薄膜-泡沫复合平面调制靶的制备

利用浇注法制备了具有正弦波调制图纹的溴代聚苯乙烯薄膜,并在此基础上将低密度聚-4-甲基-1-戊烯（PMP）泡沫溶胶浇注在薄膜调制图纹的表面,从而得到了薄膜-泡沫复合平面调制靶样品。较为详细的讨论了具有正弦波调制图纹的复合平面调制靶的制备方法并通过台阶仪、显微镜观测了薄膜表面条纹的起伏以及薄膜-泡沫截面的复合情况,实验结果发现,采用此种方法得到的复合平面调制靶样品,其薄膜厚度、泡沫密度易于控制,薄膜、泡沫调制界面清晰,易于微靶的加工与装配。     

CH薄膜泡沫复合平面调制靶制备初步研究

瑞利-泰勒（R—T）流体力学不稳定性是制约惯性约束聚变（ICF）实验点火的重要因素之一。研究证明，通过在有机薄膜或低密度泡沫上人为引入面密度扰动可以模拟靶丸表面的不完整性，通过测量激光对靶烧蚀过程中靶密度扰动的时空分布非线性增长，可估算R—T不稳定性的大小。关于调制薄膜制备的方法国内目前仅有数篇报道，但有关薄膜泡沫复合调制靶的制备还未见相关文献报道。     

掺溴聚苯乙烯平面调制箔靶的制备及测量

 平面调制靶是ICF分解实验中的重要用靶。介绍了在过去工作的基础上掺溴聚苯乙烯平面调制箔靶的制备工艺,研究旋转涂覆和流延工艺对靶的表面起伏图形转移的影响,采用SEM观察薄膜表面起伏图形的形貌,对掺杂溴的含量进行测量和控制,以台阶仪测量靶的表面粗糙度。     

掺溴聚苯乙烯平面调制箔靶的制备及测量

平面调制靶是ICF分解实验中的重要用靶。介绍了在过去工作的基础上掺溴聚苯乙烯平面调制箔靶的制备工艺,研究旋转涂覆和流延工艺对靶的表面起伏图形转移的影响,采用SEM观察薄膜表面起伏图形的形貌,对掺杂溴的含量进行测量和控制,以台阶仪测量靶的表面粗糙度。     

电子回旋共振微波等离子体离子束刻蚀技术

电子回旋共振微波等离子体技术在薄膜制备技术、材料的表面处理、离子源和等离子体刻蚀等方面得到了广泛的应用，取得了长足的进展。这些特点在ICF实验制靶过程中有重要应用，如调制靶等，而且加工精度高，能满足ICF制靶的要求。基于在未来的ICF实验中对各种有机膜制备、各种调制靶的制备需求，开展了电子回旋共振微波等离子体技术在薄膜制备和等离子体刻蚀方面的预研工作。     

平面调制靶的正弦波曲面超精密加工与表征

采用超精密车削技术加工微尺度正弦波调制曲面微结构,解决了尖刃金刚石刀具刃磨和刀具对中等关键技术,研究了进给量、背吃刀量和主轴转速等主要切削参数对铜模板表面粗糙度的影响规律。加工出波长为（20～150）m0.5 m﹑峰谷高度差为（0.2～20）m0.1 m的带正弦波调制曲面。采用原子力显微镜对模板表面轮廓扫描,在20 m20 m的范围内,其表面粗糙度均方根值小于10 nm。将正弦波调制曲面测量结果与理论轮廓进行比较,采用最小二乘寻优算法评定轮廓误差。完成了曲面轮廓的功率谱表征,利用加工的曲面微结构制备了平面调制靶,实现正弦波调制曲面轮廓的精确转移。     

平面调制靶的正弦波曲面超精密加工与表征

采用超精密车削技术加工微尺度正弦波调制曲面微结构,解决了尖刃金刚石刀具刃磨和刀具对中等关键技术,研究了进给量、背吃刀量和主轴转速等主要切削参数对铜模板表面粗糙度的影响规律。加工出波长为（20～150）m0.5 m﹑峰谷高度差为（0.2～20）m0.1 m的带正弦波调制曲面。采用原子力显微镜对模板表面轮廓扫描,在20 m20 m的范围内,其表面粗糙度均方根值小于10 nm。将正弦波调制曲面测量结果与理论轮廓进行比较,采用最小二乘寻优算法评定轮廓误差。完成了曲面轮廓的功率谱表征,利用加工的曲面微结构制备了平面调制靶,实现正弦波调制曲面轮廓的精确转移。

     

基于高精度3D打印工艺的ICF调制靶

惯性约束聚变(ICF)中的瑞利-泰勒不稳定性(RTI)研究需要基于多种结构的调制靶,针对目前调制靶制备的工艺问题,采用双光子3D打印工艺制备了平面调制、平面复合调制及球壳型调制三种典型结构的调制靶,靶材料为光敏树脂(95%:C₂₃H₃₈N₂O₈,5%:C₄H₆O₂)。采用激光共聚焦显微成像分析了三种调制靶的实际结构参数,三种靶型的实测形貌及其参数与设计结构及参数具有良好匹配度。为进一步验证双光子3D打印新型工艺制备调制靶的可行性,实验团队在“神光Ⅱ”高功率激光实验装置上进行了纳秒激光打靶实验,结果显示靶表面的调制在激光直接驱动下受RTI的作用随时间呈增长趋势,初始峰谷值为4μm的调制在激光驱动2.5 ns后形成了长度达100μm的高密度射流,表明基于高精度3D打印工艺制备结构复杂的调制靶用于RTI研究具有较高可行性。     

ICF分解实验用双介质调制靶的研制

为了研究惯性约束聚变（ICF）实验用靶丸不同密度界面的流体力学不稳定性增长,设计并制备了聚苯乙烯（CH）/碳气凝胶（CRF）, CRF /硅气凝胶（SiO2）和CH/Al三种双介质调制靶。采用溶胶-凝胶工艺制备了密度分别为250和800 mg/cm3的CRF气凝胶薄片;采用激光微加工工艺分别在两种不同密度的CRF薄片和工业用纯Al箔上引入调制图形;采用旋涂工艺在Al箔和CRF薄片（250 mg/cm3）的调制表面制备一层CH薄膜,得到CH/Al和CH/CRF双介质调制靶,采用溶胶-凝胶工艺在CRF薄片（800 mg/cm3）表面制备一层低密度SiO2气凝胶,得到CRF/SiO2双介质调制靶。采用电子天平、扫描电子显微镜、工具显微镜和台阶仪对所制备的CH/CRF, CRF/SiO2和CH/Al三种双介质调制靶进行靶参数测量。结果表明:三种双介质调制靶层与层之间结合紧密,界面清晰,调制图形为正弦,靶参数测量准确。     

ICF分解实验用双介质调制靶的研制

为了研究惯性约束聚变(ICF)实验用靶丸不同密度界面的流体力学不稳定性增长,设计并制备了聚苯乙烯(CH)/碳气凝胶(CRF),CRF/硅气凝胶(SiO2)和CH/Al三种双介质调制靶。采用溶胶-凝胶工艺制备了密度分别为250和800mg/cm3的CRF气凝胶薄片;采用激光微加工工艺分别在两种不同密度的CRF薄片和工业用纯Al箔上引入调制图形;采用旋涂工艺在Al箔和CRF薄片(250mg/cm3)的调制表面制备一层CH薄膜,得到CH/Al和CH/CRF双介质调制靶,采用溶胶-凝胶工艺在CRF薄片(800mg/cm3)表面制备一层低密度SiO2气凝胶,得到CRF/SiO2双介质调制靶。采用电子天平、扫描电子显微镜、工具显微镜和台阶仪对所制备的CH/CRF,CRF/SiO2和CH/Al三种双介质调制靶进行靶参数测量。结果表明:三种双介质调制靶层与层之间结合紧密,界面清晰,调制图形为正弦,靶参数测量准确。     

Creating Ioffe-Pritchard micro-traps from permanent magnetic film with in-plane magnetization

We present designs for Ioffe-Pritchard type magnetic traps using planar patterns of hard magnetic material. Two samples with different pattern designs were produced by spark erosion of 40 μm thick FePt foil. The pattern on the first sample yields calculated axial and radial trap frequencies of 51 Hz and 6.8 kHz, respectively. For the second sample the calculated frequencies are 34 Hz and 11 kHz. The structures were used successfully as a magneto-optical trap for ⁸⁷Rb and loaded as a magnetic trap. A third design, based on lithographically patterned 250 nm thick FePt film on a Si substrate, yields an array of 19 traps with calculated axial and radial trap frequencies of 1.5 kHz and 110 kHz, respectively.     

3D Arrangement of Magnetic Particles in Thin Polymer Films Assisted by Magnetically Patterned Exchange Bias Layer Systems

The possibility to arrange and embed magnetic micro- and nanoparticles in thin polymer film systems using flat magnetically patterned substrate templates is investigated. In contrast to self-organized particle rows forming by applying a homogeneous magnetic field, particles adapt to the magnetic field landscape of the substrate's magnetic pattern prior to polymer crosslinking. Crosslinking then fixes the particle positions in the polymer. The process is tested for composites of hydrophobic polydimethylsiloxane (PDMS) and maghemite nanoparticles as well as for hydrophilic polyvinyl alcohol (PVOH) and hydrophilic functionalized, superparamagnetic core–shell microspheres. The substrate template is an exchange bias layer system magnetically patterned into parallel-stripe domains with in-plane magnetizations and head-to-head/tail-to-tail remanent magnetization orientation in adjacent magnetic domains. A high occupancy percentage of magnetic beads on a domain wall as well as anisotropic actuation of the composite is achieved.     

Magnons in surface-rearranged ferromagnetic thin films

By a Green function approach, spin waves in a surface-rearranged ferromagnetic thin film are derived both analytically and numerically. Heisenberg exchange, bulk and surface anisotropy between nearest neighbors and external magnetic field are taken into account for an sc film with {001} surfaces. Because of the anisotropies, the dynamical matrix defined from the Green function equations is not Hermitian, so we generalize the Bogoliubov canonical transformation to derive the spin wave spectrum. The spin waves propagating inside the film result from the superposition of two sine or hyperbolic sine waves. The amplitude and polarization of spin waves are shown to be quite sensitive to the details of the surface rearrangements, whereas spin wave energies are not so sensitive to such rerrangements, except when soft modes occur in the unrearranged configuration. In that case, we show that when the surface rearrangement is taken into account, soft modes disappear in the spin wave spectrum.     

Undercut structures fabricated by microtransfer printing combined with UV exposure and their applications

In this paper, the undercut structures were fabricated by microtransfer printing of metal films on the surface of photoresist combined with UV exposure and photoresist film developing. The patterned metal films were used as mask to realize the selective UV exposure of photoresist firstly. The undercut structures, which consist of the top metal films and the patterned bottom photoresist, formed in the subsequent developing process because of the lateral dissolving of photoresist at the edge of the unexposed regions. The method proposed in this paper has wider tolerance to the changing of the patterning parameters, but without effect on the patterning resolution since the metal film was used as the top layer. The undercut structures were used as separators to pattern passive-matrix display of organic light-emitting diodes (OLEDs). No visible difference of the device performance was observed compared with the OLEDs patterned by the shadow mask.     

Patterning of gold nano-octahedra using electron irradiation combined with thermal treatment and post-cleaning process

A novel approach to pattern nanocrystalline gold (Au) octahedra is presented based on electron irradiation combined with thermal treatment and post-cleaning process using HAuCl₄-loaded poly(styrene-b-2-vinyl pyridine) (PS-b-P2VP) block copolymer (BCP) as a precursor material. The BCP tends to cross-link under electron irradiation, and thus a patterned film can be prepared by selectively irradiating an electron beam onto a precursor film using a shadow mask. A post-thermal treatment leads to the formation of crystalline Au nano-octahedra inside the patterned film with a help of the BCP acting as a capping agent. Subsequently, the BCP can be removed by O₂ plasma etching combined with oxidative degradation, with the Au nanoparticles remaining. As a result, a patterned film consisting of high-purity nanocrystalline Au octahedra is fabricated. The sizes of the Au octahedral nanoparticles can be readily controlled from 49 to 101 nm by changing the thickness of the precursor film. The patterned Au nano-octahedra films exhibit excellent surface-enhanced Raman scattering behavior with the maximum enhancement factor of ~10⁶.     

Selective ultrasonic imprinting for micropattern replication on predefined area

Conventional micro/nano patterning processes generally use rectangular patterned molds, so that the pattern replications are usually performed in a corresponding rectangular region. In this study, a selective patterning method based on ultrasonic imprinting is developed to replicate micropatterns on predefined areas with arbitrary profiles. To replicate micropatterns on predefined areas, the conventional ultrasonic imprinting process is modified by placing a profiled metal mask between a target film and an ultrasonic horn. Ultrasonic waves are then selectively transferred to the target film through the mask film, from which micropatterns can be replicated onto the predefined areas. For the implementation of the proposed selective imprinting process, the effects of the mask size and shape are experimentally investigated in terms of the replication characteristics of micropatterns. This selective imprinting process is further applied to micropattern replications on arbitrarily profiled areas. In these applications, the effects of the mask film and imprinting conditions are also discussed in terms of the replication quality in both the masked and the unmasked regions.     

X射线辐射驱动冲击波的实验测量与分析

在腔内充CH发泡材料,提高辐射驱动冲击波的平面性.利用楔形铝膜测量辐射驱动冲击波发 光信号的条纹图像,从而获得冲击波速度和冲击波压力.利用冲击波速度与辐射温度的定标 关系,求得辐射温度. 关键词：     

Temperature-electric field hysteresis loop of multicaloric effects in PbZr0.8Ti0.2O3 thin films

The Multicaloric effect in the PbZr_0.8Ti_0.2O₃ thin films is investigated with the application of sine wave electric field, dc electric field and stress using a phase field method combined with the thermodynamic analysis. The simulation results show that the adiabatic temperature change-electric field curve presents a shape of butterfly in the presence of the sine wave electric field. In order to detect the effect of the sine wave electric field, the multicaloric effect and the domain structures under the direct electric field and the sine wave electric field are compared. It is found that the domain switching behaviors are quite different under the different applied electric fields. And the negative multicaloric effect in the PbZr_0.8Ti_0.2O₃ thin film is attribute to the domain switching under the external field.     

Fabrication of complex three-dimensional nanostructures from self-assembling block copolymer materials on two-dimensional chemically patterned templates with mismatched symmetry

A study is presented of the self-assembly of a lamella-forming blend of a diblock copolymer and its respective homopolymers on periodically patterned substrates consisting of square arrays of spots, that preferentially attract one component, as a function of pattern dimensions and film thickness. The blend morphology follows the pattern at the substrate and forms a single quadratically perforated lamella (QPL). At intermediate film thicknesses necks connect this QPL to the film surface, resulting in a bicontinuous morphology. The necks do not register with the underlying square lattice but exhibit a substantial amount of hexagonal short-range order. For thicker films we observe bicontinuous morphologies consisting of parallel lamellae with disordered perforations. These results demonstrate a promising strategy for the fabrication of complex interfacial nanostructures from two-dimensional chemically patterned templates.