Synchrotron-radiation photoemission study of the ultrathin Ba/3C–SiC(111) interface

Electronic structure of the Ba/3C–SiC(111) interface has been detailed studied in situ in an ultrahigh vacuum using synchrotron radiation photoemission spectroscopy with photon energies in the range of 100–450 eV. The 3C–SiC(111) samples were grown by a new method of epitaxy of low-defect unstressed nanoscaled silicon carbide films on silicon substrates. Valence band photoemission and both the Si 2p, C 1s core level spectra have been investigated as a function of Ba submonolayer coverage. Under Ba adsorption two induced surface bands are found at binding energies of 2 eV and 6 eV. It is obtained that Ba/3C–SiC(111) interface can be characterized as metallic-like. Modification of both the Si 2p and C 1s surface-related components were ascertained and shown to be provided by redistribution effect of electron density between Ba adatoms and both the Si surface and C interface atoms.     

Cluster model approach for electronic structure of Si and Ge(111) and GaAs(110) surfaces

For the purpose of exploring how realistic a cluster model can be for semiconductor surfaces, extended Huckel theory calculations are performed on clusters modeling Si and Ge(111) and GaAs(110) surfaces as prototypes. Boundary conditions of the clusters are devised to be reduced. The ideal, relaxed, and reconstructed Si and Ge(111) surfaces are dealt with. Hydrogen chemisorbed (111) clusters of Si and Ge are also investigated as prototypes of chemisorption systems. Some comparison of the results with finite slab calculations and experiments is presented. The cluster-size dependence of the calculated energy levels, local densities of states, and charge distributions is examined for Si and Ge(111) clusters. It is found that a 45-atom cluster which has seven layers along the [111] direction is large enough to identify basic surface states and study the hydrogen chemisorption on Si and Ge(111) surfaces. Also, it is presented that surface states on the clean Si and Ge(111) clusters exist independent of relaxation. Further, the calculation for the relaxed GaAs(110) cluster gives the empty and filled dangling-orbital surface states comparable to experimental data and results of finite slab calculations. The cluster approach is concluded to be a highly useful and economical one for semiconductor surface problems.     

Surface diffusion of Si,Ge and C adatoms on Si （001） substrate studied the molecular dynamics simulation

Depositions of Si, Ge and C atoms onto a preliminary Si (001) substrate at different temperatures are investigated by using the molecular dynamics method. The mechanism of atomic self-assembling occurring locally on the flat terraces between steps is suggested. Diffusion and arrangement patterns of adatoms at different temperatures are observed. At 900 K, the deposited atoms are more likely to form dimers in the perpendicular [110] direction due to the more favourable movement along the perpendicular [110] direction. C adatoms are more likely to break or reconstruct the dimers on the substrate surface and have larger diffusion distances than Ge and Si adatoms. Exchange between C adatoms and substrate atoms are obvious and the epitaxial thickness is small. Total potential energies of adatoms and substrate atoms involved in the simulation cell are computed. When a newly arrived adatom reaches the stable position, the potential energy of the system will decrease and the curves turns into a ladder-like shape. It is found that C adatoms can lead to more reduction of the system energy and the potential energy of the system will increase as temperature increases.     

Novel electronically driven surface phase predicted in C/Si(111)

We predict a novel electronically driven phase for the recently created C/Si(111) surface at 1/3 monolayer coverage. Whereas the isoelectronic surface Sn/Ge(111) is a 3 x 3 distorted metal and Si/SiC(0001) is an undistorted magnetic Mott insulator, the new phase combines both features. Two of three adatoms in C/Si(111) should form a distorted (3 x 3) honeycomb sublattice, the third an undistorted insulating and magnetic triangular sublattice. The generally conflicting elements, namely, band energy, favoring distortion, and strong electron correlations favoring a Mott state, actually conspire in this case. This kind of state represents the surface analog of the Fazekas-Tosatti state in the charge density wave compound 1T-TaS2.     

Adsorption of potassium on a Si(111) surface

The adsorption of potassium on several sites (T₁, T₄, H₃) of a Si(111) surface is studied using the extended Hückel method and cluster models. The results show that the chemisorption energy on the T₄ site is almost equal to that on the H₃ site for an ideal surface. However, the analysis of chemical bonding of adatoms on a Si surface suggests that the chemisorption of adatoms might induce a kind of reconstruction on the Si(111) surface. Rough calculations for the adsorption on this reconstructed surface are carried out. In this paper, charge transfer, density of states and characterization of the bonds between the adatom and substrate Si atoms are also investigated in detail.     

Ga- and As-Adatom phases on the Ge(111) and Si(111) surfaces: analogies and differences

The (1 × 1) and (√3 × √3)R30° (T4) structures of Ga and As adatoms on the Ge(111) and Si(111) surfaces are studied using first-principles calculations. The surface energetics predicts, in some cases, a transformation of the T4 structure (surface covered with 1/3 monolayer (ML) of adatoms) into domains of the 1-ML covered (1 × 1) structure and areas of clean reconstructed suface. For As adatoms, such phase separation is favored on both substrates, while for Ga adatoms, it is only preferred on the Ge(111) surfaces. These results compare well with experimental observations.     

Surface mass transport of Ag and In on vicinal Si(111)

Mass transport of Ag and In on vicinal Si(111) has been investigated by scanning Auger microscopy (SAM). Highly anisotropic surface diffusion and surface electromigration due to direct current were observed for Ag and In adatoms on 0°−, 0.5°−, 3°− and 6°−off vicinal Si(111) surfaces. The diffusion on the intermediate layer is strongly enhanced in the direction parallel to the step edge for Ag adatoms, while it is remarkably suppressed in the direction perpendicular to the step edge for In adatoms. The activation energy of the diffusion for the Ag adatoms ranged between 0.81 and 1.3 eV, while that for In adatoms increased from 0.31 to 0.66 eV with increasing the vicinal angle. The anisotropic diffusion transport is explained in terms of the step structure and the difference in the binding energy at the step site and the terrace site.     

Lead growth on Si(111) surfaces reconstructed by indium

We study the Pb growth on both √3 × √3-In and 4 × 1-In reconstructed Si(111) surfaces at room and low temperature (160 K). The study takes place with complementary techniques, to investigate the role of the substrate reconstruction and temperature in determining the growth mode of Pb. Specifically, we focus on the correlation between the growth morphology and the electronic structure of the Pb films. The information is obtained by using Auger electron spectroscopy, low energy electron diffraction, soft x-ray photoelectron spectroscopy, scanning tunneling microscopy and spot profile analysis-low energy electron diffraction. The results show that, at low temperature and coverage ≤12 ML on the Si(111)√3 × √3-In surface, Pb does not alter the initial semiconducting character of the substrate and three-dimensional Pb islands with poor crystallinity are grown on a wetting layer. On the other hand, for the same coverage range, Pb growth on the Si(111)4 × 1-In surface results in metallic Pb(111) crystalline islands after the completion of a double incomplete wetting layer. In addition, the bond arrangement of the adatoms is studied, confirming that In adatoms interact more strongly with the silicon substrate than the Pb ones. This promotes a stronger Pb-Pb interaction and enhances metallization. The onset of the metallization is correlated with the amount of pre-deposited In on the Si(111) surface. The decoupling of the Pb film from the 4 × 1-In interface can also explain the unusual thermal stability of the uniform height islands observed on this interface. The formation of these Pb islands is driven by quantum size effects. Finally, the different results of Pb growth on the two reconstructed surfaces confirm the importance of the interface, and also that the growth morphology, as well as the electronic structure of the Pb film can be tuned with the initial substrate reconstruction.     

Neural network approach to diffusion of B and N adatoms on the Pt(111) surface

Artificial neural network boasts an outstanding class in terms of its performance and efficiency and is being spread widely in most fields of physics. We report our investigation of the diffusions of boron and nitrogen adatoms on the Pt(111) surface by performing molecular dynamics simulations equipped with machine-learned potentials. Platinum is commonly used as a substrate for the growth of hexagonal boron nitride (h-BN) thin films, and the diffusion of B and N atoms on the substrate, which are decomposed from the precursor molecules, plays important roles in the initial stages of h-BN growth. The two-dimensional potential energy surfaces and the trajectories of the B and N adatoms are consistent with the DFT calculation. The Arrhenius plots of the diffusion coefficients produce the diffusion barriers of the B and N adatoms on Pt(111), which agree well with the DFT barriers.     

Ab initio investigation of the clustering of carbon adatoms on Fe(001) and Fe(111) surfaces

A theoretical investigation of the interaction between carbon adatoms on the Fe(001) and Fe( 111 ) surfaces is performed using ab initio calculations in terms of density functional theory. Calc ulations of the adsorption energy demonstrate the existence of a strong bonding between single carbon adatoms and the iron surface. An analysis of the calculated energies of the interaction between carbon adatoms reveals for the first time that the repulsion between the carbon adatoms located at the nearest neighbor sites on the Fe(001) surface occurs and that clusters with a looser packing are formed on the surface.     

Si60团簇的结构及其与Si(111)面间碰撞的分子动力学模拟

利用紧束缚分子动力学退火方法模拟研究了Si60团簇的稳定结构和基态能量,结果表明Si60团簇为具有T对称性的截顶二十面体的富勒烯结构,平均键长为0236nm,直径为0933nm,原子结合能为4.45eVatom,JahnTeller效应对Si60团簇的结构有很大影响.通过对Si60分子和Si(111)面碰撞机理的粒子数、体积和能量不变分子动力学模拟,发现Si60分子吸附在Si(111)面所需要的垂直入射动能为40eV,Si60分子远不如C60分子稳定 关键词： 紧束缚 JahnTeller效应 碰撞     

STM针尖和外电场在Si(111)-7×7表面单原子操纵中的作用

利用第一性原理的离散变分局域密度泛函方法,采用团簇模型（Si₃₄H₃₆-W₁₁)来模拟STM操纵Si(111)-7×7表面顶角吸附原子的过程．通过分析在进行原子操纵过程中体系的能量与电子云密度分布来研究针尖和外电场的作用．结果表明,当针尖与样品间距离较近时,利用两者间有较强的相互作用,能有效地降低脱出能的能垒高度．外电场对体系脱出能的影响与其大小及极性有关,当样品上所加正偏压增强时,脱出能曲线高度单调下降,而外电场极性为负时,反而稍有增高．仅考虑针尖和样品之间的静态电子相互作用及静电场的作用,尚不能使被操纵原子脱离样品表面．最后讨论了在Si(111)-7×7表面上进行原子操纵的其他机理.     

Atomic mechanisms and kinetics of self-diffusion on the Pd(001) surface

The atomic mechanisms and kinetics of self-diffusion of Pd adatoms on a single-crystal Pd(001) surface are investigated using molecular dynamics simulation. It is shown that the migration of Pd adatoms on the Pd(001) surface predominantly occurs through the relay-race mechanism with the participation of substrate atoms. The activation energy for an elementary event of relay-race self-diffusion is calculated from the kinetic equation describing the change in the concentration of surface adatoms labeled at the initial instant of time.     

Features of atomic processes at the formation of a wetting layer and nucleation of three-dimensional Ge islands on Si(111) and Si(100) surfaces

The intermediate stages of the formation of a Ge wetting layer on Si(111) and Si(100) surfaces under quasiequilibrium grow conditions have been studied by means of scanning tunneling microscopy. The redistribution of Ge atoms and relaxation of mismatch stresses through the formation of surface structures of decreased density and faces different from the substrate orientation have been revealed. The sites of the nucleation of new three-dimensional Ge islands after the formation of the wetting layer have been analyzed. Both fundamental differences and common tendencies of atomic processes at the formation of wetting layers on Si(111) and Si(100) surfaces have been demonstrated. The density of three-dimensional nuclei on the Si(111) surface is determined by changed conditions for the surface diffusion of Ge adatoms after change in the surface structure. Transition to three-dimensional growth on the Si(100) surface is determined by the nucleation of single {105} faces on the rough Ge(100) surface.     

Dissociative adsorption and site specificity in the initial stages of tetraethoxysilane (TEOS) interaction with Si(111)-(7×7)

We report results of a scanning tunneling microscopy and X-ray photoelectron spectroscopy study on the interaction of tetraethoxysilane (TEOS), a precursor for chemical vapor deposition of silicon dioxide, with Si(111)-(7×7) at room temperature. Under these conditions the interaction of TEOS with the surface is predominantly dissociative. The main adsorption products are ethyl- and triethoxysiloxane groups, which probably evolve in a four-center reaction of TEOS with two neighboring surface dangling bonds. Adsorption of the dissociation products is highly site-selective: triethoxysiloxane groups adsorb on the Si adatoms while ethyl groups react with the rest-atom dangling bonds. Center adatoms are over three times more reactive towards this reaction than corner adatoms. This two-fold selectivity is explained within the concept of local electron donor/acceptor properties.     

Mechanism of Cu transport along clean Si surfaces

Cu diffusion along clean Si(111), (110) and (100) surfaces are investigated by Auger electron spectroscopy and low energy electron diffraction. The effective diffusion coefficients of copper are measured in the temperature range from 500 to 650°C. It is shown that the Cu transport along silicon surface occurs by the diffusion of Cu atoms through Si bulk and the segregation of Cu atoms to the surface during the diffusion process. It is found that the segregation coefficients of Cu to silicon surface during the diffusion process depend on surface orientation.     

Magnetic and electronic properties of Cr,Mn, and Fe adatoms on Si(001): A first-principles study

The magnetic and electronic properties of TM (TM=Cr, Mn, and Fe) adatoms adsorption on Si(001) surface are studied by means of the first-principles method. For the adsorption of a single TM atom on Si(001), we obtain decreasing spin moments and increasing adsorption energies as TM varies from Cr to Fe. In the case of TM dimers adsorption, the calculated results show that the spin coupling changes from antiferromagnetic (AFM) to ferromagnetic (FM) as the 3d electrons increased. AFM coupling is found to be preferred for Cr, while FM coupling is energetically favorable for Mn and Fe. In the case of TM wires, we find that the FM state is energetically preferred for Mn and Fe atoms on the Si(001) surface, while for Cr wires, the up–down–up state for P–M–M site Cr atoms seems to be more energy favorable. We also find that the silicon surfaces become metallic for the adsorption of TM wires.     

Vicinal and on-axis surfaces of 6H-SiC(0001) thin films observed by scanning tunneling microscopy

Surfaces of 6H-SiC(0001) homoepitaxial layers deposited on vicinal (3.5° off (0001) towards [11 0]) and on-axis 6H---SiC wafers by chemical vapour deposition have been investigated using ultra-high vacuum scanning tunneling microscopy. Undulating step configurations were observed on both the on-axis and the vicinal surfaces. The former surface possessed wider terraces than the latter. Step heights on both surfaces were 0.25 nm corresponding to single bilayers containing one Si and one C layer. After annealing at T>1100°C for 3–5 min in UHV, selected terraces contained honeycomb-like regions caused by the transformation to a graphitic surface as a result of Si sublimation. A model of the observed step configuration has been proposed based on the observation of the [ 110] or [1 10] orientations of the steps and energetic considerations. Additional deposition of very thin (2 nm) SiC films on the above samples by gas source molecular beam epitaxy was performed to observe the evolution of the surface structure. Step bunching and growth of 6H---SiC layers and formation of 3C---SiC islands were observed on the vicinal and the on-axis surfaces, respectively, and controlled by the diffusion lengths of the adatoms.     

Adsorption of hydrogen and hydrocarbon molecules on SiC(001)

Adsorption of hydrogen and hydrocarbon molecules on semiconductor surfaces plays a key role in surface science and technology. Most studies have employed silicon (Si) as a substrate because of its paramount technological importance and scientific interest. However, other semiconductor substrates are gaining an increasing interest as well. Silicon carbide (SiC), which is a material with very special properties allowing developments of novel devices and applications, offers particularly fascinating new degrees of freedom for exceptional adsorption behaviour. For example, a very unusual hydrogen-induced metallization of a SiC(001) surface has been reported and hydrogen molecules show very different adsorption behaviour on different SiC(001) reconstructions although the latter exhibit very similar surface dimers. In marked contrast to the Si(001) surface, the adsorption of hydrocarbon molecules on SiC(001) can yield structurally well-defined adlayers in favourable cases which may have large potential for organic functionalization. We review and discuss theoretical ab initio results on conceivable adsorption scenarios of atomic and molecular hydrogen as well as acetylene, ethylene, butadiene, benzene and cyclohexadiene on various reconstructions of the SiC(001) surface. The main emphasize is on a detailed understanding of these adsorption systems and on identifying the physical origin of the particular adsorption behaviour. The results will be discussed in the light of related adsorption events on the Si(001) surface and in comparison with available experimental data.     

表面氧钝化碳化硅纳米团簇电子结构和光学性质的第一性原理研究

基于密度泛函理论(DFT)和广义梯度近似(GGA),对氧钝化条件下4H-SiC纳米团簇的电子结构和光学性质进行了研究。计算了不同直径的4H-SiC纳米球氧钝化后的能带结构、电子态密度和光学性质。团簇的尺度在0.4~0.9 nm之间,构建表面仅存在硅氧双键和表面仅存在碳氧双键的两种模型。研究表明硅氧双键和碳氧双键所引起的缺陷态位于原4H-SiC的价带和导带之间,并且缺陷态与价带顶的能量差随纳米团簇颗粒直径的增大而减小;缺陷态主要是由Si原子外层电子和氧原子外层电子轨道杂化引起的。同时,由于氧的存在,对碳化硅的结构产生一定的影响,这也是缺陷态形成的一个原因。另外,碳氧双键和硅氧双键钝化对4H-SiC纳米团簇的光学性质有着不同的影响。在表面仅存在C=O的情况下,4H-SiC纳米团簇表现出各向同性的性质。在表面仅存在Si=O的情况下,4H-SiC纳米团簇表现出各向异性的性质。