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1.
Arsenic trisulphide (As2S3) thin films have been deposited onto stainless steel and fluorine doped tin oxide (FTO) coated glass substrates by electrodeposition technique using arsenic trioxide (As2O3) and sodium thiosulphate (Na2S2O3) as precursors and ethylene diamine tetracetic acid (EDTA) as a complexing agent. Double exposure holographic interferometry (DEHI) technique was used to determine the thickness and stress of As2S3 thin films. It was observed that the thickness of the thin film increases whereas film stress to the substrate decreases with an increase in the deposition time. X-ray diffraction and water contact angle measurements showed polycrystalline and hydrophilic surface respectively. The bandgap energy increases from 1.82 to 2.45 eV with decrease in the film thickness from 2.2148 to 0.9492 μm.  相似文献   

2.
This paper reports on the results of investigations into the nonlinear optical characteristics of chalcogenide films (As2S3, As20S80, 2As2S3/As2Se3, 3As2S3/As2Se3). The nonlinear refractive indices and two-photon absorption coefficients for these films are measured using the Z-scan technique at wavelengths of a picosecond Nd: YAG laser (λ=1064 and 532 nm). The optical limiting due to Kerr-type nonlinearities is analyzed.  相似文献   

3.
Reversible photo-induced volume changes have been observed accompanying reversible optical absorption edge shift produced by successive cycles of band gap illumination and annealing for well-annealed evaporated As2S3 and As4Se5Ge1 films. The As2S3 film shows an increase in its volume by illumination, while As4Se5Ge1 film shows a decrease. Qualitative discussion has been given in connection with pressure-induced optical constant change.  相似文献   

4.
The kinetics of photo‐darkening of amorphous As2S3 and a‐As2Se3 thin films follows a single exponential, but the magnitude and the rate of the process is higher in case of As2S3. The kinetics of self‐bleaching (dark relaxation) in advance photo‐darkened state follows a stretched exponential (SRE) with different stretching parameter for a‐As2S3 and a‐As2Se3. Within the J. C. Phillips approach we suppose that photo‐darkening in amorphous As2S3 films is, to some extent, accompanied by changes in short‐range order interactions, while photo‐darkening of amorphous As2Se3 is accompanied rather by changes in Coulomb interactions. The self‐bleaching process reduced the magnitude of photo‐darkening up to 45% and 60% for amorphous As2S3 and As2Se3 films, respectively. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)  相似文献   

5.
As2S3 films were exposed to band-gap illumination both at 290 and 77 K alternately, and after each exposure optical and X-ray measurements were carried out. It has been clarified that the reversible photodarkening should be attributed to the reversible change in local order of the network.  相似文献   

6.
刘启明  何漩  干福熹  钱士雄 《物理学报》2009,58(2):1002-1006
利用飞秒激光超外差光Kerr(OHD-OKE)技术研究了As2S3, As2Se3, GeS2, GeSe2, Ge20As25S55, Ge20As25Se55, Ge10As40S20关键词: 全光开关 硫系非晶半导体薄膜 飞秒激光超外差光Kerr(OHD-OKE) 三阶非线性  相似文献   

7.
Photoinduced phenomena, such as photodarkening, photorefraction, and photodissolution, were studied in different compositions of three-component mAs2S3·nAs2Se3 amorphous films. The main emphasis was on the effect of photoinduced change of dissolution rate since this effect is the basis of many applications of amorphous chalcogenide films. The results of the investigation were compared with photoinduced effects in binary As2S3 and As2Se3 films. Advanced micro-optical devices: micro-lens and micro-mirror arrays, diffractive gratings, and photonic bandgap crystals, based on three-component amorphous films which possessed optimal photodissolution characteristics were developed. The primary parameters of the micro-optical devices developed are discussed.  相似文献   

8.
During thermal annealing or light irradiation, the changes in the valence states of vapour-deposited As2S3 and As4S4 films were observed by UPS. The experimental results reveal that an as-deposited As2S3 film contains considerable numbers of As4S4 molecular units, which polymerize or cross link to form a As2S3 glassy network on annealing or irradiation.  相似文献   

9.
Photo-induced changes in the infrared spectrum of amorphous, evaporated As2S3 films are described. The results are interpreted in terms of the photopolymerization of As4S4 molecular units and sulfur chains into an As2S3 glassy network. The role of photo-induced charged states in the polymerization process is discussed.  相似文献   

10.
Optical limiting of pico-and nanosecond pulsed radiation of a Nd:YAG laser (λ=1064 and 532 nm) is studied in solutions of fullerenes (C60 and C70), semiconductor crystals and films (GaAs, As2S3, As20S80, 2As2S3/As2Se3, and 3As2S3/As2Se3), and colloidal solutions of metals (Au, Ag, Pt, and Cu). The effect of the particle aggregation in silver solutions on the optical limiting is considered. Optical limiting mechanisms, specifically, reverse saturable absorption, two-photon absorption, and self-action effects, are discussed. Nonlinear absorption coefficients of the studied materials are measured.  相似文献   

11.
Amorphous semiconductors As2?xSe3+x and As2?xS3+x have been prepared by glow discharge decomposition of a gas mixture of AsH3  H2Se and AsH3  H2S respectively. The films contain about 3–8 at. percent hydrogen according to infrared transmission measurements. Both S-H and Se-H vibrational modes were observed. Results of the D.C. electrical conductivity, X-ray structural analyses and optical absorption are presented. The films composition was found to be close to As:Se = As:S = 23.  相似文献   

12.
A photo-induced shift of the optical transmission edge to a shorter wave-length in crystalline As2S2 films has been studied at room temperature and liq. N2 temperature. This effect has been investigated by X-ray diffraction and scanning electron micrograph observations.  相似文献   

13.
Photodarkening phenomena have been studied in glassy As2S3 films under pressure up to 3 kbar. A remarkable shift of the absorption edge to lower energy by the band gap illumination is observed under pressure. The shift is quenched even after releasing pressure. X-ray diffraction studies have also been performed at various pressures. The first sharp diffraction peak disappears at 50 kbar. The origin of the observed enhancement of the photodarkening may be associated with the increase in the interlayer correlation by application of pressure.  相似文献   

14.
The conductivities of mixed As2S3Sb2S3 thin films are discussed. Temperature independent a.c. data are interpreted in terms of a hopping mechanism where correlation effects are important. Excepting As2S3, which exhibits extrinsic behaviour, the dielectric constant, a.c. conductivity and d.c. conductivity pre-exponential factor, all scale approximately linearly with composition.  相似文献   

15.
The effect of photoinduced structural transformations on dielectric and contact properties of thin films on the basis of As40S30Se30 is studied. An increase in the conductivity and variations of the type of dispersion of the dielectric conductivity are found. In the region of infralow frequencies, long-term exposure leads to a weakening of blocking properties of a contact at the met–As40S30Se30 interface.  相似文献   

16.
Reversible phtodarkening and photostructural change accomplished by repeated cycles of band-gap illumination and annealing have been observed in melt-quenched As2S3 glass for the first time. The magnitudes of photo-induced shift of optical absorption edge as well as the fraction of photo-expansion observed in melt-quenched As2S3 glass coincide quantitatively with those observed in well-annealed evaporated As2S3 glass. The experimental data involving results of crystalline As2S3 demonstrate that the reversible photostructural change is “unique” to amorphous state and is not affected by the difference in disordered structure originated from preparation technique.  相似文献   

17.
Two concentration ranges of silicon doping in MBE-grown GaAs films have been investigated in some detail. In lightly doped films, with a free-electron concentration of ≈1016cm?3, low-temperature photoluminescence spectra have been analysed to develop a model to account for spectral features previously attributed to Ge and Si acceptor levels. In heavily doped films, a maximum free-electron concentration of ≈7×1018 cm?3 has been obtained, which is only rather weakly dependent on growth conditions and the nature of the arsenic species (As2 or As4). Transmission electron microscopy has shown that no significant precipitation effects occur when higher Si fluxes are used but there is evidence for autocompensation. The maximum PL intensity (300 K) is found at a lower free electron concentration then with Sn-doped films, and is more sharply peaked, but there is no evidence for an anomalous Moss-Burstein shift.  相似文献   

18.
Infrared reflection and transmission measurements in AsχTe1?χ glasses (45?×?55) show well-defined Gaussian vibrational absorption peaks. Comparisons with spectra observed in crystalline and glassy As2S3 and As2Se3 indicate that the local order in AsχTe1?χ glasses is not like that found in crystalline As2Te3, but rather it consists primarily of AsTe3 pyramids which are probably linked together in a fashion similar to that found in As2S3 and As2Se3.  相似文献   

19.
Recording of optical holographic gratings based on photostructural transformations in thin (≈ 1 μm) As2S3 and As2S3 semiconductor layers in the presence and absence of a corona discharge and also chemical etching of these gratings are studied. Initiation of a corona at the stage of interference grating recording is shown to improve the exposure contrast of metal-glassy chalcogenide semiconductor thin-film structures. The holographic sensitivity, diffraction efficiency, dynamic range, and contrast are also improved severalfold. When phase relief gratings formed in these layers are selectively etched in a chemical etchant in the presence of a corona, their profile becomes more regular and deeper by 25–30% and the diffraction efficiency increases by 30–50%.  相似文献   

20.
Small angle X-ray scattering measurements show no evidence for the presence of voids in chalcogenide glasses, in contrast to the situation found in deposited films of Ge and Si. This result and the observation of a diffraction peak near k = 1.2 A??1 are found to be consistent with the existence of a layer structure in glassy As2S3 and As2Se3.  相似文献   

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