薄膜热处理对ZnO薄膜晶体管性能的提高

制备了两种以SiO2为绝缘层的底栅ZnO薄膜晶体管,分别以未退火和退火处理的ZnO薄膜作为有源层.与未退火处理的ZnO薄膜晶体管相比,退火处理的ZnO薄膜晶体管的饱和迁移率由2.3 cm2/(V·s)增大至3.12 cm2/(V·s),阈值电压由20.8V减小至9.9V,亚阈值摆幅由2.6 V/dec减小至1.9 V/...     

ZnO基紫外探测器研究进展

近年来,直接带隙宽禁带半导体ZnO（3.37 eV）以其优越的光电特性而成为紫外探测领域研究中的新热点.文章介绍了不同类型的ZnO基紫外光敏探测器的结构和性能,并对ZnO基紫外光敏探测器的最新研究进展和应用前景进行探讨和展望.     

基于高阻ZnO薄膜的光电导型紫外探测器

本文通过射频磁控溅射法在玻璃衬底上沉积一层ZnO薄膜, 制备了Al-ZnO-Al 结构光电导型紫外探测器件, 并在室温下测试了所制备器件的暗场特性及其对紫外线的响应特性. 暗场条件下器件电流特性测试结果表明所制备的ZnO薄膜电阻率达到了3.71×10⁹ Ω · cm, 是一种高阻薄膜. 在波长365 nm, 光强303 μW/cm²的紫外线照射下, 薄膜的电阻率为7.20×10⁶ Ω · cm, 探测器明暗电流比达到了516. 40 V偏置电压条件下周期性开关紫外线照时, 探测器的上升和下降时间分别为199 ms和217 ms, 响应速度快且重复性好, 并利用ZnO半导体表面复合慢过程和体复合快过程对瞬态响应过程进行了理论拟合分析. 本文研究结果表明, 高阻ZnO薄膜紫外探测器具有良好的紫外光电响应特性.     

多层栅介质层有机薄膜晶体管的存储与光响应特性

在真空室内一次性制备了具有多层栅介质层结构的有机薄膜晶体管(OTFTs).结果表明,制备的OTFTs具有电控开关、存储和光敏多重功能特性.分析认为,存储特性归功于器件的结构,采用了分离的CaF2纳米粒子岛作为电荷俘获中心.在光照环境下,观察到了两种不同类型的光响应特性.快速的光响应来自于有源层吸收了能量大于带隙的光子所...     

ZnO 紫外探测器的研究

利用水热法生长的N型优质ZnO晶体材料蒸镀了Au、Ag、Al金属,制备出金属-半导体-金属型(MSM)ZnO紫外探测器,测试了五种接触类型的ZnO紫外探测器(Au-ZnO-Au、Ag-ZnO-Ag、Au-ZnO-Al、Ag-ZnO-Al、Al-ZnO-Al)在365nm紫外光光照前后的I-V特性曲线。实验表明Au-ZnO-Au 型、Ag-ZnO-Ag型的探测器的光电流是暗电流的100 万倍,因此,Au-ZnO-Au型、Ag-ZnO-Ag型的ZnO紫外探测器性能比Au-ZnO-Al、Ag-ZnO-Al、Al-ZnO-Al型的优越。ZnO材料的电阻率对ZnO紫外探测器的光电流有较大的影响。在相同偏压下,电阻率越大,探测器的光电流越小。ZnO ultraviolet(UV) detectors with Metal-Semiconductor-Metal(MSM) structure were fabricated by the vacuum evaporation of Au, Ag, and Al on the n-type ZnO single crystal, which was grown with hydrothermal synthesis method. Five types of MSM ZnO detectors(Au-ZnO-Au, Ag-ZnO-Ag, Au-ZnO-Al, Ag-ZnO-Al,Al-ZnO-Al) were illuminated with 365 nm UV light respectively, and their corresponding I-V(Current-Voltage) characteristics were measured. The UV photocurrent values for Au-ZnO-Au and Ag-ZnO-Ag detectors were 1x106 times than their dark current values, and these facts imply that the Au-ZnO-Au and Ag-ZnO-Ag detectors were rather good UV detectors compared to Au-ZnO-Al, Ag-ZnO-Al, Al-ZnO-Al detectors. The photocurrent of the MSM ZnO detectors was also sensitive to the cubic resistance of the ZnO crystal. And it’s found that the higher resistance rate the ZnO crystal the smaller photocurrent value the detector under the same working voltage.     

纳米微晶结构ZnO及其紫外激光

本文介绍了近年来研制Ⅱ Ⅵ族半导体激光器的一个新的途径———ZnO的纳米微晶结构。它分为两大类别 :即六角柱形蜂巢状结构和粉末状颗粒结构。都已在近紫外波段实现了室温下光泵激发的受激发射。它将是继Ⅱ Ⅵ族硒化物和Ⅲ Ⅴ族氮化物之后的新型半导体激光器材料。     

新型半导体激光器——ZnO紫外激光器

最近人们发现在室温下ZnO薄膜能产生强烈的光受激辐射,这表明此种材料可用于制造紫外光半导体激光器,此种激光器在光信息存在贮上有广泛应用。文章介绍了最近几年来用不同方法制备的ZnO薄膜的光受激辐射的研究进展。     

紫外像增强器光谱响应特性测量方法研究

为了能及时测量自制紫外像增强器的光谱响应特性，设计了一套简便的测量紫外像增强器光谱响应的系统。该系统由专用光源室、光栅光谱仪、直流稳压电源、皮安电流计4部分构成。用光栅光谱仪配套软件直接读出光源每个波长对应的辐射功率；用皮安电流计直接测量出各个波长的光照射光阴极时光阴极产生的光电流，然后求出这2个比值并用Microsoft Excel 2003进行处理，得到光电流与波长变化的曲线，即相对光谱响应曲线。从曲线可以看出，该紫外像增强器的光谱响应范围为200nm～340nm，峰值响应在270nm附近，表明该紫外像增强器具有日盲特性。测试结果表明：系统不确定度＜10%。     

ZnO基紫外探测器研究进展

近年来，直接带隙宽禁带半导体ZnO（3．37eV）以其优越的光电特性而成为紫外探测领域研究中的新热点。文章介绍了不同类型的ZnO基紫外光敏探测器的结构和性能，并对ZnO基紫外光敏探测器的最新研究进展和应用前景进行探讨和展望。     

MSM结构ZnO紫外探测器的制备与性质

采用射频磁控溅射在石英衬底上制备了c轴择优取向的ZnO薄膜,利用蚀刻技术制备了MSM结构的光导型紫外探测器。在3V偏压下,器件的暗电流小于250nA,光响应峰值在370nm,响应度是0.34A/W。其紫外(360nm)与可见光(420nm)的抑制比为4个数量级。器件的光响应时间上沿仅为20ns。     

Numerical study on the dependence of ZnO thin-film transistor characteristics on grain boundary position

The dependence of transistor characteristics on grain boundary(GB) position in short-channel ZnO thin film transistors(TFTs) has been investigated using two-dimensional numerical simulations.To simulate the device accurately,both tail states and deep-level states are taken into consideration.It is shown that both the transfer and output characteristics of ZnO TFTs change dramatically with varying GB position,which is different from polycrystalline Si(poly-Si) TFTs.By analysing the mechanism of the carrier transportation in the device,it is revealed that the dependence is derived from the degrees of carrier concentration descent and mobility variation with GB position.     

室温下Pr0.7Ca0.3MnO3薄膜的瞬态光响应特性

在室温下利用波长532nm，脉冲宽度7ns的纳秒脉冲激光研究了不同电压和激光能量密度作用下Pr_0.7Ca_0.3MnO₃薄膜的瞬态光响应特性.在激光能量密度为275.16mJ/cm²时，其最大电阻变化率达到92.3%，响应时间约36ns.室温下电压变化对薄膜的光响应特性影响不大，而诱导光能量密度的影响则很明显，能量密度越大，电阻变化越大，响应时间越短，并且电阻变化和响应时间均与激光能量密度呈非线性关系.这种光响应来源于薄膜中的光致非稳态绝缘体-金属相变，有望在新型光电器件上获得应用.     

氧化锌碳纤维复合结构制备及其紫外光响应性能研究

利用预处理的碳纤维为模板,在其表面磁控溅射氧化锌种子层,再通过水热法生长出氧化锌纳米棒,形成刷子状复合结构。轴心的碳纤维增强了材料的导电性能,同时该结构又具有较高的比表面积。将单根氧化锌/碳纤维转移到间距为180μm的金叉指电极上构建紫外光探测器,在325 nm激光照射下,该器件显示出约200倍的光电流增益,且具有良好的稳定性和光谱选择性。文中同时对响应机理进行了讨论。     

Positive gate-bias temperature instability of ZnO thin-film transistor

The positive gate-bias temperature instability of a radio frequency （RF） sputtered ZnO thin-film transistor （ZnO TFT） is investigated. Under positive gate-bias stress, the saturation drain current and OFF-state current decrease, and the threshold voltage shifts toward the positive direction. The stress amplitude and stress temperature are considered as important factors in threshold-voltage instability, and the time dependences of threshold voltage shift under various bias temperature stress conditions could be described by a stretched-exponential equation. Based on the analysis of hysteresis behaviors in current- voltage and capacitance-voltage characteristics before and after the gate-bias stress, it can be clarified that the threshold- voltage shift is predominantly attributed to the trapping of negative charge carriers in the defect states located at the gate- dielectric/channel interface.     

铟镓锌氧薄膜晶体管的悬浮栅效应研究

为了避免光照对铟镓锌氧薄膜晶体管(InGaZnO thin film transistors,IGZO TFTs)电学特性的影响,IGZO TFT要增加遮光金属层.本文研究了遮光金属栅极悬浮时,IGZO TFT的输出特性.采用器件数值计算工具TCAD(technology computer-aided design)分析了IGZO层与栅介质层界面处电势分布,证实了悬浮栅(floating gate,FG)IGZO TFT输出曲线的不饱和现象是由悬浮栅与TFT漏端的电容耦合造成.基于等效电容的电压分配方法,提出了悬浮栅IGZO TFT电流的一阶模型.TCAD数值分析及一阶物理模型结果与测试具有较高程度的符合,较完整地解释了悬浮栅IGZO TFT的电学特性.     

Wavy channel thin film transistor architecture for area efficient,high performance and low power displays

We demonstrate a new thin film transistor (TFT) architecture that allows expansion of the device width using continuous fin features – termed as wavy channel (WC) architecture. This architecture allows expansion of transistor width in a direction perpendicular to the substrate, thus not consuming extra chip area, achieving area efficiency. The devices have shown for a 13% increase in the device width resulting in a maximum 2.5× increase in ‘ON’ current value of the WCTFT, when compared to planar devices consuming the same chip area, while using atomic layer deposition based zinc oxide (ZnO) as the channel material. The WCTFT devices also maintain similar ‘OFF’ current value, ～100 pA, when compared to planar devices, thus not compromising on power consumption for performance which usually happens with larger width devices. This work offers an interesting opportunity to use WCTFTs as backplane circuitry for large‐area high‐resolution display applications. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

ZnO/Ag/ZnO多层结构薄膜的光电性质

通过磁控溅射方法生长了不同银层厚度的ZnO/Ag/ZnO多层结构的薄膜,并对其形貌、光吸收谱、光致发光和光响应特性进行了比较研究.结果表明ZnO薄膜中银薄层的加入使得光致发光的强度增强.银层厚度为6 nm样品制成的器件在350 nm处的光响应度为0.06 A/W,相对于ZnO薄膜提高了一个数量级.而当银层厚度达到15 ...     

Boron doped ZnO thin films fabricated by RF-magnetron sputtering

By using the radio frequency-magnetron sputtering (RF-MS) method, both pure ZnO and boron doped ZnO (ZnO:B) thin films were deposited on glass substrates at ambient temperature and then annealed at 450 °C for 2 h in air. It is found that both ZnO and ZnO:B thin films have wurtzite structure of ZnO with (0 0 2) preferred orientation and high average optical transmission (≥80%). Compared with the resistivity of 6.3 × 10² Ω cm for ZnO film, both as-deposited and annealed ZnO:B films exhibit much lower resistivity of 9.2 × 10⁻³ Ω cm and 7.5 × 10⁻³ Ω cm, respectively, due to increase in the carrier concentration. Furthermore, the optical band gaps of 3.38 eV and 3.42 eV for as-deposited and annealed ZnO:B films are broader than that of 3.35 eV for ZnO film. The first-principles calculations show that in ZnO:B thin films not only the band gap becomes narrower but also the Fermi level shifts up into the conduction band with respect to the pure ZnO film. These are consistent with their lower resistivities and suggest that in the process of annealing some substituted B in the lattice change into interstitial B because of its smaller ion radius and this transformation widens the optical band gap of ZnO:B thin film.     

ZnO基紫外探测器的制作与研究

利用新型的等离子体辅助金属有机化学气相沉积(P-MOCVD)系统在蓝宝石、硅等衬底上生长出具有单一c轴取向、高阻的ZnO薄膜,利用添加的等离子体发生装置,进行氮掺杂获得高阻ZnO薄膜。利用ZnO的宽禁带与高光电导特性,结合MSM(金属-半导体-金属)结构器件响应度高、速度快、随偏压变化小、工艺简单、易于单片集成等优点,制作了ZnO基紫外探测器,器件规格为80 μm×100μm,电极为叉指式电极。测试中采用500 W的氙灯做测试光源,探测器的Ⅰ-Ⅴ特性曲线显示;正向偏压下探测器的暗电流及光照电流与外加偏压呈线性增长。不同波长下的响应曲线显示:探测器对紫外波段有响应,响应峰值在375nm附近。     

Double‐layer channel structure based ZnO thin‐film transistor grown by atomic layer deposition

A double channel structure has been used by depositing a thin amorphous‐AlZnO (a‐AZO) layer grown by atomic layer deposition between a ZnO channel and a gate dielectric to enhance the electrical stability. The effect of the a‐AZO layer on the electrical stability of a‐AZO/ZnO thin‐film transistors (TFTs) has been investigated under positive gate bias and temperature stress test. The use of the a‐AZO layer with 5 nm thickness resulted in enhanced subthreshold swing and decreased V_th shift under positive gate bias/temperature stress. In addition, the falling rate of the oxide TFT using a‐AZO/ ZnO double channel had a larger value (0.35 eV/V) than that of pure ZnO TFT (0.24 eV/V). These results suggest that the interface trap density between dielectric and channel was reduced by inserting a‐AZO layer at the interface between the channel and the gate insulator, compared with pure ZnO channel. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)