高质量胶体晶体薄膜的快速制备及表征

通过控制温度和湿度，用垂直沉积法（vertical deposition method）快速制备出了可精确控制样品的厚度、在较大范围呈现好的有序性的密排结构的聚苯乙烯（PS）胶体晶体 薄膜.利用透射电子显微镜直观准确地确定了样品为面心（fcc）密排结构.通过控制样品干燥速度和加温处理，胶体颗粒排列更加有序,并且克服了胶体晶体干燥后易碎和在水等溶 剂中容易再分散等缺点，为胶体晶体实际应用创造了条件. 关键词： 胶体晶体薄膜 垂直沉积法 面心密排结构 再分散     

采用溶胶凝胶协同自组装与光刻相结合的方法在反蛋白石结构薄膜中引入二维缺陷

采用溶胶凝胶协同自组装与光刻相结合的方法,在光子晶体反蛋白石结构中引入缺陷,通过溶胶凝胶协同自组装方法在硅片上垂直沉积胶体晶体复合薄膜,把BP212正性光刻胶均匀旋涂在复合薄膜上,通过曝光、显影等光刻工艺,把掩膜版图案复制在复合薄膜上,用此样品再次垂直沉积一层复合薄膜,使图案被复合薄膜覆盖.最后去除胶体微球与光刻胶图案,从而在反蛋白石结构中引入缺陷,用扫描电子显微镜对样品进行表征.分析了光刻胶图案对胶体微球排列的影响.     

SiO_2胶体晶体自组装技术

介绍了垂直沉降法和旋涂法制备SiO2胶体晶体,并对两种方法制备的胶体晶体在宏观形貌、微观结构及光子带隙性质进行了比较。采用改进的Stober法在乙醇介质中合成粒径不同、单分散性较好的SiO2微球,用垂直沉积法和旋涂法制备出有序性较好的密排结构的SiO2胶体晶体。宏观照片表明,用旋涂法制备的SiO2胶体晶体经白光照射出现的光柱呈6次对称,而垂直沉降法制备的胶体晶体表面出现条纹。SEM分析表明,选用不同溶剂在同等旋涂工艺下制备SiO2胶体晶体,用乙醇和乙二醇混合溶液作溶剂制备出的SiO2胶体晶体质量最好。透射光谱表明,垂直沉降法所制备的胶体晶体在(111)方向具有明显的光子带隙性质,而旋涂法制备的胶体晶体则不明显。     

光纤表面自组装胶体晶体微结构的实验研究

利用自组装方法在普通单模光纤裸纤表面生长胶体晶体,采用自组装方法制备了一种新型的三维光子晶体微结构光纤。将单分散度小于2％的二氧化硅胶体微球超声分散于乙醇溶液,通过垂直沉积法在表面经湿法腐蚀处理的裸光纤表面组装胶体晶体。采用SEM对样品进行表征,胶体样品表面为六角密排列,晶体呈FCC结构,其（111）晶面平行于光纤表面。当微球直径远小于光纤直径时,在60℃温度下制备的胶体样品有较好的质量。     

光纤圆柱曲面基底胶体微球的自组装

以标准单模光纤包层的外表面作为基底,通过改进的恒温蒸发对流引导合理控制溶剂蒸发温度和液体表面下降的速度,使用垂直沉积法在其曲面圆柱型基底涂覆三维二氧化硅胶体晶体。单模光纤垂直插入二氧化硅胶体溶液中,处于圆形容器的中心,在毛细力的驱动下胶体微球在光纤外表面形成三维的胶体晶体薄膜。实验所用二氧化硅微球平均粒径为390 nm,晶体生长时间仅为12 h。用扫描电子显微镜(SEM)分析了样品的表明形貌:确定了样品表面面心立方结构的[111]和[100]两种晶向排列,同时发现了[100]晶向之间有规律的[111]晶向排列的交叉图案。对胶体微球不同的晶向排列以及交叉图案进行了定性的分析和讨论。     

通讯波段禁带胶体光子晶体的制备及实验参数研究

采用直径为700nm的二氧化硅微球,通过垂直沉积法在玻璃基片上制备了位于光通讯波段的禁带胶体光子晶体。研究了不同蒸发温度、湿度条件、干燥过程对样品晶体质量的影响。用扫描电子显微镜(SEM)对其形貌进行了观测。实验结果表明,在温度为65℃,相对湿度为70%,缓慢干燥条件下制备出的样品具有较好的晶体质量,晶体在大范围内保持了面心立方(FCC)单晶结构,其(111)面平行于生长基片。     

圆柱基底上胶体晶体的制备及光学特性表征

在圆柱基底的曲面上利用垂直沉积法将胶体小球自组装生长为胶体晶体.观察了晶体形貌,搭建了光学测试系统,并对其光学特性进行了表征.讨论了不同实验参数对曲面上胶体晶体生长过程及质量的影响.实验结果表明,在合适的温度和浓度下,在毛细管曲面上制备了高质量的胶体晶体.     

基于光纤的三维可调胶体光子晶体

用改进的垂直沉积法在光纤端面制备了高质量的SiO₂胶体光子晶体,经过烧结、固化构成胶体光子晶体-光纤结构. 用扫描电子显微镜确定了样品为面心立方密排结构,其密排面平行于光纤基底表面. 利用全光纤传感网络测试了该胶体光子晶体,反射峰中心位于845 nm处,与Bragg理论计算值符合很好. 将该样品浸入不同折射率的液体中,反射光谱的峰值位置随着液体折射率的改变而发生偏移,近似呈线性关系,实现了峰位可调. 对于不同浓度引起的液体折射率的变化,基于光纤的胶体光子晶体结构也能够很好地分辨出来. 关键词： 可调胶体光子晶体 2微球')" href="#">SiO₂微球 Bragg反射 光纤     

二氧化硅胶体球自组装光子晶体的研究

光子晶体由于具有光子带隙和光子局域等一系列优异的光学特性而受到了人们广泛的关注。由于采用胶体颗粒自组装法制备光子晶体制备工艺简单,所需要的费用也较低,因此已成为制备可见光至红外波段三维光子晶体的一种简便有效的方法。采用垂直沉积法制得了三维光子晶体薄膜,并用扫描电子显微镜和紫外-可见光-近红外分光光度计对其显微结构和光学特性进行了详细的研究。结果表明,自组装薄膜在三维方向上都具有有序结构,其密排面平行于载波片的表面。制备的光子晶体薄膜具有明显的光子带隙特性,带隙中心波长为956nm。研究了带隙中心波长同入射线与密排面法线夹角之间的变化关系,其结果与理论值吻合得很好。     

Ag/Fe/Ag 纳米颗粒膜磁特性和微结构

"利用对靶磁控溅射法制备了一系列Ag/Fe/Ag纳米薄膜,沉积态样品Fe层厚度固定为35 nm,Ag层厚度为1、2、3、4、5 nm．随后对沉积态样品进行了退火处理,退火温度分别为200、300、400、500、600 ℃ , 退火30 min． 利用VSM测量了样品的磁特性, 利用SPM观察样品表面形貌和磁畴结构,并且利用XRD分析了样品的晶体结构．研究结果表明,沉积态样品随Ag层厚度的变化,垂直和平行膜面矫顽力均先增加后减小．当Ag层厚度为3 nm时,垂直膜面矫顽力最大约为260 Oe,样品颗粒分布均     

Deposition of Na2WO4 films by ultrasonic spray pyrolysis: effect of thickness on the crystallographic and sensing properties

Na₂WO₄ films have been grown on Si (1 0 0) and glass substrate using ultrasonic spray pyrolysis. The films are prepared from aqueous solution containing Na₂WO₄·2H₂O at 475 °C temperature and characterized by XRD and SEM techniques and the chemical composition of the films have been verified by EDX and PIXE and its formula Na₂WO₄ is confirmed by XRD. The evolution of the crystallinity was studied as a function of film thickness ranging from 2500 to 4200 nm, which corresponds to a deposition time from 10 to 30 min, respectively. The crystalline quality was found to improve, where the grain size values increased with increasing thickness. Atomic Force Microscopy (AFM) was used to study the morphology evolution with the deposition time, where porous films were found due to the synthesis parameters, and a better sensing response to gases was developed with increasing thickness. Thus, this study demonstrates the possibility of utilizing Na₂WO₄ thick films as a sensor element for the detection of ethanol vapor at room temperature, where thicker films exhibit excellent ethanol vapor sensing properties with a maximum sensitivity at 25 °C in air atmosphere with fast response time.     

Efficient fabrication of substrates for surface-assisted laser desorption/ionization mass spectrometry using laser ablation in liquids

Substrates for the surface-assisted laser desorption ionization (SALDI) technique were prepared using electrophoresis of gold nanoparticles produced by laser ablation in liquids. Throughout the preparation, no supplemental reagent was added for the stabilization and deposition of nanoparticles. Nanoparticles were deposited more uniformly using the electrophoresis technique than using dropping of the solution. Results demonstrated that the higher uniformity of the deposition of nanoparticles improved the reproducibility of SALDI measurements. Furthermore, the thickness of the deposited nanoparticles influences the SALDI efficiency.     

Photovoltaic properties of the copper-phthalocyanine and ZnO nanorod array system affected by ethanol

Well-aligned ZnO nanorod array, fabricated on conductive indium-tin-oxide (ITO) substrate by wet chemical bath deposition (CBD) method, was characterized by scanning electron microscopy (SEM) and X-ray diffraction (XRD). Surface photovoltage (SPV) technique was employed to study the photovoltaic properties of the copper-phthalocyanine (CuPc) and ZnO nanorod array system affected by ethanol. Prior to ethanol adsorption, two pronounced SPV response bands were exhibited for this system in the range 300-410 and 540-760 nm, respectively. Post-adsorption measurements reveal that the SPV intensity of the former band is enhanced, while that of the latter band is suppressed if ethanol was used to modify CuPc surface. Moreover, both of the SPV intensity of two response bands is enhanced if ethanol was used to modify ZnO and CuPc interface. Mechanisms of these phenomena were suggested.     

Diamond-DLC double layer used in corrosive protective coating

Pinhole-free diamond layers can widely be used in sensor technology as resistive coating against electrolyte solutions. The diamond layers created with chemical vapour deposition technique (CVD) are pinhole-free only above a certain thickness (at least 2.4 μm). Such layer thicknesses reduce the application possibilities. On the other hand, thin (∼200 nm) diamond like carbon (DLC) layers deposited by pulsed laser deposition technique (PLD) are pinhole free but have adhesion or contiguity problems depending on layer thickness. Utilizing the advantages of these two techniques a combined method was developed in order to prepare a pinhole free thin diamond-DLC double layer, for corrosion protection coating. The effects of various deposition parameters (such as background gas, temperature, bias, layer thickness) on the protective properties of the layers have been studied.     

金属诱导生长与超高真空化学气相沉积方法相结合制备多晶锗硅薄膜

采用金属Ni诱导与超高真空化学气相沉积(UHVCVD)相结合的方法，在热氧化硅衬底上生长了多晶锗硅薄膜.利用X射线衍射(XRD)、场发射扫描电镜(SEM)等对多晶锗硅薄膜的质量、表面形貌进行了测试分析，并就生长参数以及金属Ni对薄膜性能的影响进行了研究.结果表明：1)在420—500℃范围内，金属Ni具有明显的诱导作用；2)Ni层厚度对薄膜质量及形貌的影响使得晶粒尺寸随Ni厚度增加存在一极大值.在Ni层厚度为60nm时，能够获得晶粒尺寸均匀，晶粒大小为500—600nm，结晶质量良好的多晶锗硅薄膜. 关键词： 超高真空化学气相沉积 金属诱导 镍 多晶锗硅     

Studies on surface deformation of copper sulphide thin films by holographic interferometry technique

Holographic interferometry technique used to study the surface deformation of electrodeposited copper sulphide thin films on stainless steel substrate is here presented. It is concerned with the formation and interpretation of fringe patterns, which appears when a wave generated at some earlier time and stored in a hologram is later reconstructed by interfering with comparison wave. The proposed technique uses double exposure holographic interferometry (DEHI) together with simple mathematical relation, which allows immediate finding of stress, mass deposited and thickness of thin film. It must be further noted that, fringe spacing changes with time of deposition as well as solution concentration. The structural study (XRD) is carried out for the confirmation.     

Anomalous scaling in surface roughness evaluation of electrodeposited nanocrystalline Pt thin films

Atomic force microscopy (AFM) is used to measure the surface roughness of crystalline Pt thin films as a function of film thickness and growth rate. Our films were electrodeposited on Au/Cr/glass substrates, under galvanostatic control (constant current density), from a single electrolyte containing Pt⁴⁺ ions. Crystalline structure of the films was confirmed by X-ray diffraction (XRD) technique. The effect of growth rate (deposition current density) and film thickness (deposition time) on the kinetic roughening of the films were studied using AFM and roughness calculation. The data is consistent with a rather complex behaviour known as “anomalous scaling” where both local and large scale roughnesses show power law dependence on the film thickness.     

Quality of horizontally aligned single-walled carbon nanotubes: Is methane as carbon source better than ethanol?

Chemical vapor deposition (CVD) growth of horizontally aligned single-walled carbon nanotubes (SWNTs) was studied using two representative carbon source sources: ethanol and methane. The resulting SWNTs were compared for similar reaction conditions which were based on the formation of Ni metal nanoparticles selective electrochemical deposition (SED) on the defect sites of SWNTs. The products were analyzed by Raman spectroscopy and SEM. The results demonstrate that methane was much better carbon source for growing high quality horizontal alignment of SWNTs than ethanol due to the etching effects of OH radicals on the SWNTs.     

Effects of pulse laser duration and ambient nitrogen pressure in PLD of AlN

AlN thin films with a thickness in the nanometer range were prepared by pulsed laser deposition technique. We investigated the effect of laser wavelength, pulse duration, and ambient gas pressure on the composition and morphology of the deposited films. In all experiments we used AlN targets. We worked with three laser sources generating pulses of 34 ns@248 nm (source A), 450 fs@248 nm (source B), and 50 fs@800 nm (source C). XRD, SEM, and profilometric measurements were performed on the obtained AlN thin films. We have demonstrated that duration of the laser pulse is an important parameter for the quality and performances of AlN structures obtained by pulsed laser deposition. PACS 81.05.Ea; 81.15.Fg; 61.10.Nz     

Pulsed laser deposition (PLD) — an advanced state for technical applications

The conventional thin-film deposition equipment of pulsed laser deposition (PLD) has been modified for the preparation of individual thin solid films and nanometer-layer stacks of uniform thickness across 100-mm substrates. The planar target configuration was replaced by a cylindrical one and the target motion regime has been improved to provide precise spatial control of the plasma plume orientation. During thin-film deposition, substrate translation is preferred instead of the usual rotation technique. With this arrangement the emission characteristic of the plasma source can be computer controlled and the desired coating can be tailored via a stepper-motor-driven manipulator for the desired layer thickness profile across an extended substrate. Thus, for example, a homogeneous film thickness is obtained even for lower target/substrate distances, and an appropriate deposition rate can be maintained. In a second version, this cylinder geometry principle of plasma plume control by target surface morphology is extended to a spatial solution. The hemispherical target surface becomes the basic element for inside-wall coating of tubes or even of more complex hollow bodies. First applications of the equipment are explained and compared with typical results of the conventional technique.