气相原子氢与Pt(111)表面的相互作用: 体相氢物种的直接证据

在超高真空条件下利用高温钨丝裂解氢分子制备气相氢原子, 并研究了气相氢原子与Pt(111)表面的相互作用. 热脱附谱(TDS)结果表明气相分子氢在Pt(111)表面吸附生成表面吸附氢物种; 而气相原子氢在Pt(111)表面吸附不仅生成表面吸附氢物种, 而且能够生成体相氢物种. Pt(111)表面体相氢物种的热稳定性低于表面氢物种, 表明体相氢物种具有更高的能量. 这种弱吸附体相氢物种有可能是Pt表面催化加氢反应的活性氢物种.     

氢分子在ZrC(111)面解离过程的动态能带结构研究

采用密度泛函方法和平板模型对H₂在ZrC(111)面上的反应途径进行了研究, 结果表明H₂在该表面上的解离易于发生. 通过考察各中间态的能带结构, 在H₂解离的过程中, H 1s诱导态(占据)所处能量位置存在着先上升后下降的过程, 同时清洁表面中处在费米能级下方的以表面Zr原子4d_xz/d_yz为主要成分的能带消失. 上述能带结构分析结果再现了活性表面态在反应过程中的作用, 并与光电子能谱观测结果相吻合.     

吸附氢气后的钯团簇在氧化亚铜表面上的稳定性研究

为了探究吸附H2后的Pdn团簇在Cu2O（111）完整表面和铜缺陷表面上的稳定性,计算了负载在Cu2O（111）完整表面和铜缺陷表面上的Pdn（n=1-4）对H2分子的最稳定吸附结构;利用在给定H2压力和温度下Pdn / Cu2O表面吸附H2的相图揭示了Pdn团簇在Cu2O（111）两个表面的变化情况。结果表明,在吸附了H2分子以后,Pdn团簇更倾向于保持原有的结构,且随着Pd团簇的增大,吸附H2的数量也逐渐增长。     

过渡金属碳化物(111)面电子结构的理论研究

采用第一性原理的密度泛函方法对过渡金属碳化物MC(111)清洁表面构型和电子结构进行系统研究.结果表明,与理想表面相比,表面弛豫导致表层金属原子和次表层碳原子分别朝体相和真空方向位移,从而导致层间距的收缩.由能带计算结果得知,紧邻或被EF穿越的活性表面态成分均为表面金属原子的dxz/dyz轨道.进一步考察了弛豫对表面态组成的影响,并对表面芯能级位移和功函进行了探讨.     

苯在Si(111)-7×7表面化学吸附的理论研究

采用两种大小不同的原子簇模型Si_(30)H_(28)和Si_(13)H_(16)，分别用两层 ONIOM方法（对较大原子簇）和普通量子化学方法（对较小原子族）考察了苯分子 在Si(111)-7 * 7表面的化学吸附。对三种可能的吸附物种分别用DFT或HF方法进行 了计算。通过大小原子簇吸附物种的吸附能以及几何构型优化参数的比较发现，对 于稳定的吸附物种，较小的原子簇基本上可以代替较大的原子簇进行计算，而对于 不太稳定的吸附物种，就不得不考虑周边原子的影响。计算结果表明苯在Si(111)- 7 * 7表面的主要吸附种是双σ成键的1，4加成产物，不稳定的单吸附物种可能是 1，4加成物种的前驱态。     

窄带隙IV-VI族半导体PbTe(111)的表面氧化及氧的热脱附机理

利用X射线光电子能谱(XPS)、扫描隧道显微镜(STM)以及低能电子衍射(LEED),对PbTe(111)薄膜的表面氧化及氧的热脱附机理进行了研究.结果表明:PbTe(111)薄膜经500VAr+轰击加上250℃高温退火循环处理,可得到呈(1×1)周期性排列的清洁表面.将此清洁表面暴露于大气两天后,表面被氧化形成了PbO2、PbO和TeO2,氧化层的厚度大于2个单原子层(ML),与清洁PbTe(111)表面相比,被氧化的PbTe(111)表面的Te3d5/2与Pb4f7/2芯态谱峰的面积比明显减小,表明被氧化的PbTe(111)表面是富Pb的.在热脱附处理过程中,PbO2和TeO2的芯态峰消失,且O1s芯态峰的强度迅速减弱,表明加热处理不仅使PbO2和TeO2发生了分解,同时也使氧发生了脱附,但PbO即使在350℃退火仍吸附于PbTe(111)表面.     

窄带隙Ⅳ-Ⅵ族半导体PbTe(111)的表面氧化及氧的热脱附机理

利用X射线光电子能谱(XPS)、扫描隧道显微镜(STM)以及低能电子衍射(LEED),对PbTe(111)薄膜的表面氧化及氧的热脱附机理进行了研究.结果表明:PbTe(111)薄膜经500 V Ar+轰击加上250℃高温退火循环处理,可得到呈(1×1)周期性排列的清洁表面.将此清洁表面暴露于大气两天后,表面被氧化形成了PbO2、PbO和TeO2,氧化层的厚度大于2个单原子层(ML),与清洁PbTe(111)表面相比,被氧化的PbTe(111)表面的Te 3d5/2与Pb 4f7/2芯态谱峰的面积比明显减小,表明被氧化的PbTe(111)表面是富Pb的.在热脱附处理过程中,PbO2和TeO2的芯态峰消失,且O1s芯态峰的强度迅速减弱,表明加热处理不仅使PbO2和TeO2发生了分解,同时也使氧发生了脱附,但PbO即使在350℃退火仍吸附于PbTe(111)表面.     

Hβ负载锆催化剂的研制及其催化性能和结构性能的研究

根据层状四水硫酸锆和Hβ沸石各自的催化性能和结构特点，设计并制备得到Hβ负载锆（Zr/Hβ)催化剂。以异丙苯歧化反应为目标体系，研究了Zr/Hβ的催化性能。利用吡啶吸附程序升温脱附和低温氮吸附等方法研究了Zr/Hβ的表面酸性和孔结构，与反应性能进行关联。结果表明，Zr/Hβ较Hβ弱酸强度更弱、强酸强度更强，导致其歧化反应活性较Hβ大大提高，歧化选择性较Hβ略有提高，但其初始歧化选择性较Hβ降低；Zr/Hβ和Hβ的最可几孔径基本一致，因而Zr/Hβ催化异丙苯歧化反应产物中间位－／对位－二异丙苯的摩尔比与Hβ的基本一致。     

苯在Si(111)-7*7表面化学吸附的理论研究

采用两种大小不同的原子簇模型Si_(30)H_(28)和Si_(13)H_(16),分别用两层 ONIOM方法（对较大原子簇）和普通量子化学方法（对较小原子族）考察了苯分子 在Si(111)-7 * 7表面的化学吸附。对三种可能的吸附物种分别用DFT或HF方法进行 了计算。通过大小原子簇吸附物种的吸附能以及几何构型优化参数的比较发现,对 于稳定的吸附物种,较小的原子簇基本上可以代替较大的原子簇进行计算,而对于 不太稳定的吸附物种,就不得不考虑周边原子的影响。计算结果表明苯在Si(111)- 7 * 7表面的主要吸附种是双σ成键的1,4加成产物,不稳定的单吸附物种可能是 1,4加成物种的前驱态。     

氢原子与Fe(111)表面相互作用的理论研究

氢自由基在Fe表面的吸附是典型的表面吸附反应。本文首先对α-Fe体相开展研究,再对Fe(111)的周期性平板模型进行了参数测试,确定了7层模型可以有效表示Fe(111)表面。研究了氢原子在Fe的刚性表面和柔性表面上的吸附情况,发现弛豫效应主要集中在上3层表面,而底层4层原子几乎未发生驰豫。发现氢原子在Fe(111)表面的吸附稳定顺序为BridgeHcpFccTop。还考察了不同的泛函结合不同的色散校正方法对吸附的影响。本文提供了H@Fe(111)体系详细的模型测试结果,为今后H@Fe体系构建精细势能面的研究提供初步指导和参考。     

The structure of the mixed OH + H2O overlayer on Pt[111

The structure of the mixed p(3 x 3)-(3OH + 3H2O) phase on Pt[111] has been investigated by low-energy electron diffraction-IV structure analysis. The OH + H2O overlayer consists of hexagonal rings of coplanar oxygen atoms interlinked by hydrogen bonds. Lateral shifts of the O atoms away from atop sites result in different O-O separations and hexagons with only large separations (2.81 and 3.02 angstroms) linked by hexagons with alternating separations of 2.49 and 2.813.02 angstroms. This unusual pattern is consistent with a hydrogen-bonded network in which water is adsorbed in cyclic rings separated by OH in a p(3 x 3) structure. The top-most two layers of the Pt atoms relax inwards with respect to the clean surface and both show vertical buckling of up to 0.06 angstroms. In addition, significant shifts away from the lateral bulk positions have been found for the second layer of Pt atoms.     

NbC固体表面能带和电子结构的理论研究

采用DFT/BLYP方法对NbC(001)和(111)面的电子结构进行研究。计算结果表明,对于NbC(001)表面,其表面态主要集中于费米能级(EF)下方约4.5eV附近区域,并以表面Nb原子和C原子为主要成分。O2分子在该表面吸附时,趋向于吸附在表面Nb原子上。对于NbC(111)表面,其表面态集中在EF下方0.02.0eV区域,靠近EF的态具有较高的表面活性,其主要成分为表面Nb原子的4dxz/dyz成分。上述结论与光电子能谱实验结果基本一致;但由于金属原子d电子数的差异导致NbC(111)表面态成分与类似的TiC化合物并不相同。     

Controlled growth of Zn nano-dots on a Si(111)-7x7 surface saturated with C2H5OH

Metal atoms bonded with Si adatoms on the Si(111)-(7x7) surface undergo migration by hopping adjacent Si-rest atoms with dangling bond. By saturated adsorption of Si(111)-(7x7) surface with C(2)H(5)OH, the whole Si-rest atoms and a half of Si adatoms are occupied with Si-H and Si-OC(2)H(5), so that the Zn atoms adsorbed on this surface cannot migrate by hopping. When Zn atoms were deposited on this surface, ca. 5 nm Zn dots were grown in the hexagonal spacing of ca. 5.4 nm width around the corner holes, which work as a mold. This is quite different from the growth of honeycomb layers composed of Zn(3) clusters on the clean Si(111)-(7x7) surface. The dots grow up to nine (1.97 nm) to 13 layers (2.64 nm) by keeping their size, which implies a layer-by-layer growth of dots in the mold, where the growth is controlled by the kinetics instead of energetic feasibility.     

Infrared spectroscopy of oxygen adsorbed on hydrogen covered Pt(111)

Using infrared reflection absorption spectroscopy we have investigated how preadsorbed hydrogen affects the adsorption of O(2) on the Pt(111) surface at temperatures below the onset of the water formation reaction. On the fully hydrogen covered surface, Theta(H)=1, O(2) physisorbs at temperatures below 45 K, the weakly dipole active internal stretch vibration is observed at 1548 cm(-1). Unlike on the clean Pt(111) surface, this adsorption state does not act as a precursor for O(2) chemisorption. The physisorbed molecules simply desorb above 45 K and no chemisorbed O(2) state is populated directly from the gas phase in the temperature range 45-90 K. When the surface is approximately half covered, Theta(H) approximately 0.4, with preadsorbed hydrogen, O(2) chemisorbs on the clean Pt(111) surface regions in the characteristic peroxolike and superoxolike states with vibration frequencies around 700 cm(-1) and 870 cm(-1). These values correspond to dense O(2) islands which develop already at low O(2) coverages. At this hydrogen coverage, we find that the initial sticking probability of chemisorbed O(2) is drastically reduced at 90 K and the general uptake also proceeds slowly when compared with observations for the clean surface. We suggest that this is due to a change in the behavior of the physisorbed O(2) precursor.     

金刚石（111）清洁／附氢表面与甲基的相互作用

利用Ａｍｌ分子轨道法计算了金刚石（１１１）清洁／附氢表面与甲基相互作用的特殊势能曲线，深入研究了清洁、附氢表面与甲基相互作用下基底弛豫重建、四甲基构型及成键能的差别，进而得到附氢表面较清洁表面更适合于甲基吸附，是更好的金刚石薄膜生长址的结论。在距基底表面０．５ｎｍ内，甲基与清洁、附氢表面皆有强烈的相互作用。     

Transition state for beta-hydride elimination in alkyl groups on Pt(111)

The transition state for beta-hydride elimination in alkyl groups on the Pt(111) surface has been probed by studying the effects of fluorine substitution on the barriers to beta-hydride elimination, DeltaE++(betaH). Four different fluoroalkyl groups have been formed on the Pt(111) surface by dissociative adsorption of four fluoroalkyl iodides: RCH(2)CH(2)-I (R = CF(3), CF(3)CH(2), and CF(3)CF(2)) and (CF(3))(2)CHCH(2)-I. In the absence of preadsorbed hydrogen, fluoroalkyl groups on the Pt(111) surface dehydrogenate via beta-hydride elimination to form unsaturated fluorocarbons and deposit hydrogen atoms onto the surface. Those hydrogen atoms then hydrogenate the remaining fluoroalkyl groups to produce fluoroalkanes that desorb rapidly from the surface. The kinetics of hydrogenation and fluoroalkane desorption are rate limited by the beta-hydride elimination step and thus serve as measures of the kinetics of beta-hydride elimination. The field effects of the fluorinated substituents increase the barriers to beta-hydride elimination with a reaction constant of rho(F) = 19 +/- 2 kJ/mol. The interpretation of this effect is that the beta-carbon atom in the transition state is cationic, [RC(delta+...)H]++, with respect to the reactant. The field effect of the fluorinated substituent energetically destabilizes the electron deficient beta-carbon atom in the transition state. This is consistent with observations made on the Cu(111) surface; however, the substituent effect is significantly smaller on the Pt(111) surface. On the Pt(111) surface, the transition state for beta-hydride elimination is less polarized with respect to the initial state alkyl group than on the Cu(111) surface.     

First‐principles study of the TiN(111)/ZrN(111) interface

The TiN(111)/ZrN(111) interface was studied by first‐principles method to provide the theoretical basis for developing the TiN/ZrN coatings. Twelve geometry structures of TiN(111)/ZrN(111) interfaces were established. The calculated interfacial work of adhesion reveals that the N‐terminated TiN/N‐terminated ZrN interface with TL site shows the strongest stability. For this TiN(111)/ZrN(111) interface, the results of the partial density of state indicate that the chemical bonding at the interface appeals both ionic and covalent characteristic, which is same as that in the bulk materials. The partial density of states for Zr, Ti, and N atoms at the interface are very similar with those in the bulk, which reveals that the electronic structure transition at the interface is smooth. The results of charge density and charge density difference demonstrate that the lost charge of Ti atom is larger than that of Zr atom, indicating that TiN is more ionic than ZrN. Calculations of the work of fracture indicate that the mechanical failure of the ZrN(111)/TiN(111) interface will take place at the interface. Besides that, the calculation result of the TiN(111)/ZrN(111) interface implies that the TiZrN₂ phase might be formed at the interface because the contacting of the N―N bond is the most stable.     

镍和铂单晶(111)面上氢解离的比较研究

镍和铂单晶（１１１）面上氢解离的比较研究周鲁，孙本繁，吕日昌，唐向阳，滕礼坚（中国科学院大连化学物理研究所分子反应动力学国家重点实验室，大连１１６０２３）关键词镍晶面，铂晶面，氢解离吸附，位能面，分子催化过渡金属镍和铂是催化加氢、脱氢以及临氢重整的重...     

Chlorination-methylation of the hydrogen-terminated silicon(111) surface can induce a stacking fault in the presence of etch pits

Recently, we reported STM images of the methylated Si(111) surface [prepared through chlorination-alkylation of the Si(111)-H surface] taken at 4.7 K, indicating that the torsion angle of the methyl group with respect to the subsurface silicon layer is phi = 23 +/- 3 degrees . Repulsions between H atoms in adjacent methyl groups are minimized at 30 degrees , while repulsions between H atoms and second layer Si atoms are minimized at 60 degrees . The experimental result of 23 degrees is surprising because it suggests a tendency of the methyl group toward the eclipsed configuration (0 degrees ) rather than staggered (60 degrees ). In contrast, extensive fully periodic quantum mechanical Density Functional Theory studies of this surface give an equilibrium torsion angle of 37.5 degrees , indicating a tendency toward the staggered configuration. This discrepancy can be resolved by showing that the CH3 on the step edges and etch pits interacts repulsively with the CH3 on the surface terraces unless a stacking fault is introduced between the first and second silicon layers of the Si(111)-CH3 surface terraces. We propose that this could occur during the chlorination-alkylation of the Si(111)-H surface. This stacking fault model predicted phi = 22.5 degrees measured with respect to the bulk (corresponding to phi = 37.5 degrees with respect to the second layer Si atoms). This model can be tested by measuring the orientation of the CH3 within the etch pits, which should have phi = 37.5 degrees , or by making a surface without etch pits, which should have phi = 37.5 degrees .