Significant photoelectrical response of epitaxial graphene grown on Si-terminated 6H-SiC

Photoelectrical response characteristics of epitaxial graphene (EG) films on Si- and C-terminated 6H-SiC, and transferred chemical vapor deposition (CVD) graphene films on Si-terminated 6H-SiC have been investigated. The results show that upon illumination by a xenon lamp, the photocurrent of EG grown on Si-terminated SiC significantly increases by 147.6%, while the photocurrents of EG grown on C-terminated SiC, and transferred CVD graphene on Si-terminated SiC slightly decrease by 0.5% and 2.7%, respectively. The interfacial buffer layer between EG and Si-terminated 6H-SiC is responsible for the significant photoelectrical response of EG. Its strong photoelectrical response makes it promising for optoelectronic applications.     

Nucleation of epitaxial graphene on SiC substrate by thermal annealing and chemical vapor deposition

Growth of epitaxial graphene (EG) on silicon carbide (SiC) is regarded as one of the most effective routes to high-quality graphene towards practical applicability. We try to build up a model to illuminate the nucleation process of EG on SiC by thermal decomposition. The model is derived from some experimental results and discloses that surface diffusion plays an important role in the nucleation. For the chemical vapor deposition process used, the organic gas as carbon precursor enables carbon deposition quickly for supporting the growth of high-quality graphene via vapor transformation, so that the nucleated and final graphene becomes almost stress-free and mimics the free-standing graphene. Our findings have a potential in preparing high-quality graphene by controlling the nucleation conditions.     

Influence of defects in SiC （0001） on epitaxial graphene

Defects in silicon carbide(SiC) substrate are crucial to the properties of the epitaxial graphene(EG) grown on it. Here we report the effect of defects in SiC on the crystalline quality of EGs through comparative studies of the characteristics of the EGs grown on SiC(0001) substrates with different defect densities. It is found that EGs on high quality SiC possess regular steps on the surface of the SiC and there is no discernible D peak in its Raman spectrum. Conversely, the EG on the SiC with a high density of defects has a strong D peak, irregular stepped morphology and poor uniformity in graphene layer numbers. It is the defects in the SiC that are responsible for the irregular stepped morphology and lead to the small domain size in the EG.     

Raman Spectrum of Epitaxial Graphene on SiC （0001） by Pulsed Electron Irradiation

We report new Raman features of epitaxial graphene （EG） on Si-face 4H-SiC prepared by pulsed electron irradiation （PEI）. With increasing graphene layers, frequencies of G and 2D peaks show blue-shifts and approach those of bulk highly-oriented pyrolytic graphite. It is indicated that the EG is slightly tension strained and tends to be strain-free. Meanwhile, single Lorentzian line shapes are well fitted to the 2D peaks of EG on SiC（O001） and their full widths at half maximum decrease with the increasing graphene layers, which indicates that the multilayer EG on Si-face can also contain turbostratic stacking by our PEI route instead of only AB Bernal stacking by a traditional thermal annealing method. It is worth noting that the stacking style plays an important role on the charge carrier mobility. Therefore our findings will be a candidate for growing quality graphene with high carrier mobility both on the Si- and C-terminated SiC substrate. Mechanisms behind the features are studied and discussed.     

Freestanding graphene writing on a silicon carbide wafer

Freestanding graphene on a trench has been fabricated extensively using a transfer process of chemical vapor deposition grown graphene. Here, we demonstrate that freestanding graphene can be grown directly on a trench without a transfer process. A shallow trench was made on a 6H–SiC(0001) wafer using a focused ion beam lithography. The shallow trench was heated to a high temperature under Ar atmosphere. The heat treatment made the shallow trench become deeper and wider. Subsequently, epitaxial graphene was floating on the trench, resulting in freestanding graphene, where underlying bulk SiC was self-etched after the growth of epitaxial graphene. The freestanding graphene on a trench was characterized using Raman spectroscopy and atomic force microscopy. Such freestanding graphene writing can be applied to semiconductor fabrication process of freestanding graphene devices without a transfer process.     

A comparison of the field emission characteristics of vertically aligned graphene sheets grown on different SiC substrates

The field emission （FE） properties of vertically aligned graphene sheets （VAGSs） grown on different SiC substrates are reported. The VAGSs grown on nonpolar SiC （10-10） substrate show an ordered alignment with the graphene basal plane-parallel to each other, and show better FE features, with a lower turn-on field and a larger field enhancement factor. The VAGSs grown on polar SiC （000-1 ） substrate reveal a random petaloid-shaped arrangement and stable current emission over 8 hours with a maximum emission current fluctuation of only 4%. The reasons behind the differing FE characteristics of the VAGSs on different SiC substrates are analyzed and discussed.     

On the correction of errors in quantum cryptography systems

The Raman and photoluminescence spectra of short-period C/SiC superlattices produced by RF magnetron sputtering are investigated. The Raman data indicate that, in 35-period Sitall/Ni/[C/SiC] superlattices with the C and SiC effective thicknesses of 3.5 and 3 Å, respectively, subjected to postgrowth avalanche annealing, the carbon layers assume the structure of multilayer graphene with 3–5 graphene sheets per superlattice period. A method for the fabrication of graphene-like carbon structures on the basis of short-period superlattices grown by RF sputtering is suggested and implemented.     

The effects of the magnetopolaron on the energy gap opening in graphene

The magnetopolaron is formed via electron-acoustic deformation phonon coupling in the presence of a magnetic field in monolayer graphene. We find that an energy gap (EG) is opened due to the electron-phonon coupling. Both linear and square-root forms for the dependence of the EG on the magnetic field are obtained, which are in agreement with experimental measurements. Furthermore, we suggest that the EG can be estimated through observing the variation of Fermi velocity in cyclotron resonance experiments. The relation of the EG with the Debye cut-off wavenumber is also discussed.     

Anomalous scaling behaviour of cobalt cluster size distributions on graphite,epitaxial graphene and carbon-rich (6√3 × 6√3)R30°

The influence of the underlying interface on adsorption of cobalt (Co) is investigated by comparing the nucleation and growth of Co at room temperature on three carbon (C) surfaces, i.e. highly oriented pyrolytic graphite (HOPG), epitaxial graphene/SiC(0001) (hereafter abbreviated as EG) and precursor of EG i.e. C-rich (6√3 × 6√3)R30°/SiC(0001) (hereafter abbreviated as 6√3). On all three surfaces, Co adopts Volmer–Weber growth mode via formation of three-dimensional dome-shaped nanoclusters. Co clusters formed on 6√3 surface are smaller but denser than Co/HOPG or Co/EG. Scaling analysis reveals a critical nucleus size, i* = 1 (atom) and the smallest stable cluster (i* + 1) would be a dimer. Co/HOPG and Co/EG have the same order of magnitude for their cluster densities and sizes. Scaling analyses however show that the i* for Co/EG (i* = 3) is larger than Co/HOPG (i* = 0) and in this respect the smallest stable cluster would be tetramer and monomer respectively. This difference is attributed to the influence of an interface situated between graphene and SiC bulk. It appears that EG is more inert than HOPG towards the adsorption of Co and may act as a better substrate to host Co clusters.     

化学气相沉积SiC材料超光滑表面纳米加工

 利用传统光学加工方法，采用陶瓷磨盘和金刚石微粉对国产化学气相沉积(CVD) SiC进行了粗磨、细磨加工；然后，利用颗粒直径从4 μm到1 μm的金刚石研磨膏逐级进行抛光，发现SiC表面存在纳米级划痕；最后，改用颗粒直径为20 nm氧化铝纳米颗粒的碱性水溶液进行抛光，表面粗糙度达到0.6 nm(RMS)，表面纳米级划痕得到很好改善，获得了较高表面质量的超光滑表面。     

Solvothermal synthesis and characterization of sandwich-like graphene/ZnO nanocomposites

Graphene-based nanocomposites are emerging as a new class of materials that hold promise for many applications. In this paper, we present a general approach for the preparation of sandwich-like graphene/ZnO nanocomposites in ethylene glycol (EG) medium using graphene oxide as a precursor of graphene and zinc acetylacetonate as a single-source precursor of zinc oxide. The samples were characterized by X-ray diffraction (XRD), transmission electron microscopy (TEM), Fourier transform infrared (FT-IR) spectroscopy, ultraviolet-visible (UV-vis) spectroscopy and thermogravimetry analysis. It was shown that the as-formed ZnO nanoparticles with a diameter of about 5 nm were densely and uniformly deposited on both surfaces of the graphene sheets to form a sandwich-like composite structure and as a result, the restacking of the as-reduced graphene sheets was effectively prevented. The ZnO-coated graphene nanocomposites can be expected to effectively improve the photocatalysis and sensing properties of ZnO and would be promising for practical applications in future nanotechnology.     

The physics of epitaxial graphene on SiC(0001)

Various physical properties of epitaxial graphene grown on SiC(0001) are studied. First, the electronic transport in epitaxial bilayer graphene on SiC(0001) and quasi-free-standing bilayer graphene on SiC(0001) is investigated. The dependences of the resistance and the polarity of the Hall resistance at zero gate voltage on the top-gate voltage show that the carrier types are electron and hole, respectively. The mobility evaluated at various carrier densities indicates that the quasi-free-standing bilayer graphene shows higher mobility than the epitaxial bilayer graphene when they are compared at the same carrier density. The difference in mobility is thought to come from the domain size of the graphene sheet formed. To clarify a guiding principle for controlling graphene quality, the mechanism of epitaxial graphene growth is also studied theoretically. It is found that a new graphene sheet grows from the interface between the old graphene sheets and the SiC substrate. Further studies on the energetics reveal the importance of the role of the step on the SiC surface. A first-principles calculation unequivocally shows that the C prefers to release from the step edge and to aggregate as graphene nuclei along the step edge rather than be left on the terrace. It is also shown that the edges of the existing graphene more preferentially absorb the isolated C atoms. For some annealing conditions, experiments can also provide graphene islands on SiC(0001) surfaces. The atomic structures are studied theoretically together with their growth mechanism. The proposed embedded island structures actually act as a graphene island electronically, and those with zigzag edges have a magnetoelectric effect. Finally, the thermoelectric properties of graphene are theoretically examined. The results indicate that reducing the carrier scattering suppresses the thermoelectric power and enhances the thermoelectric figure of merit. The fine control of the Fermi energy position is thought to be key for the practical use of graphene as a thermoelectric material, which could be achieved with epitaxial graphene. All of these results reveal that epitaxial graphene is physically interesting.     

石墨烯过渡层对金属/SiC接触肖特基势垒调控的第一性原理研究

由于SiC禁带宽度大,在金属/SiC接触界面难以形成较低的势垒,制备良好的欧姆接触是目前SiC器件研制中的关键技术难题,因此,研究如何降低金属/SiC接触界面的肖特基势垒高度(SBH)非常重要.本文基于密度泛函理论的第一性原理赝势平面波方法,结合平均静电势和局域态密度计算方法,研究了石墨烯作为过渡层对不同金属(Ag,Ti,Cu,Pd,Ni,Pt)/SiC接触的SBH的影响.计算结果表明,单层石墨烯可使金属/SiC接触的SBH降低;当石墨烯为2层时,SBH进一步降低且Ni,Ti接触体系的SBH呈现负值,说明接触界面形成了良好的欧姆接触;当石墨烯层数继续增加,SBH不再有明显变化.通过分析接触界面的差分电荷密度以及局域态密度,SBH降低的机理可能主要是石墨烯C原子饱和了SiC表面的悬挂键并降低了金属诱生能隙态对界面的影响,并且接触界面的石墨烯及其与金属相互作用形成的混合相具有较低的功函数.此外,SiC/石墨烯界面形成的电偶极层也可能有助于势垒降低.     

石墨烯过渡层对金属/SiC接触肖特基势垒调控的第一性原理研究

由于SiC禁带宽度大,在金属/SiC接触界面难以形成较低的势垒,制备良好的欧姆接触是目前SiC器件研制中的关键技术难题,因此,研究如何降低金属/SiC接触界面的肖特基势垒高度(SBH)非常重要.本文基于密度泛函理论的第一性原理赝势平面波方法,结合平均静电势和局域态密度计算方法,研究了石墨烯作为过渡层对不同金属(Ag,Ti,Cu,Pd,Ni,Pt)/SiC接触的SBH的影响.计算结果表明,单层石墨烯可使金属/SiC接触的SBH降低;当石墨烯为2层时,SBH进一步降低且Ni,Ti接触体系的SBH呈现负值,说明接触界面形成了良好的欧姆接触;当石墨烯层数继续增加,SBH不再有明显变化.通过分析接触界面的差分电荷密度以及局域态密度,SBH降低的机理可能主要是石墨烯C原子饱和了SiC表面的悬挂键并降低了金属诱生能隙态对界面的影响,并且接触界面的石墨烯及其与金属相互作用形成的混合相具有较低的功函数.此外,SiC/石墨烯界面形成的电偶极层也可能有助于势垒降低.     

Giant Faraday and Kerr rotation with strained graphene

Polarized electromagnetic waves passing through (reflected from) a dielectric medium parallel to a magnetic field undergo Faraday (Kerr) rotation of their polarization. Recently, Faraday rotation angles as much as 0.1?rad were observed for terahertz waves propagating through graphene over a SiC substrate. We show that the same effect is observable with the magnetic field replaced by an in-plane strain field which induces a pseudomagnetic field in graphene. With two such sheets a rotation of π/4 can be achieved, which is the required rotation for an optical diode. Similarly a Kerr rotation of 1/4 rad is predicted from a single reflection from a strained graphene sheet.     

Graphene as interface modifier in ITO and ITO-Cr electrodes

We explore graphene as interface modifier for electrodes in optoelectronic organic devices by measuring the electrical properties of ITO/graphene and ITO/Cr/graphene. For this purpose, exfoliated graphene (EG) was electrochemically synthesized and deposited by spray-pyrolysis. The built-in voltage (Vbi) values were 450 mV for the ITO/CuPc/Al reference, 750 mV for ITO/Cr/graphene/CuPc/Al and 1000 mV for ITO/graphene/CuPc/Al device structures. From these results, we estimate the work functions as 3.20 eV, 3.45 eV and 4.75 eV for ITO/EG, ITO/Cr/EG and ITO. To understand how the work function changes, we carried out first-principles calculations based on density-functional theory (DFT) where Cr work function (~4.2 eV) is not modified by the deposition of pristine graphene; however there is a substantial increase (from 4.2 eV to 5.2 eV), upon deposition of graphene oxide (GO), resulting from a complete transfer of O atoms from the GO sheet to the Cr surface forming a thin layer of chromium oxide.     

A self-powered sensitive ultraviolet photodetector based on epitaxial graphene on silicon carbide

A self-powered graphene-based photodetector with high performance is particularly useful for device miniaturization and to save energy.Here,we report a graphene/silicon carbide(SiC)-based self-powered ultraviolet photodetector that exhibits a current responsivity of 7.4 m A/W with a response frequency of over a megahertz under 325-nm laser irradiation.The built-in photovoltage of the photodetector is about four orders of magnitude higher than previously reported results for similar devices.These favorable properties are ascribed to the ingenious device design using the combined advantages of graphene and SiC,two terminal electrodes,and asymmetric light irradiation on one of the electrodes.Importantly,the photon energy is larger than the band gap of SiC.This self-powered photodetector is compatible with modern semiconductor technology and shows potential for applications in ultraviolet imaging and graphene-based integrated circuits.     

Fabrication of a graphene field effect transistor array on microchannels for ethanol sensing

A new approach to the fabrication of back-gated graphene FET (field effect transistor) arrays on microchannels was investigated. Narrow walls fabricated on a substrate with SU-8 (a negative photoresist), with top metal electrodes were pressed onto another silicon/SiO₂ substrate with predeposited graphene pieces such that the electrodes came into contact with graphene pieces and formed the source and drain contact. The SU-8 narrow walls with the top metal layer were fabricated by the conventional lift-off process. The graphene pieces were reduced chemically from graphite oxide. The I_DS changed immediately by more than 17% when the device was exposed to an ethanol atmosphere. The current recovered very well after the ethanol gas was pumped out. The SU-8 microchannels served as gas flow passages that helped the ethanol vapor reach the sensitive region of the device: the graphene channel. This work provides a convenient way of constructing back-gated graphene FETs for sensing applications. This method could potentially be scaled up for mass production.     

Substrate-induced bandgap in the spectrum of an epitaxial graphene layer

It has been shown that a bandgap can appear in the spectrum of a graphene bilayer formed on the surface of a semiconductor. Bandgap widths have been estimated for various SiC polytypes. The predicted effect is important for the practical applications of graphene.     

石墨烯射频器件研究进展

石墨烯因具有优良的电学特性,在半导体行业中受到广泛关注,特别因其具有超薄的结构和极高的载流子迁移率,为解决短沟道效应提供了可能,并且在高速电子领域具有应用前景.近年来,使用石墨烯作为沟道材料制备射频晶体管及射频电路是发挥石墨烯材料优势的一个重要研究方向.制造高性能的射频器件,首先要制备出高性能的石墨烯材料.在金属衬底上沉积均匀的单层石墨烯材料或者在绝缘衬底上外延生长单层、双层石墨烯材料都是获得高质量石墨烯材料的常用方法.器件结构及工艺流程的设计也是提升晶体管射频性能的重要因素,多指栅结构、T型栅结构、埋栅结构以及自对准工艺的发展能够有效改善石墨烯射频晶体管的截止频率及最大振荡频率.石墨烯晶体管独特的电学特性使得其除了可以构造与其他半导体材料电路相似的射频电路结构,还可以构造出功能完整并且结构更加简单的新型射频电路结构.