Silicon solar cells with Al2O3 antireflection coating

The paper presents the possibility of using Al₂O₃ antireflection coatings deposited by atomic layer deposition ALD. The ALD method is based on alternate pulsing of the precursor gases and vapors onto the substrate surface and then chemisorption or surface reaction of the precursors. The reactor is purged with an inert gas between the precursor pulses. The Al₂O₃ thin film in structure of the finished solar cells can play the role of both antireflection and passivation layer which will simplify the process. For this research 50×50 mm monocrystalline silicon solar cells with one bus bar have been used. The metallic contacts were prepared by screen printing method and Al₂O₃ antireflection coating by ALD method. Results and their analysis allow to conclude that the Al₂O₃ antireflection coating deposited by ALD has a significant impact on the optoelectronic properties of the silicon solar cell. For about 80 nm of Al₂O₃ the best results were obtained in the wavelength range of 400 to 800 nm reducing the reflection to less than 1%. The difference in the solar cells efficiency between with and without antireflection coating was 5.28%. The LBIC scan measurements may indicate a positive influence of the thin film Al₂O₃ on the bulk passivation of the silicon.     

Efficiency improvement of quantum well solar cell with the AuGeNi metallization and Si3N4 ARC design

This study demonstrates the power conversion efficiency enhancement on In_0.19Ga_0.81As/GaAs quantum well solar cells (QWSC). The solar cell structure was grown on n-type (100)-oriented GaAs substrate by using solid-source molecular beam epitaxy technique and divided into square pieces. In order to understand whether the eight quantum wells were grown or not, scanning electron microscopy (SEM), and secondary ion mass spectrometry characterizations were done at room temperature. After that, the Si₃N₄ antireflection layers were coated onto both two square pieces of In_0.19Ga_0.81As/GaAs QWSC structure and p-GaAs substrate at different temperatures by the radio frequency magnetron sputtering system. The optical properties of the Si₃N₄ coated and uncoated p-GaAs samples have been evaluated by means of ultraviolet-visible spectrometry measurements at room temperature. According to ultraviolet-visible spectrometry results, the best Si₃N₄ antireflection coated one was obtained at 100 °C substrate temperature. Thus, the In_0.19Ga_0.81As/GaAs QWSC structure with and without Si₃N₄ layer, which was coated at 100 °C substrate temperature, was selected for other measurements and processes. Moreover, the In_0.19Ga_0.81As/GaAs QWSC samples with and without Si₃N₄ antireflection coating were separately fabricated with different metallization materials for obtaining the solar cell electrical output parameters. AuGe and AuGeNi metallization materials were used for the fabrication processes. After fabrication, the electrical output parameters were extracted from the current-voltage measurements at room temperature both in dark and under AM1.5 – 1 Sun illumination. The proposed design which includes the AuGeNi metallization and Si₃N₄ antireflection layer enhanced the power conversion efficiency by 44.40%.     

ECRCVD技术淀积太阳电池的减反膜

本文报道了用电子回旋共振化学气相淀积(ECRCVD)技术实现了低温(50℃)淀积SiON/SiN膜作硅太阳电池减反射膜的实验研究.探讨了影响薄膜性能的主要工艺参数,设计了具有较佳抗反效果的双层减反膜,并对膜层的反射率和太阳电池参数进行了测定.结果表明:该减反膜具有良好的减反效果,能实现较宽波段范围内的均匀增透,使太阳电池短路电流密度提高了42%,电池转换效率提高了45%.     

Sol-gel preparation and characterization of nanoporous ZnO/SiO2 coatings with broadband antireflection properties

Nanoporous ZnO/SiO₂ bilayer coatings were prepared on the surface of glass substrates via sol-gel dip-coating process. The structural, morphological and optical properties of the coatings were characterized. The refractive indices of ZnO layer and SiO₂ layer are 1.34 and 1.21 at 550 nm, respectively. The transmittance and reflectance spectra of the coatings were investigated and the broadband antireflection performance of the bilayer structure was determined over the solar spectrum. The solar transmittances in the range of 300-1200 nm and 1200-2500 nm are increased by 6.5% and 6.2%, respectively. The improvement of transmittance is attributed to the destructive interference of light reflected from interfaces between the different refractive-index layers with an optimized thickness. Such antireflection coatings of ZnO/SiO₂ provide a promising route for solar energy applications.     

Amorphous Er2O3 films for antireflection coatings

This paper reports that stoichiometric, amorphous, and uniform Er2O3 films are deposited on Si(001) substrates by a radio frequency magnetron sputtering technique. Ellipsometry measurements show that the refractive index of the Er2O3 films is very close to that of a single layer antireflection coating for a solar cell with an air surrounding medium during its working wavelength. For the 90-nm-thick film, the reflectance has a minimum lower than 3% at the wavelength of 600 nm and the weighted average reflectances (400-1000 nm) is 11.6%. The obtained characteristics indicate that Er2O3 films could be a promising candidate for antireflection coatings in solar cells.     

Biomimetic subwavelength antireflective gratings on GaAs

We have developed a simple and scalable bottom-up approach for fabricating moth-eye antireflective coatings on GaAs substrates. Monolayer, non-close-packed silica colloidal crystals are created on crystalline GaAs wafers by a spin-coating-based single-layer reduction technique. These colloidal monolayers can be used as etching masks during a BCl(3) dry-etch process to generate subwavelength-structured antireflective gratings directly on GaAs substrates. The gratings exhibit excellent broadband antireflective properties, and the specular reflection matches with the theoretical prediction using a rigorous coupled-wave analysis model. These bioinspired antireflection coatings have important technological applications ranging from efficient solar cells to IR detectors.     

新型空间硅太阳电池纳米减反射膜系的优化设计

结合纳米材料折射率（小于1.4）和AM0太阳光谱特性,对空间硅太阳电池的减反射膜进行了设计分析.分别设计了常规材料和纳米材料的双层、三层减反射膜,得到了最佳的膜系参数,并作出了反射率变化曲线.结果发现,采用低折射率纳米材料的三层减反射膜有着更好的减反射效果,新型纳米减反射膜系与采用常规材料的减反射膜系相比,优化后的最小加权平均反射率减小了15%（双层减反射膜）和24.5%（三层减反射膜）. 关键词： 折射率 减反射膜 纳米材料 空间硅太阳电池     

Use of porous silicon for double- and triple-layer antireflection coatings in silicon photovoltaic converters

Reflectance spectrum calculations of double- and triple-layer antireflection coatings made of porous silicon layer are performed, using the optical matrix approach method. Obtained results are compared with the reflectance spectrum of other type antireflection coatings. Lower reflectance value of both double- and triple-layer antireflection coatings made of porous silicon is obtained in comparison to that of SiO₂/TiO₂ antireflection coating. These results can be used in photovoltaic converters.     

Investigation on antireflection coatings for Al:ZnO in silicon thin-film solar cells

We numerically investigate the role of antireflection (AR) coatings, composed of SiO₂ and/or ZnO, in suppression of interfacial reflections in the presence of the transparent conducting oxide, Al-doped ZnO (AZO). Three structures are simulated: (a) AR coatings in organic light-emitting diodes (OLEDs) and flat panel displays, (b) AR coating located between the glass and the AZO, and (c) same as the case b except the involvement of another AR coating between the AZO and the amorphous silicon layers. The weighted average transmittance according to the AM1.5 solar spectrum, the photovoltaic transmittance (T_pv), suggests that there is no evident difference between the structures a and b, especially when the layer number of AR coatings is less than three. An effective way to improve T_pv is presented in the structure c, where T_pv is increased from 73.54% to 76.32% with a three-layered AR coating located between AZO and a-Si. It implies that the suppression of interfacial reflections, resulting from the considerable mismatch of refractive indices at the interface of AZO and a-Si, would benefit the efficiency improvement of silicon thin-film solar cells.     

Fabrication and analysis of thin-film GaAs solar cell on flexible thermoplastic substrate using a low-pressure cold-welding

We present flexible thin-film GaAs solar cells fabricated on thermoplastic substrates by a low-pressure cold-welding and epitaxial lift-off process. The use of polyethylene terephthalate (PET) film as a flexible substrate enables cold welding (130 °C) of gold layers between a thin-film GaAs solar cell and PET film with very low mechanical pressure (0.4 MPa), due to their thermoplastic properties. The feasibility of the proposed technique was demonstrated by fabricating GaAs single junction solar cells (without antireflection coating) on PET film, having an efficiency of 13.2%. The fabricated solar cell also showed a stable performance after 2000 cycles of bending.     

Comparison of two kinds of AlGaAs terraced substrate inner stripe superluminescent diodes

We report on two kinds of AlGaAs terraced substrate inner stripe superluminescent diodes: those with SiO _x antireflection coatings, and those with unpumped absorbing regions. The devices were fabricated by one-step liquid phase epitaxy. Both kinds of devices suppress stimulating oscillation effectively. The characteristics of the diodes with antireflection coatings are better than those with unpumped absorbing regions. The spectral width of the diodes with antireflection coatings is over 23 nm, the output power is about 7 mW, the modulation depth is less than 5%, and the horizontal divergence angle is smaller than 10–15°.     

Influence of electrical and optical losses on fundamental solar-cell parameters

Summary We present here an analysis of the dependence of the light-generated current on the current at maximum power in lossy solar cells. that is, cells with both series and shunt resistances present simultaneously — that is, a real cell. It is essentially seen that this dependence is highly sensitive to series resistance. However, for cells with series resistance of the order of 3 Ω, ϖI _g/ϖI _mp=1. We also look at the influence of TiO_x antireflection coatings on the open-circuit voltage and short-circuit current in silicon solar cells.

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Riassunto Si presenta un'analisi della dipendenza della fotocorrente dalla corrente di massima potenza nelle celle solari quando sono contemporaneamente presenti le resistenze serie e di shunt. Su tale dipendenza influisce molto la resistenza serie. Tuttavia, se questa è dell'ordine di 3 Ω, è ϖI _g/ϖI _mp=1. Si studia anche l'influenza di rivestimenti antiriflettenti di TiO_x sulla tensione di circuito aperto, sulla corrente di circuito aperto e sulla corrente di corto circuito nelle celle di silicio.

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Low cost anisotropic etching of monocrystalline Si (1 0 0): Optimization using response surface methodology

Reduced surface reflectance and enhanced light trapping is required by any high efficiency solar cell. Anisotropic etching was done on silicon (1 0 0) by using tetramethyl ammonium hydroxide TMAH, (CH₃)₄NOH, solution at 85 °C. Process variables considered were solution concentration and time proposed by response surface methodology (RSM). An effective surface texture was resulted with reflectance less than 8% without antireflection coating. The antireflection mechanism was also co-related with the etch rate of Si. Optimized values predicted by RSM for time and TMAH concentration were 5 min and 3.50% respectively. The technique and optimization of parameters by using response surface methodology (RSM) could be valuable in the texturization process for high-efficiency Si solar cells.     

Low-porosity porous silicon nanostructures on monocrystalline silicon solar cells

In this work we present a study of low-porosity porous silicon (PS) nanostructures stain etched on monocrystalline silicon solar cells. The PS layers reduce the reflectance, improve the diffusion of dopants by rapid thermal processes, and increase the homogeneity of the sheet resistance. Some samples were subjected to chemical oxidation in HNO₃ to reduce the porosity of the surface layer. After the diffusion process, deposition of a SiN_x antireflection layer, and screen printing of the samples, an efficiency of 15.5% is obtained for low-porosity PS solar cells, compared with an efficiency of 10.0% for standard PS cells and 14.9% for the reference Cz cells.     

Al2O3/SiO2 films prepared by electron-beam evaporation as UV antireflection coatings on 4H-SiC

Al₂O₃/SiO₂ films have been deposited as UV antireflection coatings on 4H-SiC by electron-beam evaporation and characterized by reflection spectrum, scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The reflectance of the Al₂O₃/SiO₂ films is 0.33% and 10 times lower than that of a thermally grown SiO₂ single layer at 276 nm. The films are amorphous in microstructure and characterize good adhesion to 4H-SiC substrate. XPS results indicate an abrupt interface between evaporated SiO₂ and 4H-SiC substrate free of Si-suboxides. These results make the possibility for 4H-SiC based high performance UV optoelectronic devices with Al₂O₃/SiO₂ films as antireflection coatings.     

On the possibility of determining the diffusion length of excitons in semiconductors from photomagnetic measurement data

The effect of a magnetic field on the photocurrent I_ph in Si and GaAs solar cells is investigated. It is shown that the observed change in the photocurrent I_ph of the solar cells in response to a magnetic field can be caused by a decrease in the diffusion length of excitons L_exc. A simplified model of the photomagnetic experiment is proposed to estimate the diffusion length of excitons L_exc and the contribution made by excitons to the photocurrent of the solar cells.     

Influence of SiNx:H film properties according to gas mixture ratios for crystalline silicon solar cells

The Hydrogenated silicon nitride (SiN_x:H) using plasma enhanced chemical vapor deposition is widely used in photovoltaic industry as an antireflection coating and passivation layer. In the high temperature firing process, the SiN_x:H film should not change the properties for its use as high quality surface layer in crystalline silicon solar cells. For optimizing surface layer in crystalline silicon solar cells, by varying gas mixture ratios (SiH₄ + NH₃ + N₂, SiH₄ + NH₃, SiH₄ + N₂), the hydrogenated silicon nitride films were analyzed for its antireflection and surface passivation (electrical and chemical) properties. The film deposited with the gas mixture of SiH₄ + NH₃ + N₂ showed the best properties in before and after firing process conditions.The single crystalline silicon solar cells fabricated according to optimized gas mixture condition (SiH₄ + NH₃ + N₂) on large area substrate of size 156 mm × 156 mm (Pseudo square) was found to have the conversion efficiency as high as 17.2%. The reason for the high efficiency using SiH₄ + NH₃ + N₂ is because of the good optical transmittance and passivation properties. Optimized hydrogenated silicon nitride surface layer and high efficiency crystalline silicon solar cells fabrication sequence has also been explained in this study.     

Spectral-splitting concentrator photovoltaic modules based on AlGaAs/GaAs/GaSb and GaInP/InGaAs(P) solar cells

A concentrator photovoltaic module with sunlight spectral splitting by Fresnel lens and dichroic filters is developed. The photoelectric conversion efficiency of such a module is estimated at a level of 49.4% when three single-junction cells are used and may reach 48.5–50.6% when a tandem two-junction cell is combined with narrow-band cells. Single-junction AlGaAs, GaAs, GaSb, and InGa(P)As solar sells are fabricated by zinc diffusion from the vapor phase into an n-type epitaxial layer. GaInP/GaAs cascade solar cells are prepared by MOS hydride epitaxy. The overall efficiency of the three single-junction solar cells developed for the spectral-splitting module is 38.1% (AM1.5D) at concentration ratio K _c = 200x. The combination of the solar cells with the cascade structure demonstrates an efficiency of 37.9% at concentrations of 400–800 suns. The parameters of the spectral-splitting photovoltaic module are measured. The photovoltaic efficiency of this module reaches 24.7% in the case of three single-junction cells and 27.9% when the two-junction and single-junction cells are combined.     

High-efficiency antireflection nanostructural optical coatings for solar cells

Potentialities of PMMA composite films with silver nanoclusters as highly effective nanostructural optical antireflection coatings of silicon solar cells are investigated in a wavelength range from 400 to 1100 nm.