Hydrogen permeation of Pd-coated V90Al10 alloy membranes at different pressures in the presence and absence of carbon dioxide

The hydrogen permeation characteristics of alloy membranes based on Pd-coated V₉₀Al₁₀ alloy membrane have been investigated in the pressure range 1-3 atm under pure hydrogen and hydrogen-carbon dioxide gas mixture at 450 °C. Hydrogen permeation experiments have been confirmed that hydrogen flux was 21.1 ml/min/cm² for a Pd-coated V₉₀Al₁₀ alloy membrane (thickness: 0.5 mm) using pure hydrogen as the feed gas. It has been found that Pd-coated V₉₀Al₁₀ alloy membranes exhibit good resistance to hydrogen embrittlement in pure hydrogen atmosphere. After different hydrogen permeation flux tests under different pressure condition in presence of hydrogen-carbon dioxide gas mixture, the characteristics of the Pd-coated V₉₀Al₁₀ alloy membranes were examined by ex-situ analysis techniques. The loss of cell performance observed in the presence of hydrogen-carbon dioxide gas mixture is mainly attributed to both physical and chemical degradations of membrane, which led to structural changes in the Pd-coated V₉₀Al₁₀ alloy membrane.     

Elucidating surface properties of dry-etched ZnO using H2/CH4 and H2/CH4/Ar plasma

This paper reports a study of reactive ion etching (RIE) of n-ZnO in H₂/CH₄ and H₂/CH₄/Ar gas mixtures. Variables in the experiment were gas flow ratios, radio-frequency (rf) plasma power, and total pressure. Structural and electrical parameters of the etched surfaces and films were determined. Both the highest surface roughness and highest etching rate of ZnO films were obtained with a maximum rf power of 300 W, but at different gas flow ratios and working pressures. These results were expected because increasing the rf power increased the bond-breaking efficiency of ZnO. The highest degree of surface roughness was a result of pure physical etching by H₂ gas without mixed CH₄ gas. The highest etching rate was obtained from physical etching of H₂/Ar species associated with chemical reaction of CH₄ species. Additionally, the H₂/CH₄/Ar plasma treatment drastically decreased the specific contact and sheet resistance of the ZnO films. These results indicated that etching the ZnO film had roughened the surface and reduced its resistivity to ohmic contact, supporting the application of a roughened transparent contact layer (TCL) in light-emitting diodes (LEDs).     

Optical characterization of PLD grown nitrogen-doped TiO2 thin films

Nitrogen-doped TiO₂ thin films were prepared by pulsed laser deposition (PLD) by ablating metallic Ti target with pulses of 248 nm wavelength in reactive atmospheres of O₂/N₂ gas mixtures. The layers were characterized by UV-VIS spectrophotometry and variable angle spectroscopic ellipsometry with complementary profilometry for measuring the thickness of the films. Band gap and extinction coefficient values are presented for films deposited at different substrate temperatures and for varied N₂ content of the gas mixture. The shown tendencies are correlated to nitrogen incorporation into the TiO_2-xN_x layers. It is shown that layers of significantly increased visible extinction coefficient with band gap energy as low as 2.89 eV can be obtained. A method is also presented how the spectroscopic ellipsometric data should be evaluated in order to result reliable band gap values.     

Substrate effects on the oxygen gas sensing properties of SnO2/TiO2 thin films

In this study, SnO₂/TiO₂ thin films are fabricated on SiO₂/Si and Corning glass 1737 substrates using a R.F. magnetron sputtering process. The gas sensing properties of these films under an oxygen atmosphere with and without UV irradiation are carefully examined. The surface structure, morphology, optical transmission characteristics, and chemical compositions of the films are analyzed by atomic force microscopy, scanning electron microscopy and PL spectrometry. It is found that the oxygen sensitivity of the films deposited on Corning glass 1737 substrates is significantly lower than that of the films grown on SiO₂/Si substrates. Therefore, the results suggest that SiO₂/Si is an appropriate substrate material for oxygen gas sensors fabricated using thin SnO₂/TiO₂ films.     

Structural and magnetic properties of free-standing Ni0.23Cu0.11Zn0.66Fe2O4 thick films prepared using a modified tape-casting method

Free-standing Ni_0.23Cu_0.11Zn_0.66Fe₂O₄ thick films have been prepared using a modified tape-casting method from a viscous paint. The surface morphology, saturation magnetization (M_s), coercivity (H_c) and complex permeability of the thick films were studied. It is demonstrated that the thick films have relatively larger complex permeability and higher resonance frequency as compared to their bulk material counterparts.     

Electrical transport properties of hydrogen-exposed p-type PbTe films

Hall coefficient and d.c. conductivity measurements were made on p-type PbTe epitaxial films exposed to molecular hydrogen gas at high pressures (100–500 psi) in the temperature range (100–300K). It is found that hydrogen converts p-type films to n-type at a pressure of about 300 psi. The results are explained by assuming that the action of hydrogen is to provide donor electrons.     

The crystalline orientation and ferroelectric properties of Bi3.25La0.75Ti3O12 thin films mediated by the intermediate layer of LaNiO3

c-Axis-oriented and (1 1 7)-oriented Bi_3.25La_0.75Ti₃O₁₂ (BLT) thin films are successfully controlled by the intermediate layer of LaNiO₃ (LNO) with chemical solution deposition (CSD), respectively. X-ray diffraction (XRD) demonstrates that the structure and orientation of LNO thin films have a strong effect on the orientation of BLT thin films. Scanning electron microscopy suggests that BLT thin films on LNO electrode exhibit crack-free, uniform size grains and dense microstructure. A crystalline orientation dependent remanent polarization is observed in BLT thin films, and it is found that the remanent polarization (2P_r) of (1 1 7)-oriented films is larger than that of c-axis-oriented films. Our research directly demonstrates that the vector of the main spontaneous polarization in these layered perovskite materials (BLT) is along a-axis.     

Characteristics of high sensitivity ethanol gas sensors based on nanostructured spinel Zn1−xCoxAl2O4

Nanocrystalline powders of Zn_1−xCo_xAl₂O₄ (x = 0, 0.2, 0.4, 0.6, 0.8, 1.0) mixed oxides, with cubic spinel structure were successfully prepared by the ethylene glycol mediated citrate sol-gel method. The structure and crystal phase of the powders were characterized by X-ray diffraction (XRD) and microstructure by transmission electron microscopy (TEM). X-ray diffraction results showed that the samples were in single phase with the space group Fd-3m. TEM analysis showed that the powders with spherical shape were uniform in particle size of about 17-24 nm with mesoporous in nature. Further investigations were carried out by FT-IR. Thick films of as-prepared Zn_1−xCo_xAl₂O₄ powders were fabricated using screen-printing technique. The response of Zn_1−xCo_xAl₂O₄ based thick films towards different reducing gases (liquefied petroleum gas, hydrogen, hydrogen sulfide, ethanol gas and ammonia) was investigated. The sensor response largely depends on the composition, temperature and the test gas species. The Co (cobalt) content has a considerable influence on the gas-sensing properties of Zn_1−xCo_xAl₂O₄. Especially, Zn_0.4Co_0.6Al₂O₄ composition exhibited high response with better selectivity to 100 ppm C₂H₅OH gas at 150 °C. The instant response (∼7 s) and fast recovery (∼16 s) are the main features of this sensor.     

Proton conduction in (NH4)3 H(SO4)2 single crystals

D.C. electrical conductivity, DTA and coulometric studies on (NH₄)₃ H(SO₄)₂ single crystals are made. Conductivity is markedly anisotropic with maximum along c¹ direction. A sudden jump in the conductivity plot along c¹ direction at 413 K is supported by a large endothermic peak in DTA, confirming the presence of transition at this temperature. The values of activation energy calculated from conductivity measurements indicated that the charge carriers are protons. This was further confirmed by coulometric experiment where the gas evolved was hydrogen, as established by a gas chromatograph and the volume of H₂ released agreed with that expected from electrolysis. The mechanism of protonic conduction in this crystal is discussed.     

用SiCl4/H2气源沉积多晶硅薄膜光照稳定性的研究

对以SiH₄/H₂及SiCl₄/H₂为源气体、采用 等离子体增强化学气相沉积技术制备的非晶硅薄膜和多晶硅薄膜进行了光照稳定性的研究.实验表明，制备的多晶硅薄膜并没有出现 非晶硅中的光致衰减现象，其光电导、暗电导在光照过程中没有下降反而有所上升且电导率 变化快慢受氢稀释度的制约.多晶硅薄膜的光照稳定性可能来源于高的晶化度及Cl元素的存在. 关键词： 多晶硅薄膜 稳恒光电导效应 晶界 光致衰退效应     

High Curie temperature in B-site ordered Sr2CrWO6 epitaxial thin films

Epitaxial and c-axis oriented double perovskite Sr₂CrWO₆ thin films were prepared on SrTiO₃ (100) and LaAlO₃ (100) substrates by pulsed-laser deposition. Structural, magnetic and transport properties were found to be sensitive to the gas conditions employed during the deposition. A small amount of oxygen along with Ar during the deposition was found to be essential for B-site ordering; such films displayed lattice parameters close to the bulk value and display ferromagnetic metallic behavior. The Curie temperature observed above 500 K in these films is higher than bulk Sr₂CrWO₆ samples. Films grown without oxygen were observed to have long c-parameter and no B-site ordering; they were non-magnetic and semiconducting.     

Nanocrystallite formation in Pd capped PrH3−δ films

Restricting the palladium cap layer thickness to ≤9 nm on top of 170 nm Pr films during in situ hydrogen loading has been shown to result in nanocrystallite size PrH_3−δ films even though the deposited Pr films are of large crystallite size. The effect is attributed to hydrogen-induced stresses in the PrH_3−δ films, which trigger structural rearrangement. These nanocrystalline films show a blue shift of the transmittance edge with respect to PrH_3−δ films of large crystallite size. The approximate size of the nanocrystallites calculated from the blue shift using an effective mass approximation (EMA) theory is supported by XRD, TEM and AFM measurements.     

Formation of Ge35In8S57 amorphous films for optical applications

Thin films of In-doped Ge-S in the form of Ge₃₅In₈S₅₇ with different film thickness were deposited using an evaporation method. The X-ray diffraction studies demonstrate that the as-prepared films are amorphous in nature for these films. Some optical constants were calculated at a thickness of 150, 300, 450 and 900?nm and annealing temperature of 373, 413, 437 and 513?K. Our optical observations show that the mechanism of the optical transition obeys the indirect transition. It was found that the energy gap, E_g, decreases from 2.44 to 2.20?eV with expanding the thickness of the film from 150 to 900?nm. On the other hand, it was found that E_g increases with annealing temperature from 373 to 513?K. The increment in the band gap can be attributed to the gradual annealing out of the unsaturated bonds delivering a decreasing the density of localized states in the band structure. Using the single oscillator model, the dispersion of the refractive index is described. The dispersion constants of these films were calculated with different both thickness and annealing temperatures. Additionally, both of nonlinear susceptibility, χ⁽³⁾ and nonlinear refractive index, n₂ were calculated.     

Roles of SiH4 and SiF4 in growth and structural changes of poly-Si films

The structural properties of polycrystalline silicon films, prepared by plasma enhanced chemical vapor deposition system, with different flow rates of SiH₄/SiF₄ mixtures at 300 °C were investigated. This study indicates that the low hydrogen coverage on the growing surface, under optimum fluorine radicals, will be leaded to an improvement of crystallized area as compared with case of high hydrogen coverage surface. Moreover, the studies of the role of SiH₄ and SiF₄ radicals show that the SiH₄ radicals are important in the nucleation and growth of grains. However, SiF₄ radicals are effective in the structural change of grain boundaries regions and by this way, in the present system, establish the growth of grains under the dominant 〈1 1 0〉 direction. The stress investigation indicates that addition of high flow rate of SiF₄ in amorphous film, results in the nearly stress free films. Finally, we found that the changes in g-value reflect the changes in the intrinsic compressive and tensile stress in the both polycrystalline and amorphous silicon films.     

Roles of SiH4 and SiF4 in growth and structural changes of poly-Si films

The structural properties of polycrystalline silicon films, prepared by plasma enhanced chemical vapor deposition system, with different flow rates of SiH₄/SiF₄ mixtures at 300 °C were investigated. This study indicates that the low hydrogen coverage on the growing surface, under optimum fluorine radicals, will be leaded to an improvement of crystallized area as compared with case of high hydrogen coverage surface. Moreover, the studies of the role of SiH₄ and SiF₄ radicals show that the SiH₄ radicals are important in the nucleation and growth of grains. However, SiF₄ radicals are effective in the structural change of grain boundaries regions and by this way, in the present system, establish the growth of grains under the dominant 〈1 1 0〉 direction. The stress investigation indicates that addition of high flow rate of SiF₄ in amorphous film, results in the nearly stress free films. Finally, we found that the changes in g-value reflect the changes in the intrinsic compressive and tensile stress in the both polycrystalline and amorphous silicon films.     

H2对Ar稀释SiH4等离子体CVD制备多晶硅薄膜的影响

以SiH₄，Ar和H₂为反应气体，采用射频等离子体化学气相沉积方法在300℃下制备了低温多晶Si薄膜.实验发现，反应气体中H₂的比例是影响薄膜结晶质量的重要因素，在适量的H₂比例下制备的多晶Si薄膜具有结晶相体积分数高，氢含量低，生长速率快、抗杂质污染等特性. 关键词： 低温多晶Si薄膜 等离子体CVD 4')" href="#">Ar稀释SiH₄ 2比例')" href="#">H₂比例     

Switching phenomenon and optical properties of Se85Te10Bi5 films

Se₈₅Te₁₀Bi₅ films of different thicknesses ranging from 126 to 512 nm have been prepared. Energy-dispersive X-ray (EDX) spectroscopy technique showed that films are nearly stoichiometric. X-ray diffraction (XRD) measurements have showed that the Se₈₅Te₁₀Bi₅ films were amorphous. Electrical conduction activation energy (ΔE_σ) for the obtained films is found to be 0.662 eV independent of thickness in the investigated range. Investigation of the current voltage (I-V) characteristics in amorphous Se₈₅Te₁₀Bi₅ films reveals that it is typical for a memory switch. The switching voltage V_th increases with the increase of the thickness and decreases exponentially with temperature in the range from 298 to 383 K. The switching voltage activation energy (ε) calculated from the temperature dependence of V_th is found to be 0.325 eV. The switching phenomenon in amorphous Se₈₅Te₁₀Bi₅ films is explained according to an electrothermal model for the switching process. The optical constants, the refractive index (n) and the absorption index (k) have been determined from transmittance (T) and reflectance (R) of Se₈₅Te₁₀Bi₅ films. Allowed non-direct transitions with an optical energy gap (E_g^opt) of 1.33 eV have been obtained. ΔE_σ is almost half the obtained value of E_g^opt, which suggested band to band conduction as indicated by Davis and Mott.     

Electrical behavior of BaZr0.1Ti0.9O3 and BaZr0.2Ti0.8O3 thin films

BaZr_0.1Ti_0.9O₃ and BaZr_0.2Ti_0.8O₃ (BZT) thin films were deposited on Pt/Ti/LaAlO₃ (1 0 0) substrates by radio-frequency magnetron sputtering, respectively. The films were further annealed at 800 °C for 30 min in oxygen. X-ray diffraction θ-2θ and Φ-scans showed that BaZr_0.1Ti_0.9O₃ films displayed a highly (h 0 0) preferred orientation and a good cube-on-cube epitaxial growth on the LaAlO₃ (1 0 0) substrate, while there are no obvious preferential orientation in BaZr_0.2Ti_0.8O₃ thin films. The BaZr_0.1Ti_0.9O₃ films possess larger grain size, higher dielectric constant, larger tunability, larger remanent polarization and coercive electric field than that of BaZr_0.2Ti_0.8O₃ films. Whereas, BaZr_0.1Ti_0.9O₃ films have larger dielectric losses and leakage current density. The results suggest that Zr⁴⁺ ion can decrease dielectric constant and restrain non-linearity. Moreover, the enhancement in dielectric properties of BaZr_0.1Ti_0.9O₃ films may be attributed to (1 0 0) preferred orientation.     

Preparation and study of silver added La0.67Ca0.33MnO3 film

La_0.67Ca_0.33MnO₃ (LCMO) and Ag admixed La_0.67Ca_0.33MnO₃ (Ag-LCMO) polycrystalline films have been prepared on SrTiO₃ single crystal (100) substrates by ultrasonic spray pyrolysis technique. These films are characterized using XRD, SEM, and temperature dependence of resistivity (ρ-T) and ac susceptibility (χ-T). The films are having cubic structure with lattice parameters as 3.890 and 3.885 Å for LCMO and Ag-LCMO films, respectively. The peek in ρ-T curve (T_p) and the ferromagnetic transition temperature (T_C) for the Ag-LCMO film is higher than that of LCMO film. The stability of both the films was tested by repeated measurements of its characteristics over a period of one week after several thermal cycling from room temperature to 77 K. In the LCMO film, the peak in the ρ-T curve (T_p) is found to shift towards lower value and conduction noise of the film increases in the subsequent measurements. In the case of Ag-LCMO the value of T_p, T_C and conduction noise of the film did not change even after several measurements. Silver segregating at the grain boundaries in Ag-LCMO polycrystalline film seems to be responsible for improving the characteristics of Ag-LCMO films.     

Effect of an in-situ applied electric field on growth of Bi4Ti3O12 films by sol-gel

Bi₄Ti₃O₁₂ (BIT) films were prepared on Pt/TiO₂/SiO₂/Si substrates by the sol-gel method. A low electric field was in-situ applied to BIT films during rapid thermal annealing (RTA). It was first found that a bias electric field has great influence on the structure, orientation, and morphology of BIT films at proper temperatures. Under the electric field of very low V/cm, BIT films show highly c-axis-oriented growth with second phase of bismuth oxide at 600 and 650 °C. The possible origin is proposed. On one hand, the electrostatic energy provides an extra driving force and the co-interaction of the electrostatic energy and interface energy promotes the c-axis-oriented growth of the BIT grains. On the other hand, the second phase of bismuth oxide produced during RTA in an electric field also plays an important role in the control of film orientation.