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巯基-乙烯基加成反应具有清洁、高效、条件温和的特点,广泛应用于有机合成、聚合物科学和材料化学等诸多领域。国内外关于这一反应的研究已有大量文献报道,但该反应在含硅聚合物的合成与应用研究中还少有触及。本文综述了巯基一乙烯基加成反应在聚硅氮烷、聚硅碳烷、聚硅氧烷三种含硅聚合物合成中的应用,介绍了国内外的研究现状及发展趋势,并... 相似文献
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二氧化硅-聚硅氧烷负载硫杂-15-冠-5铂、铑配合物的合成及其催化硅氧化性能 总被引:1,自引:0,他引:1
6-(ω'-十一碳烯氧甲基)-1-硫杂-4,7,1O,13-四氧杂环十五烷与三乙氧基硅烷进行硅氢加成,产物依次以气相法二氧化硅固载、氯亚铂酸钾或三氯化铑络合,合成了相应的二氧化硅-聚硅氧烷负载硫杂-15-冠-5-铂、铑配合物,并研究了它们在烯烃与三乙氧基硅烷的硅氢加成反应中的催化性能.结果表明,二者均为硅氢加成反应的高效催化剂. 相似文献
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聚合物分散剂对氟虫脲水悬浮剂分散稳定性的影响 总被引:4,自引:0,他引:4
通过测定药物颗粒界面Zeta电位和平均粒径, 研究了聚合物分散剂苯乙烯磺酸聚合物钠盐(GY-D08)用量、pH和盐离子对氟虫脲水悬浮剂分散稳定性的影响, 研究结果表明, 分散剂GY-D08的加入量与水悬浮剂分散效果密切相关, 制备质量分数为5%氟虫脲水悬浮剂的GY-D08最佳用量为2%, GY-D08用量过多或过少都会使分散效果下降; pH影响分散剂GY-D08在水中的电离能力, 当pH=9时, GY-D08分子完全电离, 能为颗粒提供较大的静电位阻, 水悬浮剂分散稳定性最好; Mg2+或Ca2+压缩颗粒界面的双电层, 降低Zeta电位, 使颗粒因带电量减少而聚结, 导致水悬浮剂分散稳定性变差, 且Mg2+或Ca2+浓度愈大, 其分散稳定性愈差; 当离子浓度相同时, Ca2+压缩双电层的能力比Mg2+强, 添加Ca2+后的水悬浮剂的分散稳定性更差. 相似文献
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AB2型β-环糊精功能单体及其水溶性超支化聚合物的合成与表征 总被引:1,自引:0,他引:1
为了得到结构确定的β-环糊精大单体并用于超支化聚合,通过对β-环糊精上6位伯羟基和2位仲羟基的多步功能化改性得到了同时含有Si—H和—CH CH2基团的AB2型β-环糊精大单体,并利用硅氢加成反应一步法合成了一种新型的水溶性超支化聚合物,其具有β-环糊精空腔和超支化空穴两种疏水单元,从而可构建出一种新颖的超分子体系.采用1H-NMR、13C-NMR、飞行时间质谱和元素分析对AB2单体及其聚合物的结构进行了表征.结果表明,单体和聚合物的结构与所设计的分子结构相符合.凝胶渗透色谱/多角度激光光散射(SEC/MALLS)联用仪测得该聚合物的数均分子量、分子量分布及特性黏数分别为36690、1.887和15.8mL/g. 相似文献
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Jian Ming Yu Dominique Teyssie Sylvie Boileau 《Journal of polymer science. Part A, Polymer chemistry》1993,31(9):2373-2381
Hydrosilylation of allyl carbamates by poly(methylhydrosiloxane) (PMHS) catalyzed by platinum- or rhodium-based complexes was investigated. About 10% of the carbamate molecules decompose during the hydrosilylation reaction through the cleavage of the carbamate bond. A redistribution process also takes place among the polysiloxane chains resulting in the formation of branched polymers but no crosslinking occurs. A mechanism for this side-reaction is proposed. © 1993 John Wiley & Sons, Inc. 相似文献
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季铵化聚酰胺胺树状聚合物封装的RuRh双金属DENs催化聚(甲基氢硅氧烷)区域选择性改性研究 总被引:1,自引:0,他引:1
采用共络合法制备了部分季铵化的第五代聚酰胺胺树状聚合物封装的RuRh双金属纳米粒子(DENs)催化剂, 分别利用紫外-可见光谱、光散射分析和透射电镜表征了该树状聚合物封装的RuRh双金属纳米粒子的形成、粒径及其分布. 红外光谱和核磁共振谱分析表明, RuRh双金属DENs催化剂对聚(甲基氢硅氧烷)的硅氢化改性显示了较高的催化活性和良好的区域选择性. 相似文献
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Phosphonylation of polysiloxane and cyclosiloxane oligomers is described. Hydrosilylation of vinylbenzyl chloride (VBC) with a poly(methylhydrosiloxane), or its cyclic monomer, followed by phosphonylation with triethyl phosphite leads to the production of stable phosphonosiloxanes that are characterized by Si C and C P bonds. The polymer, which is a liquid with a glass transition temperature of −38.3 °C, is soluble in alcohols and an alcohol and water mixture. The phosphonylated siloxanes dissolve and chelate uranyl nitrate and transition metal salts. The hydrosilylation of VBC yields α and β isomers: Si CH2 CH2 and Si CH(CH3); the ratio between these two depends upon the type of solvent and the reaction conversion. A kinetic study of the hydrosilylation reaction of VBC suggests a second order in respect to the reactants. The reaction rate is dependent upon the catalyst concentration and temperature. Hydrosilylation of vinylbenzyl phosphonate could not be accomplished with the platinum (complex) catalyst; this is attributed to the presence of phosphoryl groups that are strong electron donors. © 1999 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 37: 4043–4053, 1999 相似文献
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通过傅-克酰化反应得到1,4-双(4′-溴苯酰基)苯,以1,4-双(4′-溴苯酰基)苯和α,α′-双(4′-氨基苯基)-1,4-二异丙基苯为单体,通过钯催化的胺基化反应缩聚合成了含异丙基的聚亚胺酮(pr-PIK).再以pr-PIK和苯基锂为底物,通过亲核加成反应得到新型结构聚合物——含异丙基的聚醇胺(pr-PAI).聚合物结构通过FT-IR、1H NMR和元素分析表征,表征结果与目标产物吻合良好.pr-PIK和pr-PAI的热性能由DSC和TG测定,结果表明pr-PIK和pr-PAI具有良好的热稳定性,玻璃化温度大于150℃,热分解温度大于480℃. 相似文献
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Superhydrophobic films mainly based on poly(allylamine hydrochloride) (PAH) and poly(acrylic acid) (PAA) polyelectrolyte multilayer have been deposited onto cleaned glass substrate by a layer-by-layer dip coating method. 3 bilayers of the PAH and PAA was directly coated onto the substrate as an underlying layer for subsequent coating. Desired surface roughness on the polyelectrolyte bilayers was created by etching the bilayers in hydrochloric acid solution so as to create the open pore having suitable size at the surface. Then, nanoparticles such as SiO2 and TiO2 of various sizes were deposited onto the etched polyelectrolyte bilayers. Finally, the surfaces were further modified with semifluorinated silane followed by cross-linking at 180 °C for 2 h to obtain desirable surface morphological features. The effect of etching time and addition of nanoparticles on surface morphology was investigated using an atomic force microscope (AFM). Wetting ability of the prepared film was determined by measuring water droplet contact angle using a goniometer. Adhesion between the superhydrophobic films and the substrate was evaluated by using a standard tape test method (D3359). The adhesion was improved by reducing the organic content in the films. 相似文献
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Kaikai Cao Yujia Zhong Guohu Guan Chuncheng Li Wenxiang Zhu Yaonan Xiao 《高分子科学杂志,A辑:纯化学与应用化学》2013,50(6):508-517
Poly(p-phenylene benzobisoxazole)/poly(pyridobisimidazole) block copolymers (PBO-b-PIPD) were prepared by introducing poly(pyridobisimidazole) (PIPD) moieties into the main chains of poly(p-phenylene benzobisoxazole) (PBO) in order to enhance its photostability. PBO and copolymer fibers were directly prepared from the polymerization solutions by dry-jet wet-spinning. Chemical structures and molecular chains arrangement of the block copolymers were characterized by Fourier transform infrared (FTIR) spectroscopy, solid-state 13C-NMR and wide angle X-ray diffraction (WAXD). Thermal stability of the copolymers was investigated by thermogravimetric analysis (TGA) in nitrogen. Thin films of PBO and copolymers were cast from methanesulfonic acid (MSA) solutions. Both the films and fibers were exposed to UV light to determine their photostability. Changes in the chemical structures and surface morphologies of the films were characterized by FTIR spectra and scanning electronic microscopy (SEM), respectively. After UV light exposure, the retention of strength for copolymer fibers is improved compared to PBO fibers. The results revealed that copolymers suffered less photodegradation in comparison with homopolymer. The mechanism for the improved photostability of the copolymers was discussed. 相似文献