ZnO基紫外探测器研究进展

近年来,直接带隙宽禁带半导体ZnO（3.37 eV）以其优越的光电特性而成为紫外探测领域研究中的新热点.文章介绍了不同类型的ZnO基紫外光敏探测器的结构和性能,并对ZnO基紫外光敏探测器的最新研究进展和应用前景进行探讨和展望.     

ZnO基紫外探测器研究进展

近年来，直接带隙宽禁带半导体ZnO（3．37eV）以其优越的光电特性而成为紫外探测领域研究中的新热点。文章介绍了不同类型的ZnO基紫外光敏探测器的结构和性能，并对ZnO基紫外光敏探测器的最新研究进展和应用前景进行探讨和展望。     

基于三明治结构的ZnO紫外光电探测器

采用射频磁控溅射方法制备了三明治结构ZnO紫外光电探测器,即在传统金属-半导体-金属(MSM)单层ZnO紫外光电探测器的基础上再铺设一层ZnO薄膜,从而构建三明治器件结构。三明治结构ZnO紫外光电探测器响应度在5 V偏压下达到了0.05 A/W,暗电流为1.44×10^-5 A,器件的整体性相比较传统单层ZnO紫外光电探测器得到了明显的改善。这主要归因于金属与半导体接触的耗尽区可以直接吸收入射光,提高了入射光的吸收效率,避免了传统上层电极对入射光的遮蔽作用。     

InAs量子点在肖特基势垒二极管输运特性中的影响

在77到292K的范围内,系统研究了含InAs自组装量子点的金属-半导体-金属双肖特基势垒二极管的输运特性.随着温度上升,量子点的存储效应引起的电流回路逐渐减小.在测试温度范围内,通过量子点的共振隧穿过程在电流电压(I-V)曲线中造成台阶结构,且使电流回路随温度的上升急剧减小.根据肖特基势垒的反向I-V曲线,计算了势垒的反向饱和电流密度和平均理想因子.发现共振随穿效应使肖特基势垒在更大的程度上偏离了理想情况,而量子点的电子存储效应主要改变了肖特基势垒的有效势垒高度,从而影响了势垒的反向饱和电流密度 关键词： 自组装量子点 肖特基势垒 电流-电压特性     

一维纳米氧化锌自驱动紫外探测器的构建与性能研究

本文通过化学气相沉积法制备了ZnO纳米材料, 利用扫描电镜、光致发光谱、X衍射光谱及拉曼光谱等方法对制备的材料进行了表征. 基于制备的单根ZnO线分别构建了三种不同结构的紫外探测器件: Ag-ZnO-Ag肖特基型、PEDOT:PSS/n-ZnO结型和p-Si/n-ZnO结型紫外探测器, 并对器件的性能进行了研究. 结果表明: 三种不同结构的器件都表现出良好的整流特性, 对紫外线均有明显的光响应; 在零偏压下, 都有明显的自驱动特性. 三种器件中, p-Si/n-ZnO型紫外探测器性能最为优异: 在零偏压下, 暗电流约在1.2×10^-3 nA, 光电流在5.4 nA左右, 光暗电流比为4.5×10³, 上升和下降时间分别为0.7 s和1 s. 通过三类器件性能比较, 表明无机p-Si更适合与ZnO构建pn结型自驱动紫外探测器.     

肖特基结的制备与势垒测量

采用磁控溅射方法在Nb07％-SrTiO3基片上制作Au薄膜接触,并在氧气气氛下750℃退火30 min,在室温环境下测量电流电压和电容电压等特性曲线,观测整流特性,根据相应实验数据采用饱和电流法、电容C-2与反偏电压V成线性关系计算肖特基势垒的大小.     

背入射Au/ZnO/Al结构肖特基紫外探测器

设计制作了一种Au/ZnO/Al结构的紫外探测器,光的入射方式采用背入射式。ZnO薄膜是用磁控溅射在蓝宝石衬底上制备的。I-V测试表明:Au与ZnO形成了肖特基接触。得到探测器的光响应峰值在352nm,截止边为382nm,可见抑制比达一个量级。由于该探测器是一种垂直结构器件,对于进一步实现ZnO紫外探测器阵列及单光子探测有很好的研究价值。     

光损伤肖特基钙钛矿探测器的光电特性分析

为了研究飞秒激光对光电探测器光学性能的影响,本文对飞秒脉冲激光辐照CsPbBr₃背靠背肖特基光电探测器的损伤特性,以及不同激光功率密度下的光电性能进行了研究。利用化学气相沉积法在ITO叉指电极上沉积CsPbBr₃微米晶薄膜,制备了背靠背肖特基型全无机钙钛矿光电探测器。利用脉冲宽度为35 fs的钛宝石飞秒激光器辐照CsPbBr₃光电探测器,通过显微镜观察不同激光功率密度下CsPbBr₃多晶薄膜的损伤形貌,并研究了不同功率密度损伤下肖特基结构的钙钛矿光电探测器的光电性能变化。结果表明：自制的全无机金属卤化物肖特基光电探测器具有较高的损伤阈值,达到了2.1 W/cm²,并且在样品轻度损伤的情况下,样品的光电特性出现了一定程度的提升,光谱响应度出现了50 nm的展宽,并且在部分薄膜受热脱落后,器件仍然保持一定的光电探测性能。     

套刻偏差对4H-SiC 浮动结结势垒肖特基二极管的影响研究

4H-SiC浮动结结势垒肖特基二极管与常规结势垒肖特基二极管相比在 相同的导通电阻条件下具有更高的击穿电压. 由p⁺埋层形成的浮动结与主结p⁺区 之间的套刻对准是实现该结构的一项关键技术. 二维模拟软件ISE的模拟结果表明, 套刻偏差的存在会明显影响器件的击穿特性, 随着偏差的增大击穿电压减小. 尽管主结和埋层的交错结构与对准结构具有相似的击穿特性, 但是当正向电压大于2 V后, 交错结构的串联电阻更大.     

ZnO 紫外探测器的研究

利用水热法生长的N型优质ZnO晶体材料蒸镀了Au、Ag、Al金属,制备出金属-半导体-金属型(MSM)ZnO紫外探测器,测试了五种接触类型的ZnO紫外探测器(Au-ZnO-Au、Ag-ZnO-Ag、Au-ZnO-Al、Ag-ZnO-Al、Al-ZnO-Al)在365nm紫外光光照前后的I-V特性曲线。实验表明Au-ZnO-Au 型、Ag-ZnO-Ag型的探测器的光电流是暗电流的100 万倍,因此,Au-ZnO-Au型、Ag-ZnO-Ag型的ZnO紫外探测器性能比Au-ZnO-Al、Ag-ZnO-Al、Al-ZnO-Al型的优越。ZnO材料的电阻率对ZnO紫外探测器的光电流有较大的影响。在相同偏压下,电阻率越大,探测器的光电流越小。ZnO ultraviolet(UV) detectors with Metal-Semiconductor-Metal(MSM) structure were fabricated by the vacuum evaporation of Au, Ag, and Al on the n-type ZnO single crystal, which was grown with hydrothermal synthesis method. Five types of MSM ZnO detectors(Au-ZnO-Au, Ag-ZnO-Ag, Au-ZnO-Al, Ag-ZnO-Al,Al-ZnO-Al) were illuminated with 365 nm UV light respectively, and their corresponding I-V(Current-Voltage) characteristics were measured. The UV photocurrent values for Au-ZnO-Au and Ag-ZnO-Ag detectors were 1x106 times than their dark current values, and these facts imply that the Au-ZnO-Au and Ag-ZnO-Ag detectors were rather good UV detectors compared to Au-ZnO-Al, Ag-ZnO-Al, Al-ZnO-Al detectors. The photocurrent of the MSM ZnO detectors was also sensitive to the cubic resistance of the ZnO crystal. And it’s found that the higher resistance rate the ZnO crystal the smaller photocurrent value the detector under the same working voltage.     

ZnO薄膜肖特基二极管的研制

采用直流反应磁控溅射的方法,在Al/Si(100)衬底上沉积了ZnO晶体薄膜.利用Al和Pt作为与ZnO接触的欧姆电极与肖特基电极,制作了ZnO薄膜肖特基二极管.X射线衍射测试结果表明ZnO薄膜具有高度的c轴择优取向.原子力显微分析表明:样品表面光洁平整,晶粒尺寸约100nm,扩展电阻分析表明ZnO薄膜的厚度为0.4μm,载流子浓度为1.8×1015 cm-3,此后的霍尔测试证实了这一结果并说明ZnO的导电类型为n型.室温下的I-V测试显示ZnO肖特基二极管具有明显的整流特性.Pt与n型ZnO接触的势垒高度为0.54eV.文中的ZnO肖特基二极管为首次研制的原型器件,其性能可以通过器件结构与制作工艺的进一步优化而得到改善.     

ITON Schottky contacts for GaN based UV photodetectors

Lateral Schottky ultraviolet detectors were fabricated in GaN using indium-tin-oxynitride (ITON) as a contact metal. The GaN semiconductor material was grown on 2 in. sapphire substrate by metal-organic chemical vapor deposition (MOCVD). The Schottky contact has been realized using ITON that has been deposited using sputter techniques. I-V characteristics have been measured with and without UV illumination. The device shows photo-to-dark current ratios of 10³ at −1 V bias. The spectral responsivity of the UV detectors has been determined. The high spectral responsivity of more than 30 A/W at 240 nm is explained by a high internal gain caused by generation-recombination centers at the ITON/GaN interface. Persistent photocurrent effect has been observed in UV light (on-off) switching operation, time constant and electron capture coefficient of the transition has been determined.     

电极间距对ZnO基MSM紫外光电探测器性能的影响

利用金属有机物化学气相沉积法在蓝宝石衬底上制备了ZnO薄膜。利用Au电极,在ZnO薄膜上制备电极间距不同的金属-半导体-金属结构紫外光电探测器。发现随着电极间距从150μm降至5μm,探测器响应度呈现出从15 mA/W到75 mA/W的明显提高。同时,随着电极间距的减小,器件的I-V曲线线形发生了显著改变。这被归结为电极间距变化改变了器件耗尽区宽度和电极间电阻造成的结果。     

ZnO nanorod-based UV photodetection and the role of persistent photoconductivity

We report on the substantial persistent photoconductivity (PPC) response exhibited by the zinc oxide (ZnO) nanorod-based ultraviolet (UV) photodetection system. An increase in photocurrent and, hence, rise in PPC was observed for larger UV exposure times at regular intervals. Triggered by quantum efficiency, the increment in sustained conduction band electrons is proposed as the main reason behind the increased photocurrent response. In contrast, the trap centers located below the conduction band are expected to slow down the recombination rate, which accounts for the rise in PPC. The lowering of PPC upon annealing suggests the surface dependent nature of the PPC. The growth and decay mechanism of PPC has a direct relevance while assessing figure of merit of prototype nanostructure-based optical sensor and UV photodetectors.     

PEDOT:PSS Schottky contacts on annealed ZnO films

Polycrystalline ZnO and ITO films on SiO₂ substrates are prepared by radio frequency (RF) reactive magnetron sputtering. Schottky contacts are fabricated on ZnO films by spin coating with a high conducting polymer, poly(3, 4-ethylenedioxythiophene): poly(styrenesulfonate) (PEDOT:PSS) as the metal electrodes. The current-voltage measurements for samples on unannealed ZnO films exhibit rectifying behaviours with a barrier height of 0.72 eV (n=1.93). The current for the sample is improved by two orders of magnitude at 1 V after annealing ZnO film at 850 ℃, whose barrier height is 0.75 eV with an ideality factor of 1.12. X-ray diffraction, atomic force microscopy and scanning electron microscopy are used to study the properties of the PEDOT:PSS/ZnO/ITO/SiO₂. The results are useful for applications such as metal-semiconductor field-effect transistors and UV photodetectors.     

Hydrogen peroxide treatment on ZnO substrates to investigate the characteristics of Pt and Pt oxide Schottky contacts

We utilize hydrogen peroxide (H₂O₂) treatment on (0 0 0 1) ZnO substrates to investigate the characteristics of Pt and Pt oxide Schottky contacts (SCs). X-ray rocking curves show the mosaicity structure becomes larger after H₂O₂ treatment. Photoluminescence (PL) spectra show the yellow-orange emission peaking at ∼576-580 nm with respect to deep level of oxygen interstitials introduced by H₂O₂ treatment. The threshold formation of ZnO₂ resistive layer on H₂O₂-treated ZnO for 45 min is observed from grazing-incidence X-ray diffraction. The better electrical characteristic is performed by Pt oxide SC with the larger barrier height (1.09 eV) and the lower leakage current (9.52 × 10⁻¹¹ A/cm² at −2 V) than Pt SC on the H₂O₂-treated ZnO for 60 min. X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometer (SIMS) examinations indicate the promoted interface oxide bonding and Zn outdiffusion for Pt oxide contact, different from Pt contact. Based on current-voltage, capacitance-voltage, X-ray diffraction, PL spectra, XPS, and SIMS results, the possible mechanism for effective rectifying characteristic and enhanced Schottky behavior is given.     

Dependence of photocurrent on UV wavelength in ZnO/Pt bottom-contact Schottky diode

We fabricated the bottom-contacted ZnO/Pt Schottky diode and investigated the dependence of its photocurrent on the wavelength of illuminated ultraviolet (UV) light source. The bottom-contacted Schottky diode was devised by growing (000l) ZnO on (111) Pt, and the fabricated device showed a strong dependence on the UV wavelength for its photo-response characteristics. When longer-wavelength-UV (e.g., UV-A) was illuminated on the device, the photo-current was increased by a factor of 200, compared to that under illumination of shorter-wavelength-UV (e.g., UV-C). The behavior is attributed to the wavelength-dependent UV penetration depth for ZnO.     

Surface and near-surface passivation, chemical reaction, and Schottky barrier formation at ZnO surfaces and interfaces

Using a combination of depth-resolved cathodoluminescence spectroscopy, electronic transport, and surface science techniques, we have demonstrated the primary role of native defects within ZnO single crystals as well as native defects created by metallization on metal-ZnO Schottky barrier heights and their ideality factors. Native defects and impurities resident within the ZnO depletion region as well as defects extending into the bulk from the intimate metal-ZnO interface contribute to barrier thinning of, carrier hopping across, and tunneling through these Schottky barriers. Chemical reactions at clean ZnO-metal interfaces lead to metal-specific eutectic or oxide formation with pronounced transport effects. These results highlight the importance of bulk crystal quality, surface cleaning, metal interaction, and post-metallization annealing for controlling Schottky barriers.