GaSb/AlSb/GaAs应变层结构的分子束外延生长

本文以反射式高能电子衍射(RHEED)和其强度振荡为监测手段,在半绝缘GaAs衬底上成功地生长GaSb/AlSb/GaAs应变层结构,RHEED图样表明,GaSb正常生长时为Sb稳定的C(2×6)结构,AlSb为稳定的(1×3)结构,作者观察并记录GaSb,AlSb生长时的RHEED强度振荡,并利用它成功地生长10个周期的GaSb/AlSb超晶格,透射电子显微镜照片显示界面平整、清晰,采用较厚的AlSb过渡层及适当的生长条件,可在半绝缘GaAs衬底上生长出质量好的GaSb外延层,其X射线双晶衍射半峰宽小于 关键词：     

InAs/(GaIn)Sb superlattices for IR optoelectronics: Strain optimization by controlled interface formation

The structural properties of InAs/(GaIn)Sb and (InGa)As/GaSb superlattices (SLs), grown by solid-source molecular-beam epitaxy on GaAs substrates using a strain relaxed GaSb or InAs buffer layer or directly on InAs substrates, were analyzed by high-resolution X-ray diffraction and Raman spectroscopy. The residual strain within the SL was found to depend critically on the type of interface bonds, which can be either InSb- or GaAs-like. Thus, to achieve lattice matching to the buffer layer or substrate by strain compensation within the SL stack, the controlled formation of the interface bonds is vital. On the other hand, minimization of the residual strain is shown to be a prerequisite for achieving a high photoluminescence yield and high responsivities for InAs/(GaIn)Sb SL based IR detectors.     

Localized optical vibrational modes in GaSb/AlSb superlattices

The vibrational spectrum of short-period GaSb/AlSb superlattices in the frequency range of GaSb optical phonons is investigated in detail. Localization of transverse GaSb optical phonons in GaSb/AlSb superlattices is observed experimentally for the first time. The dispersions of TO and LO phonons in GaSb are measured. Pis’ma Zh. éksp. Teor. Fiz. 64, No. 5, 361–364 (10 September 1996)     

Atomically smooth interfaces of type-II InAs/GaSb superlattice on metamorphic GaSb buffer grown in 2D mode on GaAs substrate using MBE

In the paper, the comparative analysis of type-II InAs/GaSb SLs deposited on three types of GaSb buffers: homoepitaxial, metamorphic and one grown using the interfacial misfit (IMF) array technique has been presented. The buffer layers as well as superlattices were grown under nominally identical technological conditions. HRXRD investigations proved better crystal quality of the metamorphic material than the IMF-GaSb. FWHM_RC were equal to 156 arcsec and 196 arcsec, respectively. The surface roughness of about 1?ML and 4?MLs was obtained using the atomic force microscope for 4.0?μm–metamorphic GaSb and 1.5?μm-IMF-GaSb layers, respectively. The etch pits density for both buffers was similar, 1–2?×?10⁷?cm^?2. Superlattice with 500 periods deposited on the homoepitaxial buffer was used as a reference of the best crystal quality. HRTEM images revealed straight InAs/GaSb interfaces with 1?ML thicknesses in this sample. The interfaces in SL deposited on IMF-GaSb buffer were undulated and smeared over 3?MLs. The use of the metamorphic buffer resulted in 1–2?ML straight InAs/GaSb interfaces. The main reason for this is the roughness of IMF-GaSb buffer with mounds on the surface. Based on the obtained results we have demonstrated the advantage of metamorphic approach over IMF growth mode in GaSb/GaAs material system. A two times thicker buffer could be the price worth paying for high quality structures, even when working in the production mode.     

MBE growth and magnetotransport studies of ferromagnetic Ga1−xMnxSb semiconductor layers on hybrid ZnTe/GaAs substrates

Narrow-gap Ga_1−xMn_xSb layers grown on hybrid ZnTe/GaAs substrates are observed to be ferromagnetic by SQUID magnetization and anomalous Hall effect measurements. The layers display an easy axis of magnetization perpendicular to the layer plane, in contrast to in-plane easy axis orientation observed in Ga_1−xMn_xSb grown on GaSb substrates. Resistivity measured in the Ga_1−xMn_xSb/ZnTe/GaAs system shows a well-defined maximum at temperatures close to the ferromagnetic/paramagnetic transition. We determined the spontaneous resistivity anisotropy in Ga_0.98Mn_0.02Sb grown on hybrid ZnTe/GaAs substrates and compared it to that observed on Ga_0.98Mn_0.02Sb grown on a GaSb buffer. These results should provide a valuable test for future theories of transport in ferromagnetic semiconductors.     

Excitonic photoluminescence properties of nanocrystalline GaSb and Ga0.62In0.38Sb embedded in silica films

The GaSb and Ga_0.62In_0.38Sb nanocrystals were embedded in the SiO₂ films by radio-frequency magnetron co-sputtering and were grown on GaSb and Si substrates at different temperatures. We present results on the 10 K excitonic photoluminescence (PL) properties of nanocrystalline GaSb and Ga_0.62In_0.38Sb as a function of their size. The measurements show that the PL of the GaSb and Ga_0.62In_0.38Sb nanocrystallites follows the quantum confinement model very closely. By using deconvolution of PL spectra, origins of structures in PL were identified.     

Fabrication of type-II InAs/GaSb superlattice long-wavelength infrared focal plane arrays

In this paper, we present an InAs/GaSb type-II superlattice (SL) with the M-structure for the fabrication of a long-wavelength (10 μm range) infrared (LWIR) focal plane arrays (FPA), which are grown by molecular beam epitaxy (MBE). The M-structure is named for the shape of the band alignment while the AlSb layer is inserted into the GaSb layer of InAs/GaSb SL. A 320 × 256 LWIR FPA has been fabricated with low surface leakage and high R₀A product of FPA pixels by using anodic sulfide and SiO₂ physical passivation. Experiment results show that the devices passivated with anodic sulfide obviously have higher R₀A than the un-sulphurized one. The 50% cutoff wavelength of the LWIR FPA is 9.1 μm, and the R₀A is 224 Ω cm² with the average detectivity of 2.3 × 10¹⁰ cm Hz^1/2 W⁻¹.     

Electronic structure of GaxIn1-xAsySb1-y quaternary alloy by recursion method

Summary  This work reports the electronic structure of GaInAsSb quaternary alloy by recursion method. A five-orbital sp₃s^* per atom model was used in the tight-binding representation of the Hamiltonian. The local density of states (LDOS), integrated density of states (IDOS) and structural energy (ST.E) were calculated for Ga, In, As and Sb sites in Ga_0.5 In_0.5 As_0.5 Sb_0.5 and GaInAsSb lattice matched to GaAs and the same alloy lattice matched to GaSb. There are 216 atoms in our cluster arranged in a zincblend structure. The results are in good agreement with available information about the alloy.     

Optimization of growth parameters for MOVPE-grown GaSb and Ga1−xInxSb

The triethylgallium/trimethylantimony (TEGa/TMSb) precursor combination was used for the metal-organic vapour phase epitaxial growth of GaSb at a growth temperature of 520 °C at atmospheric pressure. Trimethylindium was added in the case of Ga_1−xIn_xSb growth. The effects of group V flux to group III flux ratio (V/III ratio) on the crystallinity and optical properties of GaSb layers are reported. It has been observed from the crystalline quality and optical properties that nominal V/III ratios of values greater than unity are required for GaSb epitaxial layers grown at this temperature. It has also been shown that Ga_1−xIn_xSb can be grown using TEGa as a source of gallium species at atmospheric pressure. The relationship between Ga_1−xIn_xSb vapour composition and solid composition has been studied at a V/III ratio of 0.78.     

GaSb-based mid-infrared 2–5 μm laser diodes

Laser diodes emitting at room temperature in continuous wave regime (CW) in the mid-infrared (2–5 μm spectral domain) are needed for applications such as high sensitivity gas analysis by tunable diode laser absorption spectroscopy (TDLAS) and environmental monitoring. Such semiconductor devices do not exist today, with the exception of type-I GaInAsSb/AlGaAsSb quantum well laser diodes which show excellent room temperature performance, but only in the 2.0–2.6 μm wavelength range. Beyond 2.6 μm, type-II GaInAsSb/GaSb QW lasers, type-III ‘W’ InAs/GaInSb lasers, and interband quantum cascade lasers employing the InAs/Ga(In)Sb/AlSb system, all based on GaSb substrate, are competitive technologies to reach the goal of room temperature CW operation. These different technologies are discussed in this paper. To cite this article: A. Joullié, P. Christol, C. R. Physique 4 (2003).     

Above GaSb barrier in type II quantum well structures for mid-infrared emission detected by Fourier-transformed modulated reflectivity

Modulation spectroscopy in its Fourier-transformed mode has been employed to investigate the optical properties of broken gap ‘W’-shaped GaSb/AlSb/InAs/InGaSb/InAs/AlSb/GaSb quantum well structures designed to emit in the mid infrared range of 3–4 μm for applications in laser-based gas sensing. Besides the optical transitions originating from the confined states in the type II quantum wells, a number of spectral features at the energy above the GaSb band gap have been detected. They have been analyzed in a function of InAs and GaSb layer widths and ultimately connected with resonant states in the range of AlSb tunneling barriers.     

Optimization of absorption in InAs/InxGa1-xSb superlattices for long-wavelength infrared detection

The linear absorption coefficient of InAs/In_xGa_1-xSb superlattices is optimized based on an 8×8 envelope-function approximation (EFA) model. The effect of layer widths, indium content, buffer choice, substrate orientation, interface type, layer growth order, piezoelectricity, and layer width variations on the cutoff wavelength and the linear absorption coefficient is investigated. We propose specific superlattice parameters that optimize absorption for superlattices grown on GaSb at three cutoff wavelengths.     

Tunneling radiative recombination in <Emphasis Type="Italic">p-n</Emphasis> heterostructures based on gallium nitride and other A<Superscript>III</Superscript>B<Superscript>V</Superscript> semiconductor compounds

We present summarized data on the tunneling emission in p-n heterostructures based on GaN and on a series of cubic A^IIIB^V semiconductors, including GaAs, InP, GaSb, and (Ga, In)Sb. The emission in p-n heterostructures of the InGaN/AlGaN/GaN type in a spectral interval from 1.9 to 2.7 eV predominates at small currents (J<0.2 mA). The position of maximum ?ω_max in the spectrum approximately corresponds to the applied potential difference U:?ω_max=eU. The tunneling emission is related to a high electric field strength in GaN-based heterostructures. The radiative recombination probability is higher in the structures with piezoelectric fields. The observed spectra are compared to the spectra of tunneling emission from light-emitting diodes based on GaAs, InP, and GaSb. The experimental results for various semiconductors emitting in a broad energy range (0.5–2.7 eV) are described by the equation ?ω_max=eU=0.5–2.7 eV.     

Raman and infrared spectroscopical investigation of the optical vibrational modes in GaSb/AlSb superlattices

The vibrational spectrum of ultra-thin layer GaSb/AlSb superlattices was investigated in detail by infrared (IR) and Raman spectroscopies. The effect of confinement of the transverse and longitudinal optical phonons in both types of the layers was studied. The dispersions of optical phonons of the GaSb and the AlSb obtained from the analysis of the Raman and IR spectra are in a good accordance with the theoretical data and results of neutron scattering experiments. First- and second-order Raman spectroscopy indicates the presence of intermixture of atoms at the interfaces in the GaSb/AlSb superlattices. Received: 11 May 1998 / Accepted: 21 July 1998     

Impact of ZnTe buffer on the electrical properties of n-type GaSb:Te films

We have investigated on the molecular beam epitaxy (MBE) of Te-doped GaSb films on ZnTe buffer. Te-doped GaSb (GaSb:Te) films with and without ZnTe buffer were grown on (0 0 1) GaAs substrates. GaSb:Te/ZnTe/GaAs film revealed higher mobility (=631 cm²/V s) in comparison to GaSb:Te/GaAs film (=249 cm²/V s). To explain the higher mobility of GaSb:Te on ZnTe buffer, dislocation density and temperature dependence of Hall measurement results were analyzed. Temperature dependence of Hall measurement shows strong influence of the dislocation scattering, which indicates that dislocation reduction by the ZnTe buffer enhances the carrier mobility of GaSb films.     

Dislocation-filtering AlInSb buffer layers for InSb quantum wells—Analysis by high-tilt bright-field and dark-field TEM

We have investigated the effect of an AlInSb interlayer on dislocation filtering, aiming at a further improvement in the performance of InSb quantum well devices that are often grown on a largely lattice-mismatched substrate, such as Si and GaAs, via an AlInSb buffer layer. Transmission electron microscopy (TEM) analyses under high-tilt bright-field (HTBF) and high-tilt dark-filed (HTDF) conditions provide the capabilities of (A) analyzing the reaction between threading dislocations (TDs) and misfit dislocations (MDs) and (B) measuring local TD and MD densities around an interface which is embedded deep into an epilayer. An HTBF-TEM analysis shows that 50% of TDs are eliminated at an (0 0 1) Al_0.25In_0.75Sb/Al_0.10In_0.90Sb interlayer interface where the TD density was originally 8.6×10⁹ /cm². Twenty three percent of the mechanical strain at such an interface was relaxed by a MD density of 1.6×10⁵ /cm. In this study, the detailed practical procedures of HTBF- and HTDF-TEM analyses are also discussed.     

GaSb layers with low defect density deposited on (001) GaAs substrate in two-dimensional growth mode using molecular beam epitaxy

We report on the growth of fully relaxed and smooth GaSb layers with reduced density of threading dislocations, deposited on GaAs substrate. We prove that three parameters have to be controlled in order to obtain applicable GaSb buffers with atomically smooth surface: interfacial misfit (IMF), the etch pit density (EPD) and the growth mode.The GaSb/GaAs interfacial misfit array and reduced EPD ≤1.0 × 10⁷ cm^?2 were easily obtained using As-flux reduction for 3 min and Sb-soaking surface for 10 s before the GaSb growth initiation. The successive growth of GaSb layer proceeded under the technological conditions described by the wide range of the following parameters: r_G ∈ (1.5 ÷ 1.9) Å/s, T_G ∈ (400 ÷ 520)°C, V/III ∈ (2.3 ÷ 3.5). Unfortunately, a spiral or 3D growth modes were observed for this material resulting in the surface roughness of 1.1 ÷ 3.0 nm. Two-dimensional growth mode (layer by layer) can only be achieved under the strictly defined conditions. In our case, the best quality 1-μm-thick GaSb buffer layer with atomically smooth surface was obtained for the following set of parameters: r_G = 1.5 Å/s, T_G = 530 °C, V/III = 2.9. The layer was characterized by the strain relaxation over 99.6%, 90° dislocations array with the average distance of 5.56 nm, EPD ～8.0 × 10⁶ cm^?2 and 2D undulated terraces on the surface with roughness of about 1 ML. No mounds were observed. We belive that only thin and smooth GaSb layer with reduced EPD may be applied as the buffer layer in complex device heterostructures. Otherwise, it may cause the device parameters deterioration.     

Raman scattering of polycrystalline GaSb thin films grownby co-evapouration process

<正>This paper reports that GaSb thin films have been co-deposited on soda-lime glass substrates.The GaSb thin film structural properties are characterized by Raman spectroscopy.The Sb-A_1g/GaSb-TO ratio decreases rapidly with the increase of substrate temperature,which suggests a small amount of crystalline Sb in the GaSb thin film and suggests that Sb atoms in the thin film decrease.In Raman spectra,the transverse optical（TO） mode intensity is stronger than that of the longitudinal optical（LO） mode,which indicates that all the samples are disordered.The LO/TO intensity ratio increases with increasing substrate temperature which suggests the improved polycrystalline quality of the GaSb thin film.A downshift of the TO and LO frequencies of the polycrystalline GaSb thin film to single crystalline bulk GaSb Raman spectra is also observed.The uniaxial stress in GaSb thin film is calculated and the value is around 1.0 GPa.The uniaxial stress decreases with increasing substrate temperature.These results suggest that a higher substrate temperature is beneficial in relaxing the stress in GaSb thin film.     

InAs/AlSb/GaSb量子阱中的双色光吸收

为了降低噪声对InAs/GaSb量子阱作为双色电探测器性能的影响,设计性能优良的光电探测器,在InAs/GaSb量子阱中加入AlSb夹层,以减少电子和空穴在界面处的复合,从而抑制由于电子和空穴复合引起的噪声。首先应用转移矩阵方法求解薛定谔方程得到量子阱中电子和空穴的能级和波函数,研究AlSb夹层对电子和空穴波函数的影响。应用平衡方程方法求解外加光场条件下的玻尔兹曼方程,研究所有电子和空穴跃迁通道对光吸收系数的贡献,重点研究了AlSb夹层厚度对光吸收系数的影响。结果表明:基于In As/GaSb的量子阱体系可以实现双色光吸收,加入AlSb夹层可以有效抑制电子和空穴在界面处的隧穿,从而降低复合噪声,同时AlSb夹层的加入也对吸收峰有影响。AlSb夹层的厚度达到2 nm即可有效降低电子和空穴复合噪声,双色光吸收峰在中远红外波段,为该量子阱作为性能良好的中远红外光电探测器提供理论支撑。     

Thermal annealing of GaSb quantum dots in GaAs formed by droplet epitaxy

We investigate effects of annealing on GaSb quantum dots (QDs) formed by droplet epitaxy. Ga droplets grown on GaAs are exposed to Sb molecular beam and then annealed at T_a=340–450 °C for 1 min to form GaSb QDs. An atomic force microscope study shows that with the increase of T_a, the average diameter of dots increases by about 60%, while their density decreases to about 1/3. The photoluminescence (PL) of GaSb QDs is observed at around 1 eV only for those samples annealed above T_a=380 °C, which indicates that the annealing process plays an important role in forming high quality GaSb QDs.