Oriented SrFe12O19 thin films prepared by chemical solution deposition

Thin films of SrFe₁₂O₁₉ (SrM) were prepared from a solution of iron and strontium alkoxides through the chemical solution deposition method on both amorphous (glassy SiO₂), and single crystal substrates (Si(100), Si(111), Ag(111), Al₂O₃(001), MgO(111), MgAl₂O₄(111), SrTiO₃(111)) substrates. The process of crystallization was investigated by means of powder diffraction, atomic force microscopy and scanning electron microscopy. Magnetization measurements, ferromagnetic and nuclear magnetic resonance were used for evaluation of anisotropy in the films. Whilst amorphous substrates enabled growth of randomly oriented SrM phase, use of single crystal substrates resulted in samples with different degree of oriented growth. The most pronounced oriented growth was observed on SrTiO₃(111). A detailed inspection revealed that growth of SrM phase starts through the breakup of initially continuous film into isolated grains with expressive shape anisotropy and hexagonal habit. A continuous film with epitaxial relations to the substrate was produced by repeating recoating and annealing.     

The (100) orientation evolution and temperature-dependent electrical properties of Bi(Zn1/2Ti1/2)O3–PbTiO3 ferroelectric films

The 0.2Bi(Zn_1/2Ti_1/2)O₃–0.8PbTiO₃ (0.2BZT–0.8PT) ferroelectric thin film was successfully fabricated on Pt(111)/Ti/SiO₂/Si substrates by a sol–gel method. The result indicates that the film exhibits the (100) preferred orientation and has a relatively dense and uniform microstructure with a thickness of ~230 nm. The formation mechanism of the oriented films was ascribed to the growth of the (100) oriented PbO layer at ~450 °C during a layer-by-layer crystallization process. Temperature-dependent electrical properties of the 0.2BZT–0.8PT films were investigated, showing that the film has a potential for high temperature applications.     

Microstructure and properties of sol-gel derived Pb(Zr<Subscript>0.3</Subscript>Ti<Subscript>0.7</Subscript>)O<Subscript>3</Subscript> thin films on GaN/sapphire for nanoelectromechanical systems

Highly (111) oriented, phase-pure perovskite Pb(Zr_0.3Ti_0.7)O₃ (or PZT 30/70) thin films were deposited on single-crystal, (0001) wurtzite GaN/sapphire substrates using the sol-gel process and rapid thermal annealing. The phase, crystallinity, and stoichiometry of annealed PZT films were evaluated by X-ray diffraction and Rutherford backscattering spectroscopy. The atomic force microscopy revealed a smooth PZT surface (rms roughness ∼1.5 nm) with striations and undulations possibly influenced by the nature of the underlying GaN surface. The cross-sectional field-emission scanning electron microscopic images indicated a sharper PZT/GaN interface compared to that of sol-gel derived PZT on (111) Pt/TiO₂/SiO₂/(100) Si substrates. The capacitance-voltage (C-V) characteristics for PZT in the Pt/PZT/GaN (metal-ferroelectric-semiconductor or MFS) configuration were evaluated as a function of annealing temperature and applied voltage. The observed C-V hysteresis stemmed from trapped charge at defect sites within PZT. Also, the lower capacitance density (C/A = 0.35 μF/cm², where A is the area of an electrode) and remnant polarization (P _r ∼ 4 μC/cm²) for PZT in the MFS configuration, compared to the values for PZT in the MFM configuration (Pt/PZT/Pt), were attributed to the high depolarization field within PZT.     

Preparation of Ba(Ti,Sn)O<Subscript>3</Subscript> thin films by PVP-assisted sol–gel method and their dielectric properties

Ba(Ti_1−x Sn _x )O₃ (x = 0.10 or 0.15) thin films were deposited on Si(100) and Pt(111)/TiO _x /SiO₂/Si(100) substrates via sol–gel spin-coating. Crack-free thin films could be obtained by single-step deposition, where the thickness was about 0.46 and 0.29 μm at 1000 and 2000 rpm, respectively. Circular delaminated parts 100 μm in diameter, however, tended to appear in thicker films deposited at 1000 rpm. On both kinds of substrates, the films were crystallized between 500 and 600 °C, where the perovskite phase emerged as the primary phase, and the formation of single-phase perovskite was basically achieved between 700–800 °C. The films deposited on Pt(111)/TiO _x /SiO₂/Si(100) substrates, however, tended to have small SnO₂ and BaCO₃ diffraction peaks, which decreased with increasing spinning rate. The dielectric properties were evaluated on the films deposited on Pt(111)/TiO _x /SiO₂/Si(100) substrates at 2000 rpm. The films prepared by single-step depositions had dielectric constants of 350 and 230, and dielectric loss of 0.30 and 0.10 at x = 0.1 and 0.15, respectively. The films prepared by two time deposition had dielectric constants of 450 and 250, and dielectric loss of 0.21 and 0.19 at x = 0.10 and 0.15, respectively.     

Preliminary results on sol-gel processing of 〈100〉 oriented Pb(Mg<Subscript>1/3</Subscript>Nb<Subscript>2/3</Subscript>)O<Subscript>3</Subscript>-PbTiO<Subscript>3</Subscript> thin films using diol-based solutions

A novel sol-gel method is used here for the synthesis of air-stable and precipitate-free diol-based sols of 0.7Pb(Mg_1/3Nb_2/3)O₃-0.3PbTiO₃ (PMN-PT). Sols containing a 15 mol% lead excess have been used for the preparation of PMN-PT thin films. The films were deposited onto (111)Pt/TiO₂/SiO₂/(100)Si substrates, and crystallised in oxygen by Rapid Thermal Processing (RTP), using different temperatures and soaking times. Single perovskite films are obtained when treated at temperatures between 600 and 700°C for 6 s. Those crystallised at other temperatures contain a secondary pyrochlore phase. This phase also appears in the films treated at 650°C with soaking times longer than 6 s. PMN-PT films with a 〈100〉 preferred orientation were prepared by using a PbTiO₃ seeding layer onto the substrate. These PMN-PT films present relaxor-type electrical properties. Dielectric permittivity, , shows significant dispersion. Its temperature dependence presents a broad maximum at 110–130°C, which position shifts towards higher temperatures with frequency. Ferroelectric hysteresis loops show high values of saturation polarisation but very low remanence. The piezoelectric activity of the films has been tested by the measurement of their local piezoelectric hysteresis loops.     

Dielectric and optical properties of BaTiO<Subscript>3</Subscript> thin films prepared by low-temperature process

Barium titanate (BaTiO₃) thin films have been prepared by low temperature processing on Pt/Ti/SiO₂/Si substrates using sol-gel-hydrothermal (SGHT) technique, which combined the conventional sol-gel process and hydrothermal method. X-ray diffraction analysis showed that the barium titanate thin films are polycrystalline. As-reacted barium titanate films grown on Pt(111)/Ti/SiO₂/Si(100) substrates had a dielectric constant (ε) and loss tangent (tanδ) of 80 and 0.05 at 1 MHz, respectively. The optical constants including refractive index n, extinction coefficient k, and absorption coefficient α of the barium titanate thin films in the wavelength range of 2.5–12.6 μm were obtained by infrared spectroscopic ellipsometry.     

Effect of substrate on phase formation and surface morphology of sol-gel lead-free KNbO3, NaNbO3, and K0.5Na0.5NbO3 thin films

Environmentally acceptable lead-free ferroelectric KNbO₃ (KN) or NaNbO₃ (NN) and K_0.5Na_0.5NbO₃ (KNN) thin films were prepared using a modified sol-gel method by mixing potassium acetate or sodium acetate or both with the Nb-tartrate complex, deposited on the Pt/Al₂O₃ and Pt/SiO₂/Si substrates by a spin-coating method and sintered at 650°C. X-ray diffraction (XRD) analysis indicated that the NN and KNN films on the Pt/SiO₂/Si substrate possessed a single perovskite phase, while NN and KNN films on the Pt/Al₂O₃ substrate contained a small amount of secondary pyrochlore phase, as did KN films on both substrates. Scanning electron microscopic (SEM) and atomic force microscopic (AFM) analyses confirmed that roughness R _q of the thin KNN/Pt/SiO₂/Si film (?? 7.4 nm) was significantly lower than that of the KNN/Pt/Al₂O₃ film (?? 15 nm). The heterogeneous microstructure composed of small spherical and larger needle-like or cuboidal particles were observed in the KN and NN films on both substrates. The homogeneous microstructure of the KNN thin film on the Pt/SiO₂/Si substrate was smoother and contained finer spherical particles (?? 50 nm) than on Pt/Al₂O₃ substrates (?? 100 nm). The effect of different substrates on the surface morphology of thin films was confirmed.     

TEM Investigations of Spinel-forming Solid State Reactions: Mechanism,film orientation,and interface structure during MgAl2O4 formation on MgO (001) and Al2O3 (1 1.2) single crystal substrates

The formation of well-oriented MgAl₂O₄ spinel films by solid state reactions between (i) a MgO (001) substrate and an Al₂O₃ vapour and (ii) a sapphire (1 1 .2) substrate and a deposited solid MgO film, respectively, is experimentally investigated. Composition, structure and morphology of the films are characterized by XRD, SEM, TEM/SAED, and EDX. The reaction fronts involved are investigated by cross-sectional atomic resolution transmission electron microscopy (ARM). The direction of the overall diffusion flux and the kind of diffusing species are determined in experiments using inert markers of sub-micron size. There are common features and, however, distinct differences between cases (i) and (ii). On MgO (001) substrates, the MgAl₂O₄ films grow in a simple cube-to-cube orientation: MgAl₂O₄(001) ∥ MgO(001); MgAl₂O₄[100] ∥ MgO [100]. The films consist of small grains about 25 to 50 nm in diameter, the orientation of which is symmetrically distributed around the exact orientation, with maximum deviations of about ±2°. On sapphire (1 1 .2) substrates the MgAl₂O₄ films grow almost in the orientation MgAl₂O₄(001) ∥ Al₂O₃(1 1 .2); MgAl₂O₄[010] ∥ Al₂O₃[11.0]. These films consist of larger grains about 100 nm in diameter, the orientation of which systematically deviates from the above orientation by unidirectional rotations up to 5 to 6° around the substrate [11.0] axis. The structures of the reaction fronts show corresponding differences, which are discussed in terms of different mechanisms occurring at the initial stage of the spinelforming reaction because of the different crystallographic conditions at the beginning of the reactions.     

Dielectric,Ferroelectric Properties of KTa0.65Nb0.35O3 Thin Films Prepared by Sol-Gel Process on Pt(111)/Ti/MgO(100) Substrates

KTa_0.65Nb_0.35O₃(KTN) thin films were prepared by sol-gel process on Pt(111)/Ti/MgO(100) substrates from KOAc, Ta(OC₂H₅)₅ and Nb(OC₂H₅)₅ in ethanol. The KTN thin films had a prefferred (100) orientation on Pt(111)/Ti/MgO(100) substrates and contained a small amount of pyrochlore structure phase. The 0.8-m-thick KTN film showed a room-temperature relative permittivity of 2160 and a room-temperature dielectric loss of 0.0098 at 1.0 kHz. The maximum relative permittivity of the KTN film was 4232 at 294 K and 1.0 kHz. The remanent polarization and coercive field of the KTN film were 2.8 C/cm² and 5.0 kV/cm, respectively, at 263 K.     

Textured PLCT Thin Films Prepared on Pt/Ti/SiO2/Si Substrate by Metal-Organic Decomposition

Textured calcium modified (Pb,La)TiO₃ (PLCT) films were deposited on Pt/Ti/SiO₂/Si substrates by using a metal-organic decomposition (MOD) process. The PLCT films exhibit good ferroelectric properties, a very low leakage current and a sharp PLCT/Pt interface. The (100) texture of the PLCT film is growth-controlled; the (100) oriented grains grow preferentially so as to minimize the surface energy. Particularly, the (100) preferred orientation is easy to form in the PLCT film with a layered structure for which the substrate almost does not affect the nucleation and growth of the film.     

Site engineering in chemical-solution-deposited Bi<Subscript>3.25</Subscript>La<Subscript>0.75</Subscript>Ti<Subscript>3</Subscript>O<Subscript>12</Subscript> thin films using Ce,Zr, Mn and Si atoms

Ferroelectric Bi_3.25La_0.75Ti₃O₁₂ (BLT) thin films were fabricated by depositing sol-gel solutions on Pt(111)/Ti/SiO₂/Si (100) substrates. Crystallographic orientations of the BLT films were random, but the preferred orientations along (00l) and (117) axes were found. All films showed a single-phase bismuth-layered structure but the orientation in the films could be engineered by optimizing the growth condition, as well as by introducing dopant atoms such as Ce and Zr in the films, which in turn influenced the ferroelectric properties of the films significantly. The shape of c-axis-oriented grains was more plate-like, while that of (117)-oriented grains was rod-like. Small % substitution of Ce, Mn, and Zr atoms at Ti site enhanced the remanent polarization by approximately 20%, while substitution of Si atoms reduced the remanent polarization in BLT films but improved insulating properties. It was also demonstrated that fatigue endurance could be controlled by the concentration of dopant atoms, which was thought to be due to the decrease in oxygen vacancy concentration.     

Growth of the Bismuth Titanate Films on Textured Oxide Electrode by the Spin Coating-Pyrolysis

Bismuth titanate films were fabricated onto highly oriented LaNiO₃ electrode grown on SrTiO₃(100) and LaAlO₃(012) substrates using spin-coating technique with metal naphthenates as starting materials. (00l)/(h00)-oriented bismuth titanate films on LaNiO₃/SrTiO₃ and LaNiO₃/LaAlO₃ were obtained by pyrolysis at 500°C, followed by annealing at 750°C. In-plane alignment and surface morphology of the films analyzed by pole-figure analysis ( scanning) and field emission scanning electron microscope showed an imperfect epitaxy with polycrystalline structure.An erratum to this article can be found at     

Control of microstructure and functional properties of PZT thin films via UV assisted pyrolysis

The influence of ultraviolet (UV) light during pyrolysis of sol-gel fabricated Pb(Zr_0.52Ti_0.48)O₃ thin films on (111)Pt/Ti/SiO₂/Si substrates has been investigated. The UV treated films show a homogeneous fine grain structure with (100) preferential orientation, whereas a bimodal grain structure and (111) preferential orientation were found for the untreated film. This is explained in terms of specific template layers formed during pyrolysis. The ferroelectric, dielectric and piezoelectric properties are also reported for both films. It is shown that while the ferroelectric properties are higher for the (111) films, the (100) films show better dielectric and piezoelectric properties with an effective piezoelectric coefficient, d _33eff, of 183 pm/V vs. 101.8 pm/V for the (111) films.     

Magnetoelectric Bi3.25Nd0.75Ti3O12–La0.6Ca0.4MnO3 composite thin films derived by SOL–GEL method

Magnetoelectric (ME) Bi_3.25Nd_0.75Ti₃O₁₂–La_0.6Ca_0.4MnO₃ (BNT–LCMO) composite thin films were deposited on Pt/Ti/SiO₂/Si(100) substrates by a simple SOL–GEL method and spin-coating process with two different deposition sequences: BNT/LCMO/Pt/Ti/SiO₂/Si(BLP) and LCMO/BNT/Pt/Ti/SiO₂/Si(LBP). Our results show the composite thin films exhibit both good ferroelectric and magnetic properties, as well as a ME effect. BLP thin films have larger maximum ME voltage coefficient values than LBP structured thin films. The deposition sequence has a notable effect on the ferroelectric and magnetic properties and ME coupling behavior of the bi-layer thin films.     

LiNbO3 and LiTaO3 thin films deposited by chemical and/or physical processes

Lithium niobate LiNbO₃ thin films were deposited onto silicon (111) Si and sapphire (001) AI₂O₃ single crystal substrates by the pyrosol and/or r.f. sputtering processes. A matrix of experiments was designed to determine the effects of several experimental parameters on the resulting film quality (stoichiometry, crystallization state) and properties. Under optimized conditions, requiring the combination of the two above-mentioned deposition techniques, <001 > oriented polycrystalline LiNbO₃ films were grown which exhibit homogeneous and columnar grain structures with the <c > -polar axis normal to the substrate surface.     

Enhanced dielectric properties of LSCO-buffered Ba(Sn<Subscript>0.05</Subscript>Ti<Subscript>0.95</Subscript>)O<Subscript>3</Subscript> thin film prepared by sol–gel processing

Ferroelectric Ba(Sn_0.05Ti_0.95)O₃ (BTS) thin films were deposited onto Pt/Ti/SiO₂/Si substrates by sol–gel technique with a 100 nm thick LSCO buffer layer. The influence of buffer layer on the phase and microstructure of the thin films was examined. Dielectric properties of the thin films were investigated as a function of frequency and direct current (DC) electric field. The results show that the LSCO buffer layer had a marked effect on the dielectric properties of the BTS films. The BTS thin films with LSCO buffer layer had enhanced dielectric properties.     

Growth and characterization of (K<Subscript>0.5</Subscript> Na<Subscript>0.5</Subscript>)NbO<Subscript>3</Subscript> thin films by a sol–gel method

(K_0.5 Na_0.5)NbO₃ (KNN) perovskite materials have been developed as a promising lead-free piezoelectric material for environmentally benign piezoelectric devices. KNN films with about 320 nm thickness were fabricated on Pt(111)/SiO₂/Si(100) substrates by a sol–gel method from stoichiometric and A-site ion excess precursor solutions. Two different annealing methods were also used to investigate the crystallographic evolution of the films. A layer-by-layer annealing process results in highly (001) oriented KNN from the annealing temperature of 550 °C, while the final annealing method leads to weaker crystalline peaks with a random orientation. The KNN films from the K and Na excess precursor solutions show similar crystallization behavior. However, the ferroelectric hysteresis loops of the films were greatly improved by compensating for an A-site vacancy. In particular, the KNN films from K-excess precursor solutions show better ferroelectric properties compared to the films prepared from Na excess solutions.     

Structural and nanomechanical properties of sol–gel prepared (K,Na)NbO3 thin films

Perovskite (K, Na)NbO₃ (KNN) thin films (~100 nm) were prepared by sol–gel/spin coating process on Pt/SiO₂/Si substrates and annealed at 650 °C. The structural properties of KNN films were confirmed by X‐ray diffraction analysis (XRD), Raman spectroscopy and scanning electron, transmission electron and atomic force microscopy (SEM, TEM and AFM) analysis. Pure perovskite phase of K_0.65Na_0.35NbO₃ in nonstoichiometric composition with monoclinic symmetry in film was revealed. Uniform homogeneous microstructure of KNN film with the roughness (~6.9 nm) contained spherical particles (~50–90 nm). Nanoindentation technique was used to characterize the mechanical properties of KNN films. Elastic modulus and hardness of Pt, SiO₂ and KNN thin films were calculated from their composite values of KNN/Pt/SiO₂/Si film/substrate system. The modulus and hardness of KNN film (71 and 4.5 GPa) were lower in comparison with SiO₂ (100 and 7.5 GPa). Pt film (~30 nm) did not influence the composite modulus, but had effect on hardness of KNN film. Copyright © 2015 John Wiley & Sons, Ltd.     

The influence of film thickness and process temperature on <Emphasis Type="Italic">c</Emphasis>-axis orientation of Bi<Subscript>3</Subscript>TiTaO<Subscript>9</Subscript> thin films

Bi-layered ferroelectric Bi₃TiTaO₉ (BTT) thin films with different thickness (ranging from 100 to 400 nm) were successfully fabricated on Pt(111)/TiO₂/SiO₂/(100)Si substrates using chemical solution deposition (CSD) technique at different annealing temperatures. The c-axis orientation of the films was affected by film thickness and process temperature. The thinner the film and the higher the process temperature, the higher the c-axis orientation. With the increase of film thickness, the stress decreased but the film roughness increased, which led to the decrease of c-axis orientation of films. BTT films annealed at 800°C were found to have much improved remament polarization (P _r ) than that of films annealed at 650 and 750°C. The P _r and coercive field (E _c ) values were measured to be 2 μC/cm² and 100 kV/cm, respectively. BTT films showed well-defined ferroelectric properties with grain size larger than 100 nm.     

Probing interfacial interactions of nafion ionomer: Thermal expansion of nafion thin films on substrates of different hydrophilicity/hydrophobicity

Interfacial interactions of Nafion ionomer with superhydrophilic (Pt, Au), hydrophilic (SiO₂), and hydrophobic (graphene, octyltrichlorosilane [OTS]‐modified SiO₂) is investigated, using in situ thermal ellipsometry, by quantification of substrate‐ and thickness‐dependent thermal properties of the ultrathin Nafion films of nominal thickness ranging 25–135 nm. For sub‐50 nm thin Nafion films, the thermal expansion coefficient of films decreased in the order of most hydrophobic to most hydrophilic substrate: OTS > graphene > SiO₂ > Au > Pt, implying weaker interpolymer and polymer–substrate interactions for films on hydrophobic substrates. Expansion coefficient of films on SiO₂, graphene, and OTS‐modified SiO₂ decreased with thickness whereas that of films on Au and Pt substrates increased with thickness. Above ~100 nm of thickness, films on all substrates converged toward a common value representative of bulk Nafion. Thermal transition temperature was found to be higher for films on hydrophilic SiO₂ than that for films on hydrophobic graphene and OTS‐modified SiO₂ but was not discernible for films on Au and Pt substrates. © 2019 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2019 , 57, 343–352