1MeVSi~＋衬底加温注入Al＿（0．3）Ga＿（0．7）As／GaAs超晶格和GaAs的晶格损伤研究

用卢瑟福背散射／沟道技术研究了１ＭｅＶＳｉ￣＋在衬底加温和室温下以不同剂量注入Ａｌ＿（０．３）Ｇ＿（０．７）Ａｓ／ＧａＡｓ超晶格和ＧａＡｓ后的晶格损伤。在衬底加温下，观察到Ａｌ＿（０．３）Ｇａ＿（０．７）Ａｓ／ＧａＡｓ超晶格和ＧａＡｓ都存在一个动态退火速率与缺陷产生速率相平衡的剂量范围，以及两种速率失去平衡的临界剂量。超晶格比ＧａＡｓ更难以损伤，并且它的两种速率失去平衡的临界剂量也大于ＧａＡｓ中的相应临界剂量，用热尖峰与碰撞模型解释了晶格损伤积累与注入剂量和衬底温度的关系。用ＣＮＤＯ／２量子化学方法计算了ＧａＡｓ和Ａｌ＿ｘＧａ＿（１－ｘ）Ａｓ中化学键的相对强度，并根据计算结果解释了注入过程中Ａｌ＿（０．３）Ｇａ＿（０．７）Ａｓ／ＧａＡｓ超晶格和ＧａＡｓ中晶格损伤程度的差别。     

不同晶向、厚度的超晶格界面的平均键能行为

对三种不同晶面（（１００），（１１０）和（１１１））的超晶格（ＡｌＡｓ）₁（ＧａＡｓ）₁，（ＡｌＡｓ）₃（ＧａＡｓ）₃的电子结构进行了第一性原理的计算，采用冻结势万法系统地分析了在不同的晶向和不同的周期层厚度的情况下，超晶格界面处的电荷转移、平均键能的对齐行为和价带边的不连续性。进一步从第一性原理的数值计算上检验了以平均键能为能量参考的异质界面价带边不连续性的理论计算方法。 关键词：     

浅杂质注入LEC半绝缘GaAs γ射线辐照缺陷

用深能级瞬态谱（ＤＬＴＳ）和恒温电容瞬态等技术研究了浅杂质注入ＬＥＣ半绝缘ＧａＡｓ的γ射线辐照缺陷。在Ｂｅ－Ｓｉ共注的ＬＥＣ半绝缘ＧａＡｓ中，γ射线辐照引入一电子陷阶Ｅ₂，并且大大增强了原有的Ｅ₀₁（０．２９８）和Ｅ₀₂（０．３４１）等缺陷，同时明显地瓦解了原有的少子陷阱Ｈ₀₃。在单纯注Ｓｉ的ＬＥＣ半绝缘ＧａＡｓ中，γ射线辐阳引进了Ｅ＇₀₁（０．２１６），Ｅ＇₀₂（０．３４１），Ｅ＇₂，Ｅ＇₄和Ｅ＇₅（０．６０８）等缺陷。其中Ｅ₀₁和Ｅ＇₀₁是新发现的和γ辐照有关的ＧａＡｓ缺陷。和低阻衬底同质外延ＧａＡｓ相比，Ｂｅ－Ｓｉ共注ＬＥＣ半绝缘ＧａＡｓ具有较低的γ射线辐照缺陷引入率，与此相反，单纯注Ｓｉ的ＬＥＣ半绝缘ＧａＡｓ具有较高的γ射线辐照缺陷的引入率。 关键词：     

应变层半导体超晶格价带边不连续性的第一原理研究

对处于不同应变状态下的超晶格（ＧａＰ）_１（ＧａＡｓ）_１（００１），（ＩｎＰ）_n（ＩｎＡｓ）_n（００１）（ｎ＝１，３）的电子结构进行了从头自洽计算。采用冻结势方法分析了超晶格各分子层的价带顶Ｅ_v和平均键能Ｅ_m的行为，对以Ｅ_m为能量参考的应变层超晶格价带边不连续值计算方法作了较全面的第一原理的数值检验，基于这一方法，本文分别对ＩｎＰ，ＩｎＡｓ，ＧａＰ，ＧａＡ 关键词：     

少子陷阱特性和铍硅共注半绝缘GaAs空穴陷阱

用深能级瞬态谱（ＤＬＴＳ）技术测量了高温退火的Ｂｅ和Ｓｉ共注入的ＬＥＣ半绝缘ＧａＡｓ（无掺杂）。在多子脉冲作用下的Ａｌ／Ｂｅ－Ｓｉ共注ＬＥＣＳＩＧａＡｓ肖特基势垒中，观测到Ｅ₀₁（０．２９８），Ｅ₀₂（０．３４１），Ｅ₀₃（０．５５５）和Ｅ₀₄（０．８２１）等四个电子陷阱以及两个主要的少子（空穴）陷阱Ｈ＇₀₃（０．５４）和Ｈ″₀₃（０．５７）。两少子陷阱的ＤＬＴＳ信号具有若干特点，比如它们的ＤＬＴＳ·峰难于通过增宽脉冲达到最大高度；以及峰的高度强烈地依赖于温度等。这些现象可以用少子陷阱的少子俘获和热发射理论进行合理地解释。鉴于用ＤＬＴＳ技术测量这种陷阱的困难，我们用恒温电容瞬态技术测定它们的空穴表观激活能分别为０．５４和０．５７ｅＶ。它们是新观测到的和Ｂｅ－Ｓｉ共注ＳＩＧａＡｓ有关缺陷。 关键词：     

Gd1-xCaxBa2Cu3O7-y高温超导体压力效应的研究

研究了Ｇｄ_1-xＣａ_xＢａ₂Ｃｕ₃Ｏ_7-y（０．０≤Ｘ≤０．２０）高温超导体在常压和高压下的超导电性在１－３００Ｋ温度范围内，利用Ｂｒｉｄｇｍａｎ对顶砧获得压力达９．０ＧＰａ，测量了（Ｘ＝０．１０，０．１５，０．２０）样品的ｄＴ_c／ｄｐ分别为７．６８，７．８和４．４６Ｋ／ＧＰａ。发现Ｔ_c的压力导数随着ｃａ²⁺含量的增加而下降，分析了氧含量对Ｔ_c和ｄＴ_c／ｄＰ的影响．利用常压下晶格参数精修值和阳离子与氧离子间距随压力的改变，说明ＣｕＯ₂面在超导电性上的作用，用ＣｕＯ₂面之间耦合解释Ｔ_c（Ｐ）曲线的非线性关系。 关键词：     

Pr0.7(Sr1-xCax)0.3MnO3多晶体系中的小极化子性质

采用基于柠檬酸体系的溶胶-凝胶法制备了Pr_0.7（Sr_1-xCa_x）_0.3MnO₃系列的多晶块材, 同时还用脉冲激光沉积技术（PLD）在SrTiO₃（100）衬底上外延生长了同一系列的薄膜, 系统研究了它们的晶格结构和电输运行为. 多晶和薄膜样品都具有正交晶格结构, 电输运行为在居里温度T_Ｃ以上的高温顺磁相都很好 关键词： 0.7（Sr_1-xCa_x）_0.3MnO₃')" href="#">Pr_0.7（Sr_1-xCa_x）_0.3MnO₃ 绝热小极化子模型 双交换作用 Jahn-Teller晶格畸变     

低压-金属有机物汽相外延生长的Ga1-xInxAs/InP激光器中深能级的研究

应用深能级瞬态谱（ＤＬＴｓ）技术详细研究低压－金属有机物汽相外延（ＬＰ－ＭＯＶＰＥ）生长的Ｇａ_０．４７Ｉｎ_０．５３Ａｓ／Ｉｎｐ量子阱、宽接触和质子轰击条形异质结激光器中的深能级。样品的ＤＬＴＳ表明，在宽接触激光器的ｉ－Ｇａ_０．４７Ｉｎ_０．５３Ａｓ有源层里观察到Ｈ１（Ｅ_ｖ＋０．０９ｅＶ）和Ｅ１（Ｅ_ｃ－０．３５ｅＶ)陷阱，它们可能分别与样品生长过程中扩散到ｉ－Ｇａ_{０．４ 关键词：}     

(La0.7Sr0.3MnO3)m(BiFeO3)n超晶格间隔的La0.7Sr0.3MnO3三明治结构制备及表征

采用射频磁控溅射的方法在SrTiO₃（001） 基片上制备了（La_0.7Sr_0.3MnO₃）_m（BiFeO₃）_n超晶格间隔的La_0.7Sr_0.3MnO₃三明治结构.X射线衍射分析证明（La_0.7Sr_0.3MnO_{关键词： 超晶格薄膜 电诱导效应 隧道效应}     

Ga1—xAlxAs外延片有源区Al组份的测定方法

由于ＧａＡｓ与ＡｌＡｓ晶格常数相近，ＧａＡｓ晶格常数为０．５６５３５ｎｍ，ＡｌＡｓ的晶格常数为０．５６６０５ｎｍ，当固熔体中Ａｌ组份ｘ值从０变到１时，晶格常数变化约为０．１５％．因此，在ＧａＡｓ衬底上生长Ｇａ１－ｘＡｌｘＡｓ时，在界面处的失配位错少，...     

高组份Al值的AlxGa1-x As和AlxGa1-x As/GaAs/AlxGa1-xAs/GaAs多层结构的MOCVD生长

用自制常压MOCVD系统,在半绝缘GaAs衬底上生长高Al组份Al_xGa_1-xAs（其x值达0.83）,和Al_xGa_1-xAs/GaAs/Al_xGa_1-xAs/GaAs多层结构,表面镜面光亮。生长层厚度从几十到十几μm可控,测试表明外延层晶格结构完整,x值调节范围宽,非有意掺杂低,高纯GaAs外延层载流子浓度n_300K=1.7×10¹⁵cm^-3,n_77K=1.4×10¹⁵cm^-3,迁移率μ_300K=5900cmcm²/V.S,μ_77K=55500cm²/V.S。用电子探针,俄歇能谱仪测不出非有意掺杂的杂质,各层间界面清晰平直。 对GaAs,AlGaAs生长层表面缺陷,衬底偏角生长温度及其它生长条件也进行了初步探讨。     

Interband transitions and electronic properties of InAs/GaAs quantum dots embedded in AlxGa1−xAs/GaAs modulation-doped heterostructures

Reflection high-energy electron diffraction, atomic force microscopy, transmission electron microscopy, and double-crystal X-ray curves showed that high-quality InAs quantum dot (QD) arrays inserted into GaAs barriers were embedded in an Al_0.3Ga_0.7As/GaAs heterostructure. The temperature-dependent photoluminescence (PL) spectra of the InAs/GaAs QDs showed that the exciton peak corresponding interband transition from the ground electronic subband to the ground heavy-hole subband (E₁-HH₁) was dominantly observed and that the peak position and the full width at half maximum corresponding to the interband transitions of the PL spectrum were dependent on the temperature. The activation energy of the electrons confined in the InAs/GaAs QDs was 115 meV. The electronic subband energy and the energy wave function of the Al_0.3Ga_0.7As/GaAs heterostructures were calculated by using a self-consistent method. The electronic subband energies in the InAs/GaAs QDs were calculated by using a three-dimensional spatial plane wave method, and the value of the calculated (E₁-HH₁) transition in the InAs/GaAs QDs was in reasonable agreement with that obtained from the PL measurement.     

Raman scattering from confined phonons in GaAs/AlGaAs quantum wires

We report on photoluminescence and Raman scattering performed at low temperature (T =  10 K) on GaAs/Al_0.3Ga_0.7As quantum-well wires with effective wire widths ofL =  100.0 and 10.9 nm prepared by molecular beam epitaxial growth followed by holographic patterning, reactive ion etching, and anodic thinning. We find evidence for the existence of longitudinal optical phonon modes confined to the GaAs quantum wire. The observed frequency at ο_L10 =  285.6 cm⁻¹forL =  11.0 nm is in good agreement with that calculated on the basis of the dispersive dielectric continuum theory of Enderleinas applied to the GaAs/Al_0.3Ga_0.7As system. Our results indicate the high crystalline quality of the quantum-well wires fabricated using these techniques.     

Investigation of weak damage in Al0.25Ga0.75As/GaAs by using RBS/C and Raman spectroscopy

The weak damage induced by 0.8 MeV Si ion implantation in the Al_0.25Ga_0.75As films epitaxially grown on GaAs substrates was studied by using Rutherford backscattering spectrometry/channeling (RBS/C) and Raman spectroscopy. RBS/C spectra measured from the implanted samples showed rather low damage level induced by the ion implantation with ion dose from 1×10¹⁴ to 5×10¹⁵ cm⁻². The Raman spectra were measured on these samples. Two kinds of phonon modes, GaAs-like and AlAs-like, are observed, which indicate the existence of multiple phonon vibrational modes in the epitaxial Al_0.25Ga_0.75As films on the GaAs substrate. Compared with the unimplanted sample, the Raman photon peaks for the implanted sample shift gradually to lower energy with the increase of the implantation dose. The strains induced in the implanted layer were also evaluated from the Raman spectra. The result from high resolution double crystal X-ray diffractometry (HRXRD) also verified the evolution of the strains in the implanted layers.     

Dependence of propagation loss on etching depth in Al0.3Ga0.7As/GaAs/Al0.3Ga0.7As strip-loaded type waveguides

Al_0.3Ga_0.7As/GaAs/Al_0.3Ga_0.7As strip-loaded waveguides were fabricated using a broad-beam electron cyclotron resonance (ECR) ion source. It was found that a very smooth etching profile can be obtained by ECR ion etching and the etching rate of Al_0.3Ga_0.7As is 70 nm min^-1. The propagation losses of strip-loaded type III–V compound semiconductor waveguides with various etching depths were studied by the Fabry-Perot cavity method. It was observed that the reflectance at the cleavage increases slightly with etching depth for TE polarization. The propagation loss is measured as 1.5 dB cm^-1 for etching depth of 0.7 m, less than 1 dB cm^-1 for 0.8 m, and 3.5 dB cm^-1 for 1.1 m.     

聚焦Ga+离子束注入方法研制半导体量子线结构

采用聚焦Ga⁺离子束注入方法,在GaAs/Al_0.3Ga_0.7As多量子阱材料上尝试制备半导体量子线。通过低温光致发光谱,测量了量子线的光电特性,并观察了由于沟道效应导致的深层量子阱的光谱蓝移。 关键词：     

Band offsets in In0.15Ga0.85As/ GaAs and In0.15Ga0.85As/Al0.15Ga0.85As studied by photoluminescence and cathodoluminescence

Photoluminescence and cathodoluminescence measurements of strained undoped In_0.15Ga_0.85As/GaAs and In_0.15Ga_0.85As/Al_0.15Ga_0.85As quantum well structures with emission lines attributed to the first electron–first heavy hole and first electron–first light hole excitonic transitions have been analysed theoretically within the eight-band effective mass approximation. For In_0.15Ga_0.85As/GaAs the results are consistent with either type I or type II alignment of the light hole band. In the case of In_0.15Ga_0.85As/Al_0.15Ga_0.85As our results indicate type II alignment for the light hole band and offset ratio ofQ = 0.83.     

Effects of Coulomb interaction in intentionally disordered semiconductor superlattices

The interplay between disorder and electron–electron interaction is studied using measurements of the vertical dc conductivity of intentionally disordered GaAs/Al_0.3Ga_0.7As superlattices. At low temperatures a quasimetallic behavior is observed even for large disorder which is attributed to an inhomogeneous charge distribution reducing the disorder potential. At low doping levels and low temperatures, exchange–correlation interaction leads to an inhomogeneous charge distribution over the wells of ordered superlattices similar to a one-dimensional Wigner lattice.     

Exciton luminescence in In0.3Ga0.7As/GaAs quantum well heterostructures

Emission maxima related to the recombination of excitons (e1–hh1, e1–lh1, e2–hh2, and e2–lh2) were observed in photoluminescence spectra of GaAs/In_0.3Ga_0.7As/GaAs quantum wells. The emission bands due to e1–hh1 and e1–lh1 transitions were found to have a doublet character explained by the exchange interaction of excitons in quantum wells. Emission bands due to radiative E^b–hh1, E^b–lh1 transitions in the buffer GaAs layer are observed in the region of 1.5 eV.     

Hot electron cooling in parabolic and modulation doped quantum wells and doped superlattices

Hot electron cooling in variously structured and doped quantum wells and superlattices has been studied by low temperature steady-state photoluminescence. A parabolic quantum well realized by thickness grading of Al_0.3Ga_0.7As and GaAs epitaxial layers deposited by molecular beam epitaxy with electron level spacings of ∼25 meV did not show increased electron plasma temperatures compared to thick epitaxially deposited GaAs or square quantum wells with electron level spacings greater than the LO phonon energy of GaAs; this implies that mechanisms involving intersubband Δk ≠ 0 transitions and interfacial recombination are dominant in the parabolic structure. Investigations as a function of carrier concentration in modulation-doped quantum wells and n-type superlattices with strong miniband formation indicate that increasing the carrier concentration in either structure above ∼ 5 × 10¹⁷ cm^-3 significantly increases the electron plasma temperatures, even under low light excitation, suggesting that such structures may be suited for high efficiency hot electron photovoltaic and photoelectrochemical cells.