SIMP钢中H对He热解吸行为的影响研究

为了初步理解核用结构材料中H对He行为的影响,以He离子单独辐照和He和H离子连续辐照作为对比,利用热释放谱(TDS)、透射电子显微镜(TEM)和扫描电子显微镜(SEM)研究了SIMP中H对He的热解吸和滞留行为的影响。TDS结果表明:He释放的主峰主要出现在1 198~1 222 K之间,对应于气泡的迁移释放机制。相对于He单独辐照,H的附加辐照使得He的释放峰向低温移动,且释放量增大。即H促进了He的热解吸。另外,H对He热解吸的促进作用与H的辐照剂量有关。当H注入的峰值浓度(原子分数)从5%增加到50%时,这种促进作用有所减弱。结合TEM和SEM结果发现:H的存在促进了TDS加热过程中材料表面的起泡行为,从而加速了He以气泡迁移机制释放的过程。     

Electronic structure of light emitting centers in Er doped Si

Ab-initio calculations are carried out for the Er-related electrically active centers in Si. Our proposed microscopic model is consistent with photoluminescence measurements on Si:Er and Si:Er:O samples. For isolated Er, the tetrahedral interstitial site is the stable configuration, being related to the photoluminescence lines in Si:Er. Several configurations containing oxygen and fluorine atoms, surrounding the Er impurities, are proposed to simulate the effects of co-implantation. The results suggest that six oxygen atoms around substitutional Er can stabilize the center, which can be related to the strong photoluminescence lines in Si:Er:O samples. On the other hand, no configuration containing fluorine atoms could explain the stronger photoluminescence lines resulting from fluorine co-implantation. Received: 9 September 2002 / Accepted: 12 September 2002 / Published online: 17 December 2002 RID="*" ID="*"Corresponding author. Fax: +55-11/3091-5585, E-mail: jjusto@lme.usp.br     

环境气体种类对激光烧蚀粒子速度劈裂的影响

采用蒙特-卡罗(Monte Carlo)方法, 模拟了激光烧蚀粒子输运动力学过程, 在环境气体压强为100 Pa的情况下, 研究了环境气体种类(He, Ne, Ar和假想气体等)对烧蚀粒子速度劈裂的影响. 研究结果表明, 在四种环境气体中传输的烧蚀粒子均出现了速度劈裂现象, 形成速度劈裂所需时间按He, Ne, 假想气体和Ar的次序减小. 还研究了环境气体分子的质量和半径对烧蚀粒子速度劈裂的影响, 形成速度劈裂所需时间随环境气体分子半径(或质量)增大而减小. 在假想气体中, 两速度峰强度相等时的强度最小. 结合欠阻尼振荡模型和惯性流体模型, 对劈裂的形成时间进行了解释. 所得结论可为进一步定量研究纳米晶粒生长机理提供基础.     

Er^3+,Cr^3+共掺杂BaAl2Si2O8荧光粉的发光性质及能量传递

利用高温固相法合成BaAl2Si2O8:Cr^3+,Er^3+系列荧光粉,研究了Cr^3+和Er^3+掺杂对BaAl2Si2O8材料发光特性的影响.BaAl2Si2O8:Er^3+荧光样品在393 nm激发波长下只呈现出峰值为550 nm的绿色荧光,来源于2H11/2→4I15/2和4S3/2→4I15/2跃迁的叠加.BaAl2Si2O8:Cr^3+荧光样品在550 nm激发波长下呈现峰值为694 nm的红色荧光,来源于2E→4A2的跃迁.在共掺杂样品BaAl2Si2O8:Cr^3+,Er^3+中,用Cr^3+激发峰的凹槽处380 nm作为激发光,得到的发射峰不仅有Er^3+的发射峰位,还有Cr^3+的发射峰位,说明两个离子之间可能存在辐射能量传递;对共掺杂BaAl2Si2O8:1%Cr^3+,x%Er^3+样品的荧光光谱进行测试,随着x的增加,Cr^3+的激发和发射光谱强度均有所增加,并且当x=0.5时,光谱强度是原来的4倍.另外,当固定Cr^3+的浓度时,随着Er^3+的浓度增加,Cr^3+的荧光寿命逐渐增加;当固定Er^3+的浓度时,随着Cr^3+的浓度增加,Er^3+的荧光寿命逐渐减小.这些现象表明了Er^3+和Cr^3+之间存在共振能量传递,通过理论计算得到Er^3+和Cr^3+之间的能量临界距离为4.5 nm,属于电偶极-电偶极相互作用.     

The effects of Xe irradiation on He and H co-implanted Si

A combination of X-ray diffraction, cross-sectional transmission electron microscopy (XTEM), and Raman spectroscopy was used to study the effects of irradiation with swift heavy ions on helium and hydrogen co-implanted silicon.<100>-oriented silicon wafers were co-implanted with 30 keV helium to a dose of 3×10¹⁶He⁺/cm² and 24 keV protons to a dose of 2×10¹⁶ H⁺/cm². Moreover, selected helium and hydrogen co-implanted Si wafers were irradiated with 94 MeV xenon. After He and H co-implantation and Xe-irradiation, the wafers were annealed at a temperature of 673 K for 30 min. The damage region of the wafers was examined by the XTEM analysis. The results reveal that most of the platelets are aligned parallel to the (100) plane in the He and H co-implanted Si. However, majority of the platelets lie in<texlscub>111</texlscub>planes after Xe irradiation. Blisters do not occur on the sample surface after Xe irradiation. Raman results reveal that the intensities of both SiH₂ and V₂H₆ modes increase with the increase in the dose of Xe. A possible explanation is that strong electronic excitation during Xe irradiation produces annealing effect, which reduces both lattice damage and the out-of-plane tensile strain.     

New interpretation of the angular-resolved photoemission measurements from cleaved silicon

A new interpretation of a recently observed surface state using angular-resolved photoemission spectroscopy near the top of the valence band on the cleaved (111) face of Si has been provided. We are able to explain satisfactorily the observed anisotropy, dispersion and splitting of this peak by examining the electronic structure of a (2 × 1) reconstructed surface.     

氮氟复合注入对注氧隔离SOI材料埋氧层内固定正电荷密度的影响

为了抑制埋层注氮导致的埋层内正电荷密度的上升, 本文采用氮氟复合注入方式, 向先行注氮的埋层进行了注氮之后的氟离子注入, 并经适当的退火, 对埋层进行改性. 利用高频电容-电压 (C-V) 表征技术, 对复合注入后的埋层进行了正电荷密度的表征. 结果表明, 在大多数情况下, 氮氟复合注入能够有效地降低注氮埋层内的正电荷密度, 且其降低的程度与注氮后的退火时间密切相关. 分析认为, 注氟导致注氮埋层内的正电荷密度降低的原因是在埋层中引入了与氟相关的电子陷阱. 另外, 实验还观察到, 在个别情况下, 氮氟复合注入引起了埋层内正电荷密度的进一步上升. 结合测量结果, 讨论分析了该现象产生的原因. 关键词： 绝缘体上硅(SOI) 材料 注氮 注氟 埋氧层正电荷密度     

Charge transport in the normal metal/diffusive ferromagnet/s-wave superconductor junctions

Charge transport in the normal metal/insulator/diffusive ferromagnet/insulator/s-wave superconductor (N/I/DF/I/S) junctions is studied for various situations solving the Usadel equation under the Nazarov's generalized boundary condition. Conductance of the junction is calculated by changing the magnitude of the resistance in DF, Thouless energy in DF, the exchange field in DF, the transparencies of the insulating barriers. We have found a new broad peak around zero voltage as well as zero bias conductance peak splitting and dip splitting.     

GaAs/Al0.23Ga0.77As双量子阱的带边不连续性和阱间耦合

本文报道在300和77K对一组具有不同垒宽L_b0.23Ga_0.77As双量子阱样品的光调制反射谱(PR)的研究结果。除观察到11H,11L和22H等容许跃迁外,同时还识别一个从Al_0.23Ga_0.77As价带顶至量子阱第一电子束缚能级的跃迁,另一个从量子阱第一轻空穴束缚能级至Al_0.23Ga_0.77As导带底的跃迁。利用这些跃迁确定导带边不连续性为0.63。对L_{b关键词：}     

硅化物薄膜的质子弹性散射分析

本文报道了一种分析硅衬底上SiN_x和SiO_x的N/Si和O/Si含量比的简便方法。用1.95MeV质子弹性散射测量薄膜(9000—15000)的组分比和厚度,实验值与2.1MeVHe的背散射分析(RBS)结果符合得很好;对微米以上厚度样品,MeVH束分析更为有利,这是与He束背散射分析互补的一种方法。文中给出了实验结果,并进行了讨论。 关键词：     

Superheavy hydrogen (5)H

Experimental search for (5)H using a secondary beam of (6)He has been performed. The transfer reaction (1)H((6)He,(2)He)(5)H was studied by detecting two protons emitted from the decay of (2)He. A peak consistent with a (5)H resonance at 1.7+/-0.3 MeV above the n+n+t threshold was observed, with a width of 1.9+/-0.4 MeV. The angular distribution of the (1)H((6)He,(2)He)(5)H reaction was measured as well as the energy correlation of the two protons.     

A^z^＋—H（1s）碰撞中的电荷交换和电离

本文采用与经典轨道蒙特卡罗方法（ＣＴＭＣ）不同的方法，利用精确的量子力学氢原子的波函数，抽样氢原子中电子的位置及动量分布，而不是用经典轨道抽样的办法。仔细计算了Ｈ＾＋，Ｈｅ＾２＾＋，Ｌｉ＾３＾＋，Ｃ＾６＾＋，Ｏ＾８＾＋，Ｎｅ＾１＾０＾＋，Ｓｉ＾１＾４＾＋等全裸离子与氢原子碰撞过程中的电子俘获及电离截面，并给出被俘获后的电子在入射裸离子中的壳层分布图象，实际计算表明，其结果是令人满意的，特别是俘获截     

气体吸附对硅锗异质结纳米线电子结构与光学性质的影响

基于密度泛函理论体系下的广义梯度近似(GGA),采用第一性原理方法探讨了沿[112]晶向的硅锗异质结纳米线作为气体传感器检测CO,CO₂和Cl₂的能力,着重计算了其吸附气体分子前后的吸附能、能带结构与光学性质.几何结构优化计算表明：不同硅锗组分的[112]晶向的硅锗纳米线对CO,CO₂和Cl₂分子的吸附能的绝对值在0.001 eV至1.36 eV之间,其中Si₂₄Ge₃₆H₃₂对CO₂气体的吸附能最大,气敏性能最好.能带结构计算表明：吸附CO和CO₂分子的[112]晶向硅锗纳米线能带的简并度明显减小,带隙变化较小;而吸附Cl₂分子后的价带顶与导带底之间产生了杂质能级使其带隙减小.光学性质计算表明：Si₂₄Ge₃₆H₃₂纳米线吸附CO, CO₂和Cl₂分子后的光学...     

Si(111)表面吸附氢会形成双氢化相吗?

用热脱附谱研究了原子氢在Si(111)表面的吸附,得到了两个吸附状态。从脱附谱特性同Si(100)/H系统的相似性,可以推测氢在Si(111)表面也存在单氢化相和双氢化相两种状态。单氢化相主要是顶位吸附所形成的,而双氢化相的形成则可以用McRae所提出的Si(111)(7×7)表面原子结构的三角形二聚物层错模型来解释。 关键词：     

X-ray photoelectron spectroscopy characterization of oxidated Si particles formed by pulsed ion-beam ablation

X-ray photoelectron spectroscopy (XPS) is used to probe oxidation states of Si species in particles deposited using a pulsed ion-beam evaporation method. The effects of He ambient gas, ion beam intensity and post-treatments on the oxides composition and oxygen content have been studied. It is found that presence of He ambient gas led to a profound oxidation of Si species as compared to that prepared in vacuum at the same ion-beam ablation energy, i.e. both increase of SiO₂ component and oxygen concentration in the oxides coverage. The deposition in He also resulted in an increase of oxygen concentration even under lower ablation intensity, but a higher Si suboxides concentration. It is revealed that the reaction between Si and O was controlled by the ion beam intensity (temperature of Si plasma) and the gas ambient (collision probability of Si and O species). The difference in structure of oxide layers for samples obtained under various conditions is discussed based on the results of XPS analyses.     

Tunneling Conductance and Magnetoresistance in Ferromagnet/Ferromagnet/d-Wave Superconductor Double Tunnel Junctions

The tunneling conductance and tunneling magnetoresistance (TMR) are investigated in ferromagnet/insulator/ferromagnet/insulator/d-wave superconductor (FM/I/FM/I/d-wave SC) structures by applying an extended Blonder-Tinkham-Klapwijk (BTK) approach. We study the effects of the exchange splitting in the FM, the magnetic impurity scattering in the thin insulator interface of FM/I/FM, and noncollinear magnetizations in adjacent magnetic layers on the TMR. It is shown (1) that the tunneling conductance and TMR exhibit amplitude-varying oscillating behavior with exchange splitting, (2) that with the presence of spin-flip scattering in insulator interface of FM/I/FM, the TMR can be dramatically enhanced, and (3) that the TMR depends strongly on the angle between the magnetization of two FMs.     

Lu2Si2O7∶Ce纳米晶的溶胶-凝胶法合成和闪烁性能

采用溶胶-凝胶法制备了Lu2Si2O7∶Ce纳米晶,利用X射线衍射(XRD)、扫描电镜(SEM)、荧光光谱仪、X射线激发发射谱仪对制备的Lu2Si2O7∶Ce纳米晶的晶相结构、微观形貌和光学性能进行了表征。结果表明,溶胶-凝胶法制备的Lu2Si2O7∶Ce前驱体在煅烧温度为1000℃时开始晶化,晶粒尺寸随着煅烧温度的升高而变大,1200℃煅烧2 h后的晶体颗粒均匀,分散性最优,平均晶粒尺寸约为28.9 nm,呈近球形;Lu2Si2O7∶Ce纳米晶的紫外吸收谱存在峰位分别为304 nm和350 nm两个吸收峰,源自于Ce^3+离子的4f→5d跃迁;光致发射谱和X射线激发发射谱都表现为典型的非对称双峰结构,归属于Ce^3+离子的5d^1→2F5/2和5d^1→2F7/2跃迁,Ce^3+离子的最佳掺杂浓度约为1%;荧光衰减时间约为37.2 ns,可满足高时间分辨X射线探测需要。     

初始溅射粒子密度对烧蚀粒子密度和速度分布的影响

采用蒙特-卡罗(Monte Carlo)模拟方法,研究了初始溅射粒子密度对其传输中的密度和速度分布以及环境气体密度分布的影响.结果表明,随着初始溅射粒子密度增大,烧蚀粒子和环境气体高密度峰的交叠区离开靶的最大距离减小,被衬底反弹后,距靶的最小距离减小,烧蚀粒子的速度分布随初始溅射粒子密度增大而变宽,当初始溅射粒子密度大于8.33×10²⁵ m^-3时,出现速度劈裂现象.所得结论为进一步定量研究纳米晶粒的成核机理提供了基础. 关键词： Monte Carlo模拟 烧蚀粒子 密度分布 速度分布     

The glow curve structure for the LiF:Mg,Cu,Na,Si TL detector with dopants concentrations and sintering temperatures

The glow curve structures for LiF:Mg,Cu,Na,Si TL detectors with various dopant concentrations and sintering temperatures were investigated for the improvement of the glow curve structure and sensitivity of the TL detector. The dopant concentrations were varied over the following ranges: Mg (0–0.25 mol%), Cu (0–0.07 mol%), Na and Si (0–1.5 mol%). With increasing Cu concentration, the intensity of the main peak was intensified and reached a maximum at a concentration of 0.05 mol%. The high-temperature peak was reduced. The dependency of the main peak intensity on the Mg concentration exhibits a sharp maximum at 0.2 mol%. The intensity of the high-temperature peak tends to rise slightly with increasing Mg concentration. It was found that the optimum concentrations of the dopants in the LiF:Mg,Cu,Na,Si TL material are Mg: 0.2 mol%, Cu: 0.05 mol%, Na and Si: 0.9 mol%. The dependency of the main peak intensity on sintering temperature exhibits a very sharp maximum at 830°C. The high-temperature peak was rapidly reduced after 825°C.