La0.33Pr0.34Ca0.33MnO3薄膜的应变效应

采用脉冲激光沉积法分别在(100)LaAlO₃和(100)SrTiO₃基片上生长了La_0.33Pr_0.34Ca_0.33MnO₃薄膜,并通过磁测量和电输运测量对生长在不同基片上的La_0.33Pr_0.34Ca_0.33MnO₃薄膜的物性进行了研究.结果表明,基片和薄膜之间的压应力导致La_{关键词： 钙钛矿锰氧化物 相分离 电荷有序}     

Selective wet-etching of amorphous/crystallized Ag–As–S and Ag–As–S–Se chalcogenide thin films

The paper is focused on the possibilities of selective wet etching of optically and thermally crystallized/amorphous Ag-doped chalcogenide thin films, namely Ag_x(As_0.33S_0.67)_100−x and Ag_x(As_0.33S_0.335Se_0.335)_100−x. The selective etching of optically(thermally) crystallized Ag_x(As_0.33S_0.67)_100−x and thermally crystallized Ag_x(As_0.33S_0.335Se_0.335)_100−x thin films in water solution of NaCN is presented. The good surface quality is an important and crucial parameter for optical elements fabrication (e.g. grids, waveguides, etc.) especially in nanometer dimensions. The selective etching of undoped and Ag optically doped region was also carried out to observe surface roughness of doped region before and after selective etching. Characterization of the structure and surface of studied films by Raman spectroscopy, X-ray diffraction, AFM and SEM methods has been done and potential application suggested.     

Thickness dependence of electroresistance in La0.67Ca0.33MnO3 epitaxial films

The electroresistance (ER) of La_0.67Ca_0.33MnO₃ (LCMO) epitaxial thin films with different thicknesses was studied. For the 110 nm thick LCMO film, its ER shows a maximum at T_p, where the resistance shows a peak, and decreases to zero at lower temperatures. While for the 30 nm thick LCMO film, its ER is remarkable in a wide temperature range. Another interesting observation in this work is that the electric current can tune the magnetoresistance of the ultrathin LCMO thin film. The results were discussed by considering the coexistence of ferromagnetic metallic phase with the charge ordered phase, and the variation of the phase separation with film thickness and electric current. This work also demonstrates that electric current can tune the magnetoresistance of the manganites, which is helpful for their applications.     

Effect of dispersion degree of orientation on dielectric properties of (100)-oriented PST thin film

(100) Oriented (Pb_xSr_1−x)TiO₃ (PST) thin films were prepared on indium tin oxide coated glass substrates by sol–gel technique with rapid thermal processing. The dielectric permittivity and tunability of the thin films with different dispersion degrees of orientation were investigated in detail by characterizing the full width at half maximum of their (100) peak based on rocking curves at different annealing temperatures. Influence of orientation dispersion on dielectric properties was exhibited in the tunable dielectric thin films. It shows that the dielectric constant and hence the tunability of the sol–gel derived PST thin films are improved with the decrease in the dispersion degree of orientation of the perovskite phase other than the increase in the content of crystalline phase in the thin films. The dielectric constant (capacitance) and figure of merit of the oriented thin films are 3–6 times and 1 times higher than that of randomly oriented thin film respectively.     

Synthesis and characteristics of KTa0.5Nb0.5O3 thin films

KTa_0.5Nb_0.5O₃ thin films were synthesized via a metal-organic solution. Characteristics were measured, such as X-ray diffraction pattern, surface morphology and roughness, and electric properties. The synthesized films have a (100) preferential growth orientation on Si (100) substrate. The homogeneous microstructure and smooth surface benefit to the good electric properties of the thin films. The current density-voltage characteristic shows an unexpected feature of the transition from linear to nonlinear, which can be explained by the space-charge-limited mode. Dielectric constant and loss of the thin films decrease with the increase of frequency. The decrease of dielectric loss is related to the decrease of net polarization in material. The decrease of dielectric constant can be explained by Debye formula. The phase transition temperature T _c is about 102 °C for KTa_0.5Nb_0.5O₃ materials.     

相分离La0.33Pr0.34Ca0.33MnO3薄膜体系中的交换偏置效应

在相分离La_0.33Pr_0.34Ca_0.33MnO₃薄膜体系中发现了大的交换偏置效应．在4 K时,交换偏置场的大小达到了约1 kOe．交换偏置效应可能源自薄膜内禀的电子相分离特性或薄膜的表面效应．交换偏置效应表现出强的温度、冷却磁场以及厚度依赖的关系．     

Surface and bulk phenomena in the process of hydride formation in thin films of rare earth metals: Comparison between terbium and europium

Work function changes ΔΦ caused by H₂ interaction with thin terbium and europium films deposited on glass under UHV conditions were correlated with hydrogen uptake and electrical resistance R, measured in situ. For both metals, the course of ΔΦ(H/Me) at room temperature confirms the change in charge-transfer direction on the surface during hydride formation. As a result, the hydrogen adsorbate's nature is changed from positively polarized (precursor state) to negatively polarized adspecies. The hydrogen behavior is significantly different at low temperature due to the formation of the surface ordered low-temperature phase (α′) with positively polarized hydrogen adspecies. This phase, strongly inhibiting penetration of hydrogen into the bulk, is stable up to 100 K for terbium and 160 K for europium. Increasing temperature above these values resulted in additional large absorption of hydrogen. Moreover, differences in the course of R(H/Me) are clearly noticeable between the investigated metals. The resistance of thin TbH_x (x ∼ 3) films in our experiments did not exceed 1 kΩ, however transition of thin metallic europium film into EuH_y (y ∼ 2) increased the resistance up to 10 MΩ. This dissimilarity in electrical behavior can be explained by the coexistence of two factors which are different for the two metals in question: the phase relation of hydrides and the response of thin film to stress generated during hydride formation.     

Relevancy of phase separation between electrical and thermal properties in La0.8Sr0.2MnO3 thin films

For the purpose of finding the relevancy of phase separation between electrical and thermal properties, La_0.8Sr_0.2MnO₃ thin films, deposited on quartz glass substrates, were studied for temperature dependent resistance and thermal emittance. Based on the phase separation concept, metal phase volume fraction f was calculated from the temperature dependence of resistance and emittance properties by a phenomenological model and two-energy-level Boltzmann distribution, respectively. The two sets of f coincide with each other very well. The results show f plays an important role in the electrical transportation and thermal properties, and the two properties are essentially correlated by f.     

Response of the electrical resistivity of La<Subscript>0.67</Subscript>Ba<Subscript>0.33</Subscript>MnO<Subscript>3</Subscript>(20 nm)/LaAlO<Subscript>3</Subscript>(001) films to magnetic field and variation in temperature

The structure, electrical resistivity, and magnetotransport parameters of 20-nm-thick epitaxial La_0.67Ba_0.33MnO₃ films grown by laser ablation on LaAlO₃(001) substrates are studied. The unit cell volume V _eff = 58.80 ų of the as-grown manganite films is found to be less than that for bulk La_0.67Ba_0.33MnO₃ crystals. Maximum values of the negative magnetoresistance MR(μ₀ H = 1 T) = ?0.27 for La_0.67Ba_0.33MnO₃ films are observed at a temperature of about 225 K. For 5 < T < 100 K, the film magnetoresistance depends only weakly on temperature and is on the order of ?0.1. At temperatures below 100 K and for 3 < μ₀ H < 5 T, the electrical resistivity of the as-grown films decreases linearly with increasing magnetic field.     

Chemical bath-deposited ZnS thin films: Preparation and characterization

Chemical bath deposition of ZnS thin films from NH₃/SC(NH₂)₂/ZnSO₄ solutions has been studied. The effect of various process parameters on the growth and the film quality are presented. The influence on the growth rate of solution composition and the structural, optical properties of the ZnS thin films deposited by this method have been studied. The XRF analysis confirmed that volume of oxygen of the as-deposited film is very high. The XRD analysis of as-deposited films shows that the films are cubic ZnS structure. The XRD analysis of annealed films shows the annealed films are cubic ZnS and ZnO mixture structure. Those results confirmed that the as-deposited films have amorphous Zn(OH)₂. SEM studies of the ZnS thin films grown on various growth phases show that ZnS film formed in the none-film phase is discontinuous. ZnS film formed in quasi-linear phase shows a compact and a granular structure with the grain size about 100 nm. There are adsorbed particles on films formed in the saturation phase. Transmission measurement shows that an optical transmittance is about 90% when the wavelength over 500 nm. The band gap (E_g) value of the deposited film is about 3.51 eV.     

Reactive sputtering of (Co,Fe) nitride thin films on TiN-bufferd Si

Epitaxial (Co,Fe) nitride films were prepared on TiN buffered Si(001) substrates by dual-target reactive co-sputtering method. With lower Co content, thin films mainly consist of (Co _x Fe_1?x )₄N phase. With higher Co content, STEM EELS found no N signal in the thin film, and, combined with XRD results, shows that fcc Co is the main phase of the thin films instead of Co₄N. The N₂ atmosphere is helpful to induce the fcc Co phase formation during dual-target reactive co-sputtering deposition. For the films with less Co content, the RT magnetization measurements show similar magnetic properties as epitaxial Fe₄N(001) films, while increasing the Co content, the resulting fcc Co thin films show biaxial anisotropy with the [110] in-plane easy axis.     

Dynamic phase separation as revealed by the strong resistance relaxation in epitaxially shear-strained La0.67Ca0.33MnO3/NdGaO3(0 0 1) thin-films

Strong phase competitions between the ferromagnetic metal and the charge-ordered-insulator have been induced in a wide temperature range of 10-256 K for the shear-strained La_0.67Ca_0.33MnO₃/NdGaO₃(0 0 1) films. Based on various magnetotransport measurements, the mobility of phase boundaries was inferred to change dramatically with temperature. In the high temperature range where the phase boundaries are movable, strong relaxation in resistivity was observed, while at the frozen temperatures lower than 40 K it is weakened. The resistivities tend to relax in accordance with the phase transitions driven by the temperature or magnetic field in the phase separation (PS) background. Moreover, to our surprise, while the melting fields of the insulating phase varied with film thicknesses, for a given film however, they stay unchanged when started with different phase fractions produced by the field or thermal cycling. The results show a crucial role of the inherent strain state in determining PS and phase competitions in these epitaxial thin films.     

Ferromagnetism modulation by phase change in Mn-doped GeTe chalcogenide magnetic materials

In this work, an effective method to modulate the ferromagnetic properties of Mn-doped GeTe chalcogenide-based phase change materials is presented. The microstructure of the phase change magnetic material Ge_1?x Mn _x Te thin films was studied. The X-ray diffraction results demonstrate that the as-deposited films are amorphous, and the crystalline films are formed after annealing at 350 °C for 10 min. Crystallographic structure investigation shows the existence of some secondary magnetic phases. The lattice parameters of Ge_1?x Mn _x Te (x = 0.04, 0.12 and 0.15) thin films are found to be slightly different with changes of Mn compositions. The structural analysis clearly indicates that all the films have a stable rhombohedral face-centered cubic polycrystalline structure. The magnetic properties of the amorphous and crystalline Ge_0.96Mn_0.04Te were investigated. The measurements of magnetization (M) as a function of the magnetic field (H) show that both amorphous and crystalline phases of Ge_0.96Mn_0.04Te thin film are ferromagnetic and there is drastic variation between amorphous and crystalline states. The temperature (T) dependence of magnetizations at zero field cooling (ZFC) and field cooling (FC) conditions of the crystalline Ge_0.96Mn_0.04Te thin film under different applied magnetic fields were performed. The measured data at 100 and 300 Oe applied magnetic fields show large bifurcations in the ZFC and FC curves while on the 5,000 Oe magnetic field there is no deviation.     

Transport parameters of granular La0.67Ca0.33MnO3 films grown on an R-plane sapphire

Precisely (100)-oriented, 200-nm thick La_0.67Ca_0.33MnO₃ films have been grown by laser ablation on a sapphire (R-plane) substrate covered by a (100)SrTiO₃/(001)Bi₂SrNb₂O₉/(001)CeO₂ trilayer buffer. The azimuthal misorientation of crystal grains (50–300 nm) in the La_0.67Ca_0.33MnO₃ films decreased by about 40% as the condensation temperature was increased ered from 760 to 810° C. The lattice parameter of the grown manganate films was reduced to 3.81–3.82 Å by enriching them with oxygen. The maximum in the temperature dependence of the electrical resistivity of the La_0.67Ca_0.33MnO₃ films grown was shifted toward lower temperatures by 20–50 K relative to its position for bulk ceramic samples of a stoichiometric composition. The largest magnetoresistance (MR=42% at H=0.4 T) was found in La_0.67Ca_0.33MnO₃ films with a Mn⁴⁺ concentration on the order of 50% (T=166 K).     

Magnetoresistance and electron paramagnetic resonance study of La0.67−yYyBa0.33MnO3/LaAlO3 thin films

Magnetoresistive La_0.67−yY_yBa_0.33MnO₃/LaAlO₃ thin films were prepared by the sol-gel spin-coating method. Our resistivity and the electron spin resonance (ESR) measurements indicate that the main factor determining the metal-insulator transition temperature T_m is the cation disorder represented by the cation radii variance σ², and that ferromagnetic insulating regions coexist in the ferromagnetic metallic phase. In the paramagnetic phase, the dissociation energy of spin clusters and the polaron hopping energy obtained from the ESR intensity and linewidth also displayed a prominent dependence on σ². Polaron localization due to Jahn-Teller distortions appears to be responsible simultaneously for the decrease in the ferromagnetic order and for the increase in the orbital order.     

Epitaxial growth and structural characterization of Pb(Fe1/2Nb1/2)O3 thin films

We have grown lead iron niobate thin films with composition Pb(Fe_1/2Nb_1/2)O₃ (PFN) on (0 0 1) SrTiO₃ substrates by pulsed laser deposition. The influence of the deposition conditions on the phase purity was studied. Due to similar thermodynamic stability spaces, a pyrochlore phase often coexists with the PFN perovskite phase. By optimizing the kinetic parameters, we succeeded in identifying a deposition window which resulted in epitaxial perovskite-phase PFN thin films with no identifiable trace of impurity phases appearing in the X-ray diffractograms. PFN films having thicknesses between 20 and 200 nm were smooth and epitaxially oriented with the substrate and as demonstrated by RHEED streaks which were aligned with the substrate axes. X-ray diffraction showed that the films were completely c-axis oriented and of excellent crystalline quality with low mosaicity (X-ray rocking curve FWHM?0.09°). The surface roughness of thin films was also investigated by atomic force microscopy. The root-mean-square roughness varies between 0.9 nm for 50-nm-thick films to 16 nm for 100-nm-thick films. We also observe a correlation between grain size, surface roughness and film thickness.     

The suppression of structural phase transformation in LaVO3 and La1−xSrxVO3 thin films fabricated by pulsed laser deposition

Highly oriented (100) thin films of LaVO₃ and La_1−xSr_xVO₃ have been fabricated by pulsed laser deposition in a reducing atmosphere. The films show a transition from insulating to metallic behaviour in the composition region of x, 0.175<x<0.200. In the single crystals of the antiferromagnetic insulating phase, a first-order structural phase transition is observed few degrees below the magnetic transition, which manifests itself as a kink in the temperature dependence of resistivity. In the highly oriented thin films of LaVO₃ and La_1−xSr_xVO₃ fabricated on lattice matched substrates in this study, the structural phase transformation in the insulating phase has been suppressed. The electrical conduction is found to take place via hopping through localized states at low temperatures. The metallic compositions show a non-linear (T^1.5) behaviour in the temperature dependence of resistivity. V (2p) core level spectra of these films show a gradual change in the relative intensities of V³⁺ and V⁴⁺ ions as the value of x increases.     

Pure and Nb-doped TiO1.5 films grown by pulsed-laser deposition for transparent p-n homojunctions

Pure and Nb-doped titanium oxide thin films were grown on sapphire substrates by pulsed-laser deposition in vacuum (10⁻⁷ mbar). The PLD growth leads to titanium oxide thin films displaying a high oxygen deficiency (TiO_1.5) compared with the stoichiometric TiO₂ compound. The structural and electrical properties (phase, crystalline orientation, nature and concentration of charge carriers, etc.) of these titanium oxide films were studied by XRD measurements and Hall effect experiments, respectively. The undoped TiO_1.5 phase displayed a p-type semiconductivity. Doping this titanium oxide phase with Nb⁵⁺ leads to an n-type behaviour as is generally observed for titanium oxide films with oxygen deficiency (TiO_x with 1.7 < x < 2). Multilayer homojunctions were obtained by the stacking of TiO_1.5 (p-type) and Nb-TiO_1.5 (n-type) thin films deposited onto sapphire substrates. Each layer is 75 nm thick and the resulting heterostructure shows a good transparency in the visible range. Finally, the I-V curves obtained for such systems exhibit a rectifying response and demonstrate that it is possible to fabricate p-n homojunctions based only on transparent conductive oxide thin films and on a single chemical compound (TiO_x).     

Characterization of Cu(In,Ga)Se2 thin films prepared by evaporationfrom ternary compounds

Thin films of Cu(In,Ga)Se₂ were fabricated by evaporation from ternary CuGaSe₂ and CuInSe₂ compounds for photovoltaic device applications and their properties were investigated. From XRF analysis, the Cu:(In+Ga):Se atomic ratio in all thin films was approximately 1:1:2. The Ga/(In+Ga) atomic ratio in the thin films changed linearly from 0 to 1.0 with increasing the [CGS]/([CGS]+[CIS]) mole ratio in the evaporating materials. However, for thin films prepared at the [CGS]/([CGS]+[CIS]) mole ratio above 0.4, the composition by EPMA analysis was not consistent with that by XRF analysis. The result of EPMA analysis showed that the surface of a thin film was Cu-rich. XRD studies demonstrated that the thin films prepared at the [CGS]/([CGS]+[CIS]) mole ratio under 0.2 had a chalcopyrite Cu(In,Ga)Se₂ structure and the preferred orientation to the 112 plane. On the other hand, XRD patterns of the thin films produced at the [CGS]/([CGS]+[CIS]) mole ratio above 0.6 showed the diffraction lines from a chalcopyrite Cu(In,Ga)Se₂ and a foreign phase. The separation of a peak was observed near 2θ=27°, indicative the graded Ga concentration in Cu(In,Ga)Se₂ thin film.     

Structural,optical, and electrical properties of boron-doped ZnO1-xSx thin films deposited by MOCVD

Boron-doped ZnO_1-xS_x (ZnO_1-xS_x:B) thin films were fabricated by metalorganic chemical vapor deposition (MOCVD). We investigated the structural, optical, and electrical properties of the ZnO_1-xS_x:B thin films. X-ray diffraction patterns showed that, except for the ZnO:B (x?=?0) and ZnS:B (x?=?1) thin films, the ZnO_1-xS_x:B thin films exhibit amorphous characters. Optical transmittance spectra were analyzed to estimate the band gaps of the thin films with different S content. All thin films showed direct band gaps ranging from 3.34?eV (ZnO:B) to 3.49?eV (ZnS:B). The influence of sulfur content on carrier concentration, electrical resistivity, and Hall mobility of the ZnO_1-xS_x:B thin films were analyzed from Hall effect measurements measured at temperatures ranging from liquid nitrogen temperature to room temperature. The ZnO_1-xS_x:B thin films exhibited n-type electrical conductivity except for ZnS:B, which was not measurable in this study due to its high resistivity (>100?Ω?cm).