电荷俘获存储器的过擦现象

基于密度泛函理论的第一性原理平面波超软赝势方法和VASP软件对电荷俘获存储器过擦现象进行了分析研究.通过形成能的计算,确定了含有氮空位缺陷的Si3N4和含有间隙氧缺陷的Hf O2作为研究的对象;俘获能的计算结果表明两种体系对电子的俘获能力比对空穴的大,因而对两体系擦写载流子确定为电子.分别计算了Hf O2和Si3N4擦写前后的能量、擦写前后电荷分布变化、吸附能和态密度,以说明过擦的微观机理.对能量和擦写电荷变化的研究,表明Si3N4相比于Hf O2,其可靠性较差,且Si3N4作为俘获层,在一个擦写周期后,晶胞中电子出现减少现象;界面吸附能的研究表明,Si3N4相比于Hf O2在缺陷处更容易与氧进行电子交换;最后,通过对态密度的分析表明Si3N4和Hf O2在对应的缺陷中均有缺陷能级俘获电子,前者为浅能级俘获,后者为深能级俘获.综上分析表明,Si3N4在氮空位的作用下,缺陷附近原子对电子的局域作用变弱,使得Si3N4作为俘获层时,材料本身的电子被擦出,使得擦操作时的平带偏移电压增大,导致存储器发生过擦.本文的研究结果揭示了过擦的本质,对提高电荷俘获存储器的可靠性以及存储特性有着重要的指导意义.     

紫外波段SiO2/Si3N4介质膜分布式布拉格反射镜的制备与研究

采用光学传递矩阵方法设计了紫外波段SiO₂/Si₃N₄介质膜分布式布拉格反射镜, 并利用等离子体增强化学气相沉积技术在蓝宝石(0001)衬底上制备了SiO₂/Si₃N₄介质膜分布式布拉格反射镜. 光反射测试表明, 样品反射谱的峰值波长仅与理论模拟谱线相差10 nm, 并随着反射镜周期数的增加而蓝移. 由于SiO₂与Si₃N₄具有相对较大的折射率比, 因而制备的周期数为13的样品反射谱的峰值反射率就已大于99%. 样品反射谱的中心波长为333 nm, 谱峰的半高宽为58 nm. 样品截面的扫描电子显微镜和表面的原子力显微镜测量结果表明, 样品反射谱的中心波长蓝移是由子层的层厚和界面粗糙度的变化引起的. X射线反射谱表明,子层界面过渡层对于反射率的影响较小, 并且SiO₂膜的质量比Si₃N₄差, 也是造成反射率低于理论值的原因之一.     

Growth and magnetism of Ni nanoparticles in Ni/Al2O3/Si or Si3N4 multilayers

We report on the fabrication of Ni/Al₂O₃/Si and textured Ni/Al₂O₃/Si₃N₄ multilayers containing Ni nanoparticles that exhibit significantly improved results. The secondary phases arising from thermal reaction between Ni and Si can be remarkably suppressed with increasing layers of Al₂O₃ and deposition of Ni/Al₂O₃ multilayers on Si₃N₄ substrates. Atomic force microscopy shows the formation of large as well as nanoclusters of Ni when grown on Si, whereas textured Ni nanoparticles are formed on Si₃N₄ substrates. The magnetization measurements on Ni/Al₂O₃/Si containing a single buffer layer of Al₂O₃ shows higher coercivity field with magnetic nanowire-like behavior, whereas with several Al₂O₃ alternate layers almost a superparamagnetic-like behavior is observed. However, significantly improved magnetic hysteresis was observed in textured Ni/Al₂O₃/Si₃N₄ multilayers due to preferred alignment of Ni nanocrystallites.     

Rigorous reflectance performance analysis of Si3N4 self-suspended subwavelength gratings

In this paper, we make an investigation into the reflectance performance of the Si₃N₄ self-suspended subwavelength grating (SSG) via changing several parameters including the incident wavelength, the grating period, the grating thickness and the grating filling ratio. For TM polarization of incidence, numerical results by the rigorous coupled-wave method reveal that the reflectance spectrum of the Si₃N₄ SSG has a narrow linewidth (less than 1 nm), high peak reflectance (100%), and low side bands (less than 0.5%) simultaneously in the optical telecommunication wavelength region. By using a micro-electromechanical-systems actuator, it is believed that the Si₃N₄ SSG should serve as tunable optical filters in optical telecommunication systems.     

三水合醋酸钠纳米成核剂的性能研究

三水合醋酸钠是一种具有较高的储能密度和热导率的储热相变材料,但是在凝固过程中的过冷和相分离现象限制了它的应用,需要寻求有效的成核剂和增稠剂来克服过冷和相分离的问题。本文实验分析了几种纳米材料（AIN、Si₃N₄、ZrB₂、SiO₂、BC₄、SiB₆）的成核效果,结果表明质量分数5%或4%的Si₃N₄、10%ZrB₂、5%AlN在自然分散下就能够消除三水合醋酸钠过冷度,质量分数2%的SiO₂在熔化的三水合醋酸钠中经磁力搅拌和超声分散后能够消除其过冷度。结合纳米材料的粒度分析结果,表明粒度分布在几十纳米到300纳米左右的纳米材料有较好的成核效果。     

Analytical electron microscopy of a reaction-bonded Si3N4-based ceramic containing oxide additions

The microstructure of a silicon nitride (Si₃N₄)-based ceramic, prepared by a process combining direct nitridation and reactive liquid phase sintering of silicon/ceramic oxide powder compacts, has been characterised using analytical transmission electron microscopy. The presence of the reactive liquid phase, promoted by the addition of oxides from the CaO-Al₂O₃-SiO₂ ternary system, resulted in an as-fired microstructure containing a mixture of crystalline phases based on -Si₃N₄, β-Si₃N₄ and Si₂ N₂O, and distinct amorphous regions rich in Si, Al and Ca. X-ray microanalysis revealed the calcium to be wholly partitioned to the glassy phase, while significant concentrations of aluminium were detected in both β-Si₃N₄ and Si₂N₂O. The observed compositions of these phases, together with measured lattice parameters systematically in excess of those of the pure compounds, imply that they are in fact β- and O-sialons respectively. Semi-quantitative energy dispersive X-ray spectroscopy, using an ultra-thin window detector, is demonstrated to be capable of distinguishing clearly between these phases according to their oxygen content and of determining the aluminium content of both phases to within ± 1 equ.%, even at concentration levels of <5 equ.%.     

Laser irradiation of AISI 316L stainless steel coated with Si3N4 and Ti

AISI 316L stainless steel was laser surface treated with different compositions of Si₃N₄ and Ti under various laser-processing parameters to improve its surface hardness through reinforcement of Ti-based silicides. The laser-treated regions exhibited improved surface hardness (250–1000 HV), variations in the surface morphology (smooth and bowl like) and presence of cracks and pores depending upon the Si₃N₄–Ti composition and laser-processing parameters. The study shows that when the Si₃N₄–Ti composition is 75–25 wt% and laser parameters are 1.5 kW laser power and 1.0 m min⁻¹ scan speed, a laser-treated region with high hardness of about 800 HV and smooth surface morphology as well as free from pores and cracks is observed. The X-ray diffractometer (XRD) and Energy-Dispersive Spectroscopy (EDS) analyses show that the laser surface-treated region has reinforced phase of Ti₅Si₃ and retained austenitic structure. The reinforced phase gives rise to very high hardness (or wear resistance) and also a corrosion resistance.     

特殊构型Si_2N_2分子团簇电致激发特性的密度泛函理论研究

以在可见光区有吸收峰的Cs构型的Si2N2分子团簇为研究对象,利用密度泛函B3LYP方法,在aug-ccpVTZ基组水平下优化得到了处于不同外电场中的Si2N2分子团簇的稳定结构.分析发现:在不同的外电场中,Si2N2分子构型对称性没有发生改变,均为Cs对称性,且都有6种振动模式;随着外电场强度的逐渐增大,Si2N2分子振动频率较低的前三种振动模式的频率略有减小,而后三种振动模式的频率逐渐增加;随着外电场强度的逐渐增大,在一定电场范围内最高占据分子轨道与最低空分子轨道的能隙值出现振荡,之后能隙值随着外电场强度的增大而减小.在此基础上,采用含时密度泛函TD-B3LYP方法研究了外电场对Si2N2分子吸收谱的影响规律.计算得到的吸收谱范围在紫外-可见光区,这与实验值相符合.随着外电场强度的逐渐增大,在可见光区吸收谱发生红移,最大跃迁振子强度逐渐增大.结果表明,施加外电场有利于Si2N2分子在可见光区的吸收,也有利于操控分子特定激发态的电子状态,进而调节相应的跃迁光谱特性,可达到获得所需特定波长的要求.     

Photoluminescence and capacitance–voltage characterization of GaAs surface passivated by an ultrathin GaN interface control layer

A novel surface passivation technique for GaAs using an ultrathin GaN interface control layer (GaN ICL) formed by surface nitridation was characterized by ultrahigh vacuum (UHV) photoluminescence (PL) and capacitance–voltage (C–V) measurements. The PL quantum efficiency was dramatically enhanced after being passivated by the GaN ICL structure, reaching as high as 30 times of the initial clean GaAs surface. Further analysis of PL data was done by the PL surface state spectroscopy (PLS³) simulation technique. PL and C–V results are in good agreement indicating that ultrathin GaN ICL reduces the gap states and unpins the Fermi level, realizing a wide movement of Fermi level within the midgap region and reduction of the effective surface recombination velocity by a factor of 1/60. GaN layer also introduced a large negative surface fixed charge of about 10¹² cm⁻². A further improvement took place by depositing a Si₃N₄ layer on GaN ICL/GaAs structure.     

InGaAs/Si3N4 interface obtained in ultrahigh vacuum multipolar plasma: In-situ control by ellipsometry and electrical characterization

A multipolar plasma passivation scheme controlled by in-situ ellipsometry has been developed to produce a high electrical quality InGaAs/Si₃N₄ interface. We have demonstrated the possibility to remove all native oxides at the InGaAs surface by heating the sample at 240°C, then using the action of a multipolar H₂ plasma at 185°C, without optical degradation of the surface. The passivation by a native nitride layer is then performed using a N₂ plasma, and Si₃N₄ is deposited. The treatment induces a reduction of the density of interface states N_ss(E), and also a change of the nature of these interface states as shown by a reduction in the capture cross section σ_n(E).     

无杂质空位扩散法造成InGaAsP/InP多量子阱结构带隙蓝移规律的研究

采用光荧光谱(PL)和光调制反射谱(PR)的方法,研究了由Si₃N₄、SiO₂电介质盖层引起的无杂质空位(IFVD)诱导的InGaAsP四元化合物半导体多量子阱(MQWs)结构的带隙蓝移。实验中Si₃N₄、SiO₂作为电介质盖层,用来产生空位,再经过快速热退火处理(RTA)。实验结果表明:多量子阱结构带隙蓝移和退火温度、复合盖层的组合有关。带隙蓝移随退火温度的升高而加大。InP、Si₃N₄复合盖层产生的带隙蓝移量大于InP、SiO₂复合盖层。而InGaAs、SiO₂复合盖层产生的带隙蓝移量则大于InGaAs、Si₃N₄复合盖层。同时,光调制反射谱的测试结果与光荧光测试的结果基本一致,因此,PR谱是用于测试带隙变化的另一种方法。     

助熔剂对Sr0.97Si2N2O2：0.03Eu2+荧光粉制备及发光性能的影响

在N₂气氛下,以Si₃N₄、SrCO₃和Eu₂O₃为原料,采用自还原高温固相合成法制备了Sr_0.97Si₂N₂O₂：0.03Eu²⁺荧光粉。在近紫外光激发下,该荧光粉发出明亮的黄绿光,发射峰位于533 nm处。采用XRD分析了不同助熔剂（NH₄F,NH₄Cl,Li₂CO₃,H₃BO₃）条件下的荧光粉晶相发育情况。通过SEM和荧光光谱研究了不同助熔剂对Sr_0.97Si₂N₂O₂：0.03Eu²⁺晶粒形貌及发光性能的影响。结果表明,随着助熔剂的添加,荧光粉团聚现象缓解、结晶度增强、分散性提高,且不同程度地提高了荧光粉的发光强度,其中以NH₄Cl的添加效果最佳。     

基于原位等离子体氮化及低压化学气相沉积-Si_3N_4栅介质的高性能AlGaN/GaN MIS-HEMTs器件的研究

通过对低压化学气相沉积(LPCVD)系统进行改造,实现在沉积Si_3N_4薄膜前的原位等离子体氮化处理,氮等离子体可以有效地降低器件界面处的氧含量和悬挂键,从而获得了较低的LPCVD-Si_3N_4/GaN界面态,通过这种技术制作的MIS-HEMTs器件,在扫描栅压范围V_(G-sweep)=(-30 V,+24 V)时,阈值回滞为186 mV,据我们所知为目前高扫描栅压V_(G+)(20 V)下的最好结果.动态测试表明,在400 V关态应力下,器件的导通电阻仅仅上升1.36倍(关态到开态的时间间隔为100μs).     

Dielectrics for passivation of planar InP/InGaAs diodes

We have investigated dielectrics for passivating planar InP or InGaAs photodiodes: thermally evaporated Al₂O₃ and SiO, sputtered Si₃N₄ and SiO₂ and also SiO₂ using chemical vapour deposition. The measured bulk and field-effect properties of all dielectrics excluding sputtered SiO₂ were suitable for this application. In planar InGaAs diodes with Cd diffused or Mg implanted p⁺-region a disordered dielectric/semiconductor surface led to high reverse current densities above 1 mA/cm². In InP diodes with p⁺-diffusion and dielectrics exhibiting positive flatband voltages, e.g. Si₃N₄ and Al₂O₃, reverse current densities of 10 μA/cm² were measured probably caused by a slight inversion of the semiconductor surface. With a SiO or CVD-SiO₂ passivating layer on n-InP lowest leakage current densities (10 nA/cm²) were achieved. Very low dark-current planar photodiodes InP/InGaAsP/InGaAs have been fabricated using SiO passivation (30 nA/cm²).     

Gated photoluminescence study of oxide-free InP MIS structure having an ultrathin silicon interface control layer

In order to investigate the effectiveness of a novel oxide-free surface passivation approach for InP, using an ultrathin silicon interface control layer (Si ICL), gated photoluminescence characteristics of the Si₃N₄/Si ICL/n-InP metal–semiconductor–insulator (MIS) structure were studied at room temperature. As compared with gated PL spectra of Si₃N₄/n-InP MIS without Si ICL, PL intensities of the sample with Si ICL were much more strongly modulated by the gate voltage. The interface state density distribution was estimated by an optical analog of the Terman’s C–V analysis and a good agreement with the C–V analysis was obtained. The result indicates complete removal of Fermi level pinning over the entire bandgap in the novel oxide-free MIS structure.     

Characterization of hetero-interfaces between group III nitrides formed by PLD and various substrates

We have grown group III nitride epitaxial films on various substrates by pulsed laser deposition and investigated structural properties of the surfaces and the hetero-interfaces using grazing incidence angle X-ray reflectivity (GIXR) and atomic force microscopy (AFM). It has been found that hetero-interfaces between PLD AlN and conventional substrates such as Al₂O₃ and Si are quite abrupt (about 0.5 nm) probably due to a less reactive growth ambience. However, we observed a thin interfacial layer (less than 10 nm) at the hetero-interface between AlN and (Mn,Zn)Fe₂O₄. The surface roughness of AlN is mainly determined by the extent of the lattice mismatch. It has been also found that the roughness at the hetero-interface between GaN and AlN formed by PLD coincides with the surface roughness of the AlN layer.     

Magnetic microstructure of sputtered Co-Cr films

The magnetic microstructure of a thickness series of Co₈₁Cr₁₉ layers on Si₃N₄ membranes is investigated by modified differential phase contrast (MDPC) microscopy. The development from cross-rie wall structures for a thickness < 25 nm to more complicated structures for a thickness > 50 nm is related to the macroscopic VSM measurements and the crystallite orientation determined from electron diffraction experiments.     

高温隐形材料SiBN陶瓷

已有的实验结果表明, 硅硼氮陶瓷材料具有非晶态的微观结构, 并且可在六方相氮化硅 (β-Si₃N₄) 的基础上得到较好理论模型. 本文通过同样方法建立硅硼氮陶瓷材料的理论模型, 并在此基础上进行分子动力学与密度泛函理论结合的计算研究, 得到其高温下光学性质的显著变化. 与氮化硅 (Si₃N₄) 的光学性质比较分析后发现, 低温下SiBN陶瓷对可见光甚至紫外及高频光吸收显著, 而高温下呈现对微米波的较好吸收和其他波段小于0.3的吸收系数; 低温下SiBN陶瓷的反射系数全波段接近0.1, 而高温下其反射系数可小至1%; 单晶Si₃N₄的光学性质则随温度升高几乎不发生变化. 这一结果表明SiBN陶瓷作为高温激光隐形材料的可能, 也为非晶材料光电应用指出一个新的方向. 关键词： 硅硼氮陶瓷 密度泛函理论 光吸收系数 反射系数     

Low temperature fabrication of vanadium oxide films for uncooled bolometric detectors

Vanadium oxide films with temperature coefficient of resistant of −2.6% K⁻¹ have been fabricated on Si₃N₄-film-coated Si substrates by ion beam sputtering in a controlled Ar/O₂ atmosphere, at a relatively low growth temperature of 200 °C. The as-deposited films show no semiconductor-to-metal phase transitions even heated up to 150 °C. X-ray diffractometry shows that the main compound of the VO_x film is a metastable phase of vanadium dioxide (VO₂(B)) and the VO₂(B) film can be transformed into VO₂ film by post-growth annealing at 450 °C in flowing Ar atmosphere.     

微流控技术制备ZnO纳米线阵列及其气敏特性

利用微流控技术在微通道中制备了Zn O纳米线阵列,通过X射线衍射和扫描电子显微镜分别对纳米线的物相和表面形貌进行了表征.结果发现,合成的Zn O纳米线具有良好的c轴择优取向性和结晶度.同时,对Zn O纳米线阵列在丙酮、甲醇和乙醇气体中的气敏特性进行了研究,测试结果表明:在最佳工作温度(475?C)下,纳米线阵列对200 ppm(1 ppm=10-6)丙酮气体的最大灵敏度可达8.26,响应恢复时间分别为9和5 s;通过与传统水热法制备的Zn O纳米线的气敏性能相比较发现,基于微流控技术制备的纳米线阵列具有更高的灵敏度和更快的响应恢复速度.最后,从材料表面氧气分子得失电子的角度对Zn O纳米线气敏机理进行了讨论.