The Nature of As-related Defects in Semi-Insulating GaAs Bulk Crystals

The behaviour of As-related defects in SI (semi-insulating) GaAs are studied from the viewpoint of the origination of As-related precipitates, generation and evolution of EL2 during postgrowth and the possible defect interactions involved EL2 variation under As overpressure annealing. The precipitates were identified as elemental As and As-rich GaAs polycrystalline grains and their features depend on the growth process. A defect interaction model has been proposed on the generation/annihilation of EL2 assigned as As_Ga V_As V_Ga complex respect to non-stoichiometry such as As_i V_Ga and V_As.     

Antistructure disorder and its relation to dislocations in III–V semiconductors

Intimate relationship between antistructure defects and dislocations occurs in GaAs which manifests itself as: (i) appearing of spatial correlation between grown-in dislocations and the EL2 defects (component of the latter are As_Ga antisites), (ii) similar suppression of the concentration of EL2 and dislocation density due to the doping with donor impurities, (iii) generation of As_Ga antisites during the plastic deformation of a crystal. Al these effects can be understood in terms of the dislocation-mediated generation of As_Ga antisites via absorption of As_i interstitials at dislocation jogs. Large anion (cation) precipitates appearing at dislocations are pointed out to be important for both antisite and dislocation generation under certain conditions.     

Quenching by Copper Atoms of the EL2-induced Luminescence in GaAs

It is shown that the introduction of copper atoms into GaAs crystals containing antistructure defects EL2 (isolated arsenic atoms on gallium sites As_Ga) leads to a practically complete disappearance of the EL2-induced luminescence bands peaked at 0.63 and 0.68eV. This effect is connected with the passivation of the EL2 defects (i.e. with the substantial decrease in their concentration) because of their interaction with copper atoms (they become bound by copper atoms) resulting in an appearance of electrically inactive AS_GaCU_Ga complexes.     

Effect of Fast Electron Irradiation and Annealing on the Luminescence in GaAs(Zn) crystals. Irradiation-induced 1.26 and 1.39 eV Emission Bands

The effect of 2.2 MeV electron irradiation and subsequent annealings on the photoluminescence in zinc-doped p-type GaAs crystals is studied and analyzed. Rather strong emission bands peaked at hv_m (77 K) near 1.26 eV (induced by electron irradiation) and 1.39 eV (induced by annealing of irradiated crystals) are observed. Evidence is presented that the 1.26 and 1.39 eV emission bands occur due to radiative electronic transitions in As_iZn_Ga and V_AsZn_Ga pairs induced by irradiation and annealing of irradiated crystals, accordingly. The observed variations in the intensities of the 1.26 and 1.39 eV emission bands upon irradiation and subsequent annealings of GaAs(Zn) crystals are explained in terms of irradiation and annealing-induced variations in the amount of 1.26 and 1.39 eV radiative centres resulting from: a) the effective interaction of mobile radiation-induced defects in the arsenic sublattice with zinc atoms leading to the formation of As_iZn_Ga and V_AsZn_Ga pairs; b) the thermal dissociation of As_iZn_Ga and V_AsZn_Ga pairs on individual components.     

Generation of VGaTeAsVAs Complexes in Tellurium-doped n-type GaAs by Low-temperature Annealing

It is shown that low-temperature annealing (T= 425 to 625 °C, t ⩾ 0.5 h) of tellurium-doped n-type GaAs crystals (n₀ = 2 × 10¹⁸ cm⁻³) leads to a generation of V_GaTe_AsV_As complexes as a result of a diffusion of arsenic vacancies to V_GaTe_As complexes or arsenic and gallium vacancies to isolated tellurium atoms. The observed regularities of generation of V_GaTe_AsV_As complexes as the annealing temperature and the annealing time are varied are well explained by the proposed model of diffusion-limited formation of V_GaTe_AsV_As complexes.     

Irradiation plus annealing-induced 1.20 eV emission band in p-type GaAs

The effect of 2.2 MeV electron irradiation and subsequent annealings on the luminescence of tellurium-compensated p-type GaAs crystals is studied and analyzed. A comparatively strong emission band peaked at hv_m near 1.20 eV (induced by radiative electron recombination in Te_AsV_Ga pairs) appears in irradiated annealed (at T ≧ 250 °C) compensated p-type GaAs. The data obtained testify about the following: a) electron irradiation of GaAs creates stable (at T ≦ 200 °C) defects not only in the arsenic sublattice of GaAs, but in its gallium sublattice too; b) radiation plus annealing (r.p.a.)-induced Te_AsV_Ga pairs are characterized by a rather high (compared to that for grown-in Te_As V_Ga pairs) probability of electron radiative transitions in them. The electrical characterization of the r.p. a.-induced 1.20 eV radiative centres (Te_AsV_Ga pairs) is given.     

Low temperature investigations of e−-irradiated GaAs

Positron lifetime measurements have been performed on electron irradiated chromium doped semi-insulating GaAs as a function of annealing between 139 and 908 K. Trapping at negatively charged Ga_As defects and by a vacancy mixture dominated by trivacancies took place in the as-irradiated state. Upon annealing around 210 K divacancies were formed from the trivacancies as caused by migrating arsenic interstitials. Complete trapping prevailed up to 530 K but decreased then rapidly at higher temperatures due to the migration of divacancies which also remove the Ga_As defects.     

Electrical Characterization of Irradiation plus Annealing – induced VAsZnGa Pairs in p-type GaAs (Zn) Crystals

Effect of fast electron irradiation (E =2.2 Mev, ϕ_c = 1 × 10¹⁶ el/cm²) and subsequent annealings (T = 150 to 350 °C, t = 10 to 600 min) of zinc-doped p-type GaAs crystals on the formation and dissociation of V_AsZn_Ga, pairs is studied. An analysis of the formation and dissociation kinetics of V_AsZn_Ga pairs permitted to find the diffusion coefficient of radiation-induced arsenic vacancies D(D = 1.5 × 10⁻¹⁸, 1 × 10⁻¹⁷ and 5 × 10⁻¹⁷ cm²/s at 150, 175 and 200 °C accordingly), their migration energy ϵ_m(ϵ_m = 1.1 eV), the binding energy of V_AsZn_Ga, pairs ϵ_b(ϵ_b = 0.5 eV), and also their dissociation energy ϵ_d(ϵ_d = 1.6 eV).     

The study of the influence of deep level defects on GaAs epilayer electrophysical parameters with electron beam and photoelectron paramagnetic resonance methods

Deep level point defects in the GaAs p⁺-p^ˆ−n^ˆ structures, grown by liquid-phase epitaxy, were investigated with electron-beam methods (electron-beam induced current and modulation method) and photo-EPR. It was shown that during the growing process the donor As_Ga antisite defects with levels ev + 0.52 eV and ec — 0,75 eV and acceptor defect with the level ev + 0.44 eV have appeared. The interconnection between the thickness of p^ˆ-layer, the concentration of deep levels defects, diffusion length of the minority carriers in the p° and n°-layers was found.     

Investigation of the nature of point defects in in Te-doped gallium antimonide

Precision lattice constant and density measurements held on gallium antimonide single crystals grown from stoichiometric melts showed that doping of such crystals with Te lead to the intensification of Ga-supersaturated solid solution decomposition process with initial Frenkel defect (Ga_i + V_Ga) production. It is supposed that Te_sb — simple donors form complexes with V_Ga which are believed to be acceptors. Doping of GaSb with Te up to the levels above 2 · 10¹⁸ cm⁻³ leads to partial decomposition of GaSb(Te) solid solution supersaturated with Te.     

Low-Temperature epitaxial growth of InGaAs films on InP(100) and InP(411)<Emphasis Type="Italic">A</Emphasis> substrates

The structural and electrical characteristics of In_0.53Ga_0.47As epitaxial films, grown in the low-temperature mode on InP substrates with (100) and (411)A crystallographic orientations at flow ratios of As4 molecules and In and Ga atoms of γ = 29 and 90, have been comprehensively studied. The use of InP(411)A substrates is shown to increase the probability of forming two-dimensional defects (twins, stacking faults, dislocations, and grain boundaries), thus reducing the mobility of free electrons, and As_Ga point defects, which act as donors and increase the free-electron concentration. An increase in γ from 29 to 90 leads to transformation of single-crystal InGaAs films grown on (100) and (411)A substrates into polycrystalline ones.     

Majority charge carrier reversal and its effect on thermal and electron transport in xV2O5–(1 − x) As2O3 glasses

DC resistivity, thermopower and optical absorption of xV₂O₅–(1 ? x) As₂O₃ (0.58 ≤ x ≤ 0.93) glasses have been studied as a function of composition. The transport mechanism in these glasses has been identified to be a combination of hopping of small polarons between V⁴⁺ and V⁵⁺ sites and small bipolarons between As³⁺ and As⁵⁺ sites respectively. Electrical conductivity is found to be more of a function of vanadium content than arsenic concentration in the glasses, indicating that the contribution of bipolarons to the conductivity is negligible. Thermopower has also been found to be sensitive to the composition of the glasses. At low vanadium concentrations, the thermopower is negative, which exhibits a sign reversal as vanadium concentration is increased (at x = 0.7). An important feature of these glasses is that the thermopower is not a function of [V⁵⁺]/[V⁴⁺] ratio, as is normally observed in vanadate glasses, and such a phenomenon suggests that the arsenic ions (bipolarons) in these glasses contribute to the thermal transport phenomena in a significant way.     

Network topological thresholds in gallium doped As–Te glasses – Electrical and thermal investigations

Electrical switching and differential scanning calorimetric studies are undertaken on bulk As₂₀Te_80−xGa_x glasses, to elucidate the network topological thresholds. It is found that these glasses exhibit a single glass transition (T_g) and two crystallization reactions (T_c1 & T_c2) upon heating. It is also found that there is only a marginal change in T_g with the addition of up to about 10% of Ga; around this composition an increase is seen in T_g which culminates in a local maximum around x = 15. The decrease exhibited in T_g beyond this composition, leads to a local minimum at x = 17.5. Further, the As₂₀Te_80−xGa_x glasses are found to exhibit memory type electrical switching. The switching voltages (V_T) increase with the increase in gallium content and a local maximum is seen in V_T around x = 15. V_T is found to decrease with x thereafter, exhibiting a local minimum around x = 17.5. The composition dependence of T_c1 is found to be very similar to that of V_T of As₂₀Te_80−xGa_x glasses. Based on the present results, it is proposed that the composition x = 15 and x = 17.5 correspond to the rigidity percolation and chemical thresholds, respectively, of As₂₀Te_80−xGa_x glasses.     

High-quality GaMnAs films grown with arsenic dimers

We demonstrate that GaMnAs films grown with As₂ have excellent structural, electrical and magnetic properties comparable or better than similar films grown with As₄. Using As₂, a Curie temperature of 112 K has been achieved, which is slightly higher than the best reported to date. However, more significantly films showing metallic conduction have been obtained over a much wider range of Mn concentrations from 1.5% to 8% than has previously been reported for films grown with As₄. The improved properties of the films grown with As₂ are related to the lower concentration of antisite defects at the low growth temperatures employed.     

Liquid phase epitaxial growth and characterization of thin In1−xGaxAsyP1–y layers lattice-matched to InP

Growth studies enabled the deposition of In_0.71Ga_0.29As_0.68P_0.32 single quantum well structures with InP or In_0.88Ga_0.12As_0.26P_0.74 confinement layers lattice-matched to (001) InP by liquid phase epitaxy (LPE). Well widths in the order of 50–100 Å have been achieved using a conventional step cooling technique. The physical characterization has demonstrated the capability of the employed method to produce multilayered heterostructures which display confined particle states; quantum mechanically induced blue-shifts of the low temperature PL-emission up to 125 meV were measured. A remarkable reduction of the FWHM values of the shifted PL peaks was attained by optimization of the growth conditions.     

Thermal diffusivity measurements on As-Te-Ga glasses by photo-thermal deflection technique: Composition dependence and topological thresholds

The thermal diffusivity (α) of As₂₀Te_80−xGa_x glasses (7.5 ? x ? 18.5) has been measured using photo-thermal deflection (PTD) technique. It is found that the thermal diffusivity is comparatively lower for As₂₀Te_80−xGa_x glasses, which is consistent with the memory type of electrical switching exhibited by these samples. Further, the thermal diffusivity of As₂₀Te_80−xGa_x glasses is found to increase with the incorporation of gallium initially (for x ? 9), which is consistent with the metallicity of the additive. This increase in α results in a maximum at the composition x = 9; beyond x = 9, a decrease is seen in α leading to a minimum at the composition x = 15. The observed composition dependence of thermal diffusivity of As₂₀Te_80−xGa_x glasses has been found to be similar to that of Al₂₀As_xTe_100−x glasses, based on which it is proposed that As₂₀Te_80−xGa_x glasses exhibit an extended stiffness transition with compositions x = 9 and x = 15 being its onset and completion, respectively. Also, the composition x = 17.5 at which a second maximum is seen in the thermal diffusivity has been identified to be the chemical threshold (CT) of the As₂₀Te_80−xGa_x glassy system, as at CT, the glass is configurationally closest to the crystalline state and the scattering of the diffusing thermal waves is minimal for the chemically ordered phase.     

Effect of γ-irradiation on non-linear I-V behaviour and thermoelectric measurements in amorphous semiconducting AsSeTe system

An amorphous semiconducting compound of the composition As₂SeTe₂ is studied for its non-linear current-voltage characteristics, conductivity and thermoelectric measurements. It has been observed that γ-irradiation of the sample gives a lower threshold voltage and greater thermoelectric power. The threshold voltage shifts to a lower voltage value for the irradiated sample. The non-linear I-V behaviour and p-type nature of unirradiated and γ-irradiated As₂SeTe₂ are discussed on the basis of charged defect states existing and also created after γ-irradiation in the material. The thermoelectric power for unirradiated and γ-irradiated As₂SeTe₂ is discussed on the basis of a quantity, related to conductivity and thermoelectric power which explains to a great extent the effect observed experimentally.     

A square-wave voltammetric study on the diffusivities of polyvalent elements in CaO/BaO/Al2O3/SiO2 glass melts

Diffusion coefficients of various polyvalent ions (Sn²⁺, As³⁺, As⁵⁺, Sb³⁺, Sb⁵⁺, Cr³⁺, Ti⁴⁺, V⁴⁺, V⁵⁺ and Fe³⁺) were measured in melts with the basic compositions of 10CaO·10 BaO·10Al₂O₃·70SiO₂ and 10CaO·10BaO·15Al₂O₃·65SiO₂ by means of square-wave voltammetry. At temperatures in the range of 1300-1600 °C, linear correlations between logD and 1/T were observed. At 1400 °C, the diffusion coefficients obtained are compared with those obtained from other glass melt compositions.     

Characterization of the optical properties of LPE InxGa1−xAsyP1−y thin layers grown on InP

A series of In_xGa_1?xAs_yP_1?y single-crystal thin layers have been grown on an InP substrate in a vertical liquid phase epitaxy furnace with a rotating slide boat system. The optical properties of these LPE quaternary alloys lattice-matched to InP have been investigated mainly by photoluminescence and electroreflectance measurements. Photoluminescence spectra of In_xGa_1?xAs_y P_1?y epitaxial layers are dominated by a strong luminescence line due to band-edge emission. At low temperatures, around 4.2 K, we have observed complicated luminescence bands with many fine structures. Electroreflectance spectra for the LPE In_xGa_1?xAs_yP_1?y layers are sufficiently broad to fulfil the low-field condition, and the analysis enabled us to determine precisely the band gap energy.     

Miscibility gap calculation for Ga1−xInxNyAs1−y including strain effects

A method including strain effects is introduced for calculating the miscibility gap of the Ga_xIn_1−xN_yAs_1−y material system. The Gibbs free energy is computed using the delta lattice parameter model and the conventional solution model. The contribution caused by the strain energy due to the mismatch between substrate and epitaxial layer is added. The spinodal points can be calculated from this expression. The critical temperature above which the solid is metastable has been found to be increased due to strain effects. It is pointed out that the result of the calculation depends on the choice of substrate. The miscibility gaps for Ga_xIn_1−xAs, GaN_yAs_1−y and Ga_xIn_1−xN_yAs_1−y are evaluated by this method for a more realistic model of crystal growth.