InGaAs/Si键合界面a-Si键合层厚度对InGaAs/Si雪崩光电二极管性能的影响

为从根本上阻断InGaAs/Si之间的失配晶格,获得低噪声的InGaAs/Si雪崩光电二极管,理论上在InGaAs/Si键合界面插入超薄a-Si键合层,彻底隔断键合界面异质晶格,同时保证InGaAs吸收层和Si倍增层超高的晶体质量和良好的电学传输.模拟了a-Si键合层厚度对InGaAs/Si雪崩光电二极管性能影响.由于...     

应变Si沟道nMOSFET阈值电压模型

在研究分析弛豫SiGe衬底上的应变Si 沟道nMOSFET纵向电势分布的基础上,建立了应变Si nMOSFET阈值电压模型,并利用该模型对不同的器件结构参数进行仿真,获得了阈值电压与SiGe层掺杂浓度和Ge组分的关系、阈值电压偏移量与SiGe层中Ge组分的关系、阈值电压与应变Si层掺杂浓度和厚度的关系. 分析结果表明：阈值电压随SiGe层中Ge组分的提高而降低,随着SiGe层的掺杂浓度的提高而增大;阈值电压随应变Si层的掺杂浓度的提高而增大,随应变Si层厚度增大而增大. 该模型为应变Si 器件阈值电压设计 关键词： 应变硅 阈值电压 电势分布 反型层     

Si/Gen/Si(001)异质结薄膜的掠入射荧光X射线吸收精细结构研究

利用掠入射荧光X射线吸收精细结构(XAFS)方法研究了在400℃的温度下分子束外延生长的Si/Gen/Si(001)异质结薄膜(n=1,2,4和8个原子层)中Ge原子的局域环境结构.结果表明,在1至2个Ge原子层(ML)生长厚度的异质结薄膜中,Ge原子的第一近邻配位主要是Si原子.随着Ge原子层厚度增加到4 ML,Ge原子的最近邻配位壳层中的Ge-Ge配位的平均配位数增加到1.3.当Ge原子层厚度增加到8 ML时,第一配位壳层中的Ge-Ge配位占的比例只有55%.这表明在400℃的生长条件下,Ge原子有很强的迁移到Si覆盖层的能力.随着Ge层厚度从1增加到2,4和8 ML,Ge原子迁移到Si覆盖层的量由0.5 ML分别增加到1.5,2.0和3.0 ML.认为在覆盖Si过程中Ge原子的迁移主要是通过产生Ge原子表面偏析来降低表面能和Ge层的应变能.     

Si/Gen/Si(001)异质结薄膜的掠入射荧光X射线吸收精细结构研究

利用掠入射荧光X射线吸收精细结构(XAFS)方法研究了在400℃的温度下分子束外延生长的Si/Ge_n/Si(001)异质结薄膜(n=1，2，4和8个原子层)中Ge原子的局域环境结构.结果表明，在1至2个Ge原子层(ML)生长厚度的异质结薄膜中，Ge原子的第一近邻配位主要是Si原子.随着Ge原子层厚度增加到4ML，Ge原子的最近邻配位壳层中的Ge-Ge配位的平均配位数增加到1.3.当Ge原子层厚度增加到8ML时，第一配位壳层中的Ge-Ge配位占的比例只有55%.这表明在400℃的生长条件下，Ge原子有很强的迁移到Si覆盖层的能力.随着Ge层厚度从1 增加到2，4和8ML，Ge原子迁移到Si覆盖层的量由0.5ML分别增加到1.5，2.0和3.0ML.认为在覆盖Si过程中Ge原子的迁移主要是通过产生Ge原子表面偏析来降低表面能和Ge层的应变能. 关键词： XAFS n/Si(001)异质膜')" href="#">Si/Ge_n/Si(001)异质膜 迁移效应     

具有poly-Si_(1-x)Ge_x栅的应变SiGe p型金属氧化物半导体场效应晶体管阈值电压漂移模型研究

针对具有poly-Si1-x Ge x栅的应变Si Ge p型金属氧化物半导体场效应晶体管(PMOSFET),研究了其垂直电势与电场分布,建立了考虑栅耗尽的poly-Si1-x Ge x栅情况下该器件的等效栅氧化层厚度模型,并利用该模型分析了poly-Si1-x Ge x栅及应变Si Ge层中Ge组分对等效氧化层厚度的影响.研究了应变Si Ge PMOSFET热载流子产生的机理及其对器件性能的影响,以及引起应变Si Ge PMOSFET阈值电压漂移的机理,并建立了该器件阈值电压漂移模型,揭示了器件阈值电压漂移随电应力施加时间、栅极电压、polySi1-x Ge x栅及应变Si Ge层中Ge组分的变化关系.并在此基础上进行了实验验证,在电应力施加10000 s时,阈值电压漂移0.032 V,与模拟结果基本一致,为应变Si Ge PMOSFET及相关电路的设计与制造提供了重要的理论与实践基础.     

高k栅介质应变Si SOI MOSFET的阈值电压解析模型

在结合应变Si,高k栅和SOI结构三者的优点的基础上,提出了一种新型的高k栅介质应变Si全耗尽SOI MOSFET结构.通过求解二维泊松方程建立了该新结构的二维阈值电压模型,在该模型中考虑了影响阈值电压的主要参数.分析了阈值电压与弛豫层中的Ge组分、应变Si层厚度的关系.研究结果表明阈值电压随弛豫层中Ge组分的提高和应变Si层的厚度增加而降低.此外,还分析了阈值电压与高k栅介质的介电常数和应变Si层的掺杂浓度的关系.研究结果表明阈值电压随高k介质的介 关键词： 应变Si k栅')" href="#">高k栅 短沟道效应 漏致势垒降低     

小尺寸应变Si nMOSFET物理模型的研究

本文运用高斯定律得出多晶SiGe栅应变Si nMOSFET的准二维阈值电压模型,并从电流密度方程出发建立了小尺寸应变Si nMOS器件的I-V特性模型.对所得模型进行计算分析,得出沟道Ge组分、多晶Si_1-yGe_y栅Ge组分、栅氧化层厚度、应变Si层厚度、栅长以及掺杂浓度对阈值电压的影响.运用二维器件模拟器对器件表面势和I-V特性进行了仿真,所得结果与模型仿真结果一致,从而证明了模型的正确性. 关键词： 多晶SiGe栅 高斯定理 阈值电压 速度过冲     

Ge薄层异质结构的同步辐射X射线反射法研究

用X射线反射方法研究了分子束外延技术生长的Si中Ge薄层异质结构的Ge原子分布特性.根据X射线反射理论及Parratt数值计算方法对实验反射曲线的模拟,得到不同厚度的Ge薄层异质结构样品中Ge原子的深度分布为非对称指数形式:在靠近样品表面一侧的衰减长度为8埃,而在靠近样品衬底一侧的衰减长度为3埃,且分布形式与Ge原子层的厚度无关.讨论了不同结构参数(Ge原子薄层的深度、Ge原子分布范围、样品表面粗糙度、样品表面氧化层厚度等)对样品低角反射曲线的影响.     

红外通信波段SAGM APD单光子探测应用技术研究

研究采用由过度层间隔吸收区与倍增区的InGaAs/InP雪崩光电二极管(SAGM APD)在红外通信波段实现单光子探测的方法,包括管型的选择、特性分析、工作参数以及根据实验结果提出的对这类APD设计制作的改进建议.特别研究目前市售的APD器件用作单光子探测时的实用技术.     

离子束溅射Ge量子点的应变调制生长

采用离子束溅射技术制备了单层和双层Ge量子点, 通过原子力显微镜对比了不同Si隔离层厚度和不同掩埋量子点密度情况下表层量子点的尺寸和形貌差异, 系统研究了掩埋Ge量子点产生的应变对表层量子点的浸润层及形核的影响, 并用埋置应变模型对其进行解释. 实验结果表明, 覆盖Ge量子点的Si隔离层中分布着的应变场, 导致表层量子点浸润层厚度的降低, 从而增大点的体积; 应变强度随隔离层厚度的减小而增加, 造成表层量子点形状和尺寸的变化; 此外, 应变还调控了表层量子点的空间分布. 关键词： Ge量子点 埋层应变 离子束溅射     

High-speed waveguide-integrated Ge/Si avalanche photodetector

Waveguide-integrated Ge/Si heterostructure avalanche photodetectors(APDs) were designed and fabricated using a CMOS-compatible process on 8-inch SOI substrate. The structure of the APD was designed as separate-absorption-chargemultiplication(SACM) using germanium and silicon as absorption region and multiplication region, respectively. The breakdown voltage(V_b) of such a device is 19 V at reverse bias and dark current appears to be 0.71 μA at 90% of the V_b. The device with a 10-μm length and 7-μm width of Ge layer shows a maximum 3-dB bandwidth of 17.8 GHz at the wavelength of 1550 nm. For the device with a 30-μm-length Ge region, gain-bandwidth product achieves 325 GHz.     

Characterization and estimated performance of commercial n+-p Ge APDs for long-wavelength optical receivers

For two commercial shallow-junction n⁺-p Ge APDs, it is shown empirically that the photocurrent multiplication and shot noise can be described over a wide range of wavelengths using expressions derived for single-carrier-type injection. Multiplied bulk leakage current and its associated shot noise may be similarly described, the closest agreement following from the use of photocurrent parameters applying at the longest wavelengths, 1.8m. These empirical relationships simplify the estimation of optical receiver sensitivity using Ge APDs. For bit rates up to several hundred megabaud, the performance of Ge APD receivers is expected to be inferior to that demonstrated by the high-impedance InGaAs pin—FET hybrid, particularly where operation in the range 40–60° C is specified. The two alternatives become competitive at 1 Gbaud, but the bias voltage for the Ge APD must be stable within several hundred millivolts and must be compensated for variations in temperature. Where unbounded disparity coding systems are employed, a hybrid receiver comprising a pin photodiode with a transimpedance preamplifier should still outperform the Ge APD for bit rates up to several hundred megabaud.     

Modeling the effects of interface traps on passive quenching of a Ge/Si geiger mode avalanche photodiode

The influence of interface donor and acceptor traps on the behavior of Ge/Si separate absorption, charge and multiplication Geiger mode avalanche photodiodes under passive quenching is modeled. The effects of different trap types on the quenching behavior are investigated in this paper for the first time. Our results show that trap type and trap density significantly influence the APD quenching time and ability to quench for a particular quenching resistor.     

Random response time of thin avalanche photodiodes

The avalanche built-up time using random response time model for avalanche photodiode (APD) is presented. A random response time model considers the randomness of times at which the primary and secondary carriers exit the multiplication region. The dead-space effect is included in our model to demonstrate its effect on response time of APDs especially for the thin devices. Our results show that feedback impact ionisation process and dead-space prolong the response time in APDs. The time response of homojunction InP p⁺-i-n⁺ diodes with the multiplication region of 0.281, 0.582 and 1.243 m are calculated.     

单光子探测器APD无源抑制特性研究

为了选择高性能单光子探测器件，采用无源抑制方法对工作在盖革模式下的雪崩光电二极管（APD: avalanche photodiode）特性进行了测量。利用APD两端的电压在雪崩后趋于稳定的特性，获得了一种确定暗击穿电压的方法。特性测量实验结果表明：降低温度能加宽APD的最佳工作区域范围，并提高最佳增益值，从而使APD具有更高的灵敏度。通过对EG&;G系列APD和外延APD暗电流和信噪比特性进行比较，发现外延 APD具有良好的噪声性能和信噪比性能，适用于单光子探测。     

Numerical analysis of multiplication layer on dark current for InGaAs/InP single photon avalanche diodes

The dark current of Separate Absorption Grading Charge Multiplication InP/InGaAs avalanche photodiodes(APDs) has been numerically analyzed. Effects of doping concentration, carrier lifetime and trap concentration of multiplication depletion layer on the dark current have been studied. The results indicated that the dark current of InP/InGaAs APDs strongly depended on the carrier lifetime, which was influenced by the doping and trap concentration. These characteristics can be used to analyze some problems in the device fabrication.     

On the research of avalanche photodiodes-based heterodyne in FM/cw laser rangefinder

An avalanche photodiodes (APDs)-based heterodyne technique for FM/cw laser rangefinder (FM/cw LRF) is described. Based on a modified APDs model, the properties of heterodyne are theoretically analyzed and experimentally demonstrated under different illumination intensities and multiplications, both the amplitude and the signal to noise ratio (SNR) of the difference frequency signal are inversely proportional to the unmultiplied current at a high multiplication and are proportional to the square of multiplication at a low multiplication.     

Polarization and p-type doping effects on photoresponse of separate absorption and multiplication AlGaN solar-blind avalanche photodiodes

The photoresponse characteristics of separate absorption and multiplication (SAM) AlGaN solar-blind avalanche photodiodes (APDs) were investigated in detail. The p-i-n-i-n avalanche photodiodes were examined using the newly designed model of avalanche photodiodes in AlGaN. The research results showed that the dark current density was about 3.51 × 10^?8 A/cm², the light current density was 5.86 × 10^?5 A/cm² under near-zero bias, and the avalanche breakdown occurred at about 135.0 V under reverse bias, which were all consistent with the experimental data. To investigate the effects influencing the photoresponse characteristics of the APDs, their photo responsivity spectra under different biases were simulated. The APD featured a window region over the wavelength range from 260 to 280 nm with a high rejection ratio on the short-wavelength side. Meanwhile, the dependence of APD responsivity on the polarization charge revealed that the negative polarization charges strongly affected the responsivity. Increased negative polarization charges at the Al_0.4Ga_0.6N/Al_0.6Ga_0.4N interface markedly lowered the responsivity, whereas charges of the same polarity at the GaN/Al_0.4Ga_0.6N interface enhanced the responsivity. Furthermore, the dependence of responsivity on p-type doping was analyzed by comparison with the effects of negative polarization charges on the conduction band of the APDs. Finally, the inversion layer models are used to interpret the effects of these on the APD responsivity. This research is useful for exploring polarization and p-type doping effects in SAM AlGaN structures and realization of high responsivity solar-blind APDs.     

Analysis of the effect of an electric-field profile on the gain bandwidth product of avalanche photodetectors

We investigate the effect of the electric-field profile on the gain-bandwidth product of avalanche photodetectors with separate absorption and multiplication. We show that for a given multiplication layer thickness the electric-field profile plays an important role in determining the gain-bandwidth product. The calculation results show that an increasing triangular electric-field profile yields a larger gain-bandwidth product than most other profiles for Si/InGaAs avalanche photodetectors.     

Monte Carlo simulation of excess noise in heterojunction avalanche photodetector

A Monte Carlo (MC) simulation of excess noise in heterojunction avalanche photodetector (APD), made up of InP/InGaAs, is made. The simulation is based on the hard threshold dead space consideration in the displaced exponential model of the distribution of ionization path lengths. Impact ionization and multiplication of electrons as function of ionizing electric field are also studied. The multiplication and noise are seen to be reduced compared to those in component materials. The simulated results are seen to agree well with the reports of other theoretical predictions and experimental results published in literatures.