Ultrathin films of lead oxide on gold: Dependence of stoichiometry, stability and thickness on O2 pressure and annealing temperature

Ultrathin oxide films grown in vacuum are important in many industrial areas, including microelectronics and heterogeneous catalysis. In this paper, the dependence of oxide stoichiometry, growth kinetics, thickness and stability on O₂ pressure and annealing temperature are explored using a high-stability quartz-crystal microbalance and Auger spectroscopy, for the oxidation of lead on gold as a model system. The oxide thickness increases abruptly at specific values of the O₂ pressure, as explained previously using Gibbs free energies. A qualitative difference is found between lead-oxide films which are 1 monolayer thick and those which are 2 or more monolayers thick; the former apparently involve exclusively chemisorbed oxygen and can be oxidized and reduced reversibly using thermal oxidation/annealing cycles, whereas the latter involve an extended lead oxide, are more thermally stable, and have a smaller electron inelastic mean free path. Accurate values of the O₂ sticking probability are obtained.     

A temperature programmed desorption study of the reaction of methylacetylene on Pt(111) and Sn/Pt(111) surface alloys

The adsorption and reaction of methylacetylene (H₃CC≡CH) on Pt(111) and the p(2×2) and

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surface alloys were investigated with temperature programmed desorption, Auger electron spectroscopy and low energy electron diffraction. Hydrogenation of methylacetylene to form propylene is the most favored reaction pathway on all three surfaces accounting for ca 20% of the adsorbed monolayer. Addition of Sn to the Pt(111) surface to form these two ordered surface alloys suppresses the decomposition of methylacetylene to surface carbon. The alloy surfaces also greatly increase the amount of reversibly adsorbed methylacetylene, from none on Pt(111) to 60% of the adsorbed layer on the

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surface alloy. Methylacetylene reaction also leads to a small amount of desorption of benzene, along with butane, butene, isobutylene and ethylene. There is some difference in the yield of these other reaction products depending the Sn concentration, with the (2×2)-Sn/Pt(111) surface alloy having the highest selectivity for these. Despite previous experiments showing cyclotrimerization of acetylene to form benzene on the Pt–Sn surface alloys, the analogous reaction of methylacetylene on the alloy surfaces was not observed, that is, cyclotrimerization of methylacetylene to form trimethylbenzene. It is proposed that this and the high yield of propylene is due to facile dehydrogenation of methylacetylene because of the relatively weak H–CH₂CCH bond compared to acetylene. The desorption of several C₄ hydrocarbon products at low (<170 K) temperature indicates that some minor pathway involving C–C bond breaking is possible on these surfaces.     

Lateral interactions and nonequilibrium in adsorption and desorption. Part 2. A kinetic lattice gas model for (2 × 2)-(3O + NO)/Ru(0 0 1)

A kinetic lattice gas model is set up to study nonequilibrium effects in thermal desorption caused by limited mobility in the adsorbate. Treating the theoretical desorption spectra as input data we show that nonequilibrium effects must show up when different types of Arrhenius analyses, such as threshold and isosteric methods, are applied. We obtain estimates of the lateral NO interaction energies. The theory developed here has broader applicability beyond the present system.     

Rate processes on a square lattice with top and bridge sites for adsorption

Thermal desorption and surface diffusion on a square lattice are analyzed in the framework of the lattice-gas model taking into account top and bridge sites for adsorption (with the difference in the partition functions for frustrated translations on these sites) and the nearest-neighbour and next-nearest-neighbour adsorbate-adsorbate interactions. For physically reasonable sets of parameters, the calculated thermal desorption spectra are rather insensitive with respect to the relative population of top and bridge sites. The same conclusion is applicable to the coverage dependence of the chemical diffusion coefficient. General results and discussion are accompanied by simulation of CO adsorption on Ni(001).     

Role of surface and interface science in chemical vapor deposition diamond technology

Diamond is well known as the hardest material in nature. It also has other unique bulk physical and mechanical properties, such as very high thermal conductivity and broad optical transparency, which enable a number of new applications now that large areas of diamond can be fabricated by the new diamond plasma chemical vapor deposition (CVD) technologies. However, some of the most interesting properties of diamond, including the ability to be grown over large areas by CVD processes, result not from its bulk properties but from its special and unique surface chemistry. The surface chemistry derived properties are as remarkable as the bulk properties, and in the end may enable the development of new applications, technologies, and industries which are at least as important as those based on the bulk properties. Some of these surface properties are extreme chemical inertness, low surface energy, low friction coefficients, negative electron affinity, biological inertness, and high over-voltage electrode behavior. The surface science and some of the interesting ongoing research in these areas are explored and illustrated, and unresolved questions are highlighted.     

Mechanism of associative oxygen desorption from Pt(111) surface

Mechanism of the associative desorption of oxygen from the Pt(111) surface has been studied on atomic level by means of DFT/GGA calculations and kinetic Monte Carlo simulations. It has been found that two oxygen adatoms can occur, with sufficient probability, in neighboring on-top sites, which is essential for formation and subsequent evaporation of the oxygen molecule. Monte Carlo simulations have demonstrated effectiveness of this channel for O₂ formation on Pt(111) and strongly support the suggested model of associative desorption from transition metal surfaces.     

The transition from surface to bulk oxide growth on Pt(1 0 0): Precursor-mediated kinetics

We investigated the kinetics governing the transition from surface (2D) to bulk (3D) oxide growth on Pt(1 0 0) in ultrahigh vacuum as a function of the surface temperature and the incident flux of an oxygen atom beam. For the incident fluxes examined, the bulk oxide formation rate increases linearly with incident flux (Φ_O) as the oxygen coverage increases to about 1.7 ML (monolayer) and depends only weakly on the surface temperature in the limit of low surface temperature (T_S < 475 K). In contrast, in the high temperature limit (T_S > 525 K), the bulk oxide formation rate increases with for oxygen coverages as high as 1.6 ML, and decreases with increasing surface temperature. We show that the measured kinetics is quantitatively reproduced by a model which assumes that O atoms adsorb on top of the 2D oxide, and that this species acts as a precursor that can either associatively desorb or react with the 2D oxide to form a 3D oxide particle. According to the model, the observed change in the flux and surface temperature dependence of the oxidation rate is due to a change in the rate-controlling steps for bulk oxide formation from reaction at low temperature to precursor desorption at high temperature. From analysis of flux-dependent uptake data, we estimate that the formation rate of a bulk oxide nucleus has a fourth-order dependence on the precursor coverage, which implies a critical configuration for oxide nucleus formation requiring four precursor O atoms. Considering the similarities in the development of surface oxides on various transition metals, the precursor-mediated transition to bulk oxide growth reported here may be a general feature in the oxidation of late transition metal surfaces.     

An FTIR study of the bonding of methoxy on Ni(100): effects of coadsorbed sulfur, carbon monoxide and hydrogen

The vibrational spectra of CH₃O_(a), CD₃O_(a), CDH₂O_(a) and CD₂HO_(a) on Ni(100) are analyzed and interpreted in terms of resonances between fundamental modes and either combinations or overtones. Analysis of the symmetry of the modes observed suggests that methoxy binds normal to the surface with C_s symmetry, at least at low coverages. Two distinct vibrational bands emerge in the vibrational spectrum of methoxy in the v(CO) region as the coverage increases which are attributed to bonding in four-fold hollow sites and bridging sites. These bands exhibit blue shifts of about 25 cm⁻¹ with increasing coverage up to the saturation coverage. The vibrational bands in the v(CH) region appear concomitantly at all coverages and shift down 12 cm⁻¹ as the coverage is increased. These shifts are attributed to changes in the metal-oxygen bond which are reflected in changes in the strength of the C---O and C---H bonds. Affects on the bonding also appear to occur with the coadsorption of hydrogen or CO with methoxy. Coadsorption of 0.36 ML hydrogen with 0.04 ML methoxy induces blue shifts of 15 and 7 cm⁻¹ for the v(CO) bands at 949 and 984 cm⁻¹, respectively. Adsorbing 0.43 ML of CO with 0.04 ML methoxy (and 0.04 ML hydrogen) causes a red shift of 20 and 12 cm⁻¹ for these bands. A drastic drop in mode intensities for methoxy when CO is coadsorbed suggests that the methoxy tilts away from the surface normal. Pre-adsorbing sulfur on the Ni(100) surface reduces the amount of methoxy formed from methanol, but the v(CO) methoxy bands are unshifted in frequencies relative to their position for the same methoxy coverage on the clean surface.     

Characterization and chemical behavior of submonolayer coverages of titania on a Pt foil

The interaction between submonolayer titania coverages and Pt foil has been studied by Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), temperature programmed desorption (TPD) and high-resolution electron energy loss spectroscopy (HREELS). The submonolayer titania can be fully oxidized to TiO₂ at 923 K under 10⁻⁸ Torr O₂, and partially oxidized to TiO_x at lower oxidation temperatures. The oxidized surface can be reduced by annealing to 1000 K or higher, or by heating in H₂ at 823 K, or by interacting with surface carbon formed from acetone decomposition. Under certain conditions (e.g., hydrogen reduction at 923 K), the surface titania can be fully reduced to metallic Ti which diffuses into bulk Pt readily. The reduced metallic Ti can resurface when the surface is oxidized at 923 K. Both XPS and HREELS data indicate the existence of subsurface oxygen, which plays an important role for the diffusion of Ti into and out of the Pt foil. Although no special interfacial active sites were revealed by HREELS studies of adsorbed acetone and CO, some TPD and XPS data suggest the presence of sites active for acetone decomposition.     

Subsurface oxygen formation on the Pt(110) surface: experiment and mathematical modeling

Experiments using photo emission electron microscopy (PEEM) reveal that regions on a Pt(110) surface covered by chemisorbed O atoms may be converted into a subsurface O-phase, provided that it is preceded by the interaction of CO initiating the 1 × 2 → 1 × 1 transformation of the surface structure. However, the presence of subsurface oxygen also favors lifting of the surface reconstruction. A mathematical model of this process is developed using parameters derived from previous independent experiments and numerical simulations fitting new data to experimental findings.     

It''s a dusty Universe: surface science in space

We live in a dusty Universe! Dust is not only found in our solar system among the planets but is found in a wide variety of objects throughout the Universe, mainly in those regions between the stars known as interstellar clouds. Interstellar dust particles, which consist of cores of silicates and carbonaceous material often surrounded by icy mantles, are most probably highly irregular in shape with a size distribution from micro- to nanometers. Interstellar dust is important for many reasons, including the template it provides for surface chemical reactions that form, among other species, the most important interstellar molecule––H₂. In this article, we discuss the evidence for interstellar dust, its physical and chemical properties, its role in interstellar surface chemistry, and what remains to be learned.     

Lateral interactions and nonequilibrium in adsorption and desorption. Part 1. Experimental results for (2 × 2)-(3O + NO)/Ru(0 0 1)

Extending earlier vibrational spectroscopy and thermal desorption measurements on this system, its geometrical structure and its adsorption/desorption kinetics have been investigated in detail. The adsorption and desorption of NO proceed, with little influence on the 3O template, on its (2 × 2) lattice of empty hcp sites. The desorption kinetics, with splitting of the TPD spectra into two peaks, are far from the expected behavior for independent sites. Also, the vibrational band structure shows dispersion beyond dipole-dipole interactions. So, despite the quite large NO-NO distance and their screening by the O atoms, there is clear evidence for static and dynamic lateral interactions which should be extractable from the data. A qualitative analysis suggests that these interactions are due to elastic coupling between the positions and vibrations, respectively, of the O and NO adsorbates. However, quantitative conclusions cannot be drawn directly as the kinetic data cannot be interpreted in a quasiequilibrium approach, as would be the normal procedure, due to the presence of strong nonequilibrium effects. The lack of internal equilibration is presumably caused by slow diffusion. The results are sufficiently complete and detailed to justify the effort of theoretical modeling with the aim to quantitatively describe both the lateral interactions and the nonequilibrium effects.     

Model and theory for the determination of diffusion coefficients by Auger electron spectroscopy measurements and an application to oxygen diffusion along the [0001] and [101¯0] axes in single crystal zirconium

A simple hopping model of the diffusion of adsorbed species from a surface into the bulk of a material has been formulated and solved mathematically. The difference in the energy barriers for an atom moving between the atomic layers at the surface and in the bulk are explicitly considered. This model is also capable of describing the initial stages of diffusion, something that conventional solutions of the continuum diffusion equation cannot handle. Auger electron spectroscopy has been used to measure the dissolution rate of oxygen from Zr(0001) and Zr(101¯0) surface into the bulk. Satisfactory results were obtained by applying our model to the diffusion data for these two zirconium surfaces for two different heating schedules: (i) rapid temperature ramp-and-hold and (ii) continuous linear heating with respect to time. The resulting Arrhenius expressions for diffusion are: D = (0.115 ± 0.031)exp[(−44.45 ± 4.82)kcal/RT]cm²/s along Zr[0001] and D = (1.07 ± 0.26)exp[(−46.18 ± 4.22)kcal/RT]cm²/s along Zr[101¯0].     

Methods for calculating the desorption rate of molecules from a surface at non-zero coverage: Water on MgO(0 0 1)

We present calculations of the desorption rate of water molecules from MgO(0 0 1) at a range of coverages θ and temperatures T. Our aim is to demonstrate that this can be done without making uncontrollable statistical mechanical approximations, and we achieve this by using the potential of mean force method reported previously. As in our earlier work on desorption of isolated molecules, we use a classical interaction model. We find that correlations between adsorbed molecules greatly increase the simulation time needed to obtain good statistical accuracy, compared with the isolated molecule. The activation energy for desorption varies significantly with coverage. The calculations also yield the chemical potential of adsorbed molecules as a function of θ and T, from which we can deduce the critical temperature and coverage for phase separation of adsorbed molecules.     

Beam induced reduction of U(VI) during X-ray photoelectron spectroscopy: The utility of the U4f satellite structure for identifying uranium oxidation states in mixed valence uranium oxides

Reduction of U^VI by the beam during X-ray photoelectron spectroscopy (XPS) is a commonly observed phenomenon. This can affect the determination of the U oxidation state, or states, in U oxides (or U compounds in general) and compromise the validity of peak parameters derived from U^VI oxide standards. However, there is little quantitative information on the reduction kinetics and species produced. The objective of this contribution is to investigate and quantify the effects of X-ray beam reduction of U^VI during XPS analysis. Successive U4f XPS spectra were taken over a 26 h period during the X-ray induced reduction of U^VI oxy-hydroxide that was precipitated onto the basal plane of mica. In addition, valence band XPS spectra, including the U5f region, were recorded. Factor analysis identified three dominant and, by definition, linearly independent components. Consequently, we fit the U4f level, including the satellite structure, with three components that represented U^VI, U^V, and U^IV. Peak parameters were remarkably stable and consistent with U^VI, U^V, and U^IV over the entire reduction sequence despite the likely formation of a partially covalent mixed-valence U oxide. Although the satellite features for U^IV and U^V were modified by their bonding environment, they still served well as diagnostic tools for identifying U oxidation states. In particular, the 8 eV satellite appears to be a robust indicator of U^V over a range of bonding environments. This is important because the presence of U^V might not be necessarily obvious in the primary peak envelope if XPS energy resolution is low and/or U^IV-U^V binding energy separations are appreciably less than 1 eV. We also discuss insights obtained from modeling the kinetic data for the time evolution of U^VI, U^V, and U^IV.     

Methods for calculating the desorption rate of an isolated molecule from a surface: Water on MgO(0 0 1)

We present two types of Molecular Dynamics (MD) simulation for calculating the desorption rate of molecules from a surface. In the first, the molecules move freely between two surfaces, and the desorption rate is obtained either by counting the number of desorption events in a given time, or by looking at the average density of the molecules as a function of distance from the surface and then applying transition state theory (TST). In the second, the potential of mean force (PMF) for a molecule is determined as a function of distance from the surface and the desorption rate is obtained by means of TST. The methods are applied to water on the MgO(0 0 1) surface at low coverage. Classical potentials are used so that long simulations can be performed, to minimise statistical errors. The two sets of MD simulations agree well at high temperatures. The PMF method reproduces the 0 K adsorption energy of the molecule to within 5 meV, and finds that the well depth of the PMF is not linear with temperature. This implies the prefactor frequency f in the Polanyi-Wigner equation is a function of temperature, increasing at lower temperatures due to the reduction of the available configuration space associated with an adsorbed molecule compared with a free molecule.     

Steps as adatom sources for surface chemistry: oxygen overlayer formation on Ag(110)

Surface chemical reactions often require a ready supply of substrate atoms to occur. In principle, steps serve as an efficient source of these atoms, provided that detachment rates from the step edges are sufficiently large. In this paper, we characterize atomic detachment rates from steps on clean Ag(110) by examining step fluctuations. We show that these rates are sufficient to supply atoms to form the added-row reconstruction of oxidized Ag(110) when the oxygen partial pressure is low. For high oxygen pressures, however, we find that step detachment rates are slow compared with oxidation rates, and the step source of Ag is supplemented by vacancy-island generation on the terraces. These results are compared to those obtained for the similar O/Cu(110) and O/Ni(110) systems.     

UHV-MOCVD growth of TiO2 on SiOx/Si(1 1 1): Interfacial properties reflected in the Si 2p photoemission spectra

Metal–organic chemical vapour deposition growth of titanium oxide on moderately pre-oxidised Si(1 1 1) using the titanium(IV) isopropoxide precursor has been studied for two different growth modes, reaction-limited growth at 300 °C and flux-limited growth at 500 °C. The interfacial properties have been characterized by monitoring synchrotron radiation excited Si 2p photoemission spectra. The cross-linking from oxidised Si to bulk Si after TTIP exposure has been found to be very similar to that of SiO_x/Si(1 1 1). However, the results show that the additional oxidation of Si most probably causes a corrugation of the SiO_x/Si interface. Those conclusions are valid for both growth modes. A model is introduced in which the amorphous interface region is described as (TiO₂)_x(SiO₂)_y where x and y changes linearly and continuously over the interface. The model quantifies how (TiO₂)_x(SiO₂)_y mixing changes the relative intensities of the signals from silicon oxide and silicon. The method can be generalised and used for the analyses of other metal-oxides on silicon.