High-temperature conductivity in chemical bath deposited copper selenide thin films

This paper reports high-temperature (305–523 K) electrical studies of chemical bath deposited copper (I) selenide (Cu_2−xSe) and copper (II) selenide (Cu₃Se₂) thin films. Cu_2−xSe and Cu₃Se₂ have been prepared on glass substrates from the same chemical bath at room temperature by controlling the pH. From X-ray diffraction (XRD) profiles, it has been found that Cu_2−xSe and Cu₃Se₂ have cubic and tetragonal structures, respectively. The composition of the chemical constituent in the films has been confirmed from XRD data and energy-dispersive X-ray analysis (EDAX). It has been found that both phases of copper selenide thin films have thermally activated conduction in the high-temperature range. In this paper we also report the variation of electrical parameters with film thickness and the applied voltage.     

Electronic traps in mixed Si1−xGexO2 films

Thermally stimulated luminescence (TSL) and infrared (IR) spectroscopy were measured in plasma grown Si_1−xGe_xO₂ (x=0, 0.08, 0.15, 0.25, 0.5) with different thicknesses (12–40 nm). A comparison with the TSL properties of thermally grown SiO₂ and GeO₂ was also performed. A main IR absorption structure was detected, due to the superposition of the peaks related to the asymmetric O stretching modes of (i) Si–O–Si (at ≈1060 cm⁻¹) and (ii) Si–O–Ge (at 1001 cm⁻¹). Another peak at ≈860 cm⁻¹ was observed only for Ge concentrations, x>0.15, corresponding to the asymmetric O stretching mode in Ge–O–Ge bonds. A TSL peak was observed at 70°C, and a smaller structure at around 200°C. The 70°C peak was more intense in all Ge rich layers than in plasma grown SiO₂. Based on the thickness dependence of the signal intensity we propose that at Ge concentrations 0.25x0.5 TSL active defects are localised at interfacial regions (oxide/semiconductor, Ge poor/Ge rich internal interface, oxide external surface/atmosphere). Based on similarities between TSL glow curves in plasma grown Si_1−xGe_xO₂, thermally grown GeO₂ and SiO₂ we propose that oxygen vacancy related defects are trapping states in Si_1−xGe_xO₂ and GeO₂.     

Growth and morphology of ruby crystals with unusual chromium concentration

Single crystals of ruby have been obtained from fluxed melts based on the systems Li₂O–MoO₃, Li₂O–WO₃, Na₂O–WO₃, 2PbO–3V₂O₅, PbO–V₂O₅–WO₃, PbF₂–Bi₂O₃ and Na₃AlF₆ by both the TSSG method and spontaneous crystallization at the temperatures 1330–900 °C. Al₂O₃ solubility has been measured for the flux composition of 2Bi₂O₃–5PbF₂ in the temperature range 1200–1000 °C and dissolution enthalpy has been defined as 29.4 KJ/Mol. The composition of grown crystals was studied by electron microprobe analysis. The synthetic ruby contains from 0.51 to 6.38 at% of chromium admixture depending on the crystal growth conditions. Experimental results on growth conditions, composition and morphology of grown crystals are presented for each flux and temperature interval.     

B NMR investigations in xV2O5–B2O3 and xV2O5–B2O3–PbO glasses

11B (I=3/2) MAS NMR in the binary glass system xV₂O₅–B₂O₃ (x=0.053, 0.43) and the ternary glass system xV₂O₅–B₂O₃–PbO (0.1x1.5) has been investigated at room temperature. In the xV₂O₅–B₂O₃ glasses, one NMR line due to BO₃ unit was observed. Meanwhile in the xV₂O₅–B₂O₃–PbO, two NMR lines which arise from BO₃ and BO₄ units were detected, where the appearance of BO₄ units is produced by the presence of PbO. From the computer-simulation of the ¹¹B NMR central transition line (m=−1/2↔1/2), the quadrupole parameters (e²qQ/h and η) for BO₃ units in xV₂O₅–B₂O₃, and those for BO₃ and BO₄ units in xV₂O₅–B₂O₃–PbO were obtained as a function of x. As the V₂O₅ content increases in xV₂O₅–B₂O₃–PbO, the e²qQ/h and η values of the BO₃⁻ associated resonance are found to slightly decrease and increase, respectively. Meanwhile, the e²qQ/h and η values of BO₄⁻ associated resonance in xV₂O₅–B₂O₃–PbO are found to slightly increase and decrease, respectively. By comparing the intensities of the total transitions (m=−3/2↔−1/2,m=−1/2↔1/2, and 1/2↔3/2) for the ¹¹B NMR line of BO₃ and BO₄ units contained in xV₂O₅–B₂O₃–PbO with those of respective standard samples of 0.053V₂O₅–B₂O₃ and NaBH₄, the quantitative fractions of BO₃ and BO₄ in xV₂O₅–B₂O₃–PbO were obtained as a function of x.     

Effect of the substrate temperature on the crystallization of TiO2 films prepared by DC reactive magnetron sputtering

Titanium oxide (TiO₂) films were deposited on silicon substrates at the temperature in the range 50–600 °C by DC reactive magnetron sputtering. It was found that the anatase and rutile phases co-existed in the TiO₂ films deposited at 450–500 °C, while only the anatase phase existed in those deposited at other temperatures. The mechanism of such a crystallization behavior of TiO₂ films is preliminarily explained.     

A comparison of the medium-range order in glassy GeS2 and Sb2S3

In amorphous (a-) GeS₂ there is only one medium-range order (MRO) dependent X-ray scattering feature, i.e., the ‘first sharp diffraction peak’ (FSDP), whereas in a-Sb₂S₃ all scattering features in the interval 1–2.4 Å⁻¹ are in fact MRO-dependent. The basic element of MRO in a-GeS₂ is a part of a chain of corner bound tetrahedra extracted from the high temperature form of c-GeS₂; in a-Sb₂S₃ it is a part of a crystalline-like (Sb₂S₃)_n band. Ordering of parts of these bands is characterized by a greater interband separation than in the crystal. By contrast with a-GeS₂, the MRO-dependent medium-angle scattering features in a-Sb₂S₃ are less sensitive to fluctuations of the interband (intercluster) ordering distance.     

Homogeneous line width in a zinc borate glass activated by Eu

In this work we report on the temperature depedence of the homogeneous line width (Γ_h) in 4ZnO · 3B₂O₃:Eu³⁺ glass in the region between 30 K and room temperature. The time resolved resonant fluorescence line narrowing technique was applied to the ⁷F₀ ↔ ⁵D₀ transition of Eu³⁺. We obtain that Γ_h follows the commonly found behaviour T² in the whole range of temperature (30–300 K). The Γ_h is comparable to that measured in borate glasses with a small amount of network modifier. This result, together with a linear increase of Γ_h with the excitation energy within the inhomogeneous profile, is indicative of a specific local environment around the Eu³⁺ ion in the zinc borate glass.     

Structural, thermal and dielectric studies on a new solution grown 4-dimethylaminopyridinium dihydrogen phosphate crystal

Single crystals of 4-dimethylaminopyridinium dihydrogen phosphate (DMAPDP) (C₇H₁₃N₂PO₄) were grown by the solvent evaporation method. The three-dimensional structure was solved by the single-crystal X-ray diffraction method which belongs to triclinic crystal system and the molecular arrangements in the crystal were studied. The thermal behaviour was investigated using differential scanning calorimetry (DSC) and no phase transition was identified in the temperature region −150 to 230 °C. The thermal parameters—thermal diffusivity (), thermal effusivity (e), thermal conductivity (K) and heat capacity (C_p) of DMAPDP were measured by an improved photopyroelectric technique at room temperature. Dielectric constant and dielectric loss of the grown crystal were evaluated for the frequency range 1–200 KHz in the temperature region 28–135 °C. The Vicker's hardness was measured as 42.2 for a load of 98.07 mN. The laser induced surface damage threshold of DMAPDP crystal was found to be 4.8 GW/cm² with nanosecond Nd:YAG laser.     

Synthesis of calcium carbonate polymorphs in the presence of polyacrylic acid

Calcium carbonate precipitates are prepared from a solution of CaCl₂ and K₂CO₃ in the presence of polyacrilic acid. The effect of polyacrilic acid incorporation in the [25–80 °C] temperature range on crystal morphologies and CaCO₃ precipitated polymorph concentrations are investigated using scanning electron microscopy and X-ray diffraction quantitative microstructural and phase analysis. Large changes in morphology and phase proportions are observed in the presence of polyacrylic acid, which strongly depend on the solution temperature. While crystallization of vaterite is favoured in the presence of polyacrilic acid up to 50 °C, it is largely destabilized at higher temperatures. Our process also enables the elaboration of particles in the range 10–20 nm.     

Sol–gel synthesis and optical properties of size controlled Indium Arsenide nanocrystals embedded in silica glasses

III–V semiconductor Indium Arsenide (InAs) nanocrystals embedded in silica glasses was synthesized by combining the sol–gel process and heat treatment in H₂ gas. The size of InAs nanocrystals can be easily controlled via changing the In and As content in the starting materials and the heating temperature in a H₂ gas atmosphere. Absorption measurements indicate a blue shift in energy with a reduction on the In and As content in the SiO₂ gel glasses as a result of quantum confinement effects. A near-infrared photoluminescence with peak at 3.40 μm was observed at 6 K under 514.5 nm Ar⁺ laser excitation from InAs nanocrystals embedded in the silica gel glasses.     

Growth of pyroxene-type MnGeO3 and (Mn,Mg)GeO3 crystals by the floating-zone method

Pyroxene-type solid–solution crystals of (Mn_1−xMg_x)GeO₃ with x=0.06, 0.10 and 0.20 have been grown by the floating-zone method. The end member crystal of MnGeO₃ is broken into small pieces by the orthorhombic-to-monoclonic phase transition during cooling after growth. On the other hand, the solid–solution crystals keep the orthorhombic structure between the melting points and room temperature and no crack is formed. The unit cell volumes are significantly decreased with an increase in Mg content.     

Synthesis and characterization of type-II textured tungsten disulfide thin films by vdWR process with Pb interfacial layer as texture promoter

The growth of type-II textured tungsten disulfide (WS₂) thin films by solid state reaction between the spray deposited WO₃ and gaseous sulfur vapors with Pb interfacial layer has been studied. X-ray diffraction (XRD) technique is used to measure the degree of preferred orientation ‘S’ and texture of WS₂ films. Scanning electron microscopy (SEM) and transmission electron microscopy techniques have been used to examine the microstructure and morphology. The electronic structure and chemical composition were studied using X-ray photoelectron spectroscopy (XPS). The use of Pb interfacial layer for the promotion of type-II texture in WS₂ thin films is successfully demonstrated. The presence of (0 0 3 l), (where l=1, 2, 3, …) family of planes in the XRD pattern indicates the strong type-II texture of WS₂ thin films. The crystallites exhibit rhombohedral (3R) structure. The large value of ‘S’ (1086) prompts the high degree of preferred orientation as well. The stratum of crystallites with their basal plane parallel to the substrate surface is seen in the SEM image. The EDS and XPS analyses confirm the tungsten to sulfur atomic ratio as 1:1.75. We purport that Pb interfacial layer enhances type-II texture of WS₂ thin films greatly.     

Growth and spectral properties of Nd:LaVO4 crystal

This paper reports the growth and spectral properties of 3.5 at% Nd³⁺:LaVO₄ crystal with diameter of 20×15 mm² which has been grown by the Czochralski method. The spectral parameters were calculated based on Judd–Ofelt theory. The intensity parameters Ω_λ are: Ω₂=2.102×10⁻²⁰ cm², Ω₄=3.871×10⁻²⁰ cm², Ω₆=3.235×10⁻²⁰ cm². The radiative lifetime τ_r is 209 μs and calculated fluorescence branch ratios are: β₁(0.88μm)=45.2, β₂(1.06μm)=46.7, β₃(1.34μm)=8.1. The measured fluorescence lifetime τ_f is 137 μm and the quantum efficiency η is 65.6%. The absorption band at 808 nm wavelength has an FWHM of 20 nm. The absorption and emission cross sections are 3×10⁻²⁰ and 6.13×10⁻²⁰ cm², respectively.     

Electrical properties of photoanodically generated thin oxide films on n-GaN

The characteristics of photoelectrochemically (PEC) generated gallium oxide films on n-GaN using an 0.002 M KOH electrolyte are described. The chemical composition of the resistive layers was analyzed by Auger electron spectroscopy. The DC and HF characteristics of Al/Ti/PEC-Ga₂O₃ (gallium sesquioxide)/GaN structures were studied with current–voltage and capacitance–voltage measurements, respectively. Under reverse bias we found extremely low leakage currents (<10⁻⁸ Acm⁻² at −15 V) and a very low interface state density; high-temperature operation (up to 166°C tested) motivates the integration of the described dielectric layer forming technique into GaN based device process schemes. Our method may also be employed as gate recess technology.     

A study of Raman spectroscopy and low-temperature specific heat in gel-synthesized amorphous silica

A comparative study of low-temperature specific heat (1.5–25 K), C_p, and low-frequency Raman scattering (<150 cm⁻¹) has been performed in amorphous silica samples synthesized by sol–gel method (xerogels) and thermally densified in a range of densities, from ρ=1250 kgm⁻³ to ρ=2100 kgm⁻³, close to the density of the melt quenched vitreous silica (v-SiO₂). The present analysis concerns the application of the low-energy vibrational dynamics as an appropriate tool for monitoring the progressive thermal densification of silica gels. By comparison with v-SiO₂, the Raman and thermal properties of xerogels with increasing thermal treatment temperature revealed the following important results: (i) the existence of a critical treatment temperature at about 870°C, where a homogeneous viscous sintering produces full densification of the samples. This effect is detected by the observations of the Boson peak in Raman spectra at about 45 cm⁻¹ and of a peak in C_p(T)/T³, very close to those observed in v-SiO₂; (ii) in silica xerogels treated at temperatures less than about 800°C, the low-frequency Raman scattering is greater, with a continuous decreasing unstructured shape, and the Boson peak is not detected in the spectra.     

Absorption spectra of GaN: film characterization by Urbach spectral tail and the effect of electric field

The absorption tail of undoped and Si-doped GaN films was investigated at different temperatures and under applied electric field. It was found that the spectral dependence of logarithm of absorption coefficient is combined of two linear functions: ln[(hν)]=C₁+(hν−E_g)/U₁ for hν<3.42 eV and ln[(hν)]=C₂+(hν−E_g)/U₂ for 3.44<hν<3.5 eV with Urbach energies U₁=400–470 meV and U₂=10–20 meV. The influence of an electric field effect on the absorption spectra follows the Dow and Redfield theory. It was shown that the intrinsic electric field about 10⁵ V/cm exists in our samples. The implemented analysis of the absorption spectra gives the qualitative method of film characterization.     

Characterisation of semiconducting V2O5–Bi2O3–TeO2 glasses through ultrasonic measurements

Tellurite containing vanadate (50−x)V₂O₅–xBi₂O₃–50TeO₂ glasses with different bismuth (x=0, 5, 10, 15, 20 and 25 wt%) contents have been prepared by rapid quenching method. Ultrasonic velocities (both longitudinal and shear) and attenuation (for longitudinal waves only) measurements have been made using a transducer operated at the fundamental frequency of 5 MHz in the temperature range from 150 to 480 K. The elastic moduli, Debye temperature, and Poisson’s ratio have been obtained both as a function of temperature and Bi₂O₃ content. The room temperature study on ultrasonic velocities, attenuation, elastic moduli, Poisson’s ratio, Debye temperature and glass transition temperature show the absence of any anomalies with addition of Bi₂O₃ content. The observed results confirm that the addition of Bi₂O₃ modifier changes the rigid formula character of TeO₂ to a matrix of regular TeO₃ and ionic behaviour bonds (NBOs). A monotonic decrease in velocities and elastic moduli, and an increase in attenuation and acoustic loss as a function of temperature in all the glass samples reveal the loose packing structure, which is attributed to the instability of TeO₄ trigonal bipyramid units in the network as temperature increases. It is also inferred that the glasses with low Bi₂O₃ content are more stable than with high Bi₂O₃ content.     

Growth and spectral properties of Nd-doped Sr3Y(BO3)3 crystal

A new crystal of Nd³⁺:Sr₃Y(BO₃)₃ with dimension up to 25×35 mm² was grown by Czochralski method. Absorption and emission spectra of Nd³⁺: Sr₃Y(BO₃)₃ were investigated . The absorption band at 807 nm has a FWHM of 18 nm. The absorption and emission cross sections are 2.17×10⁻²⁰ cm² at 807 nm and 1.88×10⁻¹⁹ cm² at 1060 nm, respectively. The luminescence lifetime τ_f is 73 μs at room temperature     

Crystal growth of Ce: PrF3 by micro-pulling-down method

Micro-pulling-down (μ-PD) growth apparatus was modified for fluoride crystals. PrF₃ was grown with various concentrations of Ce³⁺ from 0–100%. The crystals were transparent and colorless (CeF₃) or greenish and 3 mm in diameter and 15–50 mm in length. Neither visible inclusions nor cracks were observed. Radioluminescence spectra and decay kinetics were measured for the sample set at room temperature. In comparison to the Czochralski or Bridgman method, the μ-PD method allows to produce single crystalline material in a faster thus more economic way. Once it is established for the fluoride crystals, it is an efficient tool for exploring the field of new functional fluorides.     

Correlation between interfacial structure and c-axis-orientation of LiNbO3 films grown on Si and SiO2 by electron cyclotron resonance plasma sputtering

Thin films of crystalline lithium niobate (LN) grown on Si(1 0 0) and SiO₂ substrates by electron cyclotron resonance plasma sputtering exhibit distinct interfacial structures that strongly affect the orientation of respective films. Growth at 460–600 °C on the Si(1 0 0) surface produced columnar domains of LiNbO₃ with well-oriented c-axes, i.e., normal to the surface. When the SiO₂ substrate was similarly exposed to plasma at temperatures above 500 °C, however, increased diffusion of Li and Nb atoms into the SiO₂ film was seen and this led to an LN–SiO₂ alloy interface in which crystal-axis orientations were randomized. This problem was solved by solid-phase crystallization of the deposited film of amorphous LN; the degree of c-axis orientation was then immune to the choice of substrate material.