯Ag_2S/Ni薄膜,且在保持薄膜光催化活性基本不变的前提下可循环使用6次。提出了可见光下Ag_2S/Ag_3PO_4/Ni复合薄膜光催化降解罗丹明B的反应机理。     

Ag2S/Ag3PO4/Ni复合薄膜的制备及其光催化性能

采用电化学方法制备Ag₂S/Ag₃PO₄/Ni复合薄膜,以扫描电子显微镜（SEM）、X射线衍射（XRD）、紫外-可见漫反射光谱（UV-Vis DRS）对薄膜的表面形貌、晶相结构、光谱特性及能带结构进行了表征,以罗丹明B为模拟污染物对薄膜的光催化活性和稳定性进行了测定,采用向溶液中加入活性物种捕获剂的方法对薄膜的光催化机理进行了探索。结果表明：最佳工艺制备的Ag₂S/Ag₃PO₄/Ni是由均匀的球形纳米颗粒构成的薄膜,其光催化活性明显优于纯Ag₃PO₄/Ni薄膜和纯Ag₂S/Ni薄膜,且在保持薄膜光催化活性基本不变的前提下可循环使用6次。提出了可见光下Ag₂S/Ag₃PO₄/Ni复合薄膜光催化降解罗丹明B的反应机理。     

Photovoltaic and Catalytic Activity of Plasma-Polymerized Phthalocyanine Films

Polymeric metal (Cu, Mg, Zn, and Ni) and metal-free phthalocyanine thin films were prepared from the gas phase by low-temperature plasma polymerization. Electronic and FT-IR spectra indicated that no extensive alteration or destruction of the original ring structure had occurred. The obtained film showed good rectification, photovoltaic, and electro-chromic effects. The film also reduced methyl viologen under visible light, and its catalytic activity was as high as that of monomeric phthalocyanine particles. The formation mechanism and properties of the polymeric phthalocyanine films are discussed briefly.