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1.
对Hg1-xDdxTe(HCT)晶体表面上由电化学阳极化生长的氧化膜进行了俄歇电子能谱分析,并经Ar^+离子蚀刻,研究了薄膜及其与底晶的界面层的深度元素分布和化学计量,估计了可能生成的化合物,阐述了阳极化过程中电流密度,糟电压及电解质溶液浓度对阳极化膜的AES的影响。  相似文献   

2.
本文讨论了用连续CO_2激光器蒸发地质粉末样品,ICP-AES测定Ba和Sr。在样品中加入适量的粘合剂和石墨粉混匀压饼,用激光全部蒸发。在蒸发室出口处加入了一只多层多孔过滤器,一定程度上改善了系统长时间工作的稳定性。对影响激光采样和ICP-AES分析性能的参数进行了研究。实验结果表明,连续激光蒸发地质粉末样品、ICP-AES测定Ba、Sr,大部分分析结果满意。在选择的系统条件下,Ba、Sr的检出限分别为2.6μg·g ̄-1和3.0μg·g ̄-1;精密度RSD分别为6.3%(470μg·g ̄-1)和5.6%(52μg·g ̄-1)  相似文献   

3.
类Ni稀土X光激光波段衰减膜的设计与研究   总被引:1,自引:1,他引:0       下载免费PDF全文
对类 Ni稀土 X 光激光波段衰减膜进行了设计,并根据设计结果,利用磁控溅射和旋转涂覆法分别制备了自支撑的 Ag 衰减膜和聚苯乙烯( C8 H8)衰减膜。利用真空 α能谱测厚仪和 αstep100 台阶仪分别对衰减膜的质量厚度和均匀性进行了测量,用 Auger 电子能谱( A E S)对 Ag 衰减膜进行了表面杂质分析。  相似文献   

4.
通过X光电子能谱(XPS)、阳极氧化电压谱(AVS)和Fiske台阶电压的测量,研究了约瑟夫森结中AlOxAl隧道势垒.发现结的隧道势垒最佳沉积Al层厚度为7nm,Al上形成AlOx厚度只取决于氧化条件,与沉积Al厚无关,势垒Al氧化物可能含有一个像AlOOH态的OH基团.同时,估算了剩余Al厚度,证实了结中Al/Nb间在42K时,由常态Al而产生临近效应的存在  相似文献   

5.
通过比较多种杂多酸及铬酸盐等纯化剂的钝化效果,发现H3PMo12O40是一种优良的纯化剂。在55℃,pH1.0的条件下,A3钢在20g/L的H3PMo12O40溶液中能形成致密的耐蚀性保护膜。AES结合Ar^+溅射测得膜的元素组成为:P1.9%,Mo17.9%,O69.6%,Fe10.7%.XPS测得膜中Mo以Mo(Ⅵ)、Mo(V)t Mo(Ⅳ)三种氧化态存在。红外及Raman光谱表明,膜的主要振  相似文献   

6.
通过X光电子能谱(XPS)、阳极氧化电压谱(AVS)和Fiske台阶电压的测量,研究了约瑟夫森结中AlOx-Al隧道势垒.发现结的隧道势垒最佳沉积Al层厚度为7nm,Al上形成AlOx厚度只取决于氧化条件,与沉积Al厚无关,势垒Al氧化物可能含有一个像AlOOH态的OH基团.同时,估算了剩余Al厚度,证实了结中Al/Nb间在4.2K时,由常态Al而产生临近效应的存在 关键词:  相似文献   

7.
用化学还原法制备了组成为Ni2.52B(原子比)的超细非晶态合金,并用AES研究了氩刻时间,温度及氧对其表面组成的影响,发现其表面存在硼化和氧化物硼两种硼物种;氧优先氧化表面的硼物种,并导致表面镍物种量的下降;对样品的热处理可导致表面可导致表面组成发生突变,镍物种量几乎消失。  相似文献   

8.
本文选用加电感低能放电火花光源,解决了纯铝薄板易击穿的难题,优化了激发条件,并研究了表面氧化层和光洁度对测定结果的影响,建立了一套直接测定厚度0.20mm以上纯铝薄板中各元素的分析方法。考核及对照分析实验表明,各元素的RSD及相对偏差良好。  相似文献   

9.
ICP—AES分析中干扰及其校正方法的进展(Ⅱ)   总被引:5,自引:0,他引:5  
本文对ICP-AES分析中的光谱干扰继续进行综述,本文继(1)而继续对ICP-AES分析中的光谱干扰进行综述。  相似文献   

10.
用自组装技术以ω-巯基己酸(6-MHA)对金电极进行修饰。通过表面增强拉曼散射(SERS)光谱和电化学方法研究了6-MHA自组装单分子膜(SAM)在金电极表面的形成及由此引起的电极双电层电容的变化,并研究了该自组装单分子膜的结构模型及修饰电极对叶绿素的催化性能。结果表明,6-MHA在金电极表面能够形成一层自组装膜,并对叶绿素的氧化还原过程具有明显的催化作用。  相似文献   

11.
 利用石英晶体振荡技术测量了不同环境中稀土元素Nd薄膜靶表面氧化速率,用俄歇电子能谱,扫描电镜,X射线衍射,X射线光电子能谱分析了Nd薄膜表面氧化过程,发现保存环境对靶的表面氧化行为有重要影响。空气中水分是引起Nd快速氧化的关键因素。表面氧化层为团聚状的非晶结构,氧化物与金属的体各比较小可能是引起Nd薄膜较易氧化的原因。Nd薄膜靶表面覆盖有一层氢氧化物,其厚度按保存在真空、干燥空气和潮湿空气环境而依次递增。  相似文献   

12.
Picosecond (40 ps) pulsed Nd:YAG laser irradiation of a WTi thin film on silicon with a wavelength of 532 nm and a fluence 2.1 J/cm2 was performed in air. This led to significant changes of the chemical composition and morphology on the surface of the WTi thin film. The results show an increase in surface roughness, due to formation of conical structures, about 50 nm wide in the base, and a very thin oxide layer composed of WO3 and TiO2, with a dominant TiO2 phase at the top, within the depth of about 20 nm. The thickness of the oxide layer was dependent on the number of laser pulses. The samples were analyzed by scanning electron microscopy, atomic force microscopy, and X-ray photoelectron spectroscopy.  相似文献   

13.
The surface reaction on titanium due to pulsed Nd:YAG laser irradiation in a nitrogen atmosphere was investigated using X-ray photoelectron spectroscopy (XPS). The laser, with a wavelength of 532 nm (SHG mode), was irradiated on a titanium substrate in an atmosphere-controlled chamber, and then the substrate was transported to an XPS analysis chamber without exposure to air. This in situ XPS technique makes it possible to clearly observe the intrinsic surface reaction. The characteristics of the surface layer strongly depend on the nitrogen gas pressure. When the pressure is 133 kPa, an oxynitride and a stoichiometric titanium nitride form the topmost and lower surface layers on the titanium substrate, respectively. However, only a nonstoichiometric titanium oxide layer containing a small amount of nitrogen is formed when the pressure is lower than 13.3 kPa. Repetition of laser shots promotes the formation of the oxide layer, but the formation is completed within a few laser shots. After the initial structure is formed, the chemical state of the surface layer is less influenced by the repetition of laser shots.  相似文献   

14.
为了解决Cr12MoV钢溶蚀、表面碎裂等问题,利用Al-Ni、Nd-Ni粉末在Cr12MoV钢上进行激光熔覆实验,研究了Al、Nd对镍基覆层的宏微观形貌、组织及表面性能的影响。结果表明:Al可以减少熔覆层裂纹的产生,同时降低覆层硬度,使熔覆层中产生具有减磨作用的硬质相Al2O3等,降低覆层磨损量,14%Al覆层磨损量比2%Al的覆层磨损量低44.5%,Al较优质量分数为14%;Nd的晶粒细化作用明显,显著提升覆层显微硬度,2.5%Nd覆层平均硬度比基体平均硬度高36.8%,Nd较优质量分数为2.5%。  相似文献   

15.
The fabrication of solar cells based on laser-modified silicon (LMS) has been experimentally investigated. Laser ablation of single-crystal Si in air results in the formation of a quasi-periodic array of microcones. After removing the oxide layer, this array is coated by a transparent conducting tin oxide layer. A comparison of the spectral dependence of the mirror reflection of laser-modified Si with that of the initial flat Si surface shows a 10 to 15% drop in reflectivity. The light-to-electricity conversion efficiency is shown to exceed that of the initial flat Si surface by more than 20%.  相似文献   

16.
Surface oxidation ranging from initial stages to the onset of passive oxide layer formation have been investigated on Fe–20Cr–18Ni{1 1 1} single crystal surface by X-ray photoelectron spectroscopy (XPS). Surface segregation of the alloying elements and the morphology of the surface oxide nanostructure were characterized quantitatively by inelastic electron background analysis. Our results demonstrate that by increasing the oxidation temperature the relative concentrations of Fe2+ and Fe3+ cations increase due to their enhanced mobility. Higher temperature also improves the mobility of chromium, thus enhancing its segregation to the oxygen-rich surface and thereby reinforcing the passive layer on the alloy. This is in agreement with the results showing the sudden decrease in oxide film thickness at the oxidation temperatures exceeding 600 K. Additionally, a pronounced segregation of metallic nickel is found in the interface between the surface oxide layer and the bulk alloy.  相似文献   

17.
Removal of a thin oxide layer from a tungsten ribbon and ThO2 particulates from zircaloy surface was achieved using a pulsed Nd:YAG laser. The removal mechanism of the oxide layer from the tungsten ribbon was identified as spallation or sublimation depending on the wavelength and fluence of the coherent radiation. The oxidized and cleaned surfaces were analysed by scanning electron microscopy (SEM), energy dispersive X-ray analysis (EDS) and atomic force microscopy (AFM). Laser-cleaned tungsten ribbons were used in a thermal ionization mass spectrometer (TIMS) to determine isotopic composition of neodymium atoms. The fundamental (1064 nm) and the third harmonic (355 nm) radiations were found to be the most effective in removing ThO2 particulates from the zircaloy surface. Decontamination efficiency was found to be critically dependent on the wavelength of the coherent radiation and number of exposures. The mechanism of cleaning of ThO2 particulates from the zircaloy surface at different wavelengths of the incident radiation has been explained qualitatively.  相似文献   

18.
Porous TiO2 layer was fabricated on the surface of commercially pure titanium using an anodic spark oxidation technique for biomedical application, and subsequent hot water treatment was performed to modify the resultant oxide layer. The microstructure features and shear fracture characteristics of anodic oxide layer before and after water treatment were investigated. Results show that before water treatment, the oxide layer exhibited a porous surface with few nanometer features and consisted of poorly crystallized oxides, and an inner layer containing numerous cavities was observed near the oxide-substrate interface. After water treatment, the crystallinity degree of oxide layer was increased significantly and a nanostructured surface layer was obtained. The shear fracture characteristics of oxide layer were greatly influenced by its microstructure features. Before water treatment, the shear fracture took place primarily within the cavity-containing layer, resulting in a pitted fracture surface on the substrate side. However, after water treatment, the shear fracture occurred mainly along the bottom surface of nanostructured surface layer and the shear strength of oxide layer decreased obviously.  相似文献   

19.
The surface and surface layers of CoxCu100?x inhomogeneous thin films irradiated by an oxygen ion beam for a long time (to 100 min) are studied. The films are obtained by electrolytic deposition. With X-ray photoelectron spectroscopy and conversion electron Mössbauer spectroscopy, it is shown that the irradiation leads to the formation of an oxidized surface layer. The continuity and thickness of the layer depend on the roughness of the initial film. For a cobalt content of 8≤x≤20 at. %, the oxide layer is continuous and nonuniform in thickness, the mean thickness being estimated at several tens of nanometers. The interface between the layer and the underlying film is sharp. The films irradiated are smoother than the asdeposited ones. The formation of the oxide layer is treated in terms of a qualitative model.  相似文献   

20.
Two series of polycrystalline zinc oxide (ZnO) layers, from Zn or ZnO targets, were grown on silicon (1 1 1) substrates by pulsed laser deposition (PLD) at ambient oxygen pressure levels, stepwise increased from 1 to 35 Pa. For ablation of targets, a pulsed Nd:YAG laser was used. The structural and morphological properties of the layers were investigated by scanning electron microscopy (SEM), atomic force microscopy (AFM), and secondary ion mass spectrometry (SIMS). The SEM images of ZnO layers in SE mode show a uniform granular structure and modified surface morphology, depending on oxygen pressure. The mean grain size in height and lateral directions decreases with an increase of oxygen pressure from 1 to 5 Pa, while a subsequent rise of oxygen pressure from 5 to 35 Pa will cause an increase in the grain size. The AFM measurement revealed that the surface structures of zinc oxide layers grown from different targets were similar, and the layers formed at an ambient oxygen pressure of 5 Pa exhibited the smallest values of calculated roughness and granularity. SIMS depth profiling analyses confirmed that the ZnO composition was homogenous across the layer, up to the abrupt change of chemical composition at the interface between the ZnO layer and the Si substrate.   相似文献   

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