Performance Improvement of Organic Thin Film Transistors Based on Gate Insulator Polymethyl-Methacrylate-co-Glyciclyl-Methacrylate

Organic thin transistors （OTFTs） on indium tin oxide glass substrates are prepared with polymethyl-methacrylate-co-glyciclyl-methacrylate （PMMA-GMA） as the gate insulator layer and copper phthalocyanine as the organic semiconductor layer. By controlling the thickness, the average roughness of surface is reduced and the OTFT performance is improved with leak current decreasing to 10^-11 A and on/off ratio of 10^4. Under the condition of drain-source voltage -20 V, a threshold voltage of -3.5 V is obtained. The experimental results show that PMMA-GMA is a promising insulator material with a dielectric constant in a range of 3.9-5.0.     

Electrical Characterization of Copper Phthalocyanine Thin-Film Transistors with Fluoride Gate Insulator

Different fluoride materlals are used as gate dielectrics to fabricate copper phthalocyanine （CuPc） thin film transistors （OTFTs）. The fabricated devices exhibit good electrical characteristics and the mobility is found to be dependent on the gate voltage from 10^-3 to 10^-1 cm^2V^-1 s^-1. The observed noticeable electron injection at the drain electrode is of great significance in achieving ambipolar OTFTs, The same method for formation of organic semiconductors and gate dielectric films greatly simplifies the fabrication process. This provides a convenient way to produce high-performance OTFTs on a large scale and should be useful for integration in organic displays.     

Electrical Characteristics of Copper Phthalocyanine Thin-Film Transistors with Polyamide-6/Polytetrafluoroethylene Gate Insulator

Polyamide-6（PA 6）/polytetrafluoroethylene is studied as a potential gate dielectric for flexible organic thin film transistors. The same method used for the formation of organic semiconductor and gate dielectric films greatly simplifies the fabrication process of devices. The fabricated transistors show good electrical characteristics. Ambipolar behaviour is observed even when the device is operated in air.     

Performance of Organic Field Effect Transistors with Self-Improved Cu/Organic Interfaces

We fabricate pentacene-based organic field effect transistors （OFETs） with Cu as source and drain （S-D） electrodes. The fabricated devices stored for ten hours under ambient atmospheric conditions exhibit superior performance compared with the as-prepared devices. The field-effect mobility increases from 0. 012 to 0.03 cm^2 V^-1 s^-1, and the threshold voltage downshifts from -14 to -9 V. The on/off current ratios are close to the order of 10^4. The improved performance of the stored devices is attributed to the formation of thin Cu oxide at the Cu electrodes/organic interfaces. These results suggest a simple and available way to optimize device properties and to reduce fabrication cost for OFETs.     

低电压有机薄膜晶体管驱动顶发射有机发光二极管的集成像素的研制

研究了有机薄膜晶体管(OTFT)驱动顶发射有机发光二极管(OLED)的集成制备技术。通过减小栅绝缘层的厚度,达到降低OTFT工作电压的目的。OLED采用标准的绿光器件,利用超薄的Al薄膜作为半透明阴极实现顶发射功能。实现了低电压工作的OTFT与顶发射OLED的集成,其中OTFT的阈值电压为2.0 V,饱和场效应迁移率为0.40 cm2·V-1·s-1。基于实验数据,对集成像素的电特性进行了计算分析,在-5~-10 V的栅电压调控下,像素亮度能在50~250 cd/m2的范围内实现线性灰度调控。     

非晶InGaZnO薄膜晶体管驱动OLED像素电路的仿真研究

为解决非晶InGaZnO薄膜晶体管(a-IGZO TFT)因其阈值电压漂移而导致的OLED电流衰减的问题,本文研究了基于a-IGZO TFT的有源矩阵有机发光显示(AMOLED)像素电路的阈值电压补偿问题。利用实验室制备的a-IGZO TFT器件进行参数提取后建立的SPICE仿真模型并进行仿真计算,对电压驱动型2T1C和4T1C的像素电路进行稳定性的比较研究,证明了4T1C电路对阈值漂移有非常好的补偿效果,并指出增加存储电容值和驱动TFT的宽长比可有效提高OLED电流的保持能力。     

Nondoped Electrophosphorescent Organic Light-Emitting Diodes Based on Platinum Complexes

An undoped electrophosphorescent organic light-emitting diode is fabricated using a pure platinum（Ⅱ） （2-phenylpyridinato-N, Ca） （3-benzoyl-camphor） [（ppy）pt（bcam）] phosphorescent layer acting as the emitting layer. A maximum power efficiency Tlp of 6.621m/W and current efficiency of 14.78 cd/A at 745 cd/m2 are obtained from the device. The roll-off percentage of ηp of the pure phosphorescent phosphor layer device is reduced to 5% at a current density of 20mA/cm2, which is about 11% for conventional phosphorescent devices. The low roll-off efficiency is attributed to the phosphorescent material, which has the molecular structure of a strong steric hindrance effect.     

Room temperature fabrication Oxide TFT with Y2O3 as a gate oxide and Mo contact

In this investigation, an operating voltage as low as 5 V has been achieved for Oxide TFT with Y₂O₃ as a gate oxide and a-IGZO as an active layer. The OTFT has been fabricated at room temperature using RF sputter. The mobility and threshold voltages are 11.3 cm²/V s and 3.4 V for the device with W/L = 0.8, respectively. The annealing at 400 °C in N₂ containing 5% H₂ ambient has been utilized to improve the electrical performance of TFT. The on-off current which is determined by gate dielectric has been observed to be 10⁴. It has also been observed that the dielectric properties of gate oxide deteriorate on annealing. The dielectric constant of Y₂O₃ is observed in the range between 5.1 and 5.4 measured on various devices.     

Synthesis,Characterization of 9, 9＇-Bianthracene and Fabrication of 9, 9＇-Bianthracene Field-Effect Transistors

We synthesize and purify 9, 9＇-bianthracene with the purity up to 96.4%. The electronic and crystallographic structures of 9, 9＇-bianthracene are studied. The results of a joint experimental investigation based on a combination of x-ray diffraction （XRD） spectra, hydrogen nuclear magnetic （HNMR） spectra, infrared absorption （FT-IR） spectra, and mass spectra （MS） of 9, 9＇-bianthracene are obtained. The uniform compact film is observed by an atomic-force microscope （AFM）. Organic field effect transistors （OFETs） with an active layer based on the synthesized 9, 9＇-bianthracene are fabricated for the first time. Its field-effect mobility is as large as 0.067 cm^2 /（V·s） and the on/off ratio is above 5 ×10^4. The result demonstrates that the oligomerization of a small semiconductor molecule is an effective method to develop high-mobility organic semiconductors.     

Capacitance of Organic Schottky Diodes Based on Copper Phthalocyanine （CuPc）

The capacitance of an organic Schottky diode based on copper phthalocyanine （CuPc） is investigated. Based on the organic small-signal equivalent model established, we calculate the reverse capacitance CMetal Of the organic Schottky diode with different kinds of metal cathodes （Mg, Al, Au）. It is found that the reverse capacitance of the organic Schottky diode shows behavior as CMg 〉 CAl 〉 CAu at the same frequency, and according to our analysis, the reverse Schottky junction capacitance Cj is expected to have little effect on the reverse capacitance of the organic Schottky diode, and the space-charge limited current capacitance Us is considered to dominate the reverse capacitance, which limits the improvement of frequency characteristics of organic Schottky diodes.     

Growth Related Carrier Mobility Enhancement of Pentacene Thin-Film Transistors with High-k Oxide Gate Dielectric

Carrier mobifity enhancement from 0.09 to 0.59cm2/Vs is achieved for pentacene-based thin-film transistors （TFTs） by modifying the Hf02 gate dielectric with a polystyrene （PS） thin film. The improvement of the transistor＇s performance is found to be strongly related to the initial film morphologies of pentacene on the dielectrics. In contrast to the three-dimensional island-like growth mode on the HI02 surface, the Stranski- Krastanov growth mode on the smooth and nonpolar PS/HfO2 surface is believed to be the origin of the excellent carrier mobility of the TFTs. A large well-connected first monolayer with fewer boundaries is formed via the Stranski-Krastanov growth mode, which facilitates a charge transport parallel to the substrate and promotes higher carrier mobility.     

Optimized Performances of Thick Film Organic Lighting-Emitting Diodes

The performance of organic light-emitting diodes (OLEDs) with thick film is optimized. The alternative vanadium oxide (V₂O₅) and N,N'-di(naphthalene-1-yl)-N,N'-diphenyl-benzidine (NPB) layers are used to enhance holes in the emissive region, and 4,7-dipheny-1,10-phenanthroline (Bphen) doped 8-tris-hydroxyquinoline aluminium (Alq₃) is used to enhance electrons in the emissive region, thus ITO/V₂O₅ (8nm)/NPB (52nm)/V₂O₅ (8nm)/NPB (52nm)/Alq₃ (30 and 45nm)/Alq₃:Bphen (30wt%, 30 and 45nm)/LiF (1nm)/Al (120nm) devices are fabricated. The thick-film devices show the turn-on voltage of about 3V and the maximal power efficiency of 4.5lm/W, which is 1.46 times higher than the conventional thin-film OLEDs.     

酞菁铜薄膜的折射率及吸收特性

通过真空镀膜法在单晶硅制备了酞菁铜薄膜，在波长扫描和入射角可变全自动椭圆偏振光谱仪上研究了ＣｕＰｃ薄膜的椭偏光谱并分析了其电子结构。     

Fabrication of a graphene field effect transistor array on microchannels for ethanol sensing

A new approach to the fabrication of back-gated graphene FET (field effect transistor) arrays on microchannels was investigated. Narrow walls fabricated on a substrate with SU-8 (a negative photoresist), with top metal electrodes were pressed onto another silicon/SiO₂ substrate with predeposited graphene pieces such that the electrodes came into contact with graphene pieces and formed the source and drain contact. The SU-8 narrow walls with the top metal layer were fabricated by the conventional lift-off process. The graphene pieces were reduced chemically from graphite oxide. The I_DS changed immediately by more than 17% when the device was exposed to an ethanol atmosphere. The current recovered very well after the ethanol gas was pumped out. The SU-8 microchannels served as gas flow passages that helped the ethanol vapor reach the sensitive region of the device: the graphene channel. This work provides a convenient way of constructing back-gated graphene FETs for sensing applications. This method could potentially be scaled up for mass production.     

Low-Voltage Depletion-Mode Indium-Tin-Oxide Thin-Film Transistors Gated by Ba0.4Sr0.6TiO3 Dielectric

We report on the fabrication and characterization of low-voltage indium-tin-oxide （ITO） thin-film transistors （TFTs） gated by a0.4Sr0.6TiO3 （BST） gate dielectric deposited at room temperature. The 400-nm-thick BST film shows a low leakage current density of 6 × 10^-8 A/cm^2 and a high specific capacitance of 83 nF/cm^2 （corresponding εr= 37）. The ITO TFTs gated by such BST dielectric operate in a depletion mode with an operation voltage of 5.0 V. The device exhibits a threshold voltage of -3.7 V, a subthreshold swing of 0.5 V/decade, a field effect mobility of 3.2cm^2/Vs and a current on/off ratio of 1.4× 10^4.     

双异质结结构的双极型有机薄膜晶体管的研制

制备了基于F₁₆CuPc和CuPc的双异质结结构的双极型有机薄膜晶体管。该器件的载流子迁移率是相同工艺制备的F₁₆CuPc和CuPc双层单异质结有机薄膜晶体管器件的4~5倍。同时,该双异质结结构还能调整载流子的阈值电压,减少双层结构对薄膜厚度等工艺条件的苛刻要求。这种双异质结结构为提升双极型有机薄膜晶体管器件的性能提供了一种有效方法。     

Ultra‐high long‐term stability of oxide‐TTFTs under current stress

In this letter the stability of transparent thin‐film transistors (TTFTs) based on the ZnO–SnO₂ (ZTO) material system is investigated. Bottom‐gate devices have been subject to electrical stress via a gate–source bias of 10 V and a drain‐source bias of 10 V leading to a drain–source current of 188 µA. In optimized TTFTs with a composition of [Zn]:[Sn] = 36:64 the relative change of the saturated field effect mobility was less than 1% and the threshold voltage shift was about 320 mV after 1000 hours of operation. This extraordinary stability of ZTO TTFTs underlines their suitability as drivers in active matrix OLED displays. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)     

Switching Characteristics of Phase Change Memory Cell Integrated with Metal-Oxide Semiconductor Field Effect Transistor

A Ge2Sb2Te5 based phase change memory device cell integrated with metal-oxide semiconductor field effect transistor （MOSFET） is fabricated using standard 0.18 #m complementary metM-oxide semiconductor process technology. It shows steady switching characteristics in the dc current-voltage measurement. The phase changing phenomenon from crystalline state to amorphous state with a voltage pulse altitude of 2.0 V and pulse width of 50ns is also obtained. These results show the feasibility of integrating phase change memory cell with MOSFET.     

Thermal stability of CdZnO thin films grown by molecular-beam epitaxy

CdZnO thin films with near-band-edge (NBE) photoluminescence (PL) emission from 2.39 eV to 2.74 eV were grown by plasma-assisted molecular-beam epitaxy on c-plane sapphire substrates with 800 °C in situ annealing. CdZnO thin films evolve from pure wurtzite (wz) structure, to mixture of wz and rock-salt (rs) structures confirmed by X-ray diffraction studies. Rapid-thermo-annealing (RTA) was performed on in situ annealed CdZnO samples. Pure wz CdZnO shows insignificant NBE PL peak shift after RTA, while mixture structure CdZnO shows evident blue shifts due to phase change after annealing, indicating the rs phase CdZnO changes to wz phase CdZnO during RTA process.