退火对AlGaInP/GaInP多量子阱 LED外延片性能的影响

采用LP-MOCVD技术在n-GaAs衬底上生长了AlGaInP/GaInP多量子阱红光LED外延片.研究表明退火对外延片性能有重要影响.与未退火样品相比,460℃退火15min,外延片p型GaP层的空穴浓度由5.6×10¹⁸cm^-3增大到6.5×10¹⁸cm^-3,p型AlGaInP层的空穴浓度由6.0×10¹⁷cm^-3增大到1.1×10¹⁸cm^-3.但退火温度为780℃时,p型GaP层和p型AlGaInP层的空穴浓度分别下降至8×10¹⁷cm^-3和1.7×10¹⁷cm^-3,且Mg原子在AlGaInP系材料中的扩散加剧,导致未掺杂AlGaInP/GaInP多量子阱呈现p型电导.在460～700℃退火范围内,并没有使AlGaInP/GaInP多量子阱的发光性能发生明显变化.但退火温度为780℃时,AlGaInP/GaInP多量子阱的发光强度是退火前的2倍.     

InGaAs/GaAs应变量子阱的光谱研究

分别用光致发光谱（PL），光伏谱（PV）及时间分辨谱（TRPL）的方法，测量了应变InGaAs/GaAs单量子阱和多量子阱在不同温度下的光谱，发现单量子阱与多量子阱有不同的光学4性质。多量子阱PL谱发光峰和PV谱激子峰的强度与半高宽都比单量子阱的大，但单量子阱的半高宽随着温度的升高增大很快，这是由激子－声子耦合引起的，通过时间分辨谱研究发现了量子阱子能级之间的跃迁，多量子阱的发光寿命明显比单量子阱的长，我们利用形变势模型对量子阱的能带进行了计算，很好地解释了实验结果。     

Zn杂质扩散诱导AlGaInP/GaInP量子阱混杂

杂质扩散诱导量子阱混杂技术可用于制作腔面非吸收窗口,提高大功率半导体激光器的输出功率.以Zn2As2为扩散源,采用闭管扩散方式,在550℃下对650 nm半导体激光器的外延片进行了一系列Zn杂质扩散诱导量子阱混杂的实验.实验发现,随着扩散时间从20～120 min,样品光致发光(PL)谱蓝移偏移增加,峰值波长蓝移53 nm;当扩散时间超过60 min后,样品的PL谱中不仅出现了常见的蓝移峰,同时还出现了红移峰,峰值波长红移32 nm.分析表明PL谱蓝移来自Zn扩散引起的AlGaInP/GaInP间的量子阱混杂;红移来自Zn杂质扩散对样品中Ga0.51In0.49P缓冲层的影响.还研究了扩散温度(550℃)和扩散时间对样品晶体品质的影响,并在理论上计算了AlGaInP/GaInP量子阱混杂巾的Al-Ga的互扩散系数.     

Si掺杂对AlGaInP/GaInP多量子阱性能的影响

采用LP-MOCVD技术在n-GaAs衬底上生长了AlGaInP／GaInP多量子阱红光LED外延片。以X射线双晶衍射技术和光致发光技术对外延片进行了表征,研究了Si掺杂对AlGaInP／GaInP多量子阱性能的影响。研究表明：掺Si能大大提高(Al0．3Ga0.7)0.5In0.5P／Ga0.5In0.5P多量子阱的发光强度。相对于未故意掺杂的样品,多量子阱垒层掺Si使多量子阱的发光强度提高了13倍,阱层和垒层均掺Si使多量子阱的发光强度提高了28倍。外延片的X射线双晶衍射测试表明,Si掺杂并没有使多量子阱的界面质量变差。     

Zn1-xCdxSe-ZnSe多量子阱的光学双稳态

用常压MOCVD法在GaAs衬底上生长了Zn_1-xCd_xSe-ZnSe多层结构.通过X-射线衍射谱和光致发光等方法判断,表明该材料为多量子阱结构.从室温下的透射光谱上可以观察到这种多量子阱中的n=1的激子吸收峰,并观测到起因子激子的ns量级的光学双稳态.     

外电场对InGaAsP/InP量子阱内激子结合能的影响

在有效质量近似下采用变分法计算了InGaAsP/InP量子阱内不同In组分下的激子结合能,分析了结合能随阱宽和In组分的变化情况,并且讨论了外加电场对激子结合能的影响. 结果表明：激子结合能是阱宽的一个非单调函数,随阱宽的变化呈现先增加后减小的趋势;随着In组分增大,激子结合能达到最大值的阱宽相应变小,这与材料的带隙改变有关;在一定范围内电场的存在对激子结合能的影响很小,但电场强度较大时会破坏激子效应. 关键词： 激子 InGaAsP/InP量子阱 结合能 电场     

GaAs/AlGaAs多量子阱光生电压谱研究

在18—300K温度范围内,研究了用半绝缘体GaAs作为衬底的GaAs/AlGaAs多量子阱的光生电压谱.共观测到11H,11L,22H,22L,33H,33L,13H和31H等多种允许和禁戒的激子吸收峰.低温下的光生电压谱清晰地反映了多量子阱台阶式的状态密度分布.认为光生电压谱也可以作为一种判断多量子阱和超晶格外延生长质量的方法.还讨论了光生电压随温度的变化和光生电压效应的机理. 关键词：     

GaN基量子阱的激子跃迁和光学性质

采用光致发光谱、光致发光激发谱以及拉曼光谱对GaN基量子阱材料进行了实验观察和分析 .实验结果表明样品中量子点结构不均匀及InGaN层中In成分分布不均匀 ,且其光致发光谱的波峰是由自由激子辐射复合发光引起的 .同时由室温下InGaN/GaN量子阱的拉曼谱可得知InGaN/GaN多量子阱的结构特征     

CdSe/CdMnSe多量子阱的激子光学性质的研究

用分子束外延在GaAs衬底上生长了CdSe/CdMnSe多量子阱结构.利用X射线衍射(XRD)、变密度激发的PL光谱、变温度PL光谱和变密度激发的ps时间分辨光谱研究了CdSe/CdMnSe多量子阱结构和激子复合特性.讨论了随温度升高辐射线宽展宽和辐射复合效率降低的机理.发现不同激发密度下发光衰减时间不同,认为它的机理可能是无辐射复合引起的.在该材料中观测到激子激子散射发射峰,它被变密度激发和变温度PL光谱所证实. 关键词： CdSe/CdMnSe 量子阱 光学性质     

无杂质空位扩散法造成InGaAsP/InP多量子阱结构带隙蓝移规律的研究

采用光荧光谱(PL)和光调制反射谱(PR)的方法,研究了由Si₃N₄、SiO₂电介质盖层引起的无杂质空位(IFVD)诱导的InGaAsP四元化合物半导体多量子阱(MQWs)结构的带隙蓝移。实验中Si₃N₄、SiO₂作为电介质盖层,用来产生空位,再经过快速热退火处理(RTA)。实验结果表明:多量子阱结构带隙蓝移和退火温度、复合盖层的组合有关。带隙蓝移随退火温度的升高而加大。InP、Si₃N₄复合盖层产生的带隙蓝移量大于InP、SiO₂复合盖层。而InGaAs、SiO₂复合盖层产生的带隙蓝移量则大于InGaAs、Si₃N₄复合盖层。同时,光调制反射谱的测试结果与光荧光测试的结果基本一致,因此,PR谱是用于测试带隙变化的另一种方法。     

New mechanism of surface polariton resonance at an isolated interface between transparent dielectric media (non-Tamm quasistationary surface polariton states)

A system of quantum dots on the basis of Al_xIn_1-xAs/Al_yGa_1-y As solid solutions has been studied. The usage of broadband Al_xIn_1-x solid solutions as the basis of quantum dots makes it possible to expand considerably the spectral emission range into the short-wave region, including the wavelength region near 770 nm being of interest for the design of aerospace systems of quantum cryptography. The optical characteristics of single Al_xIn_1-xAs quantum dots grown according to the Stranski–Krastanov mechanism are studied by the cryogenic microphotoluminescence method. The fine structure of exciton states of quantum dots is studied in the wavelength region near 770 nm. It is shown that the splitting of exciton states is comparable with the natural width of exciton lines, which is of great interest for the design of emitters of pairs of entangled photons on the basis of Al_xAs_1-x quantum dots.     

Recombination dynamics in strained In1-xGaxAs/InP-quantum well structures

We present a comprehensive study of the excitonic recombination lifetime in strained and unstrained In_1-xGa_xAs/InP-quantum well structures as a function of well width and Ga mole fraction. In the lattice-matched case a minimum lifetime of 650ps is observed for a well thickness of 2nm. For widths larger as well as smaller than 2nm the lifetime increases. In strained In_1-xGa_xAs/InP quantum wells the recombination lifetime shows a strong dependence on the Ga content. While the lifetime is nearly constant in the compressively strained case (x_Ga < 0.47), we observe a drastic increase with rising Ga content for tensile strain (x_Ga > 0.47).     

Peak response wavelengths of p- and n-type InxGa1-xAs-InP quantum well infrared photodetectors

p- and n-type In_xGa_1-xAs-InP quantum wells are suitable for multi-color infrared photodetector applications in atmospheric windows due to improved barrier quality and carrier-transport properties. We apply the k ·p method to study the energy band structures and optical transition properties, which show that the peak response wavelengths of p- and n-type In_xGa_1-xAs-InP quantum well infrared photodetectors (QWIPs) are determined not only by the energy distance from the ground sublevels in the quantum well to the energy band edges of extended states, but also by the characteristics of the extended states. The optical phonon scattering process converts the broad absorption spectrum of the p-QWIP from 0 to 16 m into a short-wavelength spectrum centered at 4.5 m. The transport of electrons in the extended states of the n-QWIP is characterized by running wave boundary conditions, resulting in a theoretically optimal absorption rate by a 8-nm-thick In_0.53Ga_0.47As quantum well. Moreover, a conduction-band offset of 0.5 for an In_xGa_1-xAs-InP (x=0.53) heterostructure gives the best data fitting of theoretical and experimental response peaks, whereas 0.55 is generally recommended in the literature. PACS 73.21.-b; 73.63.Hs; 78.67.-n     

InxGa1－xAs缓冲层上InyGa1－yAs/(Al)Ga

本文中,发现在In_xGa_1-xAs缓冲层上非故意掺杂的In_yGa_1-yAs/(Al)GaAs超晶格样品中存在着两个互相反向的自建电场区,一个位于样品表面,另一个位于In_xGa_1-xAs缓冲层和超晶格界面。据此,合理地解释了样品的光伏测试结果,并对此类样品的MOCVD生长工艺给予指导。     

高In组分InxGa1－xN/GaN多量子阱材料电致荧光谱的研究

研究了高In组分In_xGa_1-xN/GaN（x≈30%）多量子阱（MQWs）结构 发光二极管样品在不同注入电流下的电致荧光（EL）谱及反常的双峰现象.结果表明：有源区 内建电场在外界电流注入条件下逐渐受屏蔽，这一效应在高In组分In_xGa_{1 -x}N/GaN MQWs材料的发光复合机理中占有重要地位. 关键词： xGa_1-xN/GaN多量子阱')" href="#">In_xGa_1-xN/GaN多量子阱 电致荧光谱 内建电场     

六方相InGaN外延膜的显微Raman散射

用X射线衍射(XRD)技术和显微Raman散射方法对金属有机化学气相沉积(MOCVD)法生长的六方相In_xGa_1-xN薄膜样品进行了研究，观察到了相分离现象和LO声子-等离子耦合模(LPP⁺)，讨论了In_xGa_1-xN的A₁(LO)模被屏蔽的主要物理机制.同时，对Raman谱中E₂和A₁(TO)声子模进行了分析和讨论.在In_xGa_1-xN样品的低温Raman谱中还观察到单电子跃迁产生的Raman散射信号. 关键词： Raman散射 X射线衍射 相分离 应力 LO声子-等离子耦合     

Ultrafast carrier dynamics in strained In1−xGaxAs/InP heterostructures

The transfer of electrons and holes from barriers to wells is investigated in strained In_1-xGa_xAs/InP multiple quantum wells by time-resolved luminescence upconversion with 300 fs time resolution. The transfer times are in the range of a few ps and independent of the Ga content. The investigation of Ga-rich structures allows to observe directly the hole transfer.     

Optical gain of interdiffused GaInNAs/GaAs quantum wells

A self-consistent model for the band structure and optical gain spectra in interdiffused Ga_xIn_1-xN_0.04As_0.96/GaAs single quantum wells are studied theoretically using Fick’s Law and the Fermi Golden Rule. Due to quantum-well interdiffusion, the peak gain and its peak vary with the annealing time. Our results show that the interdiffusion technique can be used to tune the operation wavelength for multi-wavelength applications without degradation of device performance. Received: 18 April 2001 / Accepted: 19 September 2001 / Published online: 20 December 2001     

超晶格中GaAs/InGaAs界面与InGaAs/GaAs界面的特性差异

In_xGa_1-xAs缓冲层上生长In_yGa_1-yAs/GaAs超晶格（x＜y）．阱层处于压缩应变，垒层处于伸张应变，其厚度均小于Mathews-Blakeslee（M-B）平衡理论计算的临界厚度．透射电子显微镜及俄歇电子能谱、二级离子质谱测试发现，GaAs/In_yGa_1-yAs界面铟组分过渡区比In_yGa_1-yAs/GaAs界面铟组 关键词：     

Exciton states and interband optical transitions in wurtzite InGaN/GaN quantum dot nanowire heterostructures

Within the framework of the effective-mass approximation, the exciton states and interband optical transitions in In_xGa_1−xN/GaN strained quantum dot (QD) nanowire heterostructures are investigated using a variational method, in which the important built-in electric field (BEF) effects, dielectric-constant mismatch and three-dimensional confinement of the electron and hole in In_xGa_1−xN QDs are considered. We find that the strong BEF gives rise to an obvious reduction of the effective band gap of QDs and leads to a remarkable electron-hole spatial separation. The BEF, QD height and radius, and dielectric mismatch effects have a significant influence on exciton binding energy, electron interband optical transitions, and the exciton oscillator strength.