In组分渐变提高InGaN/GaN多量子阱发光二极管发光性能

利用金属有机物化学气相沉积系统在蓝宝石衬底上通过有源层的变温生长,得到In组分渐变的量子阱结构,从而获得具有三角形能带结构的InGaN/GaN多量子阱发光二极管(LED)(简称三角形量子阱结构LED).变温光致发光谱结果表明,相对于传统具有方形能带结构的量子阱LED(简称方形量子阱结构LED),三角形量子阱结构有效提高了量子阱中电子和空穴波函数的空间交叠,从而增加了LED的内量子效率;电致发光谱结果表明,三角形量子阱结构LED器件与传统结构LED器件相比,明显改善了发光峰值波长随着电流的蓝移现象.通过以上     

量子阱结构对含V形坑InGaN/GaN蓝光LED效率衰减的影响

使用MOCVD在图形化Si衬底上生长了含V形坑的InGaN/GaN蓝光LED。通过改变生长温度,生长了禁带宽度稍大的载流子限制阱和禁带宽度稍小的发光阱,研究了两类量子阱组合对含V形坑InG aN/GaN基蓝光LED效率衰减的影响。使用高分辨率X射线衍射仪和LED电致发光测试系统对LED外延结构和LED光电性能进行了表征。结果表明:限制阱靠近n层、发光阱靠近p层的新型量子阱结构,在室温75 A/cm~2时的外量子效率相对于其最高点仅衰减12.7%,明显优于其他量子阱结构的16.3%、16.0%、28.4%效率衰减,且只有这种结构在低温时(T≤150 K)未出现内量子效率随电流增大而剧烈衰减的现象。结果表明,合理的量子阱结构设计能够显著提高电子空穴在含V形坑量子阱中的有效交叠,促进载流子在阱间交互,提高载流子匹配度,抑制电子泄漏,从而减缓效率衰减、提升器件光电性能。     

GaN基蓝光发光二极管的波长稳定性研究

尽管GaN基蓝绿光发光二极管（LED）已进入大规模商品化阶段，但其发光波长随注入电流的变化仍是一个尚未解决的关键技术难题.同时，蓝绿光LED电注入发光光谱的半高全宽多为25nm以上.通过优化LED器件材料的生长条件和总应变量，获得了高质量的InGaN/GaN多量子阱LED外延片.由此制作的LED器件在0—120?mA的注入电流下，发光波长变化小于1nm.在20mA的正向电流下，其光谱半高全宽只有18nm，且随注入电流变化较小. 关键词： GaN 发光二极管 波长稳定性     

Si(110)和Si(111)衬底上制备InGaN/GaN蓝光发光二极管

分别在Si(110)和Si(111)衬底上制备了In Ga N/Ga N多量子阱结构蓝光发光二极管(LED)器件.利用高分辨X射线衍射、原子力显微镜、室温拉曼光谱和变温光致发光谱对生长的LED结构进行了结构表征.结果表明,相对于Si(111)上生长LED样品,Si(110)上生长的LED结构晶体质量较好,样品中存在较小的张应力,具有较高的内量子效率.对制备的LED芯片进行光电特性分析测试表明,两种衬底上制备的LED芯片等效串联电阻相差不大,在大电流注入下内量子效率下降较小;但是,相比于Si(111)上制备LED芯片,Si(110)上LED芯片具有较小的开启电压和更优异的发光特性.对LED器件电致发光(EL)发光峰随驱动电流的变化研究发现,由于Si(110)衬底上LED结构中阱层和垒层存在较小的应力/应变而在器件中产生较弱的量子限制斯塔克效应,致使Si(110)上LED芯片EL发光峰随驱动电流的蓝移量更小.     

GaN基纳米阵列LED器件制备及发光特性

为了降低GaN材料中因应变诱导的量子斯托克斯效应,增加器件有源区内的电子-空穴波函数在实空间的交叠从而提高GaN基LEDs的发光效率,采用紫外软压印技术制备了均匀的周期性纳米柱阵列结构,结合常规LED器件微加工技术获得了In GaN/GaN基蓝光与绿光纳米阵列LED器件并对其进行了表征分析。结果表明:纳米柱阵列LED器件具有均匀的发光和稳定的光电性能。纳米结构不仅有效缓解了量子阱中的应力积累(弛豫度~70%),提高了器件的辐射复合几率和出光效率,同时结合纳米柱侧壁的化学钝化处理进一步降低了器件有源区的缺陷密度,显著降低了LED器件的漏电流(~10-7),最终提高了器件的发光效率。     

4-inch蓝宝石图形衬底上GaN基白光LED制备及表征

在4-inch蓝宝石图形衬底上,基于InGaN/GaN多量子阱结构制备了蓝光LED芯片,并通过与钇铝石榴石黄色荧光粉(YAG∶Ce~(3+))结合,封装成白光LED器件。简要介绍了外延生长和芯片工艺及封装流程,并对材料特性及器件性能进行了表征。外延片表面形貌良好,蓝光外延片荧光光谱(PL)显示峰值波长为442 nm。对封装后白光芯片进行电学特性测试,得出其开启与限流电压分别为2.7 V与3.6 V。此外,电致发光光谱(EL)含有两个主要的发光峰,分别是440 nm的蓝光峰以及540 nm的黄绿光峰,而随着注入电流的增加,蓝光峰位先蓝移后红移,黄绿光峰位先红移后蓝移再红移。本文中相关的芯片制备及表征技术将对固态照明研究起到一定的促进作用。     

量子阱生长气压对InGaN/GaN黄光LED光电性能的影响

采用MOCVD技术在图形化硅衬底上生长了InGaN/GaN多量子阱黄光LED外延材料,研究了不同的量子阱生长气压对黄光LED光电性能的影响。使用高分辨率X射线衍射仪（HRXRD）和荧光显微镜（FL）对晶体质量进行了表征,使用电致发光系统积分球测试对光电性能进行了表征。结果表明：随着气压升高,In的并入量略有降低且均匀性更好,量子阱中的点缺陷数目降低,但是阱垒间界面质量有所下降。在实验选取的4个气压4,6.65,10,13.3 kPa下,外量子效率最大值随着量子阱生长气压的上升而显著升高,分别为16.60%、23.07%、26.40%、27.66%,但是13.3 kPa下生长的样品在大电流下EQE随电流droop效应有所加剧,在20 A·cm^-2的工作电流下,样品A、B、C、D的EQE分别为16.60%、19.77%、20.03%、19.45%,10 kPa下生长的量子阱的整体光电性能最好。     

纳米柱高度对GaN基绿光LED光致发光谱的影响

纳米柱结构是释放高In组分InGaN/GaN绿光LED量子阱层应变的有效方法。本文采用自组装的聚苯乙烯微球掩模、感应耦合等离子体干法刻蚀和KOH溶液的湿法腐蚀,在GaN基绿光LED外延片上制备了3种高度的纳米柱结构,通过扫描电子显微镜观察纳米柱结构的形貌,并测试了常温和10 K低温时的光致发光谱(PL)。结果表明:应变释放对压电场的影响显著,使得纳米柱结构样品的内量子效率(IQE)提高,PL谱峰值波长蓝移;应变在量子阱中的不均匀分布还使得PL谱半高全宽(FWHM)展宽。与普通平面结构相比,高度为747 nm的纳米柱结构可使得IQE提升917%,PL谱峰值波长蓝移18 nm、FWHM展宽7 nm。另外,纳米柱结构样品的有源区有效面积减小可使得PL谱FWHM减小。     

GaAs/Al_xGa_(1-x)As多量子阱外延结构及其LP-MOCVD生长工艺研究

在低压金属有机化学气相沉积生长工艺中,对用于制作850nm垂直腔面发射激光器件的GaAs/Al_xGa_(1-x)As多量子阱外延结构的生长温度、反应室压力、总载气流量以及生长速度等主要工艺参量进行优化,并进行了完整外延结构的生长.实验结果表明:在700℃条件下,得到多种组分的GaAs/Al_xGa_(1-x)As多量子阱结构,通过光致发光谱对比测试得到的最佳组分x为0.24,同时得到良好的表面形貌,最终确定的最佳生长速度为0.34~0.511nm/s.     

应变SiGe SOI量子阱沟道PMOSFET阈值电压模型研究

在绝缘层附着硅(SOI)结构的Si膜上生长SiGe合金制作具有SiGe量子阱沟道的SOI p型金属氧化物半导体场效应晶体管(PMOSFET)，该器件不仅具有SOI结构的优点，而且因量子阱中载流子迁移率高，所以进一步提高了器件的性能.在分析常规的Si SOI MOSFET基础上，建立了应变SiGe SOI 量子阱沟道PMOSFET的阈值电压模型和电流-电压(I-V)特性模型，利用Matlab对该结构器件的I-V特性、跨导及漏导特性进行了模拟分析，且与常规结构的器件作了对比.模拟结果表明，应变SiGe SOI量子阱沟道PMOSFET的性能均比常规结构的器件有大幅度提高. 关键词： 应变SiGe SOI MOSFET 阈值电压 模型     

High brightness InGaN-based yellow light-emitting diodes with strain modulation layers grown on Si substrate

InGaN-based multiple quantum wells (MQWs) yellow light-emitting diodes (LEDs) were grown on Si substrate by metal organic vapor deposition. Blue MQWs were introduced as strain modulation layers for yellow MQWs. The LED chips emitted 72-mW yellow light with 566-nm dominant wavelength and 9.4 % external quantum efficiency (EQE) at 350 mA under room temperature, and it reached a peak EQE of 22.2 % at 0.7 mA. A comparison sample without strain modulation layers exhibited much weaker performance. The results reveal that long-wavelength emission of InGaN system is reliable if the strain of MQWs has been properly modulated.     

ZnO量子点的制备及其在白光LED中的应用

利用湿化学方法制备合成Zn O量子点,通过改变合成条件(反应时间、反应物浓度、反应温度)对量子点的尺寸及发光性能进行调控。利用透射电子显微镜、吸收光谱、荧光光谱等表征手段,探讨了合成条件对Zn O量子点光学性质的影响,并优化出适用于构建白光LED器件的最佳合成条件。研究结果表明,在反应温度为20℃、反应时间为3 h、前驱体Zn(OAc)_2和Li OH反应浓度比为2∶1时获得的Zn O量子点较为稳定,并在紫外光激发下发出明亮的黄绿色光。在此基础上,以该Zn O量子点为有源层、p-Ga N∶Mg基片为空穴注入层、非晶Al_2O_3薄膜为电子阻挡层构造了p-i-n型异质结LED,在正向注入电流为5 m A时,获得了来自于器件的白光发射,其色坐标为(0.28,0.30),色温为9 424 K。     

InGaN蓝光与CdTe纳米晶基白光LED

报道了倒装焊InGaN蓝光LED与黄光CdTe纳米晶的复合结构。利用蓝光作为CdTe纳米晶的激发源,通过光的下转换机制,将部分蓝光转化为黄光,复合发射出白光。室温下正向驱动电流为10mA时,发光色品坐标为x=0.29,y=0.30。实验表明,该复合结构白光LED的一大优点在于,复合光的色品坐标几乎不随正向驱动电流大小变化,颜色稳定。     

Quasi-homoepitaxial GaN-based blue light emitting diode on thick GaN template

The high power GaN-based blue light emitting diode (LED) on an 80-μ-thick GaN template is proposed and even realized by several technical methods like metal organic chemical vapor deposition (MOCVD), hydride vapor-phase epitaxial (HVPE), and laser lift-off (LLO). Its advantages are demonstrated from material quality and chip processing. It is investigated by high resolution X-ray diffraction (XRD), high resolution transmission electron microscope (HRTEM), Rutherford back-scattering (RBS), photoluminescence, current-voltage and light output-current measurements. The width of (0002) reflection in XRD rocking curve, which reaches 173" for the thick GaN template LED, is less than that for the conventional one, which reaches 258". The HRTEM images show that the multiple quantum wells (MQWs) in 80-μm-thick GaN template LED have a generally higher crystal quality. The light output at 350 mA from the thick GaN template LED is doubled compared to traditional LEDs and the forward bias is also substantially reduced. The high performance of 80-μm-thick GaN template LED depends on the high crystal quality. However, although the intensity of MQWs emission in PL spectra is doubled, both the wavelength and the width of the emission from thick GaN template LED are increased. This is due to the strain relaxation on the surface of 80-μm-thick GaN template, which changes the strain in InGaN QWs and leads to InGaN phase separation.     

Effects of a prestrained InGaN interlayer on the emission properties of InGaN/GaN multiple quantum wells in a laser diode structure

The electroluminescence (EL) and photoluminescence (PL) spectra of InGaN/GaN multiple quantum wells (MQWs) with a prestrained InGaN interlayer in a laser diode structure are investigated. When the injection current increases from 5 mA to 50 mA, the blueshift of the EL emission peak is 1 meV for the prestrained sample and 23 meV for a control sample with the conventional structure. Also, the internal quantum efficiency and the EL intensity at the injection current of 20 mA are increased by 71% and 65% respectively by inserting the prestrained InGaN interlayer. The reduced blueshift and the enhanced emission are attributed mainly to the reduced quantum-confined Stark effect (QCSE) in the prestrained sample. Such attributions are supported by the theoretical simulation results, which reveal the smaller piezoelectric field and the enhanced overlap of electron and hole wave functions in the prestrained sample. Therefore, the prestrained InGaN interlayer contributes to strain relaxation in the MQW layer and enhancement of light emission due to the reduction of QCSE.     

注入电流对绿光高压LED光电特性的影响

设计并制备了12 V 的GaN基绿光高压发光二极管（LED）,并对其进行了变电流测试。研究了绿光高压LED的正向电压、峰值波长、光功率以及光效等重要参数随注入电流的变化关系,电流变化范围为3~50 mA,测试温度为25 ℃。实验结果表明：电流对绿光高压LED的光电特性有很大影响。在驱动电流为20 mA时,对应电压为14 V。随着注入电流的增大,峰值波长蓝移了2 nm。随着电流的增大,光功率近似于线性增加。在注入电流从3 mA增大到20 mA的过程中,光效降低了约61%;在注入电流从20 mA增大到50 mA的过程中,光效降低了约39%。这说明高压LED在大电流驱动时,光效降低的幅度比较缓慢。上述结果对 GaN基绿光高压 LED 的改进优化具有一定的参考价值。     

插指型SiO_2电流阻挡层对大功率LED外量子效率的影响

为了改善蓝光大功率LED芯片p电极处的电流拥挤现象,提高大功率LED芯片的外量子效率,在ITO透明导电层与p-GaN间沉积插指型SiO_2电流阻挡层。采用等离子体增强化学气相沉积的方法沉积SiO_2薄膜,再经过光刻和BOE湿法刻蚀技术制备插指型SiO_2电流阻挡层。采用SimuLED仿真软件分析插指型SiO_2电流阻挡层对大功率LED芯片电流扩展性能的影响,研究插指型SiO_2电流阻挡层对大功率LED芯片外量子效率的影响。结果发现,插指型SiO_2电流阻挡层结构可以有效改善p电极附近的电流拥挤现象。与没有沉积插指型SiO_2电流阻挡层的大功率LED芯片相比,光输出功率得到显著的提高。在350 mA的输入电流下,沉积插指型SiO_2电流阻挡层后的大功率LED芯片的外量子效率提高了18.7%。     

Effects of multiple interruptions with trimethylindium-treatment in the InGaN/GaN quantum well on green light emitting diodes

In this study, the influence of multiple interruptions with trimethylindium(TMIn)-treatment in InGaN/GaN multiple quantum wells(MQWs) on green light-emitting diode(LED) is investigated. A comparison of conventional LEDs with the one fabricated with our method shows that the latter has better optical properties. Photoluminescence(PL) full-width at half maximum(FWHM) is reduced, light output power is much higher and the blue shift of electroluminescence(EL) dominant wavelength becomes smaller with current increasing. These improvements should be attributed to the reduced interface roughness of MQW and more uniformity of indium distribution in MQWs by the interruptions with TMIn-treatment.     

High-performance InGaN/GaN MQW LEDs with Al-doped ZnO transparent conductive layers grown by MOCVD using H_2O as an oxidizer

In this study,the high performance of InGaN/GaN multiple quantum well light-emitting diodes(LEDs) with Aldoped ZnO(AZO) transparent conductive layers(TCLs) has been demonstrated.The AZO-TCLs were fabricated on the n~+-InGaN contact layer by metal organic chemical vapor deposition(MOCVD) using H_2O as an oxidizer at temperatures as low as 400 ℃ without any post-deposition annealing.It shows a high transparency(98%),low resistivity(510 ~4 Ω·cm),and an epitaxial-like excellent interface on p-GaN with an n+-InGaN contact layer.A forward voltage of 2.82 V @ 20 mA was obtained.Most importantly,the power efficiencies can be markedly improved by 53.8%@20 mA current injection and 39.6%@350 mA current injection compared with conventional LEDs with indium tin oxide TCL(LED-Ⅲ),and by28.8%@20 mA current injection and 4.92%@350 mA current injection compared with LEDs with AZO-TCL prepared by MOCVD using O_2 as an oxidizer(LED-Ⅱ),respectively.The results indicate that the AZO-TCL grown by MOCVD using H_2O as an oxidizer is a promising TCL for a low-cost and high-efficiency GaN-based LED application.