Effects of assisting and sputtering ion current on ion beam assisted deposition textured yttria stabilized zirconia buffer layers of coated conductors

Biaxially textured yttria stabilized zirconia (0 0 1) thin films were fabricated on untextured hastelloy substrates by ion beam assisted deposition method. The effects of assisting beam current density J_a and sputtering beam current density J_s on the textures of the films were studied. The results indicate that as J_a or J_s increase, both the out-of-plane and the in-plane textures are improved initially, and then degrade. The results can be attributed to anisotropic damage and selective sputtering effect of assisting ions. At the same ion-to-atom arrival ratio r, which is reflected with J_a/J_s value, lower deposition rate can enhance the biaxial texture.     

Thermal stability of nanocrystalline layers fabricated by surface nanocrystallization

A nanocrystalline layer with ultrafine grains (about 30-40 nm) on the surface of 7050 aluminum alloy was fabricated by a new technique called High Pressure Shot Peening (HPSP) which is the combination of common Shot Peening equipment with a pressurizing vessel. Relationship between hot flow and temperature was observed by Differential Scanning Calorimetry (DSC) and the activation energy, calculated by Kisssinger equation, of the as-treated sample increased 26.6 kJ/mol when it is compared with the as-reserved sample. The Bragg peaks of the as-prepared samples, respectively treated with various annealing treatments were characterized by XRD and the microhardness distribution along the depth from the treated surface were measured at the same time, which indicated that the broadening of Bragg peaks decreased with the increasing of anneal temperature; the grain size, calculated by Scherrer-Wilson equation, increased obviously during 180-220 °C, accordingly, the microhardness obviously decreased. According to the results of DSC, XRD and microhardness, it is reasonable to deduce that the temperature range of thermal stability for aluminum alloy nanocrystalline layer is lower than 200 °C.     

Ag-N doped ZnO film and its p-n junction fabricated by ion beam assisted deposition

Ag-N doped ZnO film was synthesized by ion beam assisted deposition and its electrical properties and annealing property were investigated. The films remained p-type even after annealing at 400 °C in air for 10 min. While the annealing temperature went up to 500 °C, the conduction type of these films shifted from p-type to n-type. The p-type ZnO film revealed low resistivity (0.0016 Ω cm), low Hall mobility (0.65 cm² V⁻¹ s⁻¹) and high carrier concentration (5.8 × 10²⁰ cm⁻³). ZnO p-n homojunction consisting of a p-type layer (Ag-N doped ZnO film) and an n-type layer (In-doped ZnO film) had been fabricated by ion beam assisted deposition. With electrical measurement, its current-voltage curve had a typical rectifying characteristic with current rectification ratio of 25 at bias ±5 V and a reverse current of 0.01 mA at −5 V. The depletion width was estimated 3.8 nm by using p-n junction equation.     

Dependence of resistivity on structure and composition of AZO films fabricated by ion beam co-sputtering deposition

The correlation between the resistivity and the structure/composition in the aluminum doped zinc oxide (AZO) films fabricated by the ion beam co-sputtering deposition at room temperature was investigated. The various compositions of AZO films were controlled by the sputtered area ratio of Al to Zn target. The structure, Al concentrations and resistivities of the as-deposited films were determined by X-ray diffractometer (XRD), energy dispersive spectrometer (EDS) and four-point probe station, respectively. The lowest resistivity of the deposited film was 5.66 × 10⁻⁴ Ω-cm at the 0.7 wt.% aluminum concentration. The most intense ZnO (0 0 2) diffraction peak, the largest grain size, the longest mean free path, and the highest free carrier concentration in the film result in the lowest resistivity of 5.66 × 10⁻⁴ Ω-cm at room temperature; simultaneously, the thermal stability of the resistivity of the AZO film as a function of the sample temperature was investigated. Below 200 °C the film's resistivity was almost kept at a fixed value and the lowest resistivity of 4.64 × 10⁻⁴ Ω-cm at 247 °C was observed.     

Long-length IBAD-MgO buffer layers for high performance RE-123 coated conductors by a large ion beam source

In Fujikura, a large-scale ion-beam-assisted deposition (IBAD) system with a large ion source has been employed to fabricate biaxially textured MgO films. The large-scale IBAD system has multiple deposition lanes where substrate tapes move, and therefore we have to optimize experimental conditions at each lane. We selected an appropriate deposition area and, finally, we successfully fabricated a 1 km-length IBAD-MgO film at a production rate of 1 km/h. We also studied pulsed-laser-deposited (PLD) CeO₂ films directly on the IBAD-MgO films in spite of a large lattice mismatch between CeO₂ and MgO. From transmission electron microscope (TEM) observations at an interface between MgO and CeO₂ films, it is revealed that there is domain-matching-epitaxy relationship between MgO and CeO₂ films. We also fabricated thin (1.0 μm) and thick (3.7 μm) PLD – GdBa₂Cu₃O_7−x (GdBCO) film on the long-length CeO₂/MgO substrate (over 150 m). Critical currents (I_c) and current density (J_c) were over 300 A and 3 MA/cm² respectively for the thin GdBCO film and were about 645 A and 1.7 MA/cm² for the thick GdBCO film at 77 K in self-field.     

Grain boundary layers in nanocrystalline ferromagnetic zinc oxide

The complete solubility of an impurity in a polycrystal increases with decreasing grain size, because the impurity dissolves not only in the crystallite bulk but also on the grain boundaries. This effect is especially strong when the adsorption layers (or the grain boundary phases) are multilayer. For example, the Mn solubility in the nanocrystalline films (where the size of grains is ∼20 nm) is more than three times greater than that in the ZnO single crystals. The thin nanocrystalline Mn-doped ZnO films in the Mn concentration range 0.1–47 at % have been obtained from organic precursors (butanoates) by the “liquid ceramic” method. They have ferromagnetic properties, because the specific area of the grain boundaries in them is greater than the critical value [B.B. Straumal et al., Phys. Rev. B 79, 205206 (2009)]. The high-resolution electron transmission microscopy studies show that the ZnO nanocrystalline grains with the wurtzite lattice are separated by amorphous layers whose thickness increases with the Mn concentration. The morphology of these layers differs greatly from the structure of the amorphous prewetting films on the grain boundaries in the ZnO:Bi₂O₃ system.     

Potential for size reduction of AlGaAs optical channel waveguide structures fabricated by focused ion beam implantation and oxidation

Optical channel waveguides formed by focused ion beam (FIB) implantation-induced mixing of AlGaAs multiple quantum well structures and subsequent oxidation of the mixed regions have the potential of significantly reducing the size of integrated photonic waveguide structures. Since FIB implantation is a direct write process characterized by nanoscale precision, we suggest its use for forming channel waveguides having nanoscale (submicrometer) widths. Calculations presented for such channel waveguides show reductions in size by at least an order of magnitude are possible for directional couplers and other structures involving curved channel waveguide sections. Such size reductions would allow the realization of significantly higher levels of device integration than are now currently possible.     

Few-layer graphene film fabricated by femtosecond pulse laser deposition without catalytic layers

The films of few-layer graphene are formed through laser exfoliation of a highly ordered pyrolytic graphite(HOPG), without a catalytic layer for the growth process. The femtosecond(fs) laser exfoliation process is investigated at different laser fluences and substrate temperature. For fs laser exfoliation of HOPG, the few-layer graphene is obtained at 473 K under an optimal laser fluence. The formation of few-layer graphene is explained by removal of intact graphite sheets occurred by an optimal laser fluence ablation. The new insights may facilitate the controllable synthesis of large area few-layer graphene.     

Electron beam physical vapor deposition of YSZ electrolyte coatings for SOFCs

YSZ electrolyte coatings were prepared by electron beam physical vapor deposition (EB-PVD) at a high deposition rate of up to 1 μm/min. The YSZ coating consisted of a single cubic phase and no phase transformation occurred after annealing treatment at 1000 °C. A typical columnar structure was observed in this coating by SEM and feather-like characteristics appeared in every columnar grain. In columnar grain boundaries there were many micron-sized gaps and pores. In TEM image, many white lines were found, originating from the alignment of nanopores existing within feather-like columnar grains. The element distribution along the cross-section of the coating was homogeneous except Zr with a slight gradient. The coating exhibited a characteristic anisotropic behavior in electrical conductivity. In the direction perpendicular to coating surface the electrical conductivity was remarkably higher than that in the direction parallel to coating surface. This mainly attributed to the typical columnar structure for EB-PVD coating and the existence of many grain boundaries along the direction parallel to coating surface. For as-deposited coating, the gas permeability coefficient of 9.78 × 10⁻⁵ cm⁴ N⁻¹ s⁻¹ was obtained and this value was close to the critical value of YSZ electrolyte layer required for solid oxide fuel cell (SOFC) operation.     

Plasmonic properties of two-dimensional metallic nanoholes fabricated by focused ion beam lithography

Plasmonic metallic nanoholes are widely used to focus or image in the nanoscale field. In this article, we present the results of the design, fabrication, and plasmonic properties of a two-dimensional metallic pentagram nanohole array. The nanoholes can excite the extraordinary transmission phenomenon. We used the finite-difference time-domain method to design the transmission and the localized surface plasmon resonance electric field distribution in the near field. The focused ion beam method was used to fabricate the nanoholes. The transmittance in the far field was measured by a scanning spectrophotometer. The difference between the design and the experimental results may be caused by the conversion between the near field and the far field. The near field electric field distribution on the surface plasmonic nanoholes was measured by a near-field scanning optical microscope. From our results, we found that the maximum transmission of the nanoholes is 2.4. Therefore, our plasmonic nanohole can significantly enhance the transmission by exciting the plasmonic phenomenon on the surface of the nanostructures.     

Synthesis of molybdenum silicide by both ion implantation and ion beam assisted deposition

Two groups of Mo/Si films were deposited on surface of Si(1 0 0) crystal. The first group of the samples was prepared by both ion beam assisted deposition (IBAD) and metal vapor vacuum arc (MEVVA) ion implantation technologies under temperatures from 200 to 400 °C. The deposited species of IBAD were Mo and Si, and different sputtering Ar ion densities were selected. The mixed Mo/Si films were implanted by Mo ion with energy of 94 keV, and fluence of Mo ion was 5 × 10¹⁶ ions/cm². The second group of the samples was prepared only by IBAD under the same test temperature range. The Mo/Si samples were analyzed by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), sheet resistance, nanohardness, and modulus of the Mo/Si films were also measured. For the Mo/Si films implanted with Mo ion, XRD results indicate that phase of the Mo/Si films prepared at 400 and 300 °C was pure MoSi₂. Sheet resistance of the Mo/Si films implanted with Mo ion was less than that of the Mo/Si films prepared without ion implantation. Nanohardness and modulus of the Mo/Si films were obviously affected by test parameters.     

Optical properties of nanocrystalline silicon thin films produced by size-selected cluster beam deposition

Molecular beams of size-selected silicon clusters were used to grow nanocrystalline thin films. This technique allows the control of both average size and size dispersion of Si nanocrystals, and is then very useful to provide model materials for the study of the luminescence in silicon. We report results obtained by high-resolution electron microscopy, Raman spectrometry and photoluminescence spectroscopy.     

Nitrogen-doped ZnO prepared by capillaritron reactive ion beam sputtering deposition

Nitrogen-doped ZnO thin films have been prepared by reactive ion beam sputtering deposition utilizing a capillaritron ion source. X-ray diffraction (XRD) analysis of the as-deposited film exhibits a single strong ZnO (002) diffraction peak centred at 34.40°. Post-growth annealing causes increase of grain size and decrease of c-axis lattice constant. Micro-Raman spectroscopy analysis of the as-deposited film shows strong nitrogen-related local vibration mode at 275, 582, 640 and 720 cm⁻¹, whereas the E₂ mode of ZnO at 436 cm⁻¹ can barely be identified. Annealing at 500-800 °C causes decrease of 275, 582, 640 and 720 cm⁻¹ and increase of 436 cm⁻¹ intensity, indicating out-diffusion of nitrogen and improvement of ZnO crystalline quality. Unlike un-doped ZnO, the surface roughness of nitrogen-doped ZnO deteriorates after annealing, which is also attributed to the out-diffusion of nitrogen. A nitrogen concentration of ∼10²¹/cm³ was observed while type conversion from n-type to p-type was not achieved, which is likely due to the formation of Zn_I-N_O or (N₂)_O that act as donor/double donors.     

光刻及离子束蚀刻技术制作DNA芯片模版

采用光刻及离子束蚀刻技术制作面阵石英DNA芯片模版,利用扫描电子显微镜（SEM）和表面轮廓仪测试了所制石英DNA芯片模版的表面微结构形貌特征,分析了所制石英DNA芯片模版出现图形畸变的原因。所用工艺为在其它衬底材料表面制作更大规模及具有复杂结构的大面阵DNA芯片模版奠定了基础。     

光刻及离子束蚀刻技术制作DNA芯片模版

 采用光刻及离子束蚀刻技术制作面阵石英DNA芯片模版，利用扫描电子显微镜（SEM）和表面轮廓仪测试了所制石英DNA芯片模版的表面微结构形貌特征，分析了所制石英DNA芯片模版出现图形畸变的原因。所用工艺为在其它衬底材料表面制作更大规模及具有复杂结构的大面阵DNA芯片模版奠定了基础。     

电子束、离子辅助和离子束溅射三种工艺对光学薄膜性能的影响

运用电子束、离子辅助和离子束溅射三种镀膜工艺分别制备光学薄膜,包括单层氧化物薄膜和增透膜,然后采取一系列测试手段,如Zygo轮廓仪、原子力显微镜、表面热透镜技术和X射线衍射等技术,来分析和研究不同的工艺对这些薄膜性能的不同影响,以判断合理的沉积工艺。     

离子束辅助沉积硅薄膜负极材料的研究

采用离子束辅助沉积法制备了锂离子电池硅薄膜负极材料,研究了硅薄膜的晶体结构、表面形貌和电化学性能.研究结果表明：硅薄膜是非晶态的结构;非晶态硅薄膜发生嵌脱锂反应的电位分别为0.03 V与0.34 V和0.16 V与0.49 V;硅薄膜表现出很高比容量和充放电效率,其可逆比容量和库仑效率分别为3134.4 mAh/g和87.1％;硅薄膜具有优异的循环性能,在0.5C倍率下200次循环后容量保持率为92.2%. 关键词： 硅薄膜 离子束辅助沉积 锂离子电池 负极材料     

Density behaviors of Ge nanodots self-assembled by ion beam sputtering deposition

Self-assembled Ge nanodots with areal number density up to 2.33×1010 cm-2 and aspect ratio larger than 0.12 are prepared by ion beam sputtering deposition. The dot density, a function of deposition rate and Ge coverage, is observed to be limited mainly by the transformation from two-dimensional precursors to three-dimensional islands, and to be associated with the adatom behaviors of attachment and detachment from the islands. An unusual increasing temperature dependence of nanodot density is also revealed when a high ion energy is employed in sputtering deposition, and is shown to be related to the breaking down of the superstrained wetting layer. This result is attributed to the interaction between energetic atoms and the growth surface, which mediates the island nucleation.     

Nanostructure fabrication by glancing angle ion beam assisted deposition of silicon

Glancing angle deposition by utilizing an ion beam sputter process and a controlled substrate rotation is used to deposit silicon nanostructures with different structure varieties. The structures are grown on seeded and plain [100] silicon substrates at room temperature. The ratio of deposition rate to substrate angular frequency and the substrate surface properties determine the nanostructure geometry, size and assembly. PACS 61.46.+w; 81.05.Gc; 81.15.Cd